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The effect of initial discharge conditions on the properties of microcrystalline silicon thin films and solar cells 下载免费PDF全文
This paper studies the effects of silane back diffusion in
the initial plasma ignition stage on the properties of
microcrystalline silicon ($\mu $c-Si:H) films by Raman spectroscopy
and spectroscopic ellipsometry, through delaying the injection of
SiH7280N, 7830G, 8115H http://cpb.iphy.ac.cn/CN/10.1088/1674-1056/19/5/057205 https://cpb.iphy.ac.cn/CN/article/downloadArticleFile.do?attachType=PDF&id=111771 back diffusion, microcrystalline silicon, thin film, Raman
crystallinity Project supported by the State Key
Development Program for Basic Research of China (Grant
No.~2006CB202601). This paper studies the effects of silane back diffusion in
the initial plasma ignition stage on the properties of
microcrystalline silicon ($\mu $c-Si:H) films by Raman spectroscopy
and spectroscopic ellipsometry, through delaying the injection of
SiH$_{4}$ gas to the reactor before plasma ignition. By comparing
with standard discharge condition, delayed SiH$_{4}$ gas condition
could prevent the back diffusion of SiH$_{4}$ from the reactor to
the deposition region effectively, which induced the formation of a
thick amorphous incubation layer in the interface between bulk film
and glass substrate. Applying this method, it obtains the
improvement of spectral response in the middle and long wavelength
region by combining this method with solar cell fabrication.
Finally, results are explained by modifying zero-order analytical
model, and a good agreement is found between model and experiments
concerning the optimum delayed injection time. back;diffusion;microcrystalline;silicon;thin;film;Raman;crystallinity This paper studies the effects of silane back diffusion in the initial plasma ignition stage on the properties of microcrystalline silicon(μc-Si:H) films by Raman spectroscopy and spectroscopic ellipsometry,through delaying the injection of SiH4 gas to the reactor before plasma ignition.Compared with standard discharge condition,delayed SiH4 gas condition could prevent the back diffusion of SiH4 from the reactor to the deposition region effectively,which induced the formation of a thick amorphous incubation layer in the interface between bulk film and glass substrate.Applying this method,it obtains the improvement of spectral response in the middle and long wavelength region by combining this method with solar cell fabrication.Finally,results are explained by modifying zero-order analytical model,and a good agreement is found between the model and experiments concerning the optimum delayed injection time. 相似文献
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MPCVD等离子体的发射光谱研究 总被引:1,自引:0,他引:1
在2.45 GHz, 800 W微波等离子体化学气相沉积装置上,利用发射光谱对CH4/H2等离子体进行在线诊断,分析了等离子体中存在的基团,研究了甲烷浓度对各基团浓度及基团的空间分布的影响。结果表明:等离子体中存在CH, Hα, Hβ, Hγ, C2 基团和Mo杂质原子,随着甲烷浓度的升高,各基团的发射光谱强度均有增加,其中C2基团强度显著增加。CH与Hα基团的发射光谱强度比值随甲烷浓度的增加变化不大,而C2与Hα基团的发射光谱强度的比值随甲烷浓度的增加而显著增大。另外,甲烷浓度的增加使得等离子体中各基团在空间分布的均匀性变差。 相似文献
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在非对称磁镜场微波ECR等离子体中引入了磁电加热系统,研究了电极环大小、轴向位置以及双环加热对离子温度的影响.结果表明,大小合适的电极环能有效提高离子的加热温度,且最优电极环尺寸主要取决于离子回旋半径.电极环轴向位置的选择主要与磁镜场位形有关,将电极环置于磁镜场中部的弱磁场位置时最有利于离子温度的提高.采用双电极环加热能进一步提高离子温度,并且其加热效果是单环加热的两倍. 相似文献
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采用热丝化学气相沉积法先在铁箔上沉积了致密的碳纤维膜,后通过加热渗硫法制得硫/碳纤维复合膜,并将其用作锂硫电池正极材料。通过扫描电子显微镜和X射线衍射表征膜的形貌和结构,采用恒流充放电法和阻抗测量法测试复合膜的电化学性能。结果表明,随热丝与铁箔基底间距减小,碳纤维膜致密度先升高后降低;随H2与(Ar+C3H6O)的体积流量比减小,碳纤维膜致密度升高。当丝基距为6 mm,流量比为30/40时,铁箔上沉积了厚度为50μm的致密碳纤维膜,其中碳纤维有良好的垂直取向性和较高结晶度。在硫/碳纤维复合膜正极中,密集的碳纤维形成均匀分布且垂直取向性良好的导电骨架,当电流密度为0.4 mA.cm-2时,硫/碳纤维复合膜正极的初次放电比容量为1 128 mAh.g-1,50次循环后的放电比容量为811 mAh.g-1。 相似文献
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在微波等离子体化学气相沉积装置中,研究了金刚石薄膜在Si (100)面上的负偏压形核行为,结果表明,偏压大小对金刚石的形核均匀性有显著影响,而甲烷浓度主要影响形核时间,对金刚石的最大核密度影响不大。在硅片尺寸小于钼支撑架时,形核行为存在明显的边缘效应,即在偏压值低于-150 V时,硅片边缘金刚石核密度急剧降低,远低于硅片中央;在甲烷浓度比较低时,硅片边缘核密度要高于中间。研究表明,造成这种现象的主要原因是硅片下的钼支撑架发射电子所致,过量的原子H对金刚石的形核是不利的。 相似文献