Efficiency of radiation-induced main-chain scission of poly (methyl methacrylate) depends on the irradiation temperature because of coexisting monomer

Effect of irradiation temperature on the main-chain scission of poly (methyl methacrylate) (PMMA) caused by γ-irradiation was studied by means of gel permeation chromatography and ESR spectroscopy. Although no temperature dependency was observed on the scission efficiency for purified PMMA, the efficiency for crude or monomer-doped purified PMMA was decreased by decreasing the temperature below ca. 200 K. Above 200 K the efficiency was constant and did not depend on the purity of PMMA. ESR study of the irradiated PMMA revealed that the suppression of the scission below 200 K is induced by the addition of methyl methacrylate monomer to primary radical species, which otherwise cause the main-chain scission by warming the polymer above 200 K. The primary radical generated above 200 K immediately converts to the scission-type ? CH₂ ? ?(CH₃) COOCH₃ radical through the β-scission of the polymer main chain, so that the efficiency of the scission does not depend on both the impurity and the irradiation temperature. © 1994 John Wiley & Sons, Inc.     

Photodegradation of polystyrene containing flame-retardants: wavelength sensitivity and efficiency of degradation

Wavelength dependence on the photodegradation of flame-retardant materials (Polystyrene (PSt) containing flame-retardants) was studied. The effects of nine flame-retardants containing bromine (Br) on the efficiency of photodegradation of the PSt were compared. Samples were irradiated at 23 °C in air with monochromatic radiation of wavelengths 260, 280, 300, 320, 340, 360 and 380 nm using the Okazaki Large Spectrograph (OLS). UV-visible and FTIR spectra were measured to identify photo-induced chemical structural changes in the PSt. The number of main-chain scissions and the changes in the molecular weight distribution were estimated from the results of GPC measurements. It was found that the photo-stability of PSt was reduced by the addition of flame-retardants. The most effective irradiation wavelength for main-chain scission was found to be 280 nm for each flame-retardant except one. The photo-stability of PSt containing flame-retardants appears to depend upon the chemical structure of the additive.     

A study of the mechanism of photocrosslinking polymers by quinones

Photocrosslinking of poly(methyl methacrylate) (PMMA) was studied in the solid state in the presence of various quinones. For the study of photocrosslinking mechanism, a PMMA film containing p-benzoquinone (Q) was irradiated with UV light (λ > 370nm) and then purified by reprecipitation. It was found that the reprecipitated polymer has quinone-type moieties, besides the hydroquinone-type moieties, chemically bound to the polymer chain. The reprecipitated polymer film also crosslinking efficiency was higher than that of PMMA film containing Q. It was concluded that the formation of quinone-type structure during irradiation played an important role in the photocrossing of PMMA containing Q.     

Photocrosslinking of poly(2,3-epithiopropyl methacrylate) film with 254 nm irradiation

Poly(2,3-epithiopropyl methacrylate) (PETMA) has an absorption maximum at 258 nm (ε_max = 50) in dioxane which is due to episulfide groups. When irradiated at 254 nm under atmospheric pressure its film became insoluble. When kept at 70°C for several minutes a PETMA film became partially insoluble; however, the contribution of this thermal reaction to the photocrosslinking at room temperature was negligible. For photoreaction at 254 nm under nitrogen a low probability of main-chain scission was ascertained by the use of the Charlesby-Pinner equation. The IR spectrum of irradiated PETMA showed a decrease in episulfide groups and the formation of mercapto groups, which suggested that the photocrosslinking of PETMA results from free radicals formed by the cleavage of C? S bonds. Free radicals in the irradiated PETMA were detected by ESR spectroscopy and the assignment is discussed. In this photocrosslinking process oxygen was a retarder at the early stage but an accelerator at the later stage.     

Wavelength sensitivity of the photoinduced reaction in polycarbonate

Bisphenol A polycarbonate (PC) was irradiated with monochromatic light of wavelengths 260, 280, 300, 320, 340, 400, and 500 nm by use of the Okazaki large spectrograph (OLS). The quantum yield of main-chain scission (?_cs), efficiency of photo-Fries rearrangement (E_r), and effects of wavelength on ?_cs and E_r were investigated. It was found that photodegradation and photo-Fries rearrangement of PC took place by the irradiation of 260–300 nm light, but did not by the irradiation at λ ≧ 320 nm. The ?_cs has a maximum value in the case of the irradiation with 260 nm light, while E_r was found to have a maximum value by the irradiation of 280 nm light. © 1993 John Wiley & Sons, Inc.     

Photocurable oligo(hemiacetal ester)s having methacrylate side chains

Two types of oligo(hemiacetal ester)s which have methacrylate units and tertiary ester linkages in the side chains were synthesized by polyaddition of corresponding dicarboxylic acid with divinyl ether. One oligomer has a ortho linked main-chain structure, and the other one has meta and para linked main-chain structure. These oligomers were applied to a photocrosslinking system having photo/thermal degradable properties. On UV irradiation at 365 nm under N₂ atmosphere, oligomer films containing methyladamantyl methacrylate (MADMA), 2,2-dimethoxy-2-phenylacetophenone (DMPA), triphenylsulfonium triflate (TPST) became insoluble in acetone. Insolubilization behavior was not influenced by the difference of main-chain structure. When the crosslinked oligomer/MADMA films were irradiated at 254 nm and followed by baking, they became soluble in acetone. The effective baking temperature depended on the oligomer structure. The cleavage of hemiacetal ester and tertiary ester linkages was confirmed by FT-IR spectroscopy.     

聚甲基丙烯酸甲酯辐射裂解和消旋的空间立构效应

本文研究了三种不同空间立构聚甲基丙烯酸甲酯的辐射效应,提出裂解过程是一种裂解与重合的动态平衡过程。分子量降低和消旋作用对温度的依赖性,是由于分子运动和笼罩效应以及重合的空间位阻效应所致。辐照温度愈高,裂解产额愈大。相同条件下辐照,全同立构比无规立构试样的裂解产额更大。 全同立构聚甲基丙烯酸甲酯辐照后,不仅分子链断裂,而且空间立构也发生很大变化。随着辐照剂量的增加,全同立构含量逐渐减少,而无规立构含量和间同立构含量却逐渐增加。     

Preparation and photolysis of poly-p-methoxyacrylophenone and its copolymers with styrene and methyl methacrylate

Poly-p-methoxyacrylophenone (PPMeOAP) and its copolymers with styrene (PMe-OAP–S) and with methyl methacrylate (PMeOAP–MMA) were prepared. The photolysis in solution with 313 and 366 nm radiation was followed viscometrically. In solvents such as chlorobenzene and ethyl benzoate, random main-chain scission from n–π^* excited triplet state occurs. The lowest excited triplet state in formic acid and in ethylene chlorhydrin is of the character π–π^*, from which no main-chain scission occurs. In solvents in which destruction occurs, the main-chain scission is retarded by triplet quenchers, such as naphthalene, 2,5-dimethyl-2,4-hexadiene, and biphenyl. Quenching experiments indicate that the lifetime for the excited triplet state of PPMeOAP is 25 times that for polyacrylophenone. In PMeOAP–MMA copolymers, quantum yields of main-chain scissions were lower and lifetimes of excited triplets were longer than in PPMeOAP, due to hindered intramolecular photoreaction.     

一种含螺吡喃和肉桂酸酯双光功能基团的光致变色染料的合成与性能

合成了一种含有光致聚合肉桂酸酯基团的新型光致变色螺吡喃染料,研究其与普通螺吡喃染料在不同高分子材料中的光致变色和热退色过程(PMMA和PVCi).通过UV-Vis光谱、NMR谱和IR光谱研究了新型染料中的肉桂酸酯基团的光致聚合过程,考察了其对螺吡喃结构的光致变色显色体热稳定性的影响.     

The effect of ionising radiation on poly(methyl methacrylate) used in intraocular lenses

Gamma radiation is increasingly being used to sterilise intraocular lenses (IOLs) made from poly(methyl methacrylate) (PMMA). In this study, samples of PMMA used in the fabrication of IOLs were exposed to irradiation doses typically used for their sterilisation. The effect of this treatment on the polymer was analysed by size-exclusion chromatography (SEC), UV-visible and infrared spectroscopy and scanning electron microscopy (SEM). The PMMA was found to have undergone chain scission, decarboxylation and colour change following the irradiation.     

Photolysis of polyesters: Poly(propylene-1,2-maleate) and poly(propylene-1,2-ortho-phthalate)

A spectroscopic study of the photo-oxidation of poly(propylene-1,2-maleate), poly(propylene-1,2-o-phthalate) and poly(propylene-1,2-maleate-o-phthalate) under 280–480 nm radiation was investigated in detail. Results obtained indicate that, during photolysis of these polyesters, the primary photoreactions involve excitation of conjugated structures: carbonyl groups (in ester groups)—double bonds or carbonyl groups-phenylene rings. The secondary reactions occur by complicated mechanisms resulting in oxidation, scission, radical termination and cross-linking of structures present in the photolysed polyesters. Light of wavelength 280–480 nm causes deterioration in the polyesters in the early stages of irradiation. Singlet oxygen does not react with these polyesters even during long periods of exposure. Photo-oxidation mechanism occurs by free radical mechanism.     

ESR studies of the photodegradation of polyethylene containing trapped allylic free radicals

Changes produced in γ-irradiated polyethylene by subsequent ultraviolet irradiation have been investigated by ESR measurements, ultraviolet spectroscopy, and viscometric determination of average molecular weight. The photoinduced changes depend on the wavelength of irradiation. Upon irradiation at wave length greater than 3900 Å, main-chain scission occurs by reaction of trapped allylic radicals: A reduction in molecular weight sndicated by this reaction was verified by fractionation experiments and molecular weight determinations.     

Photo-stability of photo-cured organic coatings: Part I—Secondary reactions in thioxanthone/amine photo-cured organic coatings

Luminescence measurements on 2-iso-propylthioxanthone (ITX) in a poly(methyl methacrylate) (PMMA) film as a model system were carried out to study the secondary reactions of ITX during and after photocrosslinking of organic coatings. The energy of the lowest excited triplet state (T₁) of ITX was calculated to be E₁₁ = 62·2 kcal/mol. The ITX triplet lifetime in a PMMA film was calculated from the phosphorescence decay to be τ = 1·0 ms. Irradiation of a PMMA film containing 4 mm ITX resulted in rapid photoreduction of the aromatic ketone. In a PMMA-benzene solution, studied for comparison, the photo-reduction rate was lower than in film. Triplet excited ITX may decompose peroxides by an energy transfer process. As the model system a mixture of tert-butylhydroperoxide and di-tert-butylperoxide was irradiated with uv light in the presence of ITX in benzene solution. This was found to give tert-butoxy radicals. The same radicals were formed by irradiation of a PMMA sample containing peroxides. The radicals formed were identified and measured using ESR spectroscopy combined with the spin trapping technique. The investigations reported here have established evidence for two important secondary reactions in the photo-curing of organic coatings using thioxanthone/amine as the initiating system: photo-reduction of ITX by hydrogen abstraction from the polymer and photo-decomposition of peroxides and hydroperoxides sensitized by thioxanthone.     

Stress relaxation of natural rubber during irradiation

The site of chain scission and crosslinking in vulcanized natural rubber irradiated with 4 MeV electrons has been determined by analysis of stress relaxation data. Sulfur and peroxide vulcanizates of different crosslink densities were prepared and the crosslink densities determined from stress-strain measurements. Stress relaxation was measured during irradiation using modified commercial relaxometers. The specimens were maintained in an atmosphere of nitrogen to minimize oxidative side effects. Scission is deduced to take place in the vicinity of crosslinks, since the rate of continuous stress relaxation is independent of crosslink density. Scission may be associated both with crosslinks initially present and with those subsequently introduced by irradiation. Crosslinking by radiation is largely a random process. However, there is a crosslinking reaction dependent to a slight extent on crosslink density as well as a small contribution from random scission reactions. G values for the random reactions are given.     

Mechanistic Studies Relevant to Bromouridine-Enhanced Nucleoprotein Photocrosslinking: Possible Involvement of an Excited Tyrosine Residue of the Protein

The results of mechanistic studies on formation of uridine (U) and N-acetyl-in-(5-uridinyl)tyrosine N-ethylam-ide (2) from irradiation of aqueous, pH 7 solutions of bromouridine (BrU) and N-acetyltyrosine JV-ethylamide (1) are reported. Solutions were irradiated with monochromatic laser emission at 266, 308 and 325 nm. Quantum yield measurements as a function of excitation wavelength suggest that both products result from excitation of the tyrosine derivative followed by electron transfer to BrU, possibly with intermediacy of the hydrated electron. The BrU radical anion ejects bromide to form the uri-dinyl radical, which then abstracts a hydrogen atom from 1 or adds to the aromatic ring of 1. Formation of adduct 2 is a model for photocrosslinking of nucleic acids bearing the bromouracil chromophore to adjacent tyrosine residues of proteins in nucleoprotein complexes. The value of 325 nm excitation in photocrosslinking, where the tyrosine chromophore is more competitive for photons, was demonstrated with an RNA bound to the MS2 bacteriophage coat protein; more than a 60% increase in the yield of photocrosslinking relative to that obtained with 308 nm excitation was achieved.     

Photochemistry of polymeric systems. I. Photocrosslinking of polymers and copolymers containing pyridine N-oxide groups

Vinylpyridine-N-oxide units were introduced in polymeric chains in order to study their photocrosslinking. Copolymers of styrene and 4-vinylpyridine-N-oxide were especially synthesized and studied. The methods used for characterization of photocrosslinked films were a “photoresist test” or the measurement of the insolubility and of the swelling ratio. The Cleavage of the N-oxide bond was responsible for the photocrosslinking. The competitive formation of carbonyl compounds took place and decreased the rate of photocrosslinking. This last reaction is favored by triplet-state quenchers. The photosensitivity of the copolymers was determined as a function of the wavelength of the radiation used. When the photocrosslinking proceeded, a film of the copolymeric material became transparent in the 280–320-nm range. Thick films could therefore be completely photocrosslinked when irradiated in this range of wavelength.     

