ECR等离子体源中基本参数的数值模拟

采用混合模型求了ＥＣＲ等离子体的各种物理参量着重了中性气压、微波功率对等离子体参数以及离子能量和方向角分布的影响，并讨论了与之相关的均匀性、方向性等物理问题。     

高斯光束在单轴晶体中的布拉格衍射特性

利用适当的坐标变换和黎曼方法建立了高斯光束在单轴晶体中布拉格衍射的严格的耦合波理论 ,获得了一组严格的耦合波方程和衍射效率计算公式 ,讨论了衍射效率随折射率调制量的关系以及波长选择性和角度选择性 ,同时分析了衍射效率对再现光宽度的要求。模拟计算表明 ,异常光与异常光 (ee)型布拉格衍射能够达到的最大衍射效率由记录时入射角决定 ,而且通过各参量的适当的选择 ,理论上ee型布拉格衍射能够在折射率调制量很低(如 8.2× 10 -5)的情况下获得接近 90 %的衍射效率。该理论模型为如何在较低折射率调制量下获得较高衍射效率提供了理论指导     

Characterization of Density Profile of Cylindrical Pulsed Gas Jets

We investigated the characteristics of argon and helium gas jets produced by a cylindrical nozzle under pressures from 1 to 6 MPa using a femtosecond laser interferometry. A radial parabolic distribution and an axial exponential distribution of the gas jet density profiles are identified. The results show that the density increases linearly with the backing press ure.     

Efficient Construction of High-Dimensional Cluster State

We present a scheme for efficiently constructing high-dimensional cluster state using probabilistic entangling quantum gates. It is shown that the required computational overhead scales efficiently both with lip and n even if all the entangling quantum gates only succeed with an arbitrary small probability, where p is the success probability of the entangling quantum gate and n is the number of qubits in the computation.     

BEHAVIOR OF Ar PLASMA FORMED IN A HIGH DENSITY PLASMA SOURCE-AN ECR REACTOR

In order to develop the ultra-large scale integration(ULSI), low pressure and high density plasma apparatus are required for etching and deposit of thin films. To understand critical parameters such as the pressure, temperature, electrostatic potential and energy distribution of ions impacting on the wafer, it is necessary to understand how these parameters are influenced by the power input and neutral gas pressure. In the present work, a 2-D hybrid electron fluid-particle ion model has been developed to simulate one of the high density plasma sources-an Electron Cyclotron Resonance (ECR) plasma system with various pressures and power inputs in a non-uniform magnetic field. By means of numerical simulation, the energy distributions of argon ion impacting on the wafer are obtained and the plasma density, electron temperature and plasma electrostatic potential are plotted in 3-D. It is concluded that the plasma density depends mainly on both the power input and neutral gas pressure. However, the plasma potential and electron temperature can hardly be affected by the power input, they seem to be primarily dependent on the neutral gas pressure. The comparison shows that the simulation results are qualitatively in good agreement with the experiment measurements.     

磁控溅射法制备硒化银薄膜及其磁电阻效应研究

采用磁控溅射后退火的方式成功制备了硒化银薄膜,膜厚约为310 nm.X射线粉末衍射分析表明所制备薄膜为单相正交结构,伴随择优取向;比较不同退火温度的效果后发现300℃退火后的薄膜样品结晶最好.扫描电子显微镜、X射线能谱分析表明300℃退火后样品均匀致密,元素组分接近原始比例,是较为适宜的退火温度.低温磁电阻测试显示薄膜样品具有明显的正磁电阻效应,90K附近达到最大磁电阻值7.3;.霍尔系数测量得到薄膜样品室温载流子浓度与霍尔迁移率分别为2.2×1019 cm-3与221 cm2·V-1·s-1.     

一道题目解法探索的汇报课

今年,我带的是高三毕业班,在复习了综合法与分析法之后,我给学生留了如下一道课外思考题：     

两个冲击波相互碰撞的演化过程

利用阴影成像诊断技术，对激光约束烧蚀所产生的两个冲击波相互碰撞的演化过程进行了研究.通过分析冲击波相互碰撞在时间上和空间上的演化过程发现，当冲击波相互碰撞的时候，两个冲击波本身并不发生相互作用，而是冲击波与烧蚀等离子体之间发生相互作用.     

酰胺与酰亚胺类n型有机半导体材料的研究进展

有机半导体材料具有来源丰富、化学结构可裁剪、柔韧性较高、器件制备温度低和塑料衬底兼容性好等优点, 极大地拓展了电子器件的功能与应用. 然而, 电子传输型(n型)有机半导体在分子多样性、载流子迁移率和空气稳定性方面远远落后于空穴传输型(p型)半导体, 从而阻碍了双极晶体管、p-n结和有机互补电路的发展. 酰胺或酰亚胺功能化能显著提高有机材料的电子亲和势, 是构建高性能n型有机半导体的重要策略. 本综述总结了近年来萘二酰亚胺类、苝二酰亚胺类、吡咯并吡咯二酮类、异靛蓝类和其他酰胺/酰亚胺类小分子和聚合物n型有机半导体材料的研究进展, 从分子设计角度出发, 深入讨论了分子结构如何改变分子前线轨道能级、分子间相互作用力、聚集态结构、器件稳定性和电学性能, 最后对其未来的发展方向和面临的挑战进行了展望.