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Abstract The coordination chemistry of the ligand N-thiazol-2-yl-toluenesulfonamidate towards the copper(II) ion has been investigated using an electrochemical synthesis method. The X-ray structure of this complex was elucidated and is discussed. The compound crystallised in the monoclinic crystal system, P21/c space group with a = 17.3888(9), b = 16.3003(9), c = 18.3679(9) ? and β = 114.3640(10)°. Four bidentate sulfathiazolato anions bridge two metal centers in a paddle-wheel fashion, with the nitrogen atoms as donors to give a dimeric species with a Cu···Cu distance of 2.7859(5) ?. Graphical Abstract The coordination chemistry of the ligand N-thiazol-2-yl-toluenesulfonamidate towards the copper(II) ion has been investigated using an electrochemical synthesis method. The X-ray structure of the product has been elucidated and is discussed. Sulfathiazolato anions act as bridging ligands to give a dimeric species with a Cu···Cu distance of 2.7859(5) ?.   相似文献   
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Journal of Radioanalytical and Nuclear Chemistry - Haloperidol (HP) is a dopamine blocking agent. HP was radiolabeled with 125I using direct electrophilic substitution. Different HP formulations...  相似文献   
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N-doped ZnO films were deposited by RF magnetron sputtering in N2/Ar gas mixture and were post-annealed at different temperatures (Ta) ranging from 400 to 800 °C in O2 gas at atmospheric pressure. The as-deposited and post-annealed films were characterized by their structural (XRD), compositional (SIMS, XPS), optical (UV-vis-NIR spectrometry), electrical (Hall measurements), and optoelectronic properties (PL spectra). The XRD results authenticate the improvement of crystallinity following post-annealing. The weak intensity of the (0 0 2) reflection obtained for the as-deposited N-doped ZnO films was increased with the increasing Ta to become the preferred orientation at higher Ta (800 °C). The amount of N-concentration and the chemical states of N element in ZnO films were changed with the Ta, especially above 400 °C. The average visible transmittance (400-800 nm) of the as-deposited films (26%) was increased with the increasing Ta to reach a maximum of 75% at 600 °C but then decreased. In the PL spectra, A0X emission at 3.321 eV was observed for Ta = 400 °C besides the main D0X emission. The intensity of the A0X emission was decreased with the increasing Ta whereas D0X emission became sharper and more optical emission centers were observed when Ta is increased above 400 °C.  相似文献   
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We have studied the effect of roughness on the exchanged biased NiFe/FeMn/NiFe trilayers system. The samples were prepared under three different argon working pressures (2, 5 and 10 mTorr) to obtain different roughness degrees. The root mean square roughness of the NiFe/FeMn interfaces enhances as the argon working pressure during the deposition increases from 2 to 10 mTorr. High-angle X-ray diffraction reveals that the samples have 1 1 1 texture and besides, possible changes in grain size could be an extra contribution to the interfacial roughness. Magnetometry measurements have shown that the coervive field enhances as the root mean square roughness of the NiFe/FeMn interfaces increases, while the dependence of the exchange bias field runs in the opposite way.  相似文献   
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