Interfacial structure and electrical properties of LaAlO3 gate dielectric films on Si by metalorganic chemical vapor deposition

LaAlO₃ (LAO) gate dielectric films were deposited on Si substrates by low-pressure metalorganic chemical vapor deposition. The interfacial structure and composition distribution were investigated by high-resolution transmission electron microscopy (HRTEM), X-ray photoelectron spectroscopy (XPS), secondary-ion mass spectroscopy (SIMS), and Auger-electron spectroscopy (AES). HRTEM confirms that there exists an interfacial layer between LAO and Si in most samples. AES, SIMS, and XPS analyses indicate that the interfacial layer is compositionally graded La–Al silicate and the Al element is severely deficient close to the Si surface. Electrical properties of LAO films were evaluated. No evident difference in electrical properties between samples with and without native SiO₂ layers was observed. The electrical properties are discussed in terms of LAO growth mechanisms, in relation to the interfacial structure. PACS 73.40.Qv; 81.15.Gh; 77.55.+f; 68.35.-p     

关于多线性振荡奇异积分在加权Hardy-型空间上的一致估计

本文对一类具有光滑位相函数的多线性振荡奇异积分算子建立了一致的加权（H^1(R^n),L^1(R^n))估计及一致的加权（HKp(R^n),Kp(R^n)估计。     

代数体函数的定理

本文定义并研究了代数体函数的加法．结合杨乐的方法,将仪洪勋联系重值的亚纯函数唯一性定理推广到多值的代数体函数．     

Effect of C layer on the structures and magnetic properties of (0 0 1)-oriented [C/CoPt]n/Ag films

CoPt/Ag and [C/CoPt]n/Ag thin films have been prepared onto the glass substrates by magnetron sputtering. We investigated the evolution of texture and magnetic properties of CoPt/Ag and [C/CoPt]n/Ag films. The results show that C-doping plays an important role in improving (0 0 1) texture, improving the order parameter S, reducing the intergrain interactions, and making the magnetization reversal mechanism more close to Stoner-Wolfarth rotational mechanism. The growth mechanism of (0 0 1) texture also seems to be related strongly to the films thickness. Our results show that the highly (0 0 1)-oriented films with ordered fct phase have a significant potential for the perpendicular media of extremely high-density recording.     

中物院远红外自由电子激光实验研究

中国工程物理研究院基于射频直线加速器技术的远红外自由电子激光(FIR-FEL)实验取得阶段性进展,于2005年3月24晚8时30分首次出光, 并多次重复. 中心波长115μm, 谱宽1%.介绍了实验系统的主要组成部分和主要实验结果.     

天光一号预放大器中的放大自发辐射效应

 在三维放大自发辐射（ASE）的模拟计算中，计入了侧壁反射效应以及KrF自发辐射的谱线形状（高斯型、洛伦兹型及平顶型）的影响，并对空间网点的影响进行了考察。经过综合分析，给出了ASE对预放大器放大特性影响的上、下限范围。当计入平顶型频谱分布，壁反射系数为 0 .2时，与不计入ASE的情形对比，天光一号预放大器的提取效率下降为35%。     

Investigation of laminar plasma remelting/cladding processing

Investigation of remelting and cladding processing with laminar plasma jets on several metals has been conducted looking for possible development of a new surface modification technique. The remelting tests illustrated that the new method could evidently improve the material microstructure and properties of cast iron. The cladding was done with Al₂O₃ ceramic powder on stainless steel. The energy dispersive spectra (EDS) analysis was used to determine the distribution of the major cladding element in the plasma-processed layers, for which the microstructure observations and hardness measurements were also performed.     

无K1,r图中的哈密顿圈（英文）

本文借助对图的本质独立集和图的部分平方图的独立集的研究，对于K1,r图中哈密顿圈的存在性给出了八个充分条件。我们将利用T－插点技术对这八个充分条件给出统一的证明，本文的结果从本质上改进了C－Q.Zhang于1988年利用次形条件给出的k-连通无爪图是哈密顿图的次型充分条件，同时。G.Chen和R.H.Schelp在1995年利用次型条件给出的关于k-连通无K1，4图是哈密顿图的充分条件也被我们的结果改进并推广到无K1,r图。     

Sn-C60薄膜的紫外吸收光谱和X-射线衍射谱分析

对Sn-C60薄膜进行紫外可见光吸收，X-射线衍射和扫描电镜的测定结果显示，薄膜样品紫外可见光吸收的两个短波段吸收峰比纯C60薄膜的吸收峰显著下降，说明Sn-C60薄膜的电子光吸收跃迁为间接跃迁，能带中有杂质能级的存在；样品的X射线衍射峰则对应于面心立方结构；扫描电镜结果显示薄膜为纳米级颗粒组成。     

Effect of the Electron-LO-Phonon Coupling on an Exciton Quantum Dot

The influence of the electron-LO-phonon coupling on energy spectrum of the low-lying states ofan exciton inparabolic quantum dots is investigated as a function of dot size. Calculations are made by using the method of few-bodyphysics within the effective-mass approximation. A considerable decrease of the energy in the stronger confinement rangeis found for the low-lying states of an exciton in quantum dots, which results from the confinement of electron-phononcoupling.