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Nonlinear-Ion-Acoustic-Wave Instability, Threshold, Half Width of Trapped Region and Transition Region 下载免费PDF全文
Nonlinear Landau damping of ion acoustic wave (IAW) is one of the most important phenomena in the ionosphere and in space and laboratory plasma as well. The instability growth rate of the IAW with electron drift, the amplitude threshold for exciting the nonlinear effects, the half widths of the trapped region with the trapped electrons are studied experimentally. Under the experimental conditions, it is shown that there is a frequency range of 140--160 kHz, within which the growth rate has the largest value of about 6×104--1.5×105 s-1. We obtain the transitional region width caused by collisions theoretically and experimentally, for the first time to our knowledge. The experimental results are in good agreement with the theoretical prediction. 相似文献
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A compact diode-end-pumped passively Q-switched Nd^3+ :GdVO4/C^r4+ :YAG self-Raman laser at 1176 nm is demonstrated. When the To = 80% Cr^4+:YAG saturable absorber is inserted into the cavity, the maximum Rtaman laser output reaches 175 mW with 3.8 W incident pump power. The optical conversion from incident to the Raman laser is 4.6% and the slope efficiency is 6.5%. The pulse energy, duration, and repetition frequency of the first stokes laser are 4.5μJ, 1.8 ns, and 38.5 kHz, respectively. There is strong blue emission (about 350- 400nm) can be observed in the Nd^3+ :GdVO4 crystal when the process of stimulated Raman scattering occurs, which is induced by the upconversion of the Nd^3+ ions. 相似文献
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We report a GaN metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT) with atomic layer deposited (ALD) Al2O3 gate dielectric. Based on the previous work [Appl. Phys. Lett. 86 (2005) 063501] of Ye et al. by decreasing the thickness of the gate oxide to 3.5nm and optimizing the device fabrication process, the device with maximum transconductance of 150mS/mm is produced and discussed in comparison with the result of lOOmS/mm of Ye et al. The corresponding drain current density in the 0.8-μm-gate-length MOS-HEMT is 800mA/mm at the gate bias of 3.0 V. The gate leakage is two orders of magnitude lower than that of the conventional A1GaN/GaN HEMT. The excellent characteristics of this novel MOS-HEMT device structure with ALD Al2O3 gate dielectric are presented. 相似文献
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