脉冲高能量密度等离子体材料表面改性及其应用

脉冲高能量密度等离子体（pulsed high energy density plasma, PHEDP）是一项新的材料表面改性技术.它集高电子温度、高能量密度、高定向速度于一身,在制备薄膜时具有沉积薄膜的温度低、沉积效率高、能量利用率高的优点,并兼具表面溅射、离子注入、冲击波和强淬火效应等综合效应;它可以制备纳米晶或非晶硬质薄膜,提高基底材料的表面硬度和耐磨、耐蚀性能;能够实现非金属材料表面金属化,所制备薄膜与基底之间存在很宽的混合过渡区,因此膜/基结合良好.文章主要介绍了作者近年来在该领域的部分研究成果,简要介绍了脉冲高能量密度等离子体的原理、特点及应用.分析了脉冲等离子体与材料相互作用的基本物理现象.     

Fabricating a reactive surface on the fibroin film by a room-temperature plasma jet array for biomolecule immobilization

A simple dielectric barrier discharge(DBD) jet array was designed with a liquid electrode and helium gas.The characteristics of the jet array discharge and the preliminary polymerization with acrylic acid(AA) monomer were presented.The plasma reactor can produce a cold jet array with a gas temperature lower than 315 K,using an applied discharge power between 6 W and 30 W(V dis × I dis).A silk fibroin film(SFF) was modified using the jet array and AA monomer,and the treated SFF samples were characterized by atomic force microscopy(AFM),scanning electron microscopy(SEM),Fourier transform infrared spectroscopy(FTIR),and contact angle(CA).The deposition rate of the poly acrylic acid(PAA) was able to reach 300 nm/min,and the surface roughness and energy increased with the AA flow rate.The FTIR results indicate that the modified SFF had more carboxyl groups(-COOH) than the original SFF.This latter characteristic allowed the modified SFF to immobilize more quantities of antimicrobial peptide(AP,LL-37) which inhibited the Escherichia coli(E.Coli) effectively.     

功能染料4,4′-双(4-羧基偶氮苯)二苯并-18-冠-6的制备及其吸收光谱

以二苯并-18-冠-6和对氨基苯甲酸为原料,经重氮化、偶合等多步反应,制备了一种功能染料——4,4’-双(4-羧基偶氮苯)二苯并-18-冠-6.产率68.5%,通过IR、~1H NMR和元素分析等方法对其结构进行表征。研究了不同金属离子对目标化合物紫外一可见吸收光谱的影响,用密度泛函理论对其作用机理进行探讨。结果表明,目标化合物的吸收光谱性能良好,对稀土元素和金属汞离子具有不同作用机理的选择性识别作用。     

FTIR监测金刚石薄膜生长的研究

用电子回旋共振等离子体（ECR）系统, 在气压、衬底温度以及微波功率等外界条件不变的情况下,仅改变甲烷浓度制备金刚石薄膜,利用傅里叶红外吸收光谱仪（FTIR）对甲烷浓度为6％的ECR系 统进行实时监测,分析研究了不同沉积时间条件下,甲烷和氢气产生的等离子体对薄膜早期成核、生长过程以及衬底的影响,并结合Raman光谱X射线衍射（XRD）和扫描电镜（SEM）对金刚石薄膜进行 了分析。     

强磁场中晶体生长研究

设计和制造了一套垂直渐冷设备以研究强磁场中的晶体生长,在强磁场和无磁场下,测量了掺碲InSb熔体及其上方的温度分布;生长了低GaSh组分的InGaSb和掺碲InSb晶体.实验表明,8.00T的强磁场能改善InGaSb混晶的质最和提高InSb晶体中Te杂质轴向分布的均匀性.分析认为,这些结果是强磁场提高流体的稳定性和降低对流的速度所致. 关键词：     

主被动锁模Nd：YAG脉冲序列的观察和测量

主被动锁模Ｎｄ：ＹＡＧ脉冲序列的观察和测量马忠礼，曾族泽（辽宁师范大学物理系大连１１６０２２）前言在超短光脉冲产生、测量技术中，主被动锁模激光器是获得稳定皮秒脉冲的一种常用方法［１］．为了对输出脉冲的时间特性进行直接观察和测量，采用高速光电测试系统是...     

Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc

ZrN/TiZrN multilayers are deposited by using the cathodic vacuum arc method with different substrate bias(from 0 to 800 V),using Ti and Zr plasma flows in residual N 2 atmosphere,combined with ion bombardment of sample surfaces.The effect of pulsed bias on the structure and properties of films is investigated.Microstructure of the coating is analyzed by X-ray diffraction(XRD),and scanning electron microscopy(SEM).In addition,nanohardness,Young’s modulus,and scratch tests are performed.The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases.Solid solutions are formed for component TiZrN films.The dominant preferred orientation of TiZrN films is(111) and(220).At a pulsed bias of 200 V,the nanohardness and the adhesion strength of the ZrN/TiZrN multilayer reach a maximum of 38 GPa,and 78 N,respectively.The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions.     

堆泵浦^3He—Ar—Xe激光实验的放大管研制

介绍了堆泵浦￣３Ｈｅ－Ａｒ－ｘｅ激光实验中放大管的设计及混合气的组成。经聚乙烯慢化体慢化后的ＣＦＥＲ－Ｈ脉冲堆的热中子注量率为６×１０～（１４）ｎ／ｃｍ￣２·ｓ，根据慢化体结构设计了内充气体组份为￣３Ｈｅ：Ａｒ：Ｘｅ＝３４．７：３４．７：０．２６７，６ｏｏｍｍ×Φ３４ｍｍ的放大管，在约１．４×１０￣（１６）裂变每脉冲下进行￣３Ｈｅ－Ａｒ－Ｘｅ（λ＝１．７３μｍ）激光激射实验，获得毫瓦级功率输出。     

具有内逼近的外近似方法

本文在Fukushima标法的基础上给出一个新的外近似方法。这种方法不仅具有外近似,同样也具有内逼近性,并且内近似序列是可行的,同Fukushima标法一样,由每一迭代所产生的“割”不积累地依赖于子问题的约束。