蛋白质空间结构的实验技术和理论方法

文章主要介绍几种蛋白质空间结构的实验测定方法，在现代生物学研究中，最常用的方法包括X射线晶体学、二维核磁共振（2D-NMR）和低温冷冻电镜，近几年发展起来的单分子技术在生物大分子动态结构的研究中应用越来越多，这些方法都有它们特定的时间和空间分辨率，所测定的结构及其动力学受环境热运动涨落的影响也非常不同，文章对这些问题作了较详细的分析，在蛋白质结构的理论方法方面，介绍了一个新的折叠理论及其与现有折叠模型的关系．讨论了模拟计算在研究蛋白质构象变化和动力学方面的应用，同时强调了分子动力学和蒙特卡罗方法．指出粗粒化模型是研究的热点之一，对生物学中经常遇到的多长度多时问尺度问题提供了一个可行的解决方案。     

调谐半导体激光吸收光谱自平衡检测方法研究

可调谐半导体激光吸收光谱技术(TDLAS)是利用半导体激光器的波长调谐特性,扫描待测气体特征吸收线,从而获得待测气体的浓度信息。基于可调谐半导体激光吸收光谱的自平衡检测方法能够有效地消除激光器光强波动等共模噪声和其他同性干扰的影响。实验表明自平衡检测方法可以获得较理想的结果,检测限低于体积比1.2×10-6,与直接吸收光谱法相比降低了一个数量级。自平衡检测电路简单,自带的电子增益补偿机制能够自动进行平衡探测,该方法不用加信号调制和锁相放大器,直接探测待测气体的吸收光谱,从而降低成本,减小系统装置体积,易于集成为便携式痕量气体检测仪。     

Marginal Distributions of Wigner Function in a Mesoscopic L-C Circuit at Finite Temperature and Thermal Wigner Operator

Wigner function in phase space has its physical meaning as marginal probability distribution in coordinate space and momentum space respectively, here we endow the Wigner function with a new physical meaning, i.e., its marginal distributions’ statistical average for q ²/(2C) and p ²/(2L) are the energy stored in capacity and in inductance of a mesoscopic L-C circuit at finite temperature, respectively. PACS numbers: 03.65.-w, 73.21.-b     

[5‐(p‐alkoxy)phenyl‐10, 15, 20‐tri‐phenyl] porphyrin and their rare earth complex liquid crystalline

Three series of porphyrin liquid crystalline compounds, [5‐(p‐alkoxy)phenyl‐10, 15, 20‐tri‐phenyl] porphyrin and their rare earth complexes (Tb (III), Dy (III), Er (III), Yb (III)), with a hexagonal columnar discotic columnar(Col_h) phase have been synthesized. These compounds were characterized by elemental analysis, molar conductances, UV‐visible spectra, infrared spectra, luminescence spectra, and cyclic voltammetry. These compounds exhibit more than one mesophases, which transition points of temperature change from ?33.6 to 16.0 °C, and transition points of temperature for isotropic liquid also increase from 4.9 to 38.2 °C, with increasing chain length. Their surface photovoltage (SPV) response have also been investigated by the means of surface photovoltage spectroscopy (SPS) and field‐induced surface photovoltage spectroscopy (EFISPS). It was found that their SPV bands are analogous with the UV‐visible absorption spectra and derived from the same transition. Copyright © 2007 John Wiley & Sons, Ltd.     

Spin asymmetry and s-electron itinerancy in Co/X (X=Co,Cu, V and Ta) multilayers: their dependence on the electronegativity of non-magnetic layers

The electronic structure and magnetic properties of the Co at the Co/X (X=Co, Cu, V and Ta) interfaces have been studied by first-principle discrete variational method. We have found that the spin asymmetry and the s-electron itinerancy of the Co interface layer in the Co/X systems are strongly dependent on the electronegativity of the non-magnetic layers. A large difference in the electronegativity between the non-magnetic and Co layers is unfavorable both for s-electron itinerancy and for the spin exchange split of DOS at the Fermi level. Further study on charge density has revealed that a bond is formed across the Co/V and Co/Ta interfaces.     

Hollow glass microspheres coated with CoFe2O4 and its microwave absorption property

Spinel CoFe₂O₄ coating on the surface of hollow glass microspheres of low density was synthesized by co-precipitation method. The phase structures, morphologies, particle size, shell thickness, chemical compositions of the composites have been characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and energy dispersive X-ray spectroscopy (EDS). The results show that CoFe₂O₄ coating on hollow glass microspheres can be achieved, and the coating layers are constituted by CoFe₂O₄ nanoparticles of mean size ca. 10 nm. The as-synthesized powder materials were uniformly dispersed into the phenolic cement, then the mixture was pasted on metal plate with the area of 200 mm×200 mm as the test plate. The test of microwave absorption was carried out by the radar-absorbing materials (RAM) reflectivity far field radar cross-section (RCS) method. The results indicate that the coated CoFe₂O₄/hollow glass microspheres composites can be applied in lightweight and strong absorption microwave absorbers.     

Synthesis and electrochemical characteristics of Ta-N thin films fabricated by cathodic arc deposition

Ta-N thin films were deposited on AISI 317L stainless steel (SS) substrates by cathodic arc deposition (CAD) at substrate biases of −50 and −200 V. The as-deposited films were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray analysis (EDX). The results show that stoichiometric TaN with hexagonal lattice (3 0 0) preferred orientation was achieved at the bias of −200 V. On the other hand, Ta-rich Ta-N thin film deposited at −50 V shows amorphous nature. According to the XPS result, Ta element in the films surface exist in bonded state, including the Ta-N bonds characterized by the doublet (Ta 4f_7/2 = 23.7 eV and Ta 4f_5/2 = 25.7 eV). Electrochemical properties of the Ta-N coated stainless steel systems were investigated using potentiodynamic polarization and electrochemical impedance spectroscope (EIS) in Hank's solution at 37 °C. For the Ta-N coated samples, the corrosion current (i_corr) is two or three orders of magnitude lower than that of the uncoated ones, indicating a significantly improved corrosion resistance. Growth defects in the Ta-N thin films produced by CAD, however, play a key role in the corrosion process, especially the localised corrosion. Using the polarization fitting and the EIS modelling, we compared the polarization resistance (R_p) and the porosity (P) of the Ta-N coatings deposited at different biases. It seems that Ta-N film with comparatively lower bias (−50 V) shows better corrosion behavior in artifical physiological solution. That may be attributed to the effect of ion bombarding, which can be modulated by the substrate bias.     

Ionization effect to plasma expansion study during nanosecond pulsed laser deposition

The dynamic characteristic and effects of plasma play an important role in film growth process of pulsed laser deposition (PLD). Based on numerical hydrodynamic modeling, supposed the laser radiation and partial ionization of the plasma as a dynamic source, we deduce a set of new plasma expansion dynamics equations. Based on which, as an example of carbon target, using finite difference method, the plasma flow dynamics evolvement in vacuum is investigated. Our results show the dynamic partial ionization increases the expansion in all directions, which changes into a new dynamic source for plasma expansion. In the axial direction, because of the collisional interactions between particles, the plume density peak is in the vicinity of the target surface and the acceleration of plasma occurs mainly near the target surface too. In the transverse direction, the plume peak is not near the target, but at the surface. The space expansion distance is far less than the axial direction because there is no high initial velocity component in this direction. The predictions of the plasma expansion action based on the proposed dynamics source assumption are found to be in agreement with the experimental observation.     

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)⁹H design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al₂O₃ between the initial design and an optimized HfO₂ top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8° for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2° for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation.