Disintegration of 1-silalactones under the influence of electron impact

It is shown that the paths of fragmentation of 1-silalactones under the influence of electron impact are determined by the ring size and remain virtually unchanged when the methyl groups attached to the silicon atom are replaced by a chlorine atom or an ethyl group. The possibility of the identification of isomeric silalactones on the basis of their mass spectra was established.     

Polynuclear Heteroligand Yb(III)–Er(III) Complexes as Potential Upconversion Materials

Russian Journal of Coordination Chemistry - The synthesis of complexes LnI(C6F5O)2 and LnCp(L)2 (Ln = Er, Yb; L = C6F5O, SONF), which are convenient precursors for the preparation of heteroligand...     

Increasing adhesion of metallic films to silicon by ion bombardment during growth

Intense ion bombardment at the initial stage of film growth is used to increase the adhesion of nickel and vanadium films to silicon. The films are deposited by rf magnetron sputtering when a bias potential is applied to a substrate. The adhesion of metallic films to silicon is substantially increased due to active mixing of the contacting materials and the formation of a transition layer with a concentration gradient. A correlation between the adhesion of the films and their crystalline state is revealed.     

Effect of technological factors on the micromagnetic states of magnetic nanostructures

The results from experimental and theoretical studies of the effect of technological factors on the micromagnetic states of multilayer magnetoresistive structures are presented. Spin-valve structures are deposited via magnetron sputtering. The resulting experimental samples were characterized using Kerr effect microscopy. A theoretical analysis of the effect of technological imperfections on hysteresis loop of such structures is performed by means of micromagnetic modeling.     

Emission of Ag2 dimers from a substrate during vacuum deposition of the mixture of silver and water vapor

The work presents calculation of Ag₂ dimers emission from the substrate into the vapor medium in case of joint deposition of silver and water vapors on ideal substrate formally modeling the crystal of water ice in terms of energy properties. It is assumed that the dimers are formed on the condensation surface as a result of random collisions of atoms at their surface migration, and the dimers emission is conditioned by thermal fluctuations of crystal lattice of water ice. The calculations based on the modified Langmuir adsorption model allowed concluding that emission of silver and water dimers takes place in the entire range of the studied water vapor pressure, binding energy of silver-water, and crystal temperature. Dynamics of emission from the beginning of deposition and dependence of dimers emission on micro-roughness of the condensate surface have been investigated. Statistical processing of results has shown that the probability of dimers emission from the condensate surface is determined not only by the value of the binding energy between the dimer and condensate but by configuration of the nearest dimer environment on the condensation surface. It has been found that there is a certain value of micro-roughness of condensation surface providing the maximal intensity of dimer emission. Dimers emission from the surfaces bordering on the flows of vapor mixtures contaminates the flows with unsuspected admixtures. The latter one makes investigation of this phenomenon important for aeromechanics of vapor and gas mixtures.