Controlled chlorine plasma reaction for noninvasive graphene doping

We investigated the chlorine plasma reaction with graphene and graphene nanoribbons and compared it with the hydrogen and fluorine plasma reactions. Unlike the rapid destruction of graphene by hydrogen and fluorine plasmas, much slower reaction kinetics between the chlorine plasma and graphene were observed, allowing for controlled chlorination. Electrical measurements on graphene sheets, graphene nanoribbons, and large graphene films grown by chemical vapor deposition showed p-type doping accompanied by a conductance increase, suggesting nondestructive doping via chlorination. Ab initio simulations were performed to rationalize the differences in fluorine, hydrogen, and chlorine functionalization of graphene.     

Graphene CVD growth