High-Temperature Annealing Induced He Bubble Evolution in Low Energy He Ion Implanted 6H-SiC

Bubble evolution in low energy and high dose He-implanted 6 H-SiC upon thermal annealing is studied. The(0001)-oriented 6 H-SiC wafers are implanted with 15 keV helium ions at a dose of 1×10~(17) cm~(-2) at room temperature. The samples with post-implantation are annealed at temperatures of 1073, 1173, 1273, and 1473 K for30 min. He bubbles in the wafers are examined via cross-sectional transmission electron microscopy(XTEM)analysis. The results present that nanoscale bubbles are almost homogeneously distributed in the damaged layer of the as-implanted sample, and no significant change is observed in the He-implanted sample after 1073 K annealing. Upon 1193 K annealing, almost full recrystallization of He-implantation-induced amorphization in 6 H-SiC is observed. In addition, the diameters of He bubbles increase obviously. With continually increasing temperatures to 1273 K and 1473 K, the diameters of He bubbles increase and the number density of lattice defects decreases.The growth of He bubbles after high temperature annealing abides by the Ostwald ripening mechanism. The mean diameter of He bubbles located at depths of 120-135 nm as a function of annealing temperature is fitted in terms of a thermal activated process which yields an activation energy of 1.914+0.236 eV.     

铅离子辐照注碳4H—SiC的红外光谱特性研究

主要研究了铅离子辐照注碳4H—SiC样品在3个不同退火温度下傅立叶变换红外光谱的变化。从红外谱的变化可以知道铅辐照注碳4H-SiC样品在一定深度内出现了非晶层,波数在960—1450cm^-1范围内出现了干涉带,干涉带强度随着退火温度的升高而 变弱。1373K退火后样品的卢瑟福背散射分析结果显示,一定深度内硅原子的背散射产额明显减少。4H-SiC specimens were implanted with C-ions and then irradiated with Pb-ions, and subsequently annealed at three different temperatures. The samples were investigated by using Fourier transformation infrared spectrum（FTIR） and Rutherford backward scattering（RBS）. The obtained FTIR spectra showed that there is a buried amorphous layer close to the ion-incident surface and there are several interference fringes in the range from 960 to 1 450 cm ^-1. The intensity of fringes decreases with the increase of annealing temperature. The obtained RBS spectra showed that the yield of Si atoms in 4H-SiC crystal decreases in a well-defined depth region after annealing at 1 373 K.     

Divacancy in 4H-SiC

Electron paramagnetic resonance and ab initio supercell calculations suggest that the P6/P7 centers, which were previously assigned to the photoexcited triplet states of the carbon vacancy-antisite pairs in the double positive charge state, are related to the triplet ground states of the neutral divacancy. The spin density is found to be located mainly on three nearest C neighbors of the silicon vacancy, whereas it is negligible on the nearest Si neighbors of the carbon vacancy.     

Annealing Behavior of 57Fe Implanted in ZrO2(Y)

Using conversion electron Mossbauer spectroscopy(CEMS) and slow positron beam, the chemical states of the implanted ⁵⁷Fe (100KeV,3 × 10 ¹⁶ ions/cm ²) in ZrO₂ containing 3 mol% Y ₂O ₃( ZY ₃) and its thermodynamic behavior during annealing process with the temperature from 200 to 500°C were studied. After annealing at 400°C the complex of Fe³⁺-V has been mostly dissolved, and the prior phase to α-Fe and α-Fe nano-crystalline cluster were present in the sample. Meanwhile the mixed conducting of oxygen-ions and electrons in the ZY₃ containing Fe sample appeared. This revised version was published online in August 2006 with corrections to the Cover Date.     

Irradiation-induced magnetism in carbon nanostructures

Nitrogen (15N) and carbon (12C) ion implantations with implant energy of 100 keV for different doses were performed on nanosized diamond (ND) particles. Magnetic measurements on the doped ND show ferromagnetic hysteresis behavior at room temperature. The saturation magnetization (M(s)) in the case of 15N implanted samples was found to be higher compared to the 12C implanted samples for dose sizes greater than 10(14) cm(-2). The role of structural modification or defects along with the carbon-nitrogen (C-N) bonding states for the observed enhanced ferromagnetic ordering in 15N doped samples is explained on the basis of x-ray photoelectron spectroscopy measurements.     

Investigation of the 4H-SiC surface

The silicon carbide (SiC) surface is more complex than that of silicon and can be carbon-terminated or silicon-terminated, and can exist as several reconstructions. Investigations of the surface structure as a function of temperature, under ultrahigh vacuum (UHV) conditions using scanning tunneling microscopy (STM) and low energy electron diffraction (LEED), are presented. The 4H-SiC surface can be passivated using a silicon deposition/evaporation technique to reconstruct the surface. This has a significant effect on the electrical behaviour of metal contacts to the silicon carbide surface, critical in any electronic device. Atomic resolution STM studies of the 4H-SiC surface have revealed step features and micropipe defects in unprecedented detail. STM has also been used to image clusters of metal deposited on the 4H-SiC surface. The effect of annealing on the behaviour of these nickel clusters is also presented. The surface of the silicon carbide is extremely important in the fabrication of silicon carbide electronic devices and this paper presents a discussion of the SiC surface with particular reference to its impact on SiC device applications in power electronics.     

Epitaxial Growth of Graphene on 6H-SiC （0001） by Thermal Annealing

An epitaxial graphene （EG） layer is successfully grown on a Si-terminated 6H-SiC （（9001） substrate by the method of thermal annealing in an ultrahigh vacuum molecular beam epitaxy chamber. The structure and morphology of the EG sample are characterized by reflection high energy diffraction （RHEED）, Raman spectroscopy and atomic force microscopy （AFM）. Graphene diffraction streaks can are clearly observed in the Raman spectrum. The AFM about 4-10 layers. be seen in RHEED. The G and 2D peaks of graphene results show that the graphene nominal thickness is     

Raman analysis of defects in n-type 4H-SiC

This paper employs micro-Raman technique for detailed analysis of the defects (both inside and outside) in bulk 4H-SiC. The main peaks of the first-order Raman spectrum obtained in the centre of defect agree well with those of perfect bulk 4H-SiC, which indicate that there is no parasitic polytype in the round pit and the hexagonal defect. Four electronic Raman scattering peaks from nitrogen defect levels are observed in the round pit (395\,cm$^{-1}$, 526\,cm$^{-1}$, 572\,cm$^{-1}$, and 635\,cm$^{-1})$, but cannot be found in the spectra of hexagonal defect. The theoretical analysis of the longitudinal optical plasmon--phonon coupled mode line shape indicates the nonuniformity of nitrogen distribution between the hexagonal defect and the outer area in 4H-SiC. The second-order Raman features of the defects in bulk 4H-SiC are well-defined using the selection rules for second-order scattering in wurtzite structure and compared with that in the free defect zone.     

Numerical modelling of anisotropy in 4H－SiC MESFET‘s

A numerical model for 4H-SiC MESFET anisotropy is presented in this paper and the device performances, such as breakdown, temperature and transient characteristics, are demonstrated. The simulation results show obvious effects of the anisotropy for 4H-SiC and are in better accordance with the experimental results. The anisotropy for 4H-SiC should be involved in the device design to acquire better performances.     

氦离子注入4H-SiC晶体的纳米硬度研究

4H-SiC晶体经能量为100 keV,剂量为3×10¹⁶ cm^-2的氦离子高温（500 K）注入后,再在773—1273 K温度范围内进行了退火处理,最后使用纳米压痕仪测量了样品注入面的硬度.测试结果表明,在500—1273 K温度范围内样品的硬度随退火温度升高呈现先增大后减小再增大的趋势,其中773 K退火样品的硬度增大明显.分析认为,退火样品的硬度变化是由退火过程中缺陷复合与氦泡生长导致样品内部的Si—C键密度、键长和键角改变引起的. 关键词： SiC 注入 氦泡 纳米压痕     

Z1/Z2 defects in 4H-SiC

First-principles calculations are carried out on models for the Z(1)/Z(2) defects in 4H-SiC which are found in as-grown and irradiated n-type material. We show that an interstitial-nitrogen-interstitial-carbon defect is exceptionally thermally stable, bistable, and has negative-U character with donor and acceptor levels close to those attributed to the defect.     

Blistering kinetics in H-implanted 4H-SiC for large-area exfoliation

Layer transfer of single-crystalline SiC based on layer splitting and wafer bonding on an alternate substrate is a viable approach to fabricate SiC power devices at a lower cost. Dependence of implantation-induced surface blistering and exfoliation of thin layers, on the implantation parameters and subsequent annealing conditions, for large area exfoliation of 4H-SiC have been studied. We report the optimization of the annealing process (one-step or two-step) and annealing parameters like temperature and time to achieve large area exfoliation of SiC. Using the Föppl-von Karman (FvK) theory, the pressure inside the blister cavities and implantation-induced stress inside the damage region have been studied. We deduce that pressure inside the blister depends primarily on the blister size. HRXRD analysis has been used to determine the strain relaxation behavior as a function of annealing conditions. Raman spectroscopy and STEM measurements revealed the formation of defects inside the material due to ion implantation. AFM, Nomarski, and SEM were used to measure the size and depth details of the blisters as a function of annealing temperature and time. We have successfully exfoliated large area (up to 500 μm) in a two-step annealing process. The results reported in this paper are useful for SiC layer transfer on an arbitrary substrate by the Smart Cut process.     

Formation of precipitates in heavily boron doped 4H-SiC

Secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM) are utilized to study precipitation and the solubility of B in 4H-SiC epitaxial layers super saturated with B. Heat treatments are performed in Ar atmosphere in an rf-heated furnace at temperatures between 1700 and 2000 °C. SIMS ion images, and TEM micrographs reveal the formation of two types of precipitates where the larger, more thermally stable one is suggested to be B₄C. The boron solubility is determined from SIMS depth profiles and is shown to follow the Arrhenius expression: 7.1 × 10²² exp(−1.4 eV/k_BT) cm⁻³ over the studied temperature range.     

N型4H-SiC低温拉曼光谱特性

利用拉曼散射技术对N型4H-SiC单晶材料进行了30～300 K温度范围的光谱测量。实验结果表明,随着温度的升高,N型4H-SiC单晶材料的拉曼峰峰位向低波数方向移动,峰宽逐渐增宽。分析认为,晶格振动随着温度的升高而随之加剧,其振动恢复力会逐渐减小,使振动频率降低;原子相对运动会随温度的升高而加剧,使得原子之间及晶胞之间的相互作用减弱,致使声学模和光学模皆出现红移现象。随着温度的升高,峰宽逐渐增宽。这是由于随着温度的升高声子数逐渐增加,增加的声子进一步增加了散射概率,从而降低了声子的平均寿命,而声子的平均寿命与峰宽成反比,因此随着温度的升高峰宽逐渐增宽。声子模强度随温度升高呈现不同规律,E₂(LA),E₂(TA),E₁(TA)和A₁(LA)声子模随着温度升高强度单调增加,而E₂(TO),E₁(TO)和A₁(LO)声子模强度出现了先增后减的明显变化,在138 K强度出现极大值。分析认为造成原因是由于当温度高于138 K时,高能量的声子分裂成多个具有更低能量的声子所致。     

Electrical and optical characteristics of vanadium in 4H-SiC

A semi-insulating layer is obtained in n-type 4H-SiC by vanadium-ion implantation. A little higher resistivity is obtained by increasing the annealing temperature from 1450 to 1650℃. The resistivity at room temperature is as high as 7.6×10⁶\Omega .cm. Significant redistribution of vanadium is not observed even after 1650℃ annealing. Temperature-dependent resistivity and optical absorption of V-implanted samples are measured. The activation energy of vanadium acceptor level is observed to be at about E_C-1.1eV.     

Identification of the carbon antisite-vacancy pair in 4H-SiC

The metastability of vacancies was theoretically predicted for several compound semiconductors alongside their transformation into the antisite-vacancy pair counterpart; however, no experiment to date has unambiguously confirmed the existence of antisite-vacancy pairs. Using electron paramagnetic resonance and first principles calculations we identify the S15 center as the carbon antisite-vacancy pair in the negative charge state (C(Si)V-(C)) in 4H-SiC. We suggest that this defect is a strong carrier-compensating center in n-type or high-purity semi-insulating SiC.     

Irradiation-induced amorphization processes in nanocrystalline solids

A theoretical model is suggested which describes irradiation-induced amorphization in nanocrystalline solids, using the rate theory approach. In the framework of the model, interfaces (grain boundaries) cause the two basic effects on irradiation-induced damage and amorphization processes in nanocrystalline solids where the volume fraction of the interfacial phase is extremely large. First, amorphization is enhanced in nanocrystalline solids, because high-density ensembles of interfaces essentially contribute to the total energy of the crystalline state and thereby provide a shift in the energetics of amorphization. Second, interfaces serve as effective sinks of irradiation-produced point defects and thereby hamper amorphization driven by defect accumulation. The competition between these effects is described by kinetic equations for densities of point defects in nanoscale grains in nanocrystalline solids under irradiation treatment. This competition is shown to be responsible for the specific behavior of irradiated nanocrystalline solids, which is different from that of their coarse-grained counterparts. The suggested model accounts for the experimental data reported in the literature.PACS 61.46.+w; 61.72.Cc; 61.80.Az     

Irradiation-induced heterogeneous nucleation in uranium dioxide

Using classical molecular dynamics simulations, we have studied the first stages of defect cluster formation resulting from 10 keV displacement cascades in uranium dioxide. Nanometre size cavities and dislocation loops are shown to appear as a result of the irradiation process. A specifically designed TEM experiment involving He implanted thin foils have also been carried out to support this modelling work. These results, in conjunction with several other observations taken from the literature of ion implanted or neutron irradiated uranium dioxide, suggest a radiation damage controlled heterogeneous mechanism for insoluble fission product segregation in UO₂.     

Irradiation-induced confinement in a quasi-one-dimensional metal

The anisotropic resistivity of PrBa(2)Cu(4)O(8) has been measured as a function of electron irradiation fluence. Localization effects are observed for extremely small amounts of disorder corresponding to electron mean free paths of order 100 unit cells. Estimates of the localization corrections suggest that this anomalous localization threshold heralds a crossover to a ground state with pronounced one-dimensional character in which conduction electrons become confined to a small cluster of chains.