Penetration of plasma surface modification. II. CF4 and C2F4 low-temperature cascade arc torch

The depth of surface modification by low-temperature cascade arc torch is investigated. A stack of 10 sheets of nonwoven fabrics of polyester fibers is exposed to a low-temperature cascade arc torch containing CF₄ or C₂F₄, and the fluorination effect is examined by ESCA. It is shown that interaction of chemically reactive species, created in a low-temperature cascade arc torch, with the surface is not limited to the surface contacted by the torch (flame). The results indicate that the fluorination effect is observed on surfaces which are shadowed from the torch by overlying fibers. The highest degree of fluorination is found on the second layer, rather than on the first layer which the torch contacts directly. No significant differences in the trends of penetration of CF₄ and C₂F₄ treatment through porous samples are observed. However, ESCA data show principal differences in chemical structures of the surfaces treated with CF₄ (nonpolymer-forming gas) and C₂F₄ (polymer-forming gas). These results indicate that chemically reactive species induced by the excited species of argon rather than primary species created by the ionization process seem to play predominant roles in the surface treatment as well as the low-temperature cascade arc torch polymerization of perfluorinated compounds. © 1994 John Wiley & Sons, Inc.     

Optical emission diagnostics in cascade arc plasma polymerization and surface modification processes

Optical Emission Spectroscopy (OES) was used to identify reactive species and their excitation states in low-temperature cascade arc plasmas of N₂, CF₄, C₂F₄, CH₄, and CH₃OH. In a cascade arc plasma, the plasma gas (argon or helium) was excited in the cascade arc generator and injected into a reactor in vacuum. A reactive gas was injected into the cascade arc torch (CAT) that was expanding in the reactor. What kind of species of a reactive gas, for example, nitrogen, are created in the reactor is dependent on the electronic energy levels of the plasma gas in the cascade arc plasma jet. OES revealed that no ion of nitrogen was found when argon was used as the plasma gas of which metastable species had energy less than the ionization energy of nitrogen. When helium was used, ions of nitrogen were found. While OES is a powerful tool to identify the products of the cascade arc generation (activation process), it is less useful to identify the reactive species that are responsible for surface modification of polymers and also for plasma polymerization. The plasma surface modification and plasma polymerization are deactivation processes that cannot be identified by photoemission, which is also a deactivation process. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 1583–1592, 1998     

Experimental Study of Capacitive RF <Emphasis Type="Italic">c</Emphasis>-C<Subscript>4</Subscript>F<Subscript>8</Subscript> Discharge with Synchrotron Vacuum Ultraviolet Photoionization Mass Spectrometry

Capacitive radio frequency (RF) discharge of c-C₄F₈ (octafluorocyclobutane) has been studied with synchrotron vacuum ultraviolet (SVUV) photoionization mass spectrometry (PIMS) at 4 Torr and 33.33 kHz. Various free radicals and reactive intermediates have been identified through measurement of photoionization mass spectra and photoionization efficiency (PIE) spectra. CF₂=CF₂ is main product in the plasma, indicating that the dissociation of c-C₄F₈ into CF₂=CF₂ is one of prominent reactions in the present experimental conditions. The observation of large species including C₅F₈, C₅F₁₀ and C₆F₁₀ is presented in our work. Besides, the dependences of the signals of neutral species in the discharge of c-C₄F₈ on RF power are presented in this paper.     

