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The Mg-delta-doped GaN structure has been grown by low-pressure metalorganic chemical vapour deposition.The Hall-effect measurements reveal that the electrical properties are enhanced. The hole concentration is enhanced twice and hole mobility is enhanced three times by Mg-delta doping. Both the etch pit density data and the x-ray diffraction data demonstrate that Mg-delta doping can reduce the threading dislocation density of p-type GaN epilayer. 相似文献
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Effect of Interface Nanotexture on Light Extraction of InGaN-Based Green Light Emitting Diodes 下载免费PDF全文
We report the enhancement of the light extraction of InGaN-based green light emitting diodes (LEDs) via the interface nanotexturing. The texture consists of high-density nanocraters on the surface of a sapphire substrate with an in situ etching. The width of nanocraters is about 0.5 μm and the depth is around 0.1 μm. It is demonstrated that the LEDs with interface texture exhibit about a 27% improvement in luminance intensity, compared with standard LEDs. High power InGaN-based green LEDs are obtained by using the interface nanotexture. An optical ray-tracing simulation is performed to investigate the effect of interface nanotexture on light extraction. 相似文献
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GaN-based laser diodes (LDs) with 399 nm wavelength are grown on sapphire substrates by metal organic chemical vapour deposition (MOCVD). Electroluminescence spectra of the fabricated LDs show that the LDs from some grown wafers failed to emit laser. The SEM and XRD results show the similar surface morphology and interface qualities of multi quantum wells (MQWs) and super-lattices between LDs that succeed and fail to emit laser. However, the cathodoluminescence (CL) measurements reveal a kind of optical defect rather than structural defect in un-emitted LDs. Further depth-dependent CL imaging observation indicates that such optical defects originate from the MQWs to the surface of LDs as a non-irradiative recombination centre that should cause the failure of laser emitting of LDs. 相似文献
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采用了MOCVD生长技术来获得高阻GaN,发现GaN的方块电阻会随着成核层退火压力的降低而迅速升高.当成核层退火压力降到75torr时,形成了高阻GaN,方块电阻达到1011Ω/□以上.原子力显微镜结果显示高阻GaN的表面非常平整,表面粗糙度只有0.15nm.在位激光检测发现高阻样品的成核层经过退火后会形成密度较高的成核岛.样品的X射线分析结果表明,随着退火压力的改变,刃型位错相对于螺型位错会有较大变化.说明刃型位错是GaN电阻变化的主要原因. 相似文献
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Microstructure Study on Heterostructures of AIInGaN/GaN/Al2O3 by Using Rutherford Backscattering/Channelling and XRD 下载免费PDF全文
A quaternary AlInGaN layer is grown by metal-organic chemical vapour deposition on a sapphire (0001) substrate with a thick (〉 1μm) GaN intermediate layer. The compositions of In and A1 are determined by Rutherford backscattering (RBS). The low ratio between the channelling yield and random yield according to the spectra of RBS/C (χmin = 1.44%) means that the crystal quality of the AllnGaN film is perfect. The perpendicular and the parallel elastic strain of the AIlnGaN layer, e^⊥=-0.15% and e^//= 0.16%, respectively, are derived using a combination of XRD and RBS/channelling. 相似文献
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Effect of Al Doping in the InGaN/GaN Multiple Quantum Well Light Emitting Diodes Grown by Metalorganic Chemical Vapour Deposition 总被引:1,自引:0,他引:1 下载免费PDF全文
The effect of Al doping in the GaN layer of InGaN/GaN multiple quantum-well light emitting diodes (LEDs) grown by metalorganic chemical vapour deposition is investigated by using photoluminescence (PL) and highresolution x-ray diffraction. The full width at half maximum of PL of A1 doped LEDs is measured to be about 12nm. The band edge photoluminescence emission intensity is enhanced significantly. In addition, the in-plane compressive strain in the Al-doped LEDs is improved significantly and measured by reciprocal space map. The output power of Al-doped LEDs is 130mW in the case of the induced current of 200mA. 相似文献