Charge： Glowing in the Dark

Many areas of structure analysis have focused on finding the locations of the atoms. If, instead of the atoms, we knew the positions of the electrons we would in fact know much more, and in most respects knowing where the nuclei are is not important. There is a long history of measurements using precise electron diffraction or X-ray diffraction of the average charge density in materials, but extending beyond to local charge density is, as yet, an unexplored area.     

ON A PAIR OF NON-ISOMETRIC ISOSPECTRAL DOMAINS WITH FRACTAL BOUNDARIES AND THE WEYL-BERRY CONJECTURE

ＯＮＡＰＡＩＲＯＦＮＯＮＩＳＯＭＥＴＲＩＣＩＳＯＳＰＥＣＴＲＡＬＤＯＭＡＩＮＳＷＩＴＨＦＲＡＣＴＡＬＢＯＵＮＤＡＲＩＥＳＡＮＤＴＨＥＷＥＹＬＢＥＲＲＹＣＯＮＪＥＣＴＵＲＥＳＬＥＥＭＡＮ，Ｂ．Ｄ．ＣＨＥＮＨＵＡＭａｎｕｓｃｒｉｐｔｒｅｃ...     

一种用于SOC设计中的智能I/O处理器的实现

文章介绍了SOC设计流程，智能I／O处理器组成，在开发该处理器对VHDL源代码的优化问题。     

NiTi合金中马氏体相的低频力学谱研究

我们用最近研制成功的LMA型低频力学谱测试系统对NiTi合金马氏体相进行了在很大频率范围内（0．003～1Hz）的低频等温力学谱和温度谱的测量．我们研究的形状记忆合金NiTi（Ni50．2at％）试样长34mm，直径1mm细丝．经一定热处理，分别在333K．343K和353K做了内耗随频率的变化的测量。实验表明：频率越小，内耗越大，也就是内耗随频率减少而增大。同时我们采用阶梯升温的方法在八个温度下每个温度测量三种频率（1Hz，0．1Hz，0．01Hz）的内耗，结果清楚地表明：不同频率下，内耗峰都出现在372K（99℃）。而且频率越低，峰高越高。这是具有相变峰的特点：相变峰的峰温不随测量频率不同而变化，相变峰高度随频率减少而增大。我们还测量了在1Hz与0．5Hz频率下内耗随温度的变化。本文用马氏体相的位错理论初步讨论了上述实验结果。     

超大规模集成电路中任意形状掩模边缘附近的离子分布

离子注入过程中,注入离子在掩模边缘附近的分布决定MOS晶体管漏极区域处的电场强度,计算了70keV硼离子注入硅样品中不同掩模边缘离子密度等线,考虑了四阶矩下的杂质深度分布(无掩模情况)。合理选择掩模蚀刻工艺,可获得均匀性,高抗噪声度的器件中。同时也指出了太薄掩模材料对注入离子分布的影响。     

Quasielastic Scattering of the Halo Nucleus ^6He at 25 MeV／u from a ^9Be Target

The differential cross sections of quasielastic scattering of a 25 MeV/u ^6He from ^9Be target have been measured.The double-folding model approach is applied to generate the real part of the optical potential. The imaginary potential parameters as well as some of the real potential parameters are studied in comparison with the experimental data. The effect of the unstable nucleus is discussed.     

Full Complex Amplitude Digital Holograms： Design, Fabrication and Optical Characterization

Diffractive optical elements have a large number of industrial applications, such as beam shaping and optical filtering. Traditionally, these elements modulate the phase of the incoming light or its amplitude, but not both. To overcome this limitation, full complex-amplitude modulation diffractive optical elements were developed. Well-established integrated circuit fabrication steps were employed to fabricate the devices with high precision. Using this approach, the new element‘s optical performances are improved also for near field operations. With this device it is possible to obtain 100% efficient spatial filtering and low noise reconstructed images.     

解析真维斯成功的品牌策略

真维斯原本是澳洲的一个服装品牌,1990年被香港旭日集团与当地进口商合作收购,并经过不断的努力,成功地把产品分销网络伸展到了新西兰等其它地区。1993年,真维斯进军中国内地市场,经过十多年的发展,目前真维斯已在国内20多个省市开设了近1000家专卖店。真维斯品牌策略的成功主要表现在以下几个方面: