Optical properties of PMN–PT thin films prepared using pulsed laser deposition

(1 ? x)Pb(Mg_1/3Nb_2/3)O₃–xPbTiO₃ (PMN–PT) thin films have been deposited on quartz substrates using pulsed laser deposition (PLD). Crystalline microstructure of the deposited PMN–PT thin films has been investigated with X-ray diffraction (XRD). Optical transmission spectroscopy and Raman spectroscopy are used to characterize optical properties of the deposited PMN–PT thin films. The results show that the PMN–PT thin films of perovskite structure have been formed, and the crystalline and optical properties of the PMN–PT thin films can be improved as increasing the annealing temperature to 750 °C, but further increasing the annealing temperature to 950 °C may lead to a degradation of the crystallinity and the optical properties of the PMN–PT thin films. In addition, a weak second harmonic intensity (SHG) has been observed for the PMN–PT thin film formed at the optimum annealing temperature of 750 °C according to Maker fringe method. All these suggest that the annealing temperature has significant effect on the structural and optical properties of the PMN–PT thin films.     

Electrical and optical properties of Sb-doped ZnO thin films synthesized by sol–gel method

Sb-doped ZnO thin films with different values of Sb content （from 0 to 1.1 at.%） are deposited by the sol-gel dip- coating method under different sol concentrations. The effects of Sb-doping content, sol concentration, and annealing ambient on the structural, optical, and electrical properties of ZnO films are investigated. The results of the X-ray diffraction and ultraviolet-visible spectroscopy （UV-VIS） spectrophotometer indicate that each of all the films retains the wurtzite ZnO structure and possesses a preferred orientation along the c axis, with high transmittance （〉 90%） in the visible range. The Hall effect measurements show that the vacuum annealed thin films synthesized in the sol concentration of 0.75 mol/L each have an adjustable n-type electrical conductivity by varying Sb-doping density, and the photoluminescence （PL） spectra revealed that the defect emission （around 450 nm） is predominant. However, the thin films prepared by the sol with a concentration of 0.25 mol/L, despite their poor conductivity, have priority in ultraviolet emission, and the PL peak position shows first a blue-shift and then a red-shift with the increase of the Sb doping content.     

Electrical metal contacts to atomically thin 2H-phase MoTe2 grown by metal–organic chemical vapor deposition

We grow atomically thin molybdenum ditelluride (MoTe₂) films on a SiO₂/Si substrate by means of metal–organic chemical vapor deposition (MOCVD). Our Raman spectroscopy measurements reveal the formation of 2H-phase MoTe₂ films. Further, transmission electron microscopy and X-ray photoelectron spectroscopy studies indicate a three-atomic-layer structure and the surface element composition of MoTe₂ films. In this study, we mainly focus on the influence of metal contacts attached to the films on their electrical performance. We fabricate 2H-phase-MoTe₂-based field-effect transistors (FETs) with various metal contacts such as titanium/gold, nickel and palladium, which present p-type semiconductor properties. We also examine the influence of the work functions of the contact metals on the electrical properties of three-atomic-layer-MoTe₂-based FET devices. For a p-type MoTe₂ semiconductor, higher work functions of the contact metals afford narrower Schottky barrier heights (SBHs) and eventually highly efficient carrier injection through the contacts.     

Electrical and optical properties of a-SexTe100–x thin films

The dc electrical conductivity of as deposited thin films of a-Se_xTe_100?x (x=3, 6, 9 and 12) is measured as a function of temperature range from 298 to 383 K. It is observed that the dc conductivity increases exponentially with the increase in temperature in this glassy system. The value of activation energy calculated from the slope of ln σ_dc vs. 1000/T plot, is found to decrease on incorporation of dopant (Se) content in the Te system. On the basis of pre-exponetial factor (σ₀), it is suggested that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges. The optical absorption measurements show an indirect optical band gap in this system and it decreases on increasing Se concentration. The optical constants (extinction coefficient (k) and refractive index (n)) do change significantly with the photon energy and also with the dopant Se concentration. The decrease in optical band gap may be due to the decrease in activation energy in the present system. It is also found that the real and imaginary parts of dielectric constants show a significant change with the photon energy as well as with the dopant concentration. With large absorption coefficients and compositional dependence of optical band gap and optical constants (n and k), these materials may be suitable for optical disk applications.     

Mid-gap photoluminescence and magnetic properties of GaMnN films grown by metal–organic chemical vapor deposition

Metal-organic chemical vapor deposition （MOCVD） grown ferromagnetic GaMnN films are investigated by photo- luminescence （PL） measurement with a mid-gap excitation wavelength of 405 nm. A sharp PL peak at 1.8 eV is found and the PL intensity successively decreases with the addition of Mn, in which the Mn concentration of sample A is below 1% （[Mn]A =0.75%） but its PL intensity is stronger than other samples＇. The 1.8-eV PL peak is attributed to the recombination of electrons in the t2 state of the neutral Mn3＋ acceptor with holes in the valence band. With Mn concentration increasing, the intensity of the PL peak decreases and the magnetic increment reduces in our samples. The correlation between the PL peak intensity and ferromagnetism of the samples is discussed in combination with the experimental results.     

Room-temperature multiferroic properties of Bi4.15Nd0.85Ti3FeO15 thin films prepared by the metal–organic decomposition method

Aurivillius-structured Bi_4.15Nd_0.85Ti₃FeO₁₅ multiferroic thin films with four perovskite slabs were deposited on Pt/Ti/ SiO₂/Si substrates by the metal–organic decomposition method. The structural, dielectric and multiferroic properties of the films were investigated. Good ferroelectric behavior along with large dielectric constant and small loss factor were observed at room temperature. A weak ferromagnetic rather than an antiferromagnetic property was observed at room temperature by magnetic measurement. Moreover, the ferromagnetic property was enhanced when the temperature was below 13 K and a large saturation magnetization of about 5.4 emu/cm³ was obtained at 4 K. Possible reasons are put forward to discuss the complicated magnetic property.     

Influence of deposition rate on the properties of ZrO_2 thin films prepared in electron beam evaporation method

ZrO2 thin films were prepared in electron beam thermal evaporation method. And the deposition rate changed from 1.3 to 6.3 nm/s in our study. X-ray diffractometer and spectrophotometer were employed to characterize the films. X-ray diffraction (XRD) spectra pattern shows that films structure changed from amorphous to polycrystalline with deposition rate increasing. The results indicate that internal stresses of the films are compressive in most case. Thin films deposited in our study are inhomogeneous, and the inhomogeneity is enhanced with the deposition rate increasing.     

Optical, electrical and morphological properties of p-type Mn-doped SnO2 nanostructured thin films prepared by sol–gel process

SnO₂ thin films doped with various manganese concentrations were prepared on glass substrates by sol–gel dip coating method. The decomposition procedure of compounds produced by alcoholysis reactions of tin and manganese chlorides was studied by thermogravimetric analysis (TGA). The effects of Mn doping on structural, morphological, electrical and optical properties of prepared films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), Hall effect measurement, Fourier Transform Infrared (FTIR) spectral analysis, UV–Vis spectrophotometry, and photoluminescence (PL) spectroscopy. The results of the X-ray diffraction show that the samples are crystalline with a tetragonal rutile structure and the grain size decreases with increasing the doping concentration. The SEM and AFM images demonstrate that the surface morphology of the films was affected from the manganese incorporation. The Sn_1?x Mn _x O₂ thin films exhibited electrically p-type behavior in doping level above x=0.035 and electrical resistivity increases with increase in Mn doping. The optical transmission spectra show a shift in the position of absorption edge towards higher wavelength (lower energy). The optical constants (refractive index and extinction coefficient) and the film thickness were determined by spectral transmittance and using a numerical approximation method. The oscillator and dispersion energies were calculated using the Wemple–DiDomenico dispersion model. The estimated optical band gap is found to decrease with higher manganese doping. The room-temperature PL measurements illustrate the decrease in intensity of the emission lines when content of Mn is increased in Mn-doped SnO₂ thin films.     

