Kinetics of the thermal decomposition of bis(trifluoromethyl) peroxydicarbonate,CF3OC(O)OOC(O)OCF3

Thermal decomposition of bis(trifluoromethyl) peroxydicarbonate has been studied. The mechanism of decomposition is a simple bond fission, homogeneous first‐order process when the reaction is carried out in the presence of inert gases such as N₂ or CO. An activation energy of 28.5 kcal mol^?1 was determined for the temperature range of 50–90°C. Decomposition is accelerated by nitric oxide because of a chemical attack on the peroxide forming substances different from those formed with N₂ or CO. An interpretation on the influence of the substituents in different peroxides on the O? O bond is given. © 2002 Wiley Periodicals, Inc. Int J Chem Kinet 35: 15–19, 2003     

Recyclization of Products Formed by Addition of 5-Hydrazino-2-phenyl-1,3-oxazoles Functionally Substituted in 4-Position to Aryl Isothiocyanates

Russian Journal of General Chemistry -     

Elastoplastic torsion theory for whisker crystals

Translated from Zhurnal Prikladnoi Mekhaniki i Tekhnicheskoi Fiziki, No. 2, pp. 127–134, March–April, 1991.     

Reaction Medium and Kinetics of N-Vinylsuccinimide Copolymerization

Studies in the field of radical copolymerization of N-vinylsuccinimide were summarized, theeffect of the reaction medium on the process kinetics was examined. Factors governing the relative activity ofthe monomers were revealed, and ways to control the reactivity of N-vinylsuccinimide in binary copolymerizations were suggested.     

Recovery of Butadiene-Styrene Rubber from Latex at Low Temperature with Various Coagulants

The influence of the charge of a metal cation and the nature of a coagulant on the recovery of butadiene-styrene rubber and properties of rubber stocks and vulcanizates was examined.     

Reduction of nonholonomic variation problems to isoperimetric ones and connections in principal bundles

Translated from Matematicheskie Zametki, Vol. 49, No. 5, pp. 37–44, May, 1991.     

Interference inspection of the aspherical components of an objective for nanolithography

Methods and schemes to inspect the EUV mirror shape are developed on the basis of a point diffraction interferometer with computer processing of interferograms. A measurement accuracy to within 0.001 of a wavelength in the visual range is achieved.