排序方式: 共有113条查询结果,搜索用时 15 毫秒
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应用缓冲层对自组装结构的作用能Er和自组装结构表面能E8 的协同作用分析了InP自组装结构在GaxIn1-xP缓冲层表面的形貌变化.计算发现缓冲层组分影响自组装结构的形貌.随着缓冲层与InP自组装结构之间应力的增加,InP岛倾向于拉长.理论计算还发现随着自组装结构体积的增大,自组装结构也随之拉长.而且缓冲层的参数决定了自组装结构最小能量状态时的体积大小.应用金属有机物化学气相沉积技术在GaAs衬底上生长了不同的InP/GaInP体系,并对实验得到的自组装体系形貌进行了分析.实验结果证实了以上的理论分析. 相似文献
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在MOCVD质量控制生长模式下 ,通过分析Ⅲ -V族化合物半导体材料在衬底表面的反应过程 ,建立了一个实用的生长模型。此模型是基于分子动力学、化学反应热力学理论分析之上的。针对Turbo -Disc反应体系 ,分析了Turbo -Disc的传热以及质量传送模式后 ,建立了Turbo -Disc的生长模型。在此模型中建立了输入反应室的参数 (IPs)和边界层的生长参数的关系。在对组分匹配的GaInP/GaAs三组分生长体系进行分析时 ,发现此模型是非常有效的 ,理论计算的结果与实验得到的结果非常吻合。应用此模型在实际生产中可以迅速地得到匹配的多组分外延层。 相似文献
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Improved light extraction of GaN-based light-emitting diodes with surface-textured indium tin oxide electrodes by nickel nanoparticle mask dry-etching 下载免费PDF全文
GaN-based light-emitting diodes (LEDs) with surface-textured indium tin oxide (ITO) as a transparent current spreading layer were fabricated.The ITO surface was textured by inductively coupled plasma (ICP) etching technology using a monolayer of nickel (Ni) nanoparticles as the etching mask.The luminance intensity of ITO surface-textured GaN-based LEDs was enhanced by about 34% compared to that of conventional LED without textured ITO layer.In addition,the fabricated ITO surface-textured GaN-based LEDs would present a quite good performance in electrical characteristics.The results indicate that the scattering of photons emitted in the active layer was greatly enhanced via the textured ITO surface,and the ITO surface-textured technique could have a potential application in improving photoelectric characteristics for manufacturing GaN-based LEDs of higher brightness. 相似文献
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Efficiency enhancement of an InGaN light-emitting diode with a p-AIGaN/GaN superlattice last quantum barrier 下载免费PDF全文
In this study, the efficiency droop of an InGaN light-emitting diode (LED) is reduced slgnlncanUy oy using a p-AlGaN/GaN superlattice last quantum barrier. The reduction in efficiency droop is mainly caused by the decrease of electron current leakage and the increase of hole injection efficiency, which is revealed by investigating the light currents, internal quantum efficiencies, energy band diagrams, carrier concentrations, carrier current densities, and radiative recombination efficiencies of three LED structures with the advanced physical model of semiconductor device (APSYS). 相似文献
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利用传输矩阵方法对纤锌矿型量子级联激光器有源区的界面与受限声子进行了研究.计算结果显示:在纵光学频域有一组界面声子与二组受限声子存在,而且最低频率的两个界面声子在一定条件下能转变为受限模式.通过比较界面声子与受限声子的色散及声子势发现两者有很大不同,且计算电声散射速率可以发现由这两种声子引起的散射率是可比拟的. 相似文献
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Comparison of nitride-based dual-wavelength lightemitting diodes with an InAIN electron-blocking layer and with p-type doped barriers 下载免费PDF全文
The advantages of nitride-based dual-wavelength light-emitting diodes (LEDs) with an InA1N electron blocking layer (EBL) are studied. The emission spectra, carrier concentration in the quantum wells (QWs), energy band and internal quantum efficiency (IQE) are investigated. The simulation results indicate that an LED with an InA1N EBL performs better over a conventional LED with an A1GaN EBL and an LED with p-type-doped QW barriers. All of the advantages are due to the enhancement of carrier confinement and the lower electron leakage current. The simulation results also show that the efficiency droop is markedly improved and the luminous intensity is greatly enhanced when an InAlN EBL is used. 相似文献
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Si掺杂对AlGaInP/GaInP多量子阱性能的影响 总被引:1,自引:1,他引:0
采用LP-MOCVD技术在n-GaAs衬底上生长了AlGaInP/GaInP多量子阱红光LED外延片。以X射线双晶衍射技术和光致发光技术对外延片进行了表征,研究了Si掺杂对AlGaInP/GaInP多量子阱性能的影响。研究表明:掺Si能大大提高(Al0.3Ga0.7)0.5In0.5P/Ga0.5In0.5P多量子阱的发光强度。相对于未故意掺杂的样品,多量子阱垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍。外延片的X射线双晶衍射测试表明,Si掺杂并没有使多量子阱的界面质量变差。 相似文献
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