Synthesen und Eigenschaften von Tetrakis(perfluoralkyl)tellur Te(Rf)4 (Rf = CF3, C2F5, C2F5, C3F7, C4F9)

Synthesis and Properties of Tetrakis(Perfluoroalkyl)Tellurium Te(R_f)₄ (R_f = CF₃, C₂F₅, C₃F₇, C₄F₉) Te(CF₃)₄ is obtained from the reaction of Te(CF₃)Cl₂ with Cd(CF₃)₂ complexes as a complex with e. g. CH₃CN, DMF. It is a light and temperature sensitive hydrolysable liquid. The reaction with fluorides yields the complex anion [Te(CF₃)₄F]⁻, with fluoride ion acceptors the complex cation [Te(CF₃)₃]⁺. With traces of water an acidic solution is formed. Te(CF₃)₄ acts as a trifluoromethylation reagent. The reaction with XeF₂ gives hints for the formation of Ye(CF₃)₄F₂. Properties and NMR spectra are discussed. The much more stable complexes of Te(R_f)₄ (R_f = C₂F₅, C₃F₇, C₄F₉) are formed from the reaction of TeCl₄ with the corresponding Cd(R_f)₂ complexes.     

Fluorocarbon derivatives of nitrogen. Part 14. Studies on some (CF3)2 no-substituted fluoroaromatics; thermal rearrangement of 4-[bis(trifluoromethyl)amino-oxy]tetrafluoropyridine

The sodium salt (CF₃)₂ NO⁻Na⁺ (I) [from (CF₃)₂NOH + NaH in Et₂O], is an alternative bis(trifluoromethyl)amino-oxylating agent to the adduct (CF₃)₂NOH.CsF (III). With pentafluoropyridine it affords 4-X.C₅F₄N (II) + 2,4-X₂.C₅F₃N (IV), [X = (CF₃)₂NO]. It has been used to obtain a number of new bis(trifluoromethyl)amino-oxy-compounds; $\text{i.e.}$ the following conversions have been effected: perfluoro-(4-isopropylpyridine)→ 2-X.C₅F₃N.CF(CF₃)₂-4 (V) + 2,6-X₂.C₅F₂N.CF(CF₃)₂-4 (VI); 3-chlorotetrafluoropyridine → 4-X.C₅F₃N.Cl-3 (VII) and 2-X.C₅F₃N.Cl-5 (VIII) (not separated) + 2,4-X₂.C₅F₂N.Cl-5 (IX), 3,5-dichlorotrifluoropyridine → 2- (XI) and 4-X.C₅F₂N.Cl₂-3,5 (X) (not separated) + 2,4-X₂.C₅FN.Cl₂-3,5 (XII); and perfluorotoluene → 4-X.C₆F₄.CF₃-1 (XIII). Hexafluorobenzene resisted attack by (CF₃)₂NONa under the conditions used with these aromatic substrates ($\text{ca}$ 20 °C). Static pyrolysis (125 °C) of 4-[bis(trifluoromethyl)amino-oxy]tetrafluoropyridine (II) gave a mixture of 6-bis(trifluoromethyl)amino]tetrafluoro-4-azacyclohexa-2, 4-dienone (XV) and 4-[bis(trifluoromethyl)amino]tetrafluoro-4-azacyclohexa-2,5-dienone (XVI). The ¹³C chemical shifts, assigned by analysis of ¹⁹F-coupled and ¹⁹F broad-band decoupled ¹³C n.m.r. spectra, are in accord with a +M effect similar to that of fluorine for a (CF₃)₂NO- substituent in the 2- and 4- positions of a polyfluoropyridine and a slightly smaller -I effect; the steric effect of (CF₃)₂NO on the shifts is less than that of chlorine. In contrast, a ring carbon carrying a (CF₃)₂CF- substituent is markedly shielded compared with one carrying fluorine, presumably by a steric effect.     

Mechanisms of radical production in CF3Cl,CF3Br,and related plasma etching gases: The role of added oxidants

A model is presented that accounts for the formation of various etchants, unsaturated species, and polymers in halocarbon/oxidant plasma etching mixtures. It is discussed in terms of emission and mass spectral measurements of stable and unstable products in CF₃Cl, CF₃Br, C₂F₆, and related systems. In this reaction scheme, fluorocarbon precursors derived from the building block radical CF₂ are saturated during reactions with atoms and reactive molecules. The most reactive species are preferentially removed by the saturation reactions. An ordering of this reactivity can be used to predict the dominant atomic etchants as a function of halocarbon and additive gas compositions.     

Rate Coefficient for Self-Association Reaction of CF2 Radicals Determined in the Afterglowof Low-Pressure C4F8 Plasmas

We have analyzed decay kinetics of CF₂ radicals in the afterglow of low-pressure, high-density C₄F₈ plasmas. The decay curve of CF₂ density has been approximated by the combination of first- and second-order kinetics. The surface loss probability evaluated from the frequency of the first-order decay process has been on the order of 10^–4. This small surface loss probability has enabled us to observe the second-order decay process. The mechanism of the second-order decay is self-association reaction between CF₂ radicals (CF₂+CF₂C₂F₄). The rate coefficient for this reaction has been evaluated as (2.6–5.3)×10^–14 cm³/s under gas pressures of 2 to 100 mTorr. The rate coefficient was found to be almost independent of the gas pressure and has been in close agreement with known values, which are determined in high gas pressures above 1 Torr.     

The heat of formation of C2F4

The CCSD(T) atomization energies are extrapolated to the complete basis set limit, and are corrected for zero-point energy, spin–orbit, core-valence, and scalar relativistic effects. Our best heats of formation at 298 K for CF₄ and C₂F₄ are −223.1±1.1 and −160.5±1.5 kcal/mol, respectively. The CF₄ value is in excellent agreement with experiment (−223.04±0.18 kcal/mol), while the C₂F₄ result suggests that the experimental value (−157.6±0.6 kcal/mol) has a larger error than believed. Our value for C₂F₄ also shows that the G3 value has the expected error of ±2 kcal/mol.     

Surface Interactions of Radicals During Plasma Processing of Polymers

Surface interactions of radical species were investigated using the imaging of radicals interacting with surfaces (IRIS) technique during plasma surface modification of polymers. Three plasma systems were investigated by spatially probing the laser induced fluorescence of individual radical species and determining their surface scattering coefficients, S. The behavior of CF₂ moieties on polymer surfaces was studied using the fluorocarbon plasmas C₂F₆ and hexafluoropropylene oxide (HFPO). Three types of surface interactions were observed, surface generation of CF₂ (S > 1), surface loss of CF₂ (S < 1), and unit scattering (S = 1). Surface loss of CF₂ was seen in HFPO plasmas, while CF₂ was generated in C₂F₆ systems. The differences between these systems is believed to be the result of different overall surface interactions, specifically film deposition in the HFPO system and etching in the C₂F₆ system. Using NH₃ plasmas, the surface interactions of NH₂ radicals with polymers was also investigated. Here, NH₂ is generated at the surface of polyethylene and polytetrafluoroethylene substrates, but is consumed on polyimide substrates. Ion effects were also investigated by placing a grounded mesh in the path of the molecular beam to remove charged species.     

Plasma fluorination of polystyrene

ESCA and contact-angle measurements were used to characterize the surfaces of polystyrene films exposed to SF₆, CF₄, and C₂F₆ plasmas. SF₆ plasmas cause loss of aromaticity in the polystyrene surface region via saturation of the phenyl ring and/or carbon-bond breakage and subsequent fluorination. C₂F₆ plasmas graft CF_x radicals directly to the polystyrene surface without necessarily destroying the aromaticity of the polymer. CF₄ plasmas appear to be intermediate in character between SF₆ and C₂F₆ plasmas.     

Gas phase radiation chemistry of hexafluoroethane

The Co-60 gamma radiolysis of gaseous C₂F₆ was investigated at 50 Torr pressure, both pure and with 10% oxygen added. For the pure system, the radiolytic products and their respective C values were CF₄, 2.27; C₃F₈, 0.23; C₄F₁₀, 0.09; C₅F₁₂, 0.015; and C₆F₁₄, 0.009. All radiolysis products except for CF₄ (C = 0.61) were eliminated when 10% O₂ was added as scavenger. The results are discussed mainly in terms of the decomposition of excited C₂F₆ into free radicals, which can then combine. The unscavenged CF₄ is accounted for by the ion-molecule reaction CF₃⁺ + C₂F₆ → CF₄ + C₂F₅⁺.     

Real-time mass-spectrometric study of the chemistry initiated by infrared-laser photolysis: CF2Cl2

The infrared-laser photolysis/mass-spectrometric (ILP/MS) technique was used to monitor directly in real time the free-radical and stable reactants and products present in the reactive system initiated by the multiphoton-induced dissociation of CF₂Cl₂. It was found that contrary to conclusions based on final-products analyses, the C₂F₄ observed as a final product in this system is not formed solely through the recombination of: CF₂ radicals, but rather C₂F₄ is produced in a complex series of secondary reactions.     

Zur Reaktion von CF4, CBrF3 und CBr2F2 mit Kieselglas

Reaction of CF₄, CBrF₃, and CBr₂F₂ with Silica CF₄ reacts with silica above 1200 K forming SiF₄ and CO₂. CBrF₃ and CBr₂F₂ yield SiF₄, Br₂, CO₂, and CO as well as products of pyrolysis, such as C₂BrF₅, C₂Br₂F₄, and others. The reaction starts at 900 K (CBrF₃) or 700 K (CBr₂F₂), resp. The CO₂/CO ratio is higher than expected. SiF₄ is absorbed at the surface of silica to a considerable extent.     

Mechanisms of hydrophobization of polymeric composites etched in CF4 plasma

Achieving optimal hydrophobicity of polymer materials especially polymer–matrix composites is important for many material applications. Herein the interplay of factors determining hydrophobic surface is presented during CF₄ plasma treatments which lead to functionalization as well as selective polymer–matrix etching. The continuous exposure to plasma reactive species induces functionalization and etching on the surface, which decides the surface morphology and surface chemistry. Consequently, exothermic processes during the plasma–surface interactions are another important factor which influences the surface chemistry and etching rate of the material. The results demonstrate that despite etching and increasing surface roughness, the major contribution to hydrophobic character is dependent on the number of carbon atoms populated with fluorine, whereas the temperature is a deciding factor for type of created bonds. Copyright © 2016 John Wiley & Sons, Ltd.     

19F nmr spectra of mesomeric carbanions generated from polyfluorodiarylacetonitriles. The electronic effect of perfluoroalkyl groups

¹⁹F NMR spectra of 1,2- dimethoxyethane solutions of Na- and Li- salts of polyfluorinated carbanions [p - RC₆F₄$\text{C}$(CN)C₆F₄R′-p] Na⁺ (Li⁺) and of their neutral precursors p-RC₆F₄CH(CN)C₆F₄R′-p / R  F or CF₃ and R′= CF₃, CF₂CF₃, CF(CF₃)₂ and C(CF₃)₃/ have been studied. The values of changes in the chemical shifts of fluorine atoms in the ring and the side chain are practically the same when going from the precursor to carbanion with the perfluoroalkyl group being varied. This gave grounds to conclude that the electronic effect of the perfluoroalkyl groups is rather similar. The ¹⁹F NMR method has revealed no differences in the predominant mechanism of the negative charge distribution by these groups.     

A Widely Applicable Synthetic Approach to Alk‐1‐yn‐1‐yl(polyfluoroorganyl)‐iodonium Salts [(RC≡C)(R′)I][BF4]

The reaction of alkynyldifluoroboranes RC≡CBF₂ (R = (CH₃)₃C, CF₃, (CF₃)₂CF) with organyliodine difluoride R′IF₂ bearing electron‐withdrawing polyfluoroorganyl groups R′ = C₆F₅, (CF₃)₂CFCF=CF, C₄F₉, and CF₃CH₂ leads to the corresponding alkynyl(organyl)iodonium salts [(RC≡C)(R′)I][BF₄]. This approach uses a widely applicable method as demonstrated for a representative series of polyfluorinated aryl‐, alkenyl‐, and alkyliodine difluorides. Generally, these syntheses proceed with good yields and deliver pure iodonium salts. The distinct electrophilic nature of their [(RC≡C)(R′)I]⁺ cations is deduced from multinuclear magnetic resonance data. Within the series of new iodonium salts [CF₃C≡C(C₄F₉)I][BF₄] is an intrinsic unstable one and decomposed forming CF₃C≡CI and C₄F₁₀.     

The photolysis of pentafluoroacetone

The photolysis of pentafluoroacetone has been investigated in the 3130 Å region, from room temperature to 360°C. The Φ_CO varies from 0.7 to 0.9 over this range, and the decomposition is represented by CF₂HCOCF₃ → CF₂H + CO + CF₃. The disproportionation/combination ratio for CF₃ and CF₂H (→ CF₃H + CF₂) radicals is found to be 0.09. Arrhenius parameters for hydrogen atom abstraction from the ketone are log₁₀A = 12.7 (units are mole^?1 cc sec^?1) and E = 14.3 kcal mole^?1 for CF₂H, and log₁₀A = 12.1 and E = 11.8, for CF₃ radicals. At low pressures HF elimination reactions are observed from the vibrationally excited fluoroethanes, C₂F₅H* and C₂F₄H₂*, formed in the system. A rough estimate of the activation energy for the process C₂F₅H → C₂F₄ + HF of 60–65 kcal mole^?1 is made.     

Regiospecific synthesis of aromatic compounds via organometallic intermediates. Part 5. Substituted perfluoroalkylether benzenes

A new organometallic species, 3,5-Li₂C₆H₃X where X = C₂F₅- (OCF₂CF₂)₄OCF₂CF₂-(IIIa) has been prepared from the corresponding dibromo compound by a metal-halogen exchange reaction. The reactions between IIIa and various substrates were examined in order to determine the usefulness of this diorganometallic reagent as a synthon.     

Yield and enrichment studies of C-13 isotope by multi-photon dissociation of Freon-22 at low temperatures

Multi-photon dissociation of Freon-22 (CF₂HC1) at low temperatures has been carried out to separate the C-13 isotope using a TEA CO₂ laser. Yield and enrichment of C-13 isotope in the product C₂F₄ are studied at 9P(22) laser line as a function of temperature (−50°C to 30°C). It is observed that at a given fluence when the temperature is lowered the yield decreases and the enrichment factor of C-13 increases. Room temperature irradiation of CF₂HC1 towards the blue edge of C-13 absorption (i.e. at 9P(20) laser line) gives low yield of the product (C₂F₄) at a fluence, which produces the desired enrichment factor of 100. An increase in fluence gives very high yield of C₂F₄ but the enrichment factor is very low. Irradiating CF₂HC1 at a temperature of −10°C enhances the enrichment factor to 100 and the yield obtained is comparable to that towards the red edge of C-13 absorption (i.e. at 9P(26) laser line). At a given enrichment factor higher enrichment efficiency is achieved when CF₂HC1 is irradiated at lower temperature.     

Does the thermal motion of macromolecules really influence the fluorine-atomic concentration of plasma-fluorinated polyolefin surfaces?

The relative fluorine-atomic concentrations and the abundance of CF_x functionalities from CF₄- and C₆F₆-RF-plasma treated polypropylene (PP) film surfaces were evaluated. Survey and high resolution (HR) ESCA data indicate that intense surface fluorination can be carried out, from both fluorine precursors, under relatively low power and treatment time conditions. However, it was found that the stability (under open laboratory conditions and under various solvent and temperature environments) of plasma implanted fluorine based groups significantly depend on the nature of plasma gases involved. Simulation of plasma induced molecular fragmentation, at different electron energy MS conditions, indicates the presence of a much higher fluorine atom concentration from a CF₄-plasma in comparison to a C₆F₆-plasma. It is suggested that fluorine atom mediated fragmentation of macromolecular backbones is probably responsible for the erosion of plasma fluorinated surfaces, rather than thermal motion induced burying processes.