部分偏振光通过透镜时的偏振像差分析

本文定量推导了轴上物点发出的部分偏振光通过透镜时其偏振度、偏振分量方位角和椭率角与透镜参数和入射光参量间的关系。对已知参数的透镜进行了定量计算，表明处于一定偏振状态的部分偏振光经透镜后其偏振度、偏振分量方位角和椭率角在出射光束截面上呈一定分布，产生偏振像差。给出了部分偏振光基本参量变化的数量级。指出在高精度光学测量中为避免透镜偏振像差影响，应尽可能减小光束半径和发散角。     

快速空间测角系统中偏振像差的分析与研究

快速空间测角系统需要在一定的平移范围内均能实现测量功能,这就要求光束在接收单元具有一定的覆盖面积.受器件尺寸所限,选择对入射光束进行扩束,然而非正入射光经过系统会产生偏振态变化,存在偏振像差,引起测量误差.本文通过采用偏振光线追迹的方法,结合电磁场的边界条件,对快速空间测角系统中一定方位及入射角范围内的光束通过偏振棱镜后出射光束的偏振态变化与分布进行了理论研究及仿真分析;并通过搭建实验平台,利用平移接收单元来模拟不同的入射方位及角度变化.根据实验值与仿真结果的对比分析,得出在方位角为0o时,测量误差较小,在方位角为90o时,测量误差最大,且随平移距离(即入射角)的增大,测角误差增大.验证了偏振像差的存在对系统测角带来的影响及理论分析的正确性,并提出了改进措施.所得研o究结果对优化系统结构并进一步提高系统性能具有一定的指导意义.     

光学元件偏振参数的测量方法及装置

基于偏振光理论,对线偏振光经光学系统单个或多个元件反射后的偏振变化进行了理论分析:分析表明,通过适当调整反射光s、p分量的振幅系数r_s、r_p的值,可使经多个元件后偏振光的偏振度损失小于单个元件;同时给出了准确确定光束入射面的方法.在一简易装置上,测得780 nm高反的两反射镜(介质膜和银膜)在偏振角和入射角均为45°时其偏振保偏比分别为1 000∶1和40 000∶1,且确定了两镜的振幅系数比(r_p/r_s)和相位差δ,结果和椭偏仪一致.该方法及装置,一方面可为大学物理中偏振相关的实验提供理论和实验指导,另一方面可用于科研或工程实际中在线准确测量光学元件或系统的偏振参数(r_p/r_s,δ及偏振保偏比).     

涡旋光束在反射中的正交偏振特性研究

本文从角谱理论出发建立了涡旋光束在空气-玻璃界面反射时的傍轴传输模型, 并研究了反射过程中诱导产生的正交偏振效应. 当一水平偏振涡旋光束以不同角度入射时, 反射光束的正交偏振分量呈现出类似于一阶厄米-高斯模式的双峰强度分布, 而水平偏振分量强度分布呈现与入射光束相似的分布, 且只在布儒斯特角附近入射时才现出与正交偏振分量垂直的双峰分布. 对于任意线偏振入射光, 其正交偏振分量的偏振方向不再垂直于入射时的偏振方向, 而是与反射光束的中心波矢垂直, 此时正交偏振分量出现有趣的旋转特性, 其物理原因归结于任意线偏振光入射时所对应的水平与垂直偏振分量的反射系数不同. 最后进行了相关实验验证, 发现实验结果与理论分析符合得较好. 关键词： 正交偏振 涡旋光束 任意线偏振     

反射式旋转对称光学系统中的偏振像差分析

为了控制反射式旋转对称光学系统中的偏振效应,对该类系统中的偏振像差进行了分析。在偏振像差理论的基础上,通过偏振光线追迹的方法,导出反射式旋转对称光学系统的偏振像差的计算公式,提出了反射界面产生的偏振像差的影响因子,对影响其偏振像差的因素进行了分析。实例分析结果表明,对于具有宽光谱、大入射角、大视场等特点的反射式旋转对称光学系统,要想提高其光学系统的性能,必须控制光学系统的偏振像差。提出尽可能减小入射角的大小,并通过薄膜设计减小偏振分离来降低系统中的偏振效应,是控制反射式旋转对称光学系统中的偏振像差的有效措施。     

任意偏振态光束全反射时的侧向和横向位移

光束在电介质界面发生全反射时,实际反射光束会在入射面内相对于几何反射光束产生一侧向位移,在垂直于入射面的方向产生一横向位移。利用改进的能流法研究了任意偏振态光束发生全反射时的侧向和横向位移特性。研究表明,侧向位移的大小与入射光束的两组成部分———TE和TM偏振光的相位差无关,而与两组分的光强比密切相关,且该位移可以表示为TE和TM偏振光束各自的位移按光强的加权平均。横向位移的大小不仅与入射光束两组分的光强比相关,还与组分的相位差密切相关。另外,反射光束不仅在椭圆偏振态入射的情况下会产生横向位移,而且在TE和TM偏振态之外的其他线偏振态入射时,也会产生横向位移。     

关于部分偏振光能量传递和偏振态的光线椭圆分析方法

部分偏振光传播时的光强和偏振态变化情况比较复杂, 尤其是当大数值孔径成像时, 光束的偏振态还会影响成像质量. 本文提出一种用于分析部分偏振光能量传递和偏振态的光线椭圆方法, 采用光线椭圆叠加的办法来分析光束在各向同性的均匀介质中传输时能量和偏振态的变化情况, 同时直观性好, 计算量小. 论文最后, 对大数值孔径、 高像质的齐明透镜系统讨论了入射无偏振光的能量、 偏振态变化, 以及偏振效应问题. 结果表明, 大数值孔径使成像光束中TM偏振光强度相对增加, 影响成像对比度; 提高像方介质的折射率, 会改善此种偏振效应问题.     

非偏振分光镜对外差干涉仪非线性误差的影响

除了激光源、偏振分光镜（PBS）和波片等偏振器件之外,非偏振分光镜（NPBS）也是外差干涉仪中重要的非线性误差源。研究了多层介质膜NPBS的退偏效应和方位角对非线性误差的影响。采用p、s分量透射比、反射比、反射相移和透射相移共同表征NPBS的退偏效应,并逐项分析了其非线性误差模型。如果入射光束为理想线偏振光,则只有NPBS的反射相移和透射相移影响测量精度。如果入射光束存在偏振椭圆化和非正交,则NPBS的方位角、透射比和反射比、相移等参数的变化都会引入非线性误差,误差曲线的斜率受椭圆率和非正交角的影响。因此选用不同的激光源,同一个NPBS产生的非线性误差大小不同,一般可达几个纳米量级。为了实现纳米/亚纳米级精度的外差干涉测量,选择性能稳定的NPBS,特别是NPBS退偏效应与激光源输出偏振态之间的匹配非常重要。     

NA1.35投影光刻光学系统偏振像差的优化

为了实现NA1.35投影光刻光学系统高质量成像，在设计过程中除了控制波像差，还需进一步优化光学系统的偏振像差。利用Jones光瞳和物理光瞳表达了NA1.35投影光刻光学系统的偏振像差，并用二向衰减量与延迟量分析了光学系统偏振像差的大小；根据光线入射到不同光学面上最大入射角度的不同，为每个光学面设计相应的膜系以优化光学系统的偏振像差。相比于采用常规膜系，膜系优化后NA1.35投影光刻光学系统的二向衰减量和延迟量分别减小到了0.021 8、0.057 2 rad，即减小了光学系统的偏振像差。利用Prolith光刻仿真软件，分别对采用常规膜系和优化膜系的NA1.35投影光刻光学系统进行曝光性能仿真，结果显示:膜系优化后光学系统的成像对比度提高了4.4%，证明了NA1.35投影光刻光学系统偏振像差优化方法的有效性。     

相干激光通信光学系统偏振像差研究

相干激光通信系统中,光学系统的偏振像差会改变信号光的偏振态,降低信号光与本振光的混频效率。为了定量分析和研究光学系统的偏振特性,提出了三维偏振光线追迹算法。针对大口径相干激光通信检测平台系统,利用该算法对平台的通信系统进行偏振光线追迹,并根据追迹计算所得的偏振变换矩阵,分析了偏振像差对圆偏振信号光偏振态的影响。通过搭建实验平台,验证了平台通信系统的偏振特性。     

慧差对线偏振贝塞耳-高斯光束聚焦场的影响

利用Richards-Wolf矢量衍射积分公式,获得线偏振贝塞耳-高斯光束经具有初级慧差的高数值孔径系统聚焦后的三维光场复振幅函数,根据复振幅函数模拟了不同慧差系数下线偏振贝塞耳-高斯光束各分量及总光场在焦平面上的光强分布模式。研究结果表明,初级慧差使线偏振贝塞耳-高斯光束聚焦光场在焦平面的分布由双轴对称变成单轴对称,光强模式发生改变;各分量及总光场的光强模式中的光斑位置随初级慧差系数的增大偏离光轴;大的初级慧差使焦平面出现干涉条纹。     

A possible origin of room temperature ferromagnetism in Indium-Tin oxide thin film: Surface spin polarization and ferromagnetism

Room temperature ferromagnetism in both transition-metals doped and undoped semiconductor thin films and nanostructures challenges our understanding of the magnetism in solids. In this report, we performed the magnetic measurement and Andreev reflection spectroscopy study on undoped Indium-Tin oxide (ITO) thin films and bulk samples. The magnetic measurement results of thin films show that the total magnetization/cm² is thickness independent. Prominent ferromagnetism signal was also discovered in bulk samples. Spin polarized electron transports were probed on ITO thin film/superconductor interface and bulk samples surface/superconductor interface. Based on the magnetic measurement results and spin polarization measurement data, we propose that the ferromagnetism in this material originates from the surface spin polarization and this surface polarization may also explain the room temperature ferromagnetism discovered in other undoped oxide semiconductor thin films and nanostructures.     

微结构对Eu掺杂Bi4Ti3O12铁电薄膜铁电性能的影响

采用金属有机物分解法在Pt/Ti/Si(111)基底上制备了退火温度分别为600℃,650℃,700℃的Bi_3.15Eu_0.85Ti₃O₁₂(BET)铁电薄膜,并对其结构及铁电性能进行了测试,再使用扫描探针显微镜对BET薄膜的电畴翻转进行了实时观测.BET薄膜c畴发生180°畴变的最小电压为+6V,而r畴由于其高四方性,即使极化电压增至+12V也不会发生翻转.薄膜的铁电性主要源于c畴的极化,随着退火温度的升高,c畴的区域面积增加,BET薄膜的剩余极化强度随之增大.退火温度为700℃的BET薄膜剩余极化强度达到84μC/cm². 关键词： 铁电薄膜 电畴翻转 扫描探针显微镜     

Accuracy of Determining the Optical Parameters of Thin Films by the Method of the Reflectance-Spectrum Extrema Envelopes

A technique to evaluate the accuracy with which the optical parameters of thin films are determined by the method of reflectance-spectrum extrema envelopes is presented. The general case of s-polarized light impinging obliquely on a weakly absorbing thin film formed on an absorbing substrate is discussed. Rather simple analytical expressions are derived which can easily be used in program realization on computers for calculating errors. On the basis of the error analysis, a procedure for determining the optical constants and thickness of thin films is proposed, which allows one to reach the maximum accuracy in solving the inverse problem of spectrophotometry. The optical constants and the thicknesses of the films of perylenetetracarboxylic acid and 2-[4-(4-aminophenyl)phenyliminomethyl]phenol formed on silicon substrates are found by the developed technique in the spectral range 550–900 nm.     

Inscription of holographic gratings using circularly polarized light: influence of the optical set-up on the birefringence and surface relief grating properties

The polarization properties of the optical set-up used for holographic recording of diffraction gratings on azopolymer thin films are analyzed. The state of polarization of circularly polarized light is fully analyzed after reflection on a mirror at various incidences (Lloyd-mirror set-up). The Stokes analysis is performed using a photopolarimeter and the phase shift, the ellipticity and the azimuth orientation are compared with those calculated from Fresnel formulae. At large angles of incidence, an initially right circularly polarized (RCP) beam becomes elliptically polarized with an azimuth of nearly +45°. From these results, holographic diffraction gratings are recorded on an azobenzene-containing polymer thin film using (i) co- and contra-circularly polarized beams and (ii) a right circularly polarized beam interfering with a +45° linearly polarized light beam. Using Jones-matrix formalism, the polarization states of the diffracted orders from the birefringence (Δn) and the surface-relief (2Δd) gratings are derived and compared with experimental measurements. Finally, the induced local birefringences and surface-relief amplitudes are discussed in connection with atomic force microscopy measurements. The diffraction efficiencies obtained under the (+45°+RCP) and (LCP + RCP) (where LCP = left circularly polarized) configurations are thus compared and discussed. Received: 5 October 2001 / Revised version: 26 November 2001 / Published online: 17 January 2002     

分振幅型全Stokes同时偏振成像系统波片相位延迟误差分析

分振幅型全Stokes同时偏振成像仪具有实时性好、空间分辨率高、精度高等优点,有很高的应用价值.分振幅型全Stokes同时偏振成像系统利用偏振分束器、1/2波片和1/4波片将入射光Stokes矢量调制在4幅图像中,可解析入射光Stokes矢量. 1/2波片和1/4波片的相位延迟误差对Stokes矢量测量精度有着不可忽略的影响.建立了包含上述两种误差的Stokes矢量测量误差方程,分析了1/2波片和1/4波片相位延迟耦合误差对自然光、0°/45°线偏光、左旋圆偏光等典型基态入射光的Stokes矢量测量误差的影响,推导了任意偏振态的Stokes矢量测量误差的表征方法.在邦加球球面和球内选取不同偏振度的Stokes矢量作为入射光进行仿真.结果表明, Stokes矢量测量误差和偏振度测量误差均随着入射光偏振度的增大而增大.选取入射光偏振度为1时的偏振测量精度评估系统.为满足2%的偏振测量精度, 1/2波片相位延迟误差应在±1.6°内, 1/4波片相位延迟误差应在±0.5°内.这对提高系统的偏振测量精度具有重要意义,为系统设计和研制提供了重要的理论指导.     

掺杂和未掺杂氧化锌薄膜的拉曼光谱

利用拉曼光谱分别对不同衬底上,未掺杂和掺杂以及掺杂浓度不同的ZnO薄膜进行了系统的分析研究。其中ZnO薄膜均由溶胶-凝胶法制得,掺杂源为LiCl。测得的拉曼光谱显示,Pt/Ti/SiO2/Si衬底上生长的ZnO薄膜的拉曼特征峰(437cm-1)的强度明显高于SiO2/Si衬底上ZnO薄膜的拉曼特征峰的强度,说明Pt/Ti/SiO2/Si衬底上ZnO的晶化程度比SiO2/Si上ZnO的晶化程度高;但ZnO拉曼特征峰的位置和半高宽并没有发生变化,说明两种衬底上ZnO薄膜中应力大小没有发生变化。掺Li+后,580cm-1处的峰位向高频方向移动,且掺杂浓度越大频移量越大,说明掺杂已经在不同程度上引起了ZnO晶体中自由载流子浓度的变化。此外,还分析了掺Li+未在很大程度上引起ZnO晶格畸变的原因。     

Changes in the intensity distribution and polarization of non-uniformly polarized beams focused by a spherically aberrated lens with annular aperture

Based on the generalized Huygens-Fresnel diffraction integral and beam coherence polarization (BCP) matrix formulation, the focusing properties of a type of non-uniformly polarized (NUP) beam through a spherical aberrated lens with annular aperture are studied. The dependence of focal shift, intensity distribution, power in the bucket (PIB) and degree of polarization on the spherical aberration coefficient, obscure ratio and polarization parameters is illustrated numerically. The focusing of NUP beams by a spherically aberrated lens with circular aperture is treated as a special case, where the inner radius of the aperture is equal to zero.     

Investigations of aluminum films with synchrotron radiation of wavelengths 500 to 1000 Å

Measurements of the photocurrent from thin Al cathodes in a windowless electron multiplier as a function of wavelength, polarization, angle of incidence, and film thickness have been carried out in the extreme vacuum ultraviolet. A normal incidence monochromator utilizing synchrotron radiation provided highly polarized light. A marked difference is found between the photocurrent measured during irradiation of thin films with “s” and “p” polarized light at wavelengths near the Al plasma wavelength (835 Å). For films thicker than about 500 Å pronounced interference effects are found in both “p” and “s” light at wavelengths less than the plasma wavelength. The observations can be explained by assuming the photocurrent is related to the photon density (electromagnetic energy density) in the photocathode. Calculations of the energy density in films irradiated with light give the structure found in the measured photocurrent. The measurements indicate our monochromator yields light with a degree of polarization consistent with the calculated polarization of the synchrotron radiation incident upon our grating (about 85%).