Nb/A1-AlO_X/Nb隧道结的制备研究

通过改进RIE的刻蚀工艺和绝缘层的生长工艺,在SiO2/Si衬底上制备出了性能良好的超导Nb/A1-AlOX/Nb隧道结。采用CF4作为刻蚀气体,降低了RIE对结势垒层和衬底SiO2层的刻蚀。使用PECVD生长绝缘层SiO2,改善了绝缘性能,从而降低了隧道结的漏电流。     

Nb/Al-AlO_x/Nb隧道结制备中压控电压源阳极氧化工艺研究

采用计算机程控的压控电压源阳极氧化模式研究制备出自对准Nb/Al-AlOx/Nb隧道结的绝缘层Nb2O5/Al2O3/Nb2O5。研究了氧化电压、氧化层的厚度和氧化时间的关系。当阳极氧化电压变化率低于8V/min时,阳极氧化层的厚度基本取决于氧化电压的大小,而与氧化电压变化率无关。我们已采用电压源阳极氧化技术成功制备出超导Nb/Al-AlOx/Nb隧道结。     

用于电压基准的Nb/NbxSi1-x/Nb约瑟夫森单结的研制

现代可编程约瑟夫森电压基准的核心器件是约瑟夫森结阵.目前最具有优势的约瑟夫森结阵是 Nb/Nb_xSi_1-x/Nb材料的结阵. Nb/Nb_xSi_1-x/Nb材料的约瑟夫森结 具有三层薄膜的制作过程简便, Nb和Nb_xSi_1-x刻蚀工艺相同以及Nb_xSi_1-x 势垒层成分可调等优点.中国计量科学研究院设计制作了Nb/Nb_xSi_1-x/Nb约瑟夫森单结. 通过在4.2 K低温下对所做单结进行直流电流-电压特性测量,观测到了清晰的超导隧穿电流和 从零电压态向电压态的跳变,最后就测量结果进行了分析讨论.此项工作属于国内首个开展 Nb/Nb_xSi_1-x/Nb材料约瑟夫森单结研究的工作.     

Ag/K_4Nb_6O_(17)异质结催化剂的制备、光谱分析及光催化性能研究

采用低温水热法成功制备了层状的K4Nb6O17半导体光催化材料。考虑到水热合成的K4Nb6O17表面多羟基(Nb—OH)和端氧(Nb O,Nb—O-)的特点,采用Ag(en)2+配合物前驱体法制备了高度均匀分散的Ag/K4Nb6O17异质结光催化剂,光催化性能评价结果表明,半导体K4Nb6O17表面负载极少量的Ag,其光催化降解甲基橙活性便得到大幅度提高,Ag的最佳负载量为0.5 at%。综合XRD,FTIR,UV-VisDRS,XRF和TEM表征结果,对Ag/K4Nb6O17异质结光催化剂的作用机制进行了较详细地阐述并获得如下结论:(1)K4Nb6O17提供了降解有机染料分子的电子和空穴;(2)K4Nb6O17纳米晶上Ag粒子作为光生电子接受器,促进了金属-半导体界面上电荷的转移,有效地分离了光生电子-空穴对,提高了光催化活性。     

核聚变用内Sn法Nb3Sn股线的制备与性能

采用内Sn法工艺研究了ITER用Nb3Sn股线的制备与性能.我们已成功的研究出了批量生产股线的制备技术,股线具有优异的特性.股线非Cu区的临界电流密度Jcn在12T、4.2K、0.1μV/cm判据下达到1087A/mm2;在±3T的磁场变化范围,磁滞损耗为540 kJ/m3(4.2K);股线的n值在12T、4.2K下为20.此外我们也研究了Nb3Sn层的显微结构和Nb/Sn比.     

脉冲激光沉积制备YBa2Cu3O7-δ/Nb-doped SrTiO3双层结

超导体/半导体结(Superconductor/semiconductor p-n junction)在制备场效应管,晶体管方面具有巨大的潜力.本文通过脉冲激光沉积的方法,使用Nb掺杂的(100)方向SrTiO3作为薄膜衬底,沉积了厚度约为350nm c轴取向的YBa2Cu3O7-δ薄膜,从而得到YBa2Cu3O7-δ/Nb:SrTiO3双层结.R～T曲线,以及XRD曲线显示YBa2Cu3O7-δ薄膜具有良好的超导电性和晶体结构,在零磁场不同温度下测量得电流-电压曲线显示YBa2Cu3O7-δ/Nb:SrTiO3构成的超导体/半导体双层结在小于YBa2Cu3O7-δ临界转变温度Tc时具有p-n结整流特性,当大于YBa2Cu3O7-δ超导转变温度时,呈现出非典型肖特基结的特性.     

Nb/SnO2复合薄膜的制备、结构及光电性能

用溶胶-凝胶旋涂法在玻璃基底上制备出Nb/SnO₂复合透明导电薄膜,利用XRD,SEM,紫外—可见分光光度计,四探针电阻仪等测试方法对Nb/SnO₂复合薄膜的结构和物性进行了研究.结果表明: 当Nb含量小于0.99at%时,Nb/SnO₂复合薄膜为较纯的四方金红石结构;复合薄膜中晶粒分布均匀,平均尺寸在5—7 nm.当Nb含量小于0.99at%时,Nb/SnO₂复合薄膜的电阻率先减小后增大,当Nb含量为0.37at%时 关键词： 溶胶-凝胶法 2复合薄膜')" href="#">Nb/SnO₂复合薄膜 结构表征 光电性能     

Nb/Al-AlO_x/Nb隧道结的制备

本文报道了在射频磁控溅射装置上Nb/Al-AlO_x/Nb隧道结的制备工艺和所获得的结果。对SIS三层结构形成时基片的温度、势垒,以及电极形成方法等问题进行了讨论。     

Nb/Al-AlOx/Nb隧道结的制备

本文报道了在射频磁控溅射装置上Nb/Al-AlO_x/Nb隧道结的制备工艺和所获得的结果。对SIS三层结构形成时基片的温度、势垒,以及电极形成方法等问题进行了讨论。 关键词：     

Fe/Nb多层膜中离子辐照效应研究(英文)

〗采用磁控溅射技术在Si衬底上沉积Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/Nb(4 nm)\]2/ \[Fe(4 nm)/Nb(4 nm)\]4多层膜。 用2 MeV的 Xe离子在室温下辐照多层膜。采用俄歇深度剖析、X射线衍射和振动样品磁强计分析辐照引起的多层膜元素分布、 结构及磁性变化。AES深度剖析谱显示当辐照注量达到1.0×1014 ions/cm2时, 多层膜界面两侧元素开始混合; 当辐照注量达到2.0×1016ions/cm2时, 多层膜层状结构消失, Fe层与Nb层几乎完全混合。XRD谱显示, 当辐照注量达到1.0×1014ions/cm2时, Nb的衍射峰和Fe的各衍射峰的峰位相对于标准卡片向小角方向偏移, 这说明辐照引起Nb基和Fe基FeNb固溶体相的形成;当辐照注量大于1.0×1015 ions/cm2时, 辐照引起非晶相的出现。 VSM测试显示,多层膜的磁性随着结构的变化而变化。 在此实验基础上, 对离子辐照引起界面混合现象的机理进行了探讨。The behavior of the metallic multilayers of Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/ Nb(4 nm)\]2/\[Fe(4 nm)/Nb(4 nm)\]4 under 2 MeV Xe ion irradiation has been investigated by depth profile analysis of Auger electron spectroscopy,X ray diffraction and vibrating sample magnetometer. The obtained experimental results show that the inter mixing between Fe and Nb layers occurs in the 1.0×1014 ions/cm2 irradiated multilayer sample which results in the formation of Nb based and Fe based FeNb solid solution. For the samples irradiated to fluence larger than 1.0×1014 ions/cm2, amorphisation is observed, and moreover, the layered structure of the multilayer samples is broken up completely for the samples under 1.0×1016 or 2.0×1016 ions/cm2 irradiation. Vibrating sample magnetometer measurement also reveals that the magnetization of the samples changes with the evolution of the structure of multilayers. Possible mechanism of the modification in Fe/Nb multilayers induced by Xe ion irradiation is briefly discussed.     

Fabrication of sub-micron Nb/Al-oxide/Nb sis junctions

I describe a process for fabricating high critical current density, submicron superconductor/insulator/superconductor (SIS) tunnel junctions, suitable for use as millimeter-wave or submillimeter-wave mixers. The superconducting electrodes are niobium; the insulating barrier is aluminum oxide. Standard optical photolithography is employed, with subsequent shrinkback of the photoresist mesa defining the device through reactive-ion etching in an oxygen plasma to enhance step-coverage by the insulating layer. Active areas as small as 0.5µm² have been made. I discuss two variations of the process, one starting from a small initial trilayer region defined by liftoff, and the other starting from a whole-wafer initial trilayer.     

Properties of superconducting Nb/Al/Nb/Al?AlOx?Al?AlOx?Al/Nb/Al/Nb tunnel junctions

Modified geometry (MG) devices, Nb/Al/Nb/Al−AlO_x−Al−AlO_x−Al/Nb/Al/Nb, have been fabricated and investigated in comparison with the basic geometry (BG) double-barrier Nb/Al−AlO_x−Al−AlO_x−Al/Nb devices. The enhancement of the critical temperature in the Al film is found to be weaker for the MG devices as compared with the BG devices at temperatures nearT=4.2 K but stronger at lowT. Indication of an enhancement of dc Josephson critical current density,j _c , at bias voltageV≠0 as compared withj _c (V=0) has been observed in the MG devices for the first time.     

Fabrication of high-quality submicron Nb/Al--AlOx/Nb tunnel junctions

Nb/Al-AlOx/Nb tunnel junctions are often used in the studies of macroscopic quantum phenomena and superconducting qubit applications of the Josephson devices. In this work, we describe a convenient and reliable process using electron beam lithography for the fabrication of high-quality, submicron-sized Nb/Al-AlOx/Nb Josephson junctions. The technique follows the well-known selective Nb etching process and produces high-quality junctions with Vm=100 mV at 2.3 K for the typical critical current density of 2.2 kA/cm^2, which can be adjusted by controlling the oxygen pressure and oxidation time during the formation of the tunnelling barrier. We present the results of the temperature dependence of the sub-gap current and in-plane magnetic-field dependence of the critical current, and compare them with the theoretical predictions.     

Resistive transitions in Nb/Cu0.41Ni0.59/Nb trilayers

The superconducting phase transition in Nb/Cu_0.41Ni_0.59/Nb trilayers, with superconducting (S) Nb and ferromagnetic (F) Cu_0.41Ni_0.59, has been experimentally studied as a function of the F-layer thickness by measuring the temperature dependence of the electrical resistance R(T). It is shown that the shape and the width of the R(T) curves depends on the Cu_0.41Ni_0.59 thickness, in particular in the regime where π is the coupling between the S layers, which can be expected. To explain the data, we developed a qualitative model which makes the interconnection between the superconducting phase transition and the 0 to π transition in SFS structures are more evident. The text was submitted by the authors in English.     

0-π oscillations in nanostructured Nb/Fe/Nb Josephson junctions

The physics of the π phase shift in ferromagnetic Josephson junctions may enable a range of applications for spin-electronic devices and quantum computing. We investigate transitions from “0” to “π” states in Nb/Fe/Nb Josephson junctions by varying the Fe barrier thickness from 0.5 nm to 5.5 nm. From magnetic measurements we estimate for Fe a magnetic dead layer of about 1.1 nm. By fitting the characteristic voltage oscillations with existing theoretical models we extrapolate an exchange energy of 256 meV, a Fermi velocity of 1.98 ×10⁵ m/s and an electron mean free path of 6.2 nm, in agreement with other reported values. From the temperature dependence of the I_CR_N product we show that its decay rate exhibits a nonmonotonic oscillatory behavior with the Fe barrier thickness.     

Proximity effect in Nb/Zr multilayers with variable Nb/Zr ratio

We have investigated the effect of varying the individual layer thickness on the superconducting transition temperature (T_C) of Nb/Zr multilayers. These thin film multilayer structures were deposited using UHV magnetron sputtering with layer thickness ranging from 0.5 to 8 nm. In conformity with the predictions of the de Gennes equations in the Cooper limit (layer thickness small compared to coherence length), we find that the T_C increases with increasing thickness of the Nb layer (when the Zr layer thickness is constant), and decreases with increasing thickness of the Zr layer (when the Nb layer thickness is constant). The possible effect of the existence of an interfacial Nb-Zr layer is discussed. We also point out the marked influence of the in-plane grain dimension on the T_C in these multilayers.