Silicene on substrates:A theoretical perspective

Silicene, as the silicon analog of graphene, is successfully fabricated by epitaxially growing it on various substrates.Like free-standing graphene, free-standing silicene possesses a honeycomb structure and Dirac-cone-shaped energy band,resulting in many fascinating properties such as high carrier mobility, quantum spin Hall effect, quantum anomalous Hall effect, and quantum valley Hall effect. The existence of the honeycomb crystal structure and the Dirac cone of silicene is crucial for observation of its intrinsic properties. In this review, we systematically discuss the substrate effects on the atomic structure and electronic properties of silicene from a theoretical point of view, especially with emphasis on the changes of the Dirac cone.     

高性能石墨烯霍尔传感器

本文回顾了石墨烯霍尔传感器的相关研究工作.通过改善石墨烯生长转移和霍尔元件的微加工工艺,石墨烯霍尔元件和霍尔集成电路都展示出超越传统霍尔传感器的优异性能.石墨烯霍尔元件的灵敏度、分辨率、线性度和温度稳定性等重要指标都优于传统商用霍尔元件.通过开发一套钝化工艺,霍尔元件的稳定性有了明显提升.结合石墨烯材料的特点,展示了石墨烯在柔性磁传感和多功能传感领域的新颖应用.此外,成功实现了石墨烯/硅互补型金属-氧化物-半导体(CMOS)混合霍尔集成电路,并进行了应用展示.通过发展一套低温加工工艺(不超过180℃),将石墨烯霍尔元件制备在硅基CMOS芯片的钝化层上,从而与硅基CMOS电路实现了单片集成.本文的研究结果表明石墨烯在霍尔磁探测方向拥有重大的性能优势,在产业化应用中有巨大发展潜力.     

Transport properties of high-quality epitaxial graphene on 6H-SiC(0001)

We have extensively studied the electronic properties of epitaxial graphene grown on the Si face of a 6H silicon carbide substrate by thermal decomposition in an argon atmosphere. Using e-beam lithography, large van der Pauw structures as well as Hall bars were patterned. Their size ranged from millimeters down to submicrometer-sized Hall bars, the latter entirely placed on atomically flat substrate terraces. We found reproducible electronic properties, independent of the sample size and orientation, over a broad temperature range. A comparison of the mobility values indicated no enhanced scattering at the macroscopic step edges of the SiC substrate and due to adsorbed molecules. However, the strong coupling to the substrate results in an elevated charge carrier density n and a reduced mobility μ compared to exfoliated graphene. If n is decreased the mobility rises substantially (up to 29 000 cm²/V s at 25 K), and Shubnikov-de Haas oscillations and the graphene-like quantum Hall effect become visible. This leads to the conclusion that the electrons in epitaxial graphene have the same quasi-relativistic properties previously shown in exfoliated graphene and expected from theory.     

室温下石墨烯的霍尔效应实验研究

对用化学气相沉积法(CVD)研制的长、宽均为1.23 cm,厚度为3个原子层尺寸的石墨烯样品,进行了室温下的霍尔效应相关研究。实验中电极与石墨烯之间有良好的欧姆接触。通过范德堡法测量了样品在磁场强度为0.353 T,不同电流强度下的霍尔电压,并对结果进行处理分析,得到石墨烯的霍尔系数RH=7.00×10-7m3/C、载流子浓度n=10.52×1024/m3、霍尔元件乘积灵敏度KH=6.87×102m2/C。     

Extraction and scattering analyses of 2D and bulk carriers in epitaxial graphene-on-SiC structure

Hall effect measurements of a graphene-on-SiC system were carried out as a function of temperature (1.8–200 K) at a static magnetic field (0.5 T). With the analysis of temperature dependent single-field Hall data with the Simple Parallel Conduction Extraction Method (SPCEM), bulk and two-dimensional (2D) carrier densities and mobilities were extracted successfully. Bulk carrier is attributed to SiC substrate and 2D carrier is attributed to the graphene layer. For each SPCEM extracted carrier data, relevant three-dimensional or 2D scattering analyses were performed. Each SPCEM extracted carrier data were explained with the related scattering analyses. A temperature independent mobility component, which may related to an interaction between graphene and SiC, was observed for both scattering analyses with the same mobility limiting value. With the SPCEM, effective ionized impurity concentration of SiC substrate, extracted 2D-mobility, and sheet carrier density of the graphene layer are calculated with using temperature dependent static magnetic field Hall data.     

Quantized four-terminal resistances in a ferromagnetic graphene p-n junction

The quantum Hall and longitudinal resistances in four-terminal ferromagnetic graphene p-n junctions under a perpendicular magnetic field are investigated. In the Hall measurement, the transverse contacts are assumed to be located at the p-n interface to avoid the mixing of edge states at the interface and the resulting quantized resistances are then topologically protected. According to the charge carrier type, the resistances in a four-terminal p-n junction can be naturally divided into nine different regimes. The symmetric Hall and longitudinal resistances are observed, with many new robust quantum plateaus revealed due to the competition between spin splitting and local potentials.     

Effect of surface morphology on the electron mobility of epitaxial graphene grown on 0° and 8° Si-terminated 4H-SiC substrates

Graphene with different surface morphologies were fabricated on 8° -off-axis and on-axis 4H-SiC(0001) substrates by high-temperature thermal decompositions. Graphene grown on Si-terminated 8° -off-axis 4H-SiC(0001) shows lower Hall mobility than the counterpart of on-axis SiC substrates. The terrace width is not responsible for the different electron mobility of graphene grown on different substrates, as the terrace width is much larger than the mean free path of the electrons. The electron mobility of graphene remains unchanged with an increasing terrace width on Siterminated on-axis SiC. Interface scattering and short-range scattering are the main factors affecting the mobility of epitaxial graphene. After the optimization of the growth process, the Hall mobility of the graphene reaches 1770 cm 2 /V·s at a carrier density of 9.8.×10 12 cm 2 . Wafer-size graphene was successfully achieved with an excellent double-layer thickness uniformity of 89.7% on a 3-inch SiC substrate.     

光子石墨烯中赝磁场作用下的谷霍尔效应

将石墨烯中赝磁场的产生机理运用于光子石墨烯,通过在光子石墨烯中引入晶格有规律单轴形变的方式,理论分析得到了谷依赖的均匀赝磁场,并通过数值模拟的方法观察到明显的谷霍尔效应.这种谷霍尔效应的显著程度随晶格形变度的增加而加强.在具有一定损耗的电介质材料构成的形变光子石墨烯中仍可观察到明显的谷霍尔效应.随着电介质材料损耗的增加,谷霍尔效应导致的波束转弯效果依然能够保持,只是强度逐渐变弱.类似于自旋电子学中的自旋霍尔效应,这种光子石墨烯中等效赝磁场作用下的谷霍尔效应在未来谷极化器件的设计和应用中具有重要意义.     

Temperature dependence of the thickness and morphology of epitaxial graphene grown on SiC （0001） wafers

Epitaxial graphene is synthesized by silicon sublimation from the Si-terminated 6H–SiC substrate. The effects of graphitization temperature on the thickness and surface morphology of epitaxial graphene are investigated. X-ray photoelectron spectroscopy spectra and atomic force microscopy images reveal that the epitaxial graphene thickness increases and the epitaxial graphene roughness decreases with the increase in graphitization temperature. This means that the thickness and roughness of epitaxial graphene films can be modulated by varying the graphitization temperature. In addition, the electrical properties of epitaxial graphene film are also investigated by Hall effect measurement.     

On triggering role of carrier mobility for Laughlin state organization

Recent experiments with suspended graphene have corroborated an important role of carrier mobility in the competition between Laughlin state and insulating state, presumably of Wigner-type electron crystal. Moreover, the fractional quantum Hall effect (FQHE) in graphene has been observed at low carrier densities when the interaction was reduced due to carrier dilution. This suggests that not solely interaction and the flat band with quenched kinetic energy may be important for formation of FQHE. Here, some exclusive for 2D topological arguments are supposed to explain the triggering role of carrier mobility in formation of the collective FQHE state, when conditions of sufficient flattening of a band and interaction presence are fulfilled.     

石墨烯与金属的欧姆接触理论研究

石墨烯材料应用于多种电子器件时不可避免地要与金属电极接触,它们之间的接触电阻直接影响了器件的性能.为了揭示影响金属电极与石墨烯间接触电阻的因素,提出有效地抑制这些影响的措施,本文建立了一种求解接触电阻的物理模型,将载流子的输运分为金属与正下方石墨烯之间、正下方石墨烯与邻近石墨烯之间的两个过程,分别研究各个过程的输运概率;结合金属电极与石墨烯接触对载流子分布的影响分析接触电阻,据此分别探讨了金属电极材料、栅极电压、掺杂浓度、金属与石墨烯原子距离等对接触电阻的影响.为验证理论分析结果的正确性,制作了金与石墨烯接触的实验样品,实验测得的接触电阻与理论分析结果符合.理论分析结果表明,可通过选择与石墨烯功函数接近的金属材料,降低二氧化硅层厚度,增加载流子平均自由程,改进金属材料的表面形态使其更光滑,减小金属与石墨烯耦合长度等方法降低石墨烯与金属电极的接触电阻.     

Engineering and metrology of epitaxial graphene

Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.     

硅基底石墨烯器件的现状及发展趋势

石墨烯是一种由单层碳原子紧密排列而形成的具有蜂窝状结构的二维晶体材料,特殊的结构赋予了其优异的性能,如高载流子迁移率、电导率、热导率、力学强度以及量子反常霍尔效应.由于石墨烯优异的特性,迅速激起了人们对石墨烯研究以及应用的热情.石墨烯沉积或转移到硅片后,其器件构建与集成和传统硅基半导体工艺兼容.基于石墨烯的硅基器件与硅基器件的有机结合,可以大幅度提高半导体器件的综合性能.随着石墨烯制备工艺和转移技术的优化,硅基底石墨烯器件将呈现出潜在的、巨大的实际应用价值.随着器件尺寸的纳米化,器件的发热、能耗等问题成为硅基器件与集成发展面临的瓶颈问题,石墨烯的出现为解决这些问题提供了一种可能的解决方案.本文综述了石墨烯作为场效应晶体管研究的进展,为解决石墨烯带隙为零、影响器件开关比的问题,采用了量子限域法、化学掺杂法、外加电场调节法和引入应力法.在光电器件研究方面,石墨烯可以均匀吸收所有频率的光,其光电性能也受到了广泛的关注,如光电探测器、光电调制器、太阳能电池等.同时,石墨烯作为典型的二维材料,其优越的电学性能以及超高的比表面积,使其作为高灵敏度传感器的研究成为纳米科学研究的前沿和热点领域.     

The physics of epitaxial graphene on SiC(0001)

Various physical properties of epitaxial graphene grown on SiC(0001) are studied. First, the electronic transport in epitaxial bilayer graphene on SiC(0001) and quasi-free-standing bilayer graphene on SiC(0001) is investigated. The dependences of the resistance and the polarity of the Hall resistance at zero gate voltage on the top-gate voltage show that the carrier types are electron and hole, respectively. The mobility evaluated at various carrier densities indicates that the quasi-free-standing bilayer graphene shows higher mobility than the epitaxial bilayer graphene when they are compared at the same carrier density. The difference in mobility is thought to come from the domain size of the graphene sheet formed. To clarify a guiding principle for controlling graphene quality, the mechanism of epitaxial graphene growth is also studied theoretically. It is found that a new graphene sheet grows from the interface between the old graphene sheets and the SiC substrate. Further studies on the energetics reveal the importance of the role of the step on the SiC surface. A first-principles calculation unequivocally shows that the C prefers to release from the step edge and to aggregate as graphene nuclei along the step edge rather than be left on the terrace. It is also shown that the edges of the existing graphene more preferentially absorb the isolated C atoms. For some annealing conditions, experiments can also provide graphene islands on SiC(0001) surfaces. The atomic structures are studied theoretically together with their growth mechanism. The proposed embedded island structures actually act as a graphene island electronically, and those with zigzag edges have a magnetoelectric effect. Finally, the thermoelectric properties of graphene are theoretically examined. The results indicate that reducing the carrier scattering suppresses the thermoelectric power and enhances the thermoelectric figure of merit. The fine control of the Fermi energy position is thought to be key for the practical use of graphene as a thermoelectric material, which could be achieved with epitaxial graphene. All of these results reveal that epitaxial graphene is physically interesting.     

Electric- and magnetic-field-tuned Landau levels and Hall conductivity in AA-stacked bilayer graphene

We theoretically study the combined effect of magnetic and electric fields on the Landau levels and Hall conductivity in AA-stacked bilayer graphene. From the analytic expressions derived, we obtain explicit criterions for determining the zero-energy Landau level and different level crossings in the graphene bilayer. For providing a scheme of experimental verification, we further explore the quantum Hall effect in such a biased bilayer. It is found that the zero-conductance Hall plateau in this system can vanish at certain specific combinations of magnetic and electric fields, accompanying with the occurrence of resonance Hall conductivity steps.     

金属衬底上高质量大面积石墨烯的插层及其机制

石墨烯作为一种新型二维材料,因其优异的性质,在科学和应用领域具有非常重要的意义.而其超高的载流子迁移率、室温量子霍尔效应等,使其在信息器件领域备受关注.如何获得高质量并且与当代硅基工艺兼容的石墨烯功能器件,是未来将石墨烯应用于电子学领域的关键.近年来,研究人员发展了一种在外延石墨烯和金属衬底之间实现硅插层的技术,将金属表面外延石墨烯高质量、大面积的特点与当代硅基工艺结合起来,实现了无需转移且无损地将高质量石墨烯置于半导体之上.通过系统的实验研究并结合理论计算,揭示了插层过程包含四个主要阶段:诱导产生缺陷、异质原子插层、石墨烯自我修复和异质原子扩散成膜,并证实了这一插层机制的普适性.拉曼和角分辨光电子能谱实验结果表明,插层后的石墨烯恢复了本征特性,接近自由状态.此外,还实现了多种单质元素的插层.不同种类的原子形成不同的插层结构,从而构成了多种石墨烯/插层异质结.这为调控石墨烯的性质提供了实验基础,也展现了该插层技术的普适性.     

光电子材料InP玷污的研究

文章给出了光电子材料InP （100）和（111）晶面质谱分析的结果，对（100）晶面做了光荧光分析。在300和77K温度下测量了（100）晶面的电子浓度及电子迁移率。研究表明玷污主要来自硅。     

Intercalation of metals and silicon at the interface of epitaxial graphene and its substrates

Intercalations of metals and silicon between epitaxial graphene and its substrates are reviewed. For metal intercala- tion, seven different metals have been successfully intercalated at the interface of graphene/Ru（O001） and form different intercalated structures. Meanwhile, graphene maintains its original high quality after the intercalation and shows features of weakened interaction with the substrate. For silicon intercalation, two systems, graphene on Ru（O001） and on Ir（l I 1）, have been investigated. In both cases, graphene preserves its high quality and regains its original superlative properties after the silicon intercalation. More importantly, we demonstrate that thicker silicon layers can be intercalated at the interface, which allows the atomic control of the distance between graphene and the metal substrates. These results show the great potential of the intercalation method as a non-damaging approach to decouple epitaxial graphene from its substrates and even form a dielectric layer for future electronic applications.     

Electrical properties of purified solar grade silicon substrates using a combination of porous silicon and SiCl4

This work investigates the photo-thermal treatment of solar grade (SG) silicon to reduce impurities to a low level suitable for high efficiency low-cost solar cells application. It describes experiment carried out by using a tungsten lamps furnace (rapid thermal processing, RTP) to purify solar grade silicon wafers using a combination of porous silicon (PS) and silicon tetrachloride. This process enables to attract the impurities towards the porous layer where they react with SiCl₄ to form metallic chlorides. The gettering effect was studied using the Hall Effect and the Van Der Pauw methods to measure the resistivity, the majority carrier concentration and mobility. We have obtained a significant improvement of the majority carrier mobility after such thermo-chemical treatment. The gettering efficiency is also evaluated by the relative increase of the minority carrier diffusion length L, measured by the light beam induced current (LBIC) technique.     

不同织构CVD金刚石膜的Hall效应特性

采用热丝化学气相沉积法在p型硅衬底上制备了不同织构的多晶金刚石膜,使用XRD表征了CVD金刚石膜的结构特征, 研究了退火后不同织构金刚石膜的电流特性, 使用Hall效应检测仪研究了金刚石膜的霍尔效应特性及随温度变化的规律, 结果表明所制备的金刚石膜是p型材料, 载流子浓度随着温度的降低而增加, 迁移率随着温度的降低而减小. 室温下[100]织构金刚石薄膜的载流子浓度和迁移率分别为4.3×10⁴ cm^-3和76.5 cm²/V·s.