Photosensitization of bioinspired thymine-containing polymers

Here, we report a sensitization study on a family of water-soluble photopolymers based on thymine. The goal of this study was to determine whether the presence of sensitizer molecules would promote photocrosslinking/immobilization of the polymers using low-energy irradiation (520 nm) as compared to the UV irradiation (approximately 280 nm) necessary for the standard photoinduced process to take place. With the aid of Eosin Y Spirit Soluble (EY) as a sensitizer, water-soluble polystyrene copolymers of vinylbenzylthymine-vinylbenzyltriethylammonium chloride (VBT-VBA) were immobilized after exposure to visible irradiation. By exciting the sensitizer molecule in the presence of VBT copolymers at a wavelength where absorption by the latter does not occur, the triplet state of the sensitizer is generated in high yields, and consequently, polymer photocross-linking takes place. UV-vis spectroscopy has been used to study the effect of irradiation dose, copolymer composition, and sensitizer concentration on the photoreactivity of VBT polymers. These studies demonstrate the feasibility of using Eosin Y as a sensitizer to achieve the thymine photodimer formation, resulting in immobilization of VBT-VBA-EY films on PET substrate. This provides complementary information on photoinduced immobilization of VBT-VBA films that are crucial for developing new classes of environmentally benign materials and new energy-saving methods.     

Azo‐Polymer Janus Particles Assembled by Solvent‐Induced Microphase Separation and Their Photoresponsive Behavior

We report the successful fabrication of photoresponsive Janus particles (JPs) composed of an epoxy‐based azo polymer and poly(methyl methacrylate) (PMMA). Two representative azo polymers, of which one polymer (BP‐AZ‐CN) has cyano groups as electron‐withdrawing substituents on the azobenzene moieties and the other polymer (BP‐AZ‐CA) has carboxyl groups as the electron‐withdrawing substituents, were adopted for the investigation. The nanoscaled JPs, with a narrow size distribution and different azo polymer/PMMA ratios, were fabricated through self‐assembly in solution and as dispersions. Upon irradiation with linearly polarized light (λ=488 nm), two types of photoresponsive behavior were observed for JPs in the solid state. For JPs composed of BP‐AZ‐CN and PMMA, the light irradiation caused the azo‐polymer component to be stretched along the light polarization direction. Conversely, for JPs composed of BP‐AZ‐CA and PMMA, the azo‐polymer component became separated from PMMA component under the same irradiation conditions. These observations are valuable for a deeper understanding of the nature of self‐assembly and photoinduced mass‐transport at the nanometer scale.     

ULTRAVIOLET ACTION SPECTRA FOR AEROBIC AND ANAEROBIC INACTIVATION OF Escherichia coli STRAINS SPECIFICALLY SENSITIVE AND RESISTANT TO NEAR ULTRAVIOLET RADIATIONS

Abstract— Action spectra for the lethal effects of ultraviolet light (254–434 nm) irradiation delivered under aerobic or anaerobic conditions to Escherichia coli RT2 (specifically sensitive to near-UV radiation; > 320 nm) and E. coli RT4 (near-UV resistant) were prepared. Negligible oxygen dependence was observed for both strains below about 315 nm. The oxygen enhancement ratio (OER) for RT4 increased above this wavelength to the longest wavelength used, whereas for RT2 there was a greater increase in the OER to a large peak at 365 nm, then a progressive decrease at longer wavelengths. The results are consistent with the possibility that the sensitivity of strain RT2 to near-UV radiation may be due to hyperproduction of photosensitizer, operating via photodynamic type reactions involving excited species of oxygen.     

Novel UV-sensitive bis-chalcone derivatives: synthesis and photocrosslinking properties in solution and solid PMMA film

A series of chalcone derivatives in which two chalcone groups are attached by alkyldioxy chains were synthesized and characterized by ¹H NMR, UV–Vis, and Fourier transform infrared (FTIR) spectral analysis. Upon the irradiation of 365-nm UV light, the chalcone groups in the molecules underwent [2π + 2π] photodimerization. The photocrosslinking properties were investigated both in solution and in polymethyl methacrylate (PMMA) solid films on quartz plate. It has been found that the photocrosslinking rates of the compounds depended on the different flexibility of the functional groups, which was determined by the length of the spacer chain between the two chalcone moieties. The longest soft chain containing derivatives has a faster photocrosslinking rate both in solution and in solid film. Irradiated by polarized ultraviolet light (PUV), all of the films doped with bis-chalcone derivatives showed an anisotropic absorption property, which may give a promising application as LC-alignment materials.