ZnO∶Er薄膜的结构和发光特性研究

本文研究了用电子束分蒸技术制备的ZnO∶Er薄膜的结构和发光特性.X射线衍射(XRD)谱表明,六角晶体结构的ZnO∶Er薄膜具有强的择优c轴取向(002).在室温下,用阴极射线激发样品,观测到强的蓝光(455nm)发射.本文认为,蓝光发射是ZnO∶Er薄膜中铒离子(Er3+)的激发态4F5/2到基态4I15/2的辐射跃迁.研究薄膜的阴极射线发光强度与电子束流的关系时发现,蓝光发射强度强烈地依赖于电子束流的大小.此外,超过阈值电子束流0.6μA,蓝光发射强度首先迅速增加,然后缓慢地增加,趋于饱和,根据瓶颈效应和稀土发光理论很好地解释了这一实验结果.     

Photoluminescence and Optically Pumped Ultraviolet Lasing from Nanocrystalline ZnO Thin Films Prepared by Thermal Oxidation of High—Quality ZnS Thin Films

We present a simple and useful method for preparing high-quality nanocrystalline ZnO thin films,i.e.the thermal oxidation of high-quality ZnS films prepared by the low-pressure metal-organic chemical vapour deposition technique.The x-ray diffraction measurements reveal that the nanocrystalline ZnO has a hexagonal wurtzite structure.Raman spectra show that the longitudinal optical phonon with the E1-mode appears at 578 cm^-1.The multiple phonon scattering process is also observed,indicating the formation of a high-quality nanocrystalline ZnO thin film.The photoluminescence spectrum has a single emission peak at 3.264eV from the free-exciton mission,under the condition of low excitation power at room temperature.However,when excitation intensities exceed the threshold of 150kW/cm^2,a new and narrow peak emerges at lower energies,which are attributed to exciton-exciton collisions,and is called the P line.The intensity of this peak increases superlinearly with the pumping power over a threshold value.This supplies strong evidence of stimulated emission.The multiple longitudinal cavity modes observed in the stimulated emission spectrum indicate the successful realization of optically pumped lasing from nanocrystalline ZnO films at room temperature.     

InP在两种化学腐蚀系统中的腐蚀特性

本文研究了各种浓度的Br2:CH3OH和Br2:HBr:H2O两种腐蚀系统分别对用负性KPP和正性AZ1350J光致光刻胶直接掩蔽[001]InP的腐蚀特性。分别给出了腐蚀速率与溴浓度,腐蚀深度与时间的关系曲线。同时从结晶学角度定性解释了腐蚀速率与溴浓度,腐蚀方向与腐蚀图形的依赖关系。     

用非水二甲基溶液作电解液电沉积ZnO纳米晶薄膜

用含ZnCl2的二甲基亚砚溶液做电解液可在Si衬底上电化学沉积纳米晶薄膜。薄膜的粒径尺寸为8.9nm，样品的光致发光谱以紫外发射峰为主。分析表明用本文介绍的方法可以制备高质量的不含-OH的ZnO纳米晶薄膜。     

ZnO一维纳米线及其异质结构的外延生长

一维纳米结构因其优异的光、电特性，在纳米电子学，光电子学器件等方面有重要的应用价值而倍受关注．在一维半导体纳米材料中，ZnO因激子束缚能大（60meV），可在室温获得高效的紫外发光而成为近年来继GaN材料后的又一研究热点．外延生长一维纳米结构ZnO及其量子阱材料除因量子尺寸效应更适宜做室温紫外发光、激光材料与器件外，还因界面和量子限制效应而具有许多新奇的光、电、和力学特性，可应用于纳米光电子学器件，传感器及存储器件，纳米尺度共振隧道结型器件和场效应晶体管的研制和开发．文章着重介绍了目前ZnO一维纳米结构制备，一维ZnO纳米异质结构和一维ZnO／Zn1-xMgxO多量子阱结构的外延生长和研究进展．     

