Dimensional variation in production of high-aspect-ratio micro-pillars array by micro powder injection molding

Micro powder injection molding (μPIM) is one of the potential processes for the mass production of metallic microstructures and micro components. Here, μPIM is the miniaturization of conventional PIM, which involves four processing steps: mixing, injection molding, debinding and sintering. This paper looks into the feasibility and effectiveness of μPIM as a key mass production process for the fabrication of metallic micro components. For it to be an effective re-production process, it is imperative to examine how well parts can be duplicated/fabricated from a master mold. In this work, the dimensional variation of high-aspect-ratio micro-pillars arrays, in particular the dimensional shrinkage, global warpage, and surface roughness at each stage of the μPIM process for a range of molding pressures, are quantified and compared in detail. The sensitivity of the dimensional variation of the microstructures to the packing pressure is reported. The mechanism behind the dimensional variation is analyzed. PACS 81.20.Ev; 81.20.Hy; 81.70.Fy; 07.60.Ly; 81.05.-t     

Effect of Al content on the properties of Cr1−xAlxC films prepared by RF reactive magnetron sputtering

Cr_1−xAl_xC films were deposited on high-speed steel by RF reactive magnetron sputtering. In this study, we aimed to identify the effect of the Al content on the properties of Cr_1−xAl_xC films. We found that Cr_1−xAl_xC films exhibited a fine columnar grain microstructure with some special characteristics, such as high hardness of Hv 1426, a low friction coefficient of 0.29, and a large contact angle of 90° for x = 0.18. Furthermore, an increase in Al content resulted in a decrease in film hardness and an increase in contact angle. Moreover, on annealing at 923 K, the mechanical properties of the films improved and a dense protective film of complex Cr₂O₃ and Al₂O₃ oxides was formed on the surface for better wear resistance, which will ultimately increase the lifetime of the high-speed steel substrate.     

KNSBN晶体猫式互抽动相位共轭光特性

在KNSBN：Ce晶体中，利用二波耦合作用，在单一光束无法获得相位共轭光的条件下，实现了“猫”式互抽运相位共轭光输出，获得较高的共轭光发射率，实验结果表明，晶体的二波耦合作用可以使晶体的自抽运相位共轭光的阈值光强降低。入射光的入射角范围增大，响应时间缩短。     

Mn替代对Dy2AlFe16-xMnx化合物的结构和磁性的影响

通过X射线衍射及磁测量手段研究了Dy2AlFe16-xMnx化合物的结构和磁性.研究结果表明Dy2AlFe16-xMnx化合物具有六角相的Th2Ni17型结构.对x=1,2的样品采用X射线热膨胀测定法在104-647K的温度范围内测量了其热膨胀性质,发现这些化合物在低温下存在热膨胀反常现象,在居里点附近出现负膨胀性质.对自发磁致伸缩的研究结果表明Dy2AlFe16-xMnx化合物中存在着较强的各向异性的自发磁致伸缩,随着Mn含量的增加,其低温下的自发体磁致伸缩减弱.磁测量结果表明Mn的替代导致Dy2AlFe16-xMnx化合物的居里温度及自发磁化强度急剧下降.     

乳液聚合阶段Ⅱ动力学研究的进展

本文简述了乳浓聚合动力学研究的进展,着重于澳大利亚Sydney大学Gilbert等在乳液聚合阶段Ⅱ动力学方面的研究概况。介绍了不同水溶性单体的小尺寸种子乳液体系的SmithEwart递推方程的求解方法及其解析解形式和乳液聚合动力学数据的处理。同时讨论了该研究的局限性。     

基于LiCo0.8M0.2O2 (M=Ni,Zr)薄膜的全固态薄膜锂电池

用射频磁控溅射结合传统退火的方法制备LiCo0.8M0.2O2 (M=Ni,Zr)阴极薄膜．X射线衍射、拉曼光谱、扫描电子显微镜等手段表征了不同掺杂的LiCo0.8M0.2O2薄膜．结果显示,700℃退火的LiCo0.8M0．2O2薄膜具有类似α-NaFeO2的层状结构．通过对不同掺杂锂钴氧阴极的全固态薄膜锂电池Li／LiPON／LiCo0.8M0.2O2的电化学性能研究表明,电化学活性元素Ni的掺杂使全固态电池具有更大的放电容量(56μAh／cm2μm),而非电化学活性元素Zr的掺杂使全固态电池具有更好的循环稳定性．     

场源基本微元的对称性与场的性质

直接由标量基本微元（点源）和矢量基本微元（电流元等）的对称性和两个基本假设讨论基本微元产生的场矢量的性质。     

Ab Initio Study on the Isomerization and Dehydrogenation of Methylnitrene

The ab initio calculations were performed at the RHF/4-31G level with the reaction pathways of the iso-merization and dehydrogenation of methylnitrene by the intrinsic reaction coordinate method. The results show that the transformation from methylnitrene to methylenimine would be very easy. This accountes for the experimental fact that one couldn' t find the methylnitrene, but only obtained the methylenimine in the pyrolysis of methyl azide. The mode-selective study reveals the reaction coordinates (IRC) of isomerization and dehydrogenation of methylnitrene are associated with the molecular deformation mode of 1191 cm-1 and the methyl group unsymmetrical stretch mode, respectively. The coupling between normal coordinates is favourable to select the reaction channel of isomerization.     

位移和速度反馈的数学模型及实现方法

本文提出了位移和速度同时反馈的数学模型 .并给出了位移和速度反馈的实现方法 ,该方法用传统的差动变压器实现了位移和速度的同时反馈     

Surface free energy of CrNx films deposited using closed field unbalanced magnetron sputtering

CrN_x thin films have attracted much attention for semiconductor IC packaging molding dies and forming tools due to their excellent hardness, thermal stability and non-sticking properties (low surface free energy). However, few data has been published on the surface free energy (SFE) of CrN_x films at temperatures in the range 20-170 °C. In this study CrN_x thin films with CrN, Cr(N), Cr₂N (and mixture of these phases) were prepared using closed field unbalanced magnetron sputtering at a wide range of Cr⁺² emission intensity. The contact angles of water, di-iodomethane and ethylene glycol on the coated surfaces were measured at temperatures in the range 20-170 °C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the CrN_x films and their components (e.g., dispersion, polar) were calculated using the Owens-Wendt geometric mean approach. The influences of CrN_x film surface roughness and microstructure on the surface free energy were investigated by atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. The experimental results showed that the lowest total SFE was obtained corresponding to CrN at temperature in 20 °C. This is lower than that of Cr(N), Cr₂N (and mixture of these phases). The total SFE, dispersive SFE and polar SFE of CrN_x films decreased with increasing surface temperature. The film roughness has an obvious effect on the SFE and there is tendency for the SFE to increase with increasing film surface roughness.