Structural,compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

The hydrogenated amorphous carbon nitride (a‐CN_x:H) thin films were synthesized on the SS‐304 substrates using a dense plasma focus device. The a‐CN_x:H thin films were synthesized using CH₄/N₂ admixture gas and 20 focus deposition shots on substrates placed at different distances from the anode top. X‐ray photoelectron spectroscopy and Raman analysis confirmed different C–N bonding in the a‐CN_x:H thin films. A decrease in the N/C ratio as well as the sp³/sp² ratio with an increase in the substrate distance has been observed. The higher amount of C–N formation for the film synthesized at 10 cm is observed which decreases with increasing distance. The X‐ray photoelectron spectroscopy and Raman analysis affirmed the C ≡ N presence in all the thin films synthesized at different distances. The morphology of the synthesized a‐CN_x:H thin films showed nanoparticles and nanoparticle clusters formation at the surface. The hardness results showed comparatively lower hardness of the a‐CN_x:H thin films due to the presence of C ≡ N. The C–N formation with lower amount of C ≡ N and a higher N/C ratio as well as a higher sp³/sp² ratio for the films synthesized at 10 cm show reasonably higher hardness. Copyright © 2016 John Wiley & Sons, Ltd.     

Effect of surface morphology on measurement and interpretation of boundary slip on superhydrophobic surfaces

Highly liquid repellent surfaces have been obtained by the combination of roughness and hydrophobicity. Studies have reported that the flow over such surfaces exhibits larger boundary slip as compared to the smooth hydrophobic surfaces. However, the surface roughness can also lead to apparent slip. Thus, the effect of the two factors, that is, wettability and roughness, needs to be segregated. In this study, we have measured the slippage of water on rough hydrophilic and hydrophobic surfaces using colloidal probe atomic force microscopy technique (CP‐AFM). Results showed that the effect of surface roughness on the measured slip is dominant over that of wettability. It was also found that slip on surfaces with sparsely distributed asperities is highly local and measurements on various locations give dissimilar results. The results suggested that the main reason of the larger slip, on rough hydrophobic surfaces, is likely to be the roughness and not the hydrophobicity. Moreover, it was also found that the slip does not vary considerably with the increase or decrease in the shear rate. Most likely, this kind of slip phenomena is caused by the apparent decrease of the drag force, because the nanoasperities on the surface restrict the probe from reaching the surface properly. Copyright © 2016 John Wiley & Sons, Ltd.     

Structural,morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10?cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10?cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4?±?0.4?GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10?cm axial distance with 15 PFS.     

Effect of ion velocity on SHI-induced mixing in Ti/Bi system

Energetic ion beams are proving to be versatile tools for modification and depth profiling of materials. The energy and ion species are the deciding factor in the ion-beam-induced materials modification. Among the various parameters such as electronic energy loss, fluence and heat of mixing, velocity of the ions used for irradiation plays an important role in mixing at the interface. The present study is carried out to find the effect of the velocity of swift heavy ions on interface mixing of a Ti/Bi bilayer system. Ti/Bi/C was deposited on Si substrate at room temperature by an electron gun in a high-vacuum deposition system. Carbon layer is deposited on top to avoid oxidation of the samples. Eighty mega electron volts Au ions and 100?MeV Ag ions with same value of S_e for Ti are used for the irradiation of samples at the fluences 1?×?10¹³–1?×?10¹⁴ ions/cm². Different techniques like Rutherford backscattering spectroscopy, atomic force microscopy and grazing incidence X-ray diffraction were used to characterize the pristine and irradiated samples. The mixing effect is explained in the framework of the thermal spike model. It has been found that the mixing rate is higher for low-velocity Au ions in comparison to high-velocity Ag ions. The result could be explained as due to less energy deposition in thermal spike by high-velocity ions.     

An approximate analytic solution of the Blasius problem

The [4/3] Pade approximant for the derivative is modified so that the resulting expression has the required asymptotic behavior. This gives an analytical result which represents the solution of the classical Blasius problem on the whole domain.