High-crystalline GaSb epitaxial films grown on GaAs(001) substrates by low-pressure metal–organic chemical vapor deposition

Orthogonal experiments of Ga Sb films growth on Ga As(001)substrates have been designed and performed by using a low-pressure metal–organic chemical vapor deposition(LP-MOCVD)system.The crystallinities and microstructures of the produced films were comparatively analyzed to achieve the optimum growth parameters.It was demonstrated that the optimized Ga Sb thin film has a narrow full width at half maximum(358 arc sec)of the(004)ω-rocking curve,and a smooth surface with a low root-mean-square roughness of about 6 nm,which is typical in the case of the heteroepitaxial single-crystal films.In addition,we studied the effects of layer thickness of Ga Sb thin film on the density of dislocations by Raman spectra.It is believed that our research can provide valuable information for the fabrication of high-crystalline Ga Sb films and can promote the integration probability of mid-infrared devices fabricated on mainstream performance electronic devices.     

Nanostructures and luminescence properties of porous ZnO thin films prepared by sol–gel process

ZnO thin films containing nano-sized pores were synthesized on solid substrates through a sol–gel process by accommodating cetyl-trimethyl-ammonium bromide (CTAB) as an organic template in the precursor solution. By X-ray diffraction the resultant ZnO films were found to possess ordered pore arrays forming lamellar structure with the spacing between two adjacent pores being ∼3.0 nm. Photoluminescence measurements indicated that the surfactants effectively passivated the surface defects of the ZnO films responsible for the green emission. Al doping was found to improve not only the lamellar structure of the pore arrays but also the near-band-gap emission intensity while the suppression effect of CTAB on the green emission remained undisturbed. With a proper control of doping level, the optical property as well as the structural integrity can be tailored to augment the potential of ZnO films for the optoelectronics and sensor applications.     

Various properties of sputter-deposited Ta–Ru thin films

This paper discusses several structural, electrical and oxidation characteristics of co-sputtered Ta–Ru alloy films on oxidized Si-substrates. From X-ray examination, the Ta₁Ru₁ phase has formed and dominates in the compositions exceeding 54 at.% Ru content. The resistivity of the Ta–Ru thin films can reach a maximum of ∼320 μΩ cm in the composition range between 35 and 54 at.% Ru. After thermal treatment in air (600°C, 1 h), Ru-rich samples show a less increase in resistivity than Ta-rich ones. The observed preferential oxidation of Ta in the Ta–Ru samples can be further interpreted by thermodynamic calculations. The Ta-rich surface oxide is believed to be responsible for the passivating ability of the Ru atom toward oxidation at high temperatures. This results in the Ru of the metallic state though the oxidation of Ta occurs.     

Microstructure of pulsed laser deposited ceramic–metal and polymer–metal nanocomposite thin films

Ceramic–metal (MgO combined with Fe, Ti and Ni₈₀Nb₂₀) and polymer–metal (polycarbonate combined with Ag and Pd) nanocomposite multilayers were deposited at room temperature by laser ablation (at 248 nm). The multilayers were characterized by X-ray reflectometry, infrared spectroscopy and transmission electron microscopy. In the case of MgO/metal multilayers, well-layered structures are produced down to layer periodicities of 1.2 nm, necessary for tunneling magnetoresistance devices and X-ray mirrors in the water window. The interface roughness in the case of polymer/metal multilayers is found to be a strong function of the metal layer thickness and also the nature of the metal. PACS 68.55.-a; 81.15.Fg     

Li–N dual-doped ZnO thin films prepared by an ion beam enhanced deposition method

Li–N dual-doped ZnO films [ZnO:(Li,N)] with Li doping concentrations of 3 at.%–5 at.% were grown on a glass substrate using an ion beam enhanced deposition(IBED) method. An optimal p-type ZnO:(Li,N) film with the resistivity of 11.4 Ω·cm was obtained by doping 4 at.% of Li and 5 sccm flow ratio of N2. The ZnO:(Li,N) films exhibited a wurtzite structure and good transmittance in the visible region. The p-type conductive mechanism of ZnO:(Li,N) films are attributed to the Li substitute Zn site(LiZn) acceptor. N doping in ZnO can forms the Lii–NOcomplex, which depresses the compensation of Li occupy interstitial site(Lii) donors for LiZnacceptor and helps to achieve p-type ZnO:(Li,N) films. Room temperature photoluminescence measurements indicate that the UV peak(381 nm) is due to the shallow acceptors LiZnin the p-type ZnO:(Li,N) films. The band gap of the ZnO:(Li,N) films has a red-shift after p-type doping.     

Some optical properties of Ge–S amorphous thin films

Amorphous Ge_xS_1−x films (x=0.27, 0.32, 0.36 and 0.4) were prepared by thermal evaporation. The values of the refractive index, the optical gap and the parameters of the Wemple–DiDomenico single oscillator model were determined. Using Miller's generalized rule the values of the third-order non-linear susceptibility were also estimated. Thermally induced bleaching was observed for films studied. Photobleaching was observed for sulfur rich and nearly stoichiometric films (x=0.27, 0.32) while for a germanium rich film (x=0.4) no response to the illumination was observed. The differences in photobleaching are attributed to the role of p-lone pair states and to an overall network rigidity of the films.     

Rare earth doped α-alumina thin films prepared by pulsed laser deposition: structural and optical properties

-Al₂O₃ films doped with about 1% Eu³⁺ were grown on sapphire (012) substrates by pulsed laser deposition using an ArF excimer laser under 10^-4 mbar oxygen pressure and at temperatures higher than 1050 °C. The Eu doping rate was measured by Rutherford backscattering spectroscopy. The crystalline structure was determined by X-ray diffraction and transmission electron microscopy. The films are grown epitaxially on the sapphire substrate. The Eu³⁺ fluorescence spectra are constituted of narrow lines. By means of pulsed laser deposition, Eu³⁺ ions may be introduced into a single site of the -phase lattice, with a concentration that cannot be reached using conventional crystal-growth methods. PACS 81.15.Fg; 68.37.Lp; 78.55.Hx     

Effect of calcination atmosphere on photoluminescence properties of nanocrystalline ZrO2 thin films prepared by sol–gel dip coating method

Highly transparent and homogeneous nanocrystalline ZrO₂ thin films were prepared by the sol–gel dip coating method. The X-ray diffraction (XRD) pattern of ZrO₂ thin films calcined in air, O₂ or N₂ shows the formation of tetragonal phase with varying crystallite size. X-ray photoelectron spectroscopy (XPS) gives Zr 3d and O 1s spectra of thin film annealed in air, which reveal zirconium suboxide component (ZrO_x, 0<x<2), Zr–O bond and surface defects. An average transmittance greater than 85% (in UV–vis region) is observed in all calcined samples. Photoluminescence (PL) reveals an intense emission peak at 379 nm and weak peaks at 294, 586 and 754 nm for ZrO₂ film calcined in air. An enhancement of PL intensity and red-shift is observed in films calcined in O₂ and N₂ atmosphere. This is due to the reconstruction of zirconium nanocrystal interfaces and vacancies, which help passivate the non-radiative defects. The oxygen deficient defect, which is due to the distorted Zr–O bond, is suggested to be responsible for photoluminescence. The defect states in the nanocrystalline zirconia thin films play an important role in the energy transfer process. The luminescence defects in the film make it suitable for gas sensors development and tunable lasers.     

The optical properties of MgxZnl-xO thin films

Mg_xZn_1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of Mg_xZn_1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400--760\,nm at the incident angle of 70℃. Both absorption coefficients and optical band gaps of Mg_xZn_1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of Mg_xZn_1-xO films shift to higher energies and band gaps linearly increase from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important information for the design and modelling of ZnO/ Mg_xZn_1-xO heterostructure optoelectronic devices.