Fabrication of Supramolecular Semiconductor Block Copolymers by Ring‐Opening Metathesis Polymerization

ω‐Telechelic poly(p‐phenylene vinylene) species (PPVs) are prepared by living ring‐opening metathesis polymerization of a [2.2]paracyclophane‐1,9‐diene in the presence of Hoveyda–Grubbs 2nd generation initiator, with terminating agents based on N¹,N³‐bis(6‐butyramidopyridin‐2‐yl)‐5‐hydroxyisophthalamide (Hamilton wedge), cyanuric acid, Pd^II–SCS‐pincer, or pyridine moieties installing the supramolecular motifs. The resultant telechelic polymers are self‐assembled into supramolecular block copolymers (BCPs) via metal coordination or hydrogen bonding and analyzed by ¹H NMR spectroscopy. The optical properties are examined, whereby individual PPVs exhibit similar properties regardless of the nature of the end group. Upon self‐assembly, different behaviors emerge: the hydrogen‐bonding BCP behaves similarly to the parent PPVs whereas the metallosupramolecular BCP demonstrates a hypsochromic shift and a more intense emission owing to the suppression of aggregation. These results demonstrate that directional self‐assembly can be a facile method to construct BCPs with semiconducting networks, while combating solubility and aggregation.     

Design and Synthesis of a New Family of Fluorinated Liquid Crystals

A convenient and simple three‐step pathway to the new family of CF₂CF₂S‐bridged alkanes and CF₂S‐, CF₂O‐bridged alkenes and alkynes was elaborated by using catalytic olefination reaction as a key step of the synthetic sequence. The obtained compounds revealed attractive liquid crystalline characteristics.     

Template–polymer commensurability and directed self‐assembly block copolymer lithography

Block copolymer directed self‐assembly (BCP) with chemical epitaxy is a promising lithographic solution for patterning features with critical dimensions under 20 nm. In this work, we study the extent to which lamellae‐forming poly(styrene‐b‐methyl methacrylate) can be directed with chemical contrast patterns when the pitch of the block copolymer is slightly compressed or stretched compared to the equilibrium pitch observed in unpatterned films. Critical dimension small angle X‐ray scattering complemented with SEM analysis was used to quantify the shape and roughness of the line/space features. It was found that the BCP was more lenient to pitch compression than to pitch stretching, tolerating at least 4.9% pitch compression, but only 2.5% pitch stretching before disrupting into dislocation or disclination defects. The more tolerant range of pitch compression is explained by considering the change in free energy with template mismatch, which suggests a larger penalty for pitch stretching than compressing. Additionally, the effect of width mismatch between chemical contrast pattern and BCP is considered for two different pattern transfer techniques. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 595–603