The possibility of separating hydrogen fluoride from its gaseous mixture with silicon tetrafluoride

We report in this paper investigations of the conditions necessary to effect the selective absorption of hydrogen fluoride from its gaseous mixture with silicon tetrafluoride when that mixture is brought into contact with solid sodium fluoride. Thus, when an anhydrous HF-SiF₄ gas mixture is brought into contact with granular NaF at room temperature only hydrogen fluoride is absorbed (giving NaF·HF), while silicon tetrafluoride remains in the gaseous state. In this way it is possible to separate HF from SiF₄. The hydrogen fluoride may subsequently be regenerated by heating the sodium hydrogen fluoride at 350–400°¹. If, however, the gaseous mixture contains only small traces of water vapor then SiF₄ also reacts with NaF to give Na₂SiF₆ in addition to NaF·HF. Under these circumstances it is not possible to effect a separation.     

Synthesis of nanosized silicon particles by a rapid metathesis reaction

A solid-state rapid metathesis reaction was performed in a bed of sodium silicofluoride (Na₂SiF₆) and sodium azide (NaN₃) powders diluted with sodium fluoride (NaF), to produce silicon nanoparticles. After a local ignition of Na₂SiF₆+4NaN₃+kNaF mixture (here k is mole number of NaF), the reaction proceeded in a self-sustaining combustion mode developing high temperatures (950–1000 °C) on very short time scales (a few seconds). Silicon nanoparticles prepared by the combustion process was easily separated from the salt byproducts by simple washing with distilled water. The structural and morphological studies on the nanoparticles were carried out using X-ray diffractometer (XRD) and field emission scanning electron microscope (FESEM). The mean size of silicon particles calculated from the FESEM image was about 37.75 nm. FESEM analysis also shows that the final purified product contains a noticeable amount of silicon fibers, dendrites and blocks, along with nanoparticles. The mechanism of Si nanostructures formation is discussed and a simple model for interpretation of experimental results is proposed.     

Zum Einfluß der Gasphase auf die thermische Zersetzung von K2[SiF6]

Effect of the Gas Phase on the Thermal Decomposition of K₂[SiF₆] K₂SiF₆ produced in usual ways is contaminated by traces of oxygen and protons. These and traces of water fed by gas atmosphere influence the thermal decomposition reaction. To study the influence of the gas phase definite amounts of H₂O and HF were added. The formation of SiF₄ was determined. The development of a SiO₂ phase in presence of H₂O and other experimental results suggest the construction of a layer on the K₂SiF₆ surface, which hinders further SiF₄ being developped. Temperature and linear velocity of the gas influence the length of a zone of decomposition migrating through the solid. This is explained by sorption and reaction behavior of intermediately formed fluorosiloxanes.     

Experimental investigation of the formation of double phosphates in the LaPO4–NaF system

In the course of segregation smelting of rare-earth and rare metal raw materials with a fluxing agent (NaF), two immiscible melts form, one of which is a silicate melt and the other is a phosphate–salt melt. The silicate melt is enriched with Fe₂O₃, Al₂O₃, SiO₂, and Nb₂O₅, and the phosphate–salt melt is dominated by P₂O₅, TR₂O₃, Sc₂O₃, and Y₂O₃, and also with Ca, Sr, and Ba oxides. Chemical reactions between lanthanum orthophosphate and sodium fluoride in the LaPO₄–NaF system were studied for developing a technology for processing the phosphate–salt (rare-earth metal) melt. It was found that a metathesis reaction gives double phosphate Na₃La[PO₄]₂ and binary fluoride NaLaF₄. The products of crystallization of melts in the LaPO₄–NaF system decompose in weak mineral acids unlike those in conventional technology for processing monazite raw material.     

Phasenbeziehungen und Natriumionenleitung im quasi-binären System Na2SiF6/Na3AlF6

Phase Relations and Sodium Ion Conductivity within the Quasi-binary System Na₂SiF₆/Na₂AIF₆ . The phase diagram of the Na₂SiF₆/Na₃AlF₆ system has been determined by means of x-ray powder diffraction, thermal analysis and conductivity measurements in the sub-solidus region. Na₃AlF₆ accomodates up to 73 mol.-% Na₂SiF₆ maintaining the crystal structure type. The sodium ion conductivity increases by about five orders of magnitude upon doping Na₃AlF₆ with Na₂SiF₆.     

Contributions to the mechanism of water glass hardening by using thermal analysis methods and X-ray diffractometry

Thermal analysis methods and X-ray diffractometry provided data on and permitted practical use of the eutectic mixture between Na₂O·2SiO₂ and SiO₂, which melts at 790°C. Based on this, water glass was used as a binder to obtain artificial cluster granules, ceramically hardened by heating at 800°C. The process of water glass hardening in the presence of hardening reagents such as Na₂SiF₆, NH₄Cl, silica gel and ultra-fine silica was studied by thermal analysis. In the first stage, gelification of the SiO₂ sol takes place by neutralization of the NaOH deflocculant, while the second stage involves tridimensional cross-linking by polycondensation, promoted by powders rich in SiO₂.

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Zusammenfassung Die durch Thermoanalyse und Röntgendiffraktion gewonnenen Daten ermöglichten die Nutzung eines eutektischen Gemisches aus Na₂O·2SiO₂ und SiO₂ mit einem Schmelzpunkt von 790°C. Auf dieser Basis wurde Wasserglas als Bindemittel zur Herstellung von künstlichen Cluster-Granulaten genutzt, die bei 800°C keramisch gehärtet wurden. Dieser Härtungsprozess von Wasserglas in Gegenwart von Härtemitteln wie z.B. Na₂SiF₆, NH₄Cl, Silikagel und ultrafeiner Kieselerde wurde mittels Thermoanalyse untersucht. Im ersten Schritt der Gelbildung aus dem SiO₂-Sol erfolgt die Neutralisation des NaOH-Deflokulanten, während der zweite Schritt durch Polykondensation eine dreidimensionale Vernetzung umfaßt, die durch SiO₂-reiche Pulver unterstützt wird.

     

Über die Thermische Zersetzung von Zink- und Cadmiumhexafluorosilikat

The simultaneous dehydration and decomposition of zinc and cadmium fiuorosilicates leads to the release of gaseous H₂O and SiF₄, which form amorphous SiO₂. The difference of the weight loss measured by thermogravimetry from the calculated value can be accounted for on the basis of the reaction mechanism given. The reaction of H₂O with SiF₄ affects the thermal dehydration and decomposition of the fluorosilicates studied, and complicated energy effects also occur.     

Phase Analysis of the Binary System of Cryolite (Na3AlF6) and Sodium Metasilicate (Na2SiO3)

The phase analysis of cryolite (Na₃AlF₆) and sodium metasilicate (Na₂SiO₃) was performed by thermal analysis. The eutectic system with a region of two immiscible substances at a concentration of Na₂SiO₃ between 42.8 and 46.3 mol‐% was identified and the eutectic temperature determined to (886±2) °C. Based on the results of mass‐loss measurements, it was assumed that the introduced Na₂SiO₃ reacts with Na₃AlF₆ due to the formation of some nonvolatile stable compounds. The stable reaction products were identified by X‐ray diffraction analysis and IR spectroscopy of the spontaneously cooled samples, which established the formation of NaF and stable amorphous aluminosilicate compounds.     

Chemical analysis of acidic silicon etch solutions: II. Determination of HNO3, HF, and H2SiF6 by ion chromatography

The processing of silicon in microelectronics and photovoltaics involves the isotropic chemical etching using HF-HNO₃ mixtures to clean the surface from contaminations, to remove the saw damage, as well as to polish or to texture the wafer surface. Key element of an effective etch process control is the knowledge of the actual etch bath composition in order to maintain a certain etch rate by replenishment of the consumed acids. The present paper describes a methods for the total analysis of the etch bath constituents HF, HNO₃, and H₂SiF₆ by ion chromatography. First step is the measurement of the total fluoride and nitrate content in the analyte. In a second step, H₂SiF₆ is precipitated as K₂SiF₆. After careful filtration of the precipitate, the fluoride concentration in the filtrate is measured and the content of free HF is calculated therefrom. The K₂SiF₆ is dissolved again and the fluoride content measured and recalculated as H₂SiF₆. The results obtained with the presented method are discussed with respect to the results from two other, previously published methods, based on a titration using methanolic cyclohexylamine solution as titrant and based on a method using a fluoride ion selective electrode (F-ISE). An evaluation with respect to the needs for an industrial application is given.     

Chemical analysis of acidic silicon etch solutions: I. Titrimetric determination of HNO3, HF, and H2SiF6

The chemical etching of silicon using HF-HNO₃ mixtures is a widely used process in the processing of silicon wafers for microelectronic or photovoltaic applications. The control of the etch bath composition is the necessary condition for an effective bath utilization, for the replenishment of the consumed acids, and to maintain a certain etch rate. The present paper describes two methods for the total analysis of the individual etch bath constituents HF, HNO₃, and H₂SiF₆. Both methods start with an aqueous acid-base titration determining the total acid concentration and the concentration of H₂SiF₆. The first method is an acid-base titration using a 0.1 mol L⁻¹ methanolic solution of cyclohexylamine (CHA) as non-aqueous titrant to determine the content of nitric acid. Then, the amount of hydrofluoric acid is calculated from the difference between the total acid and nitric acid content. The second method is based on the determination of the total fluoride concentration using a fluoride ion-selective electrode (F-ISE). The content of hydrofluoric acid is obtained from the difference between the total fluoride content and the amount of fluoride bound as H₂SiF₆. The amount of nitric acid results finally calculated as difference to the total acid content.     

A Fluorooxosilicophosphate with an Unprecedented SiO2F4 Species

The large number and structural beauty of silicates are largely due to the variety of connection mode of SiO₄ tetrahedra. SiO₆ and SiF₆ octahedra are also known and give rise for structural versatility of inorganic silicates. However, to date, the crystal structure of inorganic fluorooxosilicates with oxofluoride SiO_xF_4?x or SiO_xF_6?x species are unknown. Now, fluorine was successfully introduced into the silicophosphates, and the first fluorooxosilicophosphate K₄Si₃P₂O₇F₁₂ with an unprecedented SiO₂F₄ species was synthesized. The existence of Si?F bonds was verified by comprehensively experimental and theoretical work. Using ab initio and bond valence calculations, the oxofluoride SiO_xF_6?x species is shown to be stable when oxygen atoms connect to other atoms with strong covalent interactions. This work will contribute to the structural diversity of silicate chemistry by the exploration of the new fluorooxosilicates.     

Sodium fluoroaluminates formed in the reaction between aluminum fluoride solution and crystalline sodium fluoride

The reaction of aluminum fluoride solution with crystalline sodium fluoride was investigated. Conditions for the formation of Na₃AlF₆ (cryolite), Na₅Al₃F₁₄ (chiolite) and NaAlF₄.H₂O were established. The hitherto presumed to be unstable NaAlF₄.H₂O was isolated and its X-ray diffraction data as well as thermal behavior were determined. The possibility to convert these compounds one into the other was outlined.     

超声化学法制备不同形貌的CaF2微米晶

采用超声化学法,以CaCl2与不同氟源(NaBF4、K2SiF6)在溶液中反应,制得了不同形貌的CaF2微米晶(立方体、花状、多面体)。用XRD、SEM及TEM对产物晶相及形貌进行了表征。XRD结果显示所有产物均为结晶良好的立方相CaF2。SEM及TEM结果表明由NaBF4制得的产物形貌为均匀的立方体微米晶,而由K2SiF6制得的产物为多面体。在添加配体Na2EDTA的情况下,由NaBF4得到的产物为纳米片组成的花状结构。本文详细讨论了氟源种类、反应物比例、配体等反应参数对产物CaF2形貌的影响,并提出了可能的反应机理。     

Über den Einfluß von Kristallkeimen auf die Bildung von Silicaten der Zusammensetzung 3 CaO · 2 SiO2

On the Influence of Seed Crystals on the Formation of Calcium Silicates with the Composition 3 CaO · 2 SiO₂ The formation of the calcium silicates kilchoanite and rankinite of the composition 3 CaO · 2 SiO₂ is facilitated and enabled, respectively, in the presence of appropriate seed crystals. Kilchoanite (Ca₆[(SiO₄)(Si₃O₁₀)]) is formed from mixtures of CaO and SiO₂ in the autoclave at 200°C and from C? S? H (di, poly) under normal atmosphere at 700°C by seeding for example with kilchoanite, aluminium compounds, γ-Ca₂SiO₄. Rankinite (Ca₃Si₂O₇) can be synthesized under the same conditions, when rankinite itself is applied as seed crystal.     

Nature of influence exerted by Na<Subscript>2</Subscript>SiF<Subscript>6</Subscript> on REE recovery from orthophosphoric acid solution in the course of CaSO<Subscript>4</Subscript>·0.5H<Subscript>2</Subscript>O crystallization

Chemical and X-ray phase analyses were used to study the influence exerted by Na₂SiF₆ on the isomorphic inclusion of cerium into the structure of CaSO₄?0.5H₂O precipitates formed from solutions of phosphoric acid hemihydrate (38 wt % P₂O₅). The poorly soluble suspensions of CaSO₄?0.5H₂O precipitates can serve as adsorbents for cerium compounds, with CaSO₄?0.5H₂O–NaCe(SO₄)₂?H₂O and CaSO₄?0.5H₂O–CePO₄?0.5H₂O solid solutions formed. The introduction of Na₂SiF₆ makes the sorption properties CaSO4?0.5H2O several times better because the Na₂SiF₆ phase is a source of sodium cations and creates the necessary Na: Ce ratio of 1: 1 for extracting cerium from the liquid phase into a precipitate in the form of a CaSO₄?0.5H₂O–[NaCe(SO₄)₂?H₂O + CePO₄?0.5H₂O] solid solution. Under the industrial conditions in which extraction phosphoric acid is manufactured, a similar isomorphous capture of rare-earth elements of the cerium group (La–Sm) may occur in joint precipitation of CaSO₄?0.5H₂O and Na₂SiF₆.     

Reaktionen von Natronwasserglas mit Kaolin unter hydrothermalen Bedingungen

Reactions of Sodium Silicate with Kaolin under Various Hydrothermal Conditions The reactions of sodium silicate (molar ratio SiO₂/Na₂O 3.8) with kaolin were investigated under various conditions of hydrothermal treatment in saturated water vapours in an autoclave. The products of reaction were identified by X-ray, electron-microscopic, and infrared methods. The results have shown that, under autoclave conditions, sodium silicate reacts with kaolin to alumosilicagel or to a crystallized zeolite mineral analcime Na₂O · Al₂O₃ · 4 SiO₂ · 2 H₂O. At the reaction kaolin dissolves and α-quartz simultaneously appears in the product of reaction.     

Effect of synthesis parameters on the composition and properties of the product silica

The properties of two silica samples were studied; one sample precipitated by ammonia from a saturated (NH₄)₂SiF₆ solution and the other washed out from the sublimate obtained by joint evaporation of (NH₄)₂SiF₆ and SiO₂. These silicas are fundamentally different compounds. Their chemical composition was determined. Evolution of samples during heating to 1000°C was interpreted using chemical analysis, IR spectroscopy, and X-ray powder diffraction. A possibility of removing fluorine and ammonia from test samples by heat and chemical treatment is demonstrated. Fluorine impurities in the form of fluoroammonium salts are removed completely during heating to 300–400°C; surface fluoride ions are removed only upon heating to 800°C.     

A theoretical investigation of the electronic and geometrical structure of silicon fluorides SiF n and their anions SiF n −,n=1−6

The electronic and geometrical structure of the ground and low-lying excited states of the SiF _n and SiF_n ^– series (n = 1-6) are calculated using the density functional method. Energies of fragmentation through different decay channels were evaluated for both series and found to be in good accord with the experimental data and results of nonempirical calculations. The adiabatic electron affinity (EA) of the neutral series is estimated for the first time. The SiF₄ ^– anion is shown to be stable toward dissociation though its neutral precursor possesses adiabatic EA close to zero. The SiF₅ ^– and SiF₆ ^– anions are stable toward dissociation in the gas phase; however, the neutral radical SiF₅ is near the stability threshold and SiF₆ is unstable as regards dissociation to SiF₄+F₂. An interesting peculiarity of the silicon fluoride anions is their similar energy of F-detachment, i.e. the affinities of all the neutral SiF_n, (n = 0-5) for the fluoride anion are similar.Translated fromIzvestiya Akademii Nauk. Seriya Khimicheskaya, No. 1, pp. 44–53, January, 1993.     

(NH4)2SiF6 evaporation in the presence of SiO2

The kinetics and mechanism of the solid-phase reaction between (NH₄)₂SiF₆ and silica at molar ratios of (0.5–5): 1 were studied. SiO₂ is bound with (NH₄)₂SiF₆ to form volatile NH₄SiOF₃, which abruptly enhances the ammonium hexafluorosilicate evaporation. The activation energy and rate constants of evaporation were calculated for an (NH₄)₂SiF₆ + SiO₂ (2: 1) mixture in the range 220–300°C. The reaction with crystalline SiO₂ has a higher yield than with an amorphous “white soot.” The role of the SiO₂ surface in the formation of the volatile products is discussed. The phase and chemical composition of the sublimates was studied.     

Untersuchungen zur Reaktion zwischen Alkalihexafluorosilicaten und einigen oxidischen Niobverbindungen

Investigations of the Reaction between Alkalihexafluorosilicates and Some Oxidic Niobium Compounds The reactions of Na₂SiF₆ with M-Nb₂O₅ or NaNbO₃ always produce Na₂Nb₂O₅F₂ and the thermolysis product is NaNbO₃. On the other hand various reactions of K₂SiF₆. exist. Initially with M-Nb₂O₅ an intermediate phase of a bronzestructure type is formed, like α-K_0,25NbO_2,25F_0,75, being converted into K₃NbO₂F₄ and another amorphous niobium phase. Moreover K₂NbO₃F crystallizes in a long time reaction. However first of all K₂NaNbO₂F₄ is formed by the reaction of K₂SiF₆ with NaNbO₃ and only if there is an excess of K₂SiF₆ this substance is changed slowly into K₃NbO₂F₄. The thermolysis of K₃NbO₂F₄ can produce such compounds as K₆Nb₂O₇F₂.