电子辐照掺锂硅中深能级

用深能级瞬态谱法,从与锂有关的缺陷的产生和锂对电照缺陷的退火的影响两个侧面,研究了不同合氧量硅中锂和电照缺陷的相互作用。指出了氧能抑制锂和电照缺陷的相互作用,只有当锂浓度不是远小于氧浓度时,锂才能有作用。E(0.17),E(0.21),E(0.38),E(0.50),H(0.42)和H(0.47)等与锂有关的缺陷分别在不同的条件下被观测到。对比了硅中氢和锂在与电照缺陷相互作用方面的相似与不同之处。     

吸附钌吡啶类配合物染料分子对氧化多孔硅光致发光性质的影响

化学氧化多孔硅经cis-Ru(bpy)~2(CN)~2的乙醇溶液浸泡后,发光峰位红移,强度减弱,激发态寿命缩短。而在trans-Ru(py)~4(CN)~2溶液中浸泡的氧化多孔硅的发光峰位,强度和寿命几乎没有变化。对比两个染料分子的氧化还原电位和光吸收性质得出：与trans-Ru(py)~4(CN)~2相比,cis-Ru(bpy)~2(CN)~2有一个与多孔硅发光能量接近的低能级吸收带,使得多孔硅纳米粒子向该染料分子传递能量成为可能,能量传递的发生引起了发光峰位的红移和激发态寿命的缩短,虽然伴随着发光效率的损耗,但对有目的地选择染料分子来改变多孔硅的发光峰位和获得激发态寿命尽可能小的多孔硅提供了思路,也为深入理解多孔硅的光致发光机制提供了更多的实验事实。     

Efficient 1.3-μm electroluminescence from high concentration boron-diffused silicon p^＋-n junctions

Etectroluminescence peaking at 1.3 μm is observed from high concentration boron-diffused silicon p^＋-n junctions. This emission is efficient at low temperature with a quantum efficiency 40 times higher than that of the band-to-band emission around 1.1 μm, but disappears at room temperature. The 1.3-μm band possibly originates from the dislocation networks lying near the junction region, which are introduced by high concentration boron diffusion.     

RAMAN SCATTERING INTENSITIES OF FOLDED LONGITUDINAL ACOUSTIC PHONONS IN GexSi1-x/Si SUPERLATTICES

In terms of photoelastic mechanism we have investigated the Raman scattering intensities of the folded longitudinal acoustic (FLA) phonons in Ge_xSi_1-x/ Si superlattices (SLs), taking into account the differences between the acoustic and photoelastic parameters of the two constituents in the SLs. The relative intensities calculated for the FLA phonons are in excellent agreement with the experimental results at the frequencies up to about 50 cm^-1. The broadening of the linewidth arising from the so called strong acoustic attenuation, which was reported previously located around the frequency 15 cm^-1 in Ge_xSi_1-x/Si SLs(x≈0.5), has not been observed in this work.     

n+-Si与p-Si衬底上含纳米硅的SiO2膜电致发光

对于Au/富Si-SiO₂/p-Si和Au/富Si-SiO₂／n⁺-Si这两种结构，研究并比较了它们的电致发光特性．对于前者，当正向偏压大于4V时发射红光，而加反向偏压时不发光；对于后者，加正向偏压不发光，而当反向偏压大于3.5V时发射红光．着重讨论了Au/富Si-SiO₂/n⁺-Si的电致发光机制 关键词：     

含纳米锗粒二氧化硅薄膜的光致发光研究

以锗-二氧化硅(GSO)复合靶作为溅射靶，改变靶上锗与总靶面积比为0%，5%和10%，用射频磁控溅射方法在p型硅衬底上淀积了含锗量不同的三种二氧化硅薄膜.各样品分别在氮气氛中经过300至900℃不同温度的退火处理.通过对样品所作Raman散射光谱的分析，发现随着锗在溅射靶中面积比的增加，所制备的氧化硅薄膜中纳米锗粒的平均尺寸在增大.确定出随着退火温度由600℃升高到900℃，GSO(5%)样品中纳米锗粒的平均直径由5.4nm增至9.5nm.含纳米锗粒大小不同的二氧化硅薄膜的光致发光谱中都存在位于2.1eV     

Synthesis and PL Properties of ZnSe Nanowires with Zincblende and Wurtzite Structures

Single crystalline ZnSe nanowires with both zincblende and wurtzite structures have been synthesized via a chemical vapour deposition method under different growth conditions. The nanowires are usually 50-80nm in diameter, and several tens of microns in length. Room-temperature photoluminescence spectra from zincblende and wurtzite ZnSe nanowires show a broad luminescence band peaked at around 2. 71 e V and a deep level emission band peaked at around 2.00 eV, respectively. Effects of post-growth annealing on the photoluminescence of these nanowires have been investigated. Strong room-temperature band-edge emission could be obtained from the annealed zincblende ZnSe nanowires.     

离子注入GaN的拉曼散射研究

研究了离子注入前后GaN的拉曼散射光谱,特别是其中几个在各种离子注入后都存在的拉曼散射峰,如298,362和661cm-1峰的性质,峰值强度随注入元素原子量、注入剂量和退火温度的变化关系.上述三个拉曼散射峰的强度都随注入元素原子量的增加而降低.当注入剂量增大时,362和661cm-1峰值强度减少,而298cm-1峰值强度却增大.随退火温度的升高,这三个拉曼散射峰的强度先增加后降低.对所观察到的实验现象和这三个峰的起源进行了分析和讨论. 关键词： GaN 离子注入 拉曼散射 局域振动     

零偏退火与反偏退火对含氢的Au/n-Si肖特基势垒的控制

〈１１１〉晶向的掺磷的ｎ型硅外延片经等离子进氢后连同未经等离子氢处理的对比片一起淀积金，制得Ａｕ／ｎ－Ｓｉ肖特基势垒。实验结果表明：氢能使Ａｕ／ｎ－Ｓｉ的肖特基势垒高度下降０．１３ｅＶ；含氢的肖特基势垒的高度可以被零偏退火与反偏退火所控制，即零偏退火使含氢的肖特基势垒的高度降低，而反偏退火使含氢的肖特基势垒的高度升高；而且零偏退火与反偏退火对肖特基势垒高的这种控制作用至少在三个循环过程中是可逆的。在反偏退火以后，含氢的肖特基势垒的高度升高的数值不仅与退火时所应用的偏置电压有关，而且与退火温度也有关。     

RAMAN SCATTERING INTENSITIES OF FOLDED LONGITUDINAL ACOUSTIC PHONONS IN GexSi1-x/Si SUPERLATTICES

In terms of photoelastic mechanism we have investigated the Raman scattering intensities of the folded longitudinal acoustic (FLA) phonons in Ge_xSi_1-x/ Si superlattices (SLs), taking into account the differences between the acoustic and photoelastic parameters of the two constituents in the SLs. The relative intensities calculated for the FLA phonons are in excellent agreement with the experimental results at the frequencies up to about 50 cm^-1. The broadening of the linewidth arising from the so called strong acoustic attenuation, which was reported previously located around the frequency 15 cm^-1 in Ge_xSi_1-x/Si SLs(x≈0.5), has not been observed in this work.