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81.
The results of an experimental verification of the activation concept of strength, first proposed by the author in 1952, are described. The theoretical conclusions are confirmed by tests on various vulcanizates, polystyrene, polymethyl methacrylate, cellophane, and polypropylene, New means of improving the strength of polymers are suggested.Mekhanika Polimerov, Vol. 4, No. 3, pp. 474–482, 1968  相似文献   
82.
The effect of bond strength on over-all tensile strength has been investigated in relation to two-layer materials consisting of cellophane film cut in the longitudinal and transverse directions and bonded with polyisobutylene. It is shown that there is a linear correlation between the bond strength and the combination hardening effect. The breaking stress of two-layer materials is higher than that of the individual films. A possible explanation of this effect is proposed.Mekhanika Polimerov, Vol. 3, No. 1, pp. 89–94, 1967  相似文献   
83.
The development of resistance to current antifungal therapeutics drives the search for new effective agents. The fact that several acetophenone-derived Mannich bases had shown remarkable antifungal activities in our previous studies led us to design and synthesize some acetophenone-derived Mannich bases, 1-8 and 2-acetylthiophene-derived Mannich base 9, 1-aryl-2-dimethylaminomethyl-2-propen-1-one hydrochloride, to evaluate their antifungal activities. The designed chemical structures have α,β-unsaturated ketone moieties, which are responsible for the bioactivities of the Mannich bases. The aryl part was C?H?(1); 4-CH?C?H? (2); 4-CH?OC?H? (3); 4-ClC?H? (4); 4-FC?H? (5); 4-BrC?H? (6); 4-HOC?H? (7); 4-NO?C?H? (8); and C?H?S(2-yl) (9). In this study the designed compounds were synthesized by the conventional heating method and also by the microwave irradiation method to compare these methods in terms of reaction times and yields to find an optimum synthetic method, which can be applied for the synthesis of Mannich bases in further studies. Since there are limited number of studies reporting the synthesis of Mannich bases by microwave irradiation, this study may also contribute to the general literature on Mannich bases. Compound 7 was reported for the first time. Antifungal activities of all compounds and synthesis of the compounds by microwave irradiation were also reported for the first time by this study. Fungi (15 species) were used for antifungal activity test. Amphotericin B was tested as an antifungal reference compound. In conclusion, compounds 1-6, and 9, which had more potent (2-16 times) antifungal activity than the reference compound amphotericin B against some fungi, can be model compounds for further studies to develop new antifungal agents. In addition, microwave irradiation can be considered to reduce reaction period, while the conventional method can still be considered to obtain compounds with higher reaction yields in the synthesis of new Mannich bases.  相似文献   
84.
The mechanism of the palladium-catalysed [3+2] intramolecular cycloaddition of alkylidenecyclopropanes to alkynes has been computationally explored at DFT level. The energies of the reaction intermediates and transition states for different possible pathways have been calculated in a model system that involves the use of PH3 as a ligand. The results obtained suggest that the most favourable reaction pathway involves the initial C--C oxidative addition of the cyclopropane to a Pd0 complex to give an alkylidenepalladacyclobutane, which isomerises to a methylenepalladacyclobutane intermediate. Subsequent cyclisation by alkyne carbometallation, followed by reductive elimination affords the final product. An alternative mechanism consisting of a palladaene-type rearrangement is less probable in terms of Gibbs energy, but cannot be fully discarded because it is competitive if one considers electronic energies. For substrates that present an ester group at the terminal position of the triple bond we have found an alternative, more favourable mechanistic route that explains why the [3+2] cycloaddition of these types of systems does not lead to the expected cycloadducts.  相似文献   
85.
We present a class of exact ground states of a three-dimensional periodic Anderson model at 3/4 filling. Hopping and hybridization of d and f electrons extend over the unit cell of a general Bravais lattice. Employing novel composite operators combined with 55 matching conditions the Hamiltonian is cast into positive semidefinite form. A product wave function in position space allows one to identify stability regions of an insulating and a conducting ground state. The metallic phase is a non-Fermi liquid with one dispersing and one flat band.  相似文献   
86.
Chemistry of Heterocyclic Compounds - The reaction of substituted 1,3-oxathiolanes with diazocarbonyl compounds in the presence of Cu(OTf)2 and Rh2(OAc)4 was studied. The reaction is accompanied by...  相似文献   
87.
88.
Many theoretical works discuss the magnetic properties of the strongly repulsive Hubbard model near half filling. Several authors suggest that the system which contains a few holes does not behave as a ferromagnet, unlike in the one-hole case described by Nagaoka's famous result. We discuss the finite temperature properties of finite lattices. Using an efficient Monte Carlo method magnetic and specific heat results are presented for a 10 by 10 lattice with two holes. Our results show that the magnetization increases with decreasing temperature for such a finite system.  相似文献   
89.
90.
In this work, a fluid model has been applied to study HBr/Ar capacitively coupled plasma discharges that are being used for anisotropic etching process. Based on time average reaction rates, the model identify the most dominant species in HBr/Ar plasma. Our simulation results show that the neutral species like H and Br, which are the key precursors in chemical etching, have bell shape distribution while ions like HBr+, Br+ and Ar+ which plays a dominant role in the physical etching, have double humped distribution and shows peaks near electrodes. The effect of HBr/Ar mixing ratios on densities of dominant species are analyzed. The addition of Ar to HBr plasma decreases H, Br and HBr+ densities slightly while increases Br+ and Ar+ densities. It was found that the dilution of HBr by Ar results in an increase in electron density and electron temperature, which results in more ionization and dissociation. The densities and hence the fluxes of the neutrals and positive ions for etching and subsequently chemical etching versus physical etching in HBr/Ar plasmas discharge can be controlled by tuning Ar concentration in the discharge and the desire etching can be achieved.  相似文献   
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