可擦除光存储教学实验的开设

研究了在聚甲基丙稀酸甲脂（PMMA）中掺杂羚羟基亚甲基苯胺N-salicylideneaniline(SA)样品的可擦除光存储特性，依据相干光调制光强分布诱导光异构形成相位光栅和光异构产生压力梯度引起质量输运形成表面光栅机理，分析了两光栅的相位关系，合理解释了写入过程和擦除过程中衍射信号强度随时间的变化关系，通过阐述上述复杂的分析过程，培养和提高学生分析问题与解决问题的能力。     

m面蓝宝石上外延（110）取向立方MgZnO薄膜及其日盲紫外探测器件研究

由于在日盲紫外探测方面的应用前景,具有合适带隙的MgZnO合金半导体薄膜受到越来越多的关注。获得具有择优取向的单一相MgZnO对提升MgZnO基日盲紫外探测器性能至关重要。本文利用低压金属有机化学气相沉积（LP-MOCVD）方法在m面蓝宝石衬底上制备了一系列不同组分的Mg_xZn_1-xO薄膜。光学和结构特性测试结果表明：Zn摩尔分数达到55%的Mg_0.45Zn_0.55O薄膜依然是单一立方相,其光学带隙可以达到4.7 eV。立方岩盐结构MgZnO与m面蓝宝石衬底的外延结构关系为（110）_MgZnO‖（1010）_sapphire、[001]_MgZnO‖[1210]_sapphire和[110]_MgZnO‖[0001]_sapphire。唯一确定的面内取向有利于薄膜晶体质量的提高。基于（110）取向立方相Mg_0.45Zn_0.55O薄膜制备金属-半导体-金属（MSM）结构器件,获得了光响应峰在260 nm、光响应截止波长278 nm的日盲紫外探测器。     

Zn1-xCdx S合金薄膜的结构和光学性质

采用低压金属有机化学气相沉积(LP-MOCVD)技术,在普通石英衬底上制备出不同Cd组分(0．02,0．44,0．59,0．83,0．91)的Zn1-xCdxS合金薄膜材料。X射线测量表明样品为单一取向的纤锌矿结构,并且随着x的增加衍射峰位基本成线性地从ZnS衍射峰向CdS衍射峰移动。此外,在PL谱中还可以看出随着样品中Cd含量的增加,发光峰从3．66eV红移到2．43eV。根据发光峰位与Zn1-xCdxS中x的变化关系,推导出它们之间的关系近似为Eg(Zn1-xCdxS)=3．61-1．56x 0．38x^2。还探讨了不同Cd组分薄膜材料的X射线衍射峰半峰全宽以及发光峰半峰全宽的变化。     

包埋于氮化硅薄膜中的硅团簇的光致发光特性

采用等离子体增强化学气相沉积(PECVD)技术,在低温下制备了富硅氢化氮化硅薄膜。利用红外吸收(IR)谱,光电子能谱(XPS)和光致发光(PL)谱,研究了在不同温度下退火的薄膜样品的结构和发光特性。在经过低温退火的薄膜中观测到一个强的可见发光峰。当退火温度较高时,随着与硅悬键有关的发光峰消失,可见发光峰位发生了蓝移。讨论了退火对薄膜中硅团簇的形成及其对发光的影响。根据Raman谱,计算了氮化硅薄膜中硅团簇的尺寸大小。通过实验结果和分析,我们认为PL谱中较强的室温可见发光峰来自于包埋于氮化硅中的硅团簇。     

Performance enhancement of ZnO nanowires/PbS quantum dot depleted bulk heterojunction solar cells with an ultrathin Al_2O_3 interlayer

Depleted bulk heterojunction(DBH)PbS quantum dot solar cells(QDSCs),appearing with boosted short-circuit current density(J_(sc)),represent the great potential of solar radiation utilization,but suffer from the problem of increased interfacial charge recombination and reduced open-circuit voltage(V_(oc)).Herein,we report that an insertion of ultrathin Al_2O_3 layer(ca.1.2 A thickness)at the interface of ZnO nanowires(NWs)and Pb S quantum dots(QDs)could remarkably improve the performance of DBH-QDSCs fabricated from them,i.e.,an increase of V_(oc) from 449 mV to 572 mV,Jsc from21.90 mA/cm~2 to 23.98 mA/cm~2,and power conversion efficiency(PCE)from 4.29% to 6.11%.Such an improvement of device performance is ascribed to the significant reduction of the interfacial charge recombination rate,as evidenced by the light intensity dependence on Jsc and Voc,the prolonged electron lifetime,the lowered trap density,and the enlarged recombination activation energy.The present research therefore provides an effective interfacial engineering means to improving the overall performance of DBH-QDSCs,which might also be effective to other types of optoelectronic devices with large interface area.