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[100]金刚石薄膜的辐照响应特性研究 总被引:1,自引:0,他引:1
采用热丝辅助化学气相沉积(HFCVD)方法生长得到25μm厚的[100]取向金刚石膜,用以制备辐射探测器.在100 V偏压下,测得暗电流为16.1 nA,55Fe X射线(5.9 keV)和241Am α粒子(5.5 MeV)辐照下的净光电流分别为15.9nA和7.0nA.光电流随时间的变化先快速增加随后由于"pumping"效应逐渐达到稳定.X射线和α粒子辐照下的平均电荷收集效率分别为45;和19;,并由Hecht理论计算得到对应的电荷收集距离为11.25μm和4.75μm. 相似文献
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采用原子力显微镜(AFM)、俄歇电子能谱(AES)和显微压痕分析等手段对射频等离子体增强化学气相沉积法制备的掺氮类金刚石(DLC:N)薄膜的微观结构和力学性能进行了研究.结果表明,随着含氮量的增加,DLC薄膜的AFM表面形貌中出现了几十纳米的颗粒,原子侧向力显微镜和AES分析表明这种纳米颗粒是x大于0.126的非晶氮化碳CNx结构.这种非晶DLC/CNx的纳米复合结构,减小了薄膜的内应力,从而提高了薄膜与衬底的附着力.
关键词:
类金刚石碳膜
微观结构
附着特性 相似文献
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采用等离子增强化学气相法(PECVD)在碲镉汞(MCT)衬底上沉积出纳米团聚的类金刚石薄膜(DLC).用原子力显微镜(AFM )和侧向力显微镜(LFM)对DLC和MCT表面形貌进行表征;用俄歇电子能谱(AES)对DLC/MCT界面附近各元素含量的分布进行分析研究.结果表明:当膜厚达到25nm以上,这种DLC膜就能够有效地抑制MCT中HgTe的分解和Hg与Te的外扩散.AFM 和LFM的观察结果表明,原始MCT晶片经100℃在氮气气氛中退火30min,表面区域出现了不同与MCT的微米量级的新相,而由DLC膜保护的MCT晶片表面就没有观察到这种由分解反应引起的相变. 相似文献
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Synthesis and photoelectric properties of a high soluble zinc phthalocyanine-epoxy derivative are investigated. The derivative can be solubilized in convenient solvents, such as Ctt30tt, Ctt3Ctt20tt and H2O. The fluorescence and UV-visible analyses indicate that the ZnPc-epoxy derivative still maintains the plane structure which comesfrom Zn(4,4′,4″,4-ta)Pc and the derivative has obvious up-conversion luminescence in room temperature. The up-conversion luminescence can be explained by the selection rule depending on the two-photon absorption. 相似文献
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Room-temperature Raman and PL spectra, photocurrent (PC) and thermally stimulated current (TSC) were measured to investigate the mid-gap defects in diamonds grown by using a hot-filament chemical vapour deposition (CVD) technique. The [Si-V]^0 centres caused by the Si-C bonds in diamond grains and at grain boundaries are located at 1.68eV. We firstly detect the level 1.55eV by using PL and it is tentatively attributed to the zero-phonon luminescence line or vibronic band of the [Si-V]^0 induced by the Si-O bonds. The 2.7-3.2eV and 1.9-2.1 eV PC peaks were detected and discussed. The IN-V] complex may be attributed to these defect levels.Some shallow energy levels lower than 1.0eV were also observed in the CVD diamond. 相似文献
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采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量,分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数,优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关,当温度为750℃,碳源浓度为0.9%和压强为4.0 kPa时,金刚石薄膜的红外椭偏光学性质最佳,折射率平均值为2.385,消光系数在10-4范围内,在红外波段具有良好的透过性.
关键词:
薄膜光学
红外光学性质
工艺条件
金刚石薄膜 相似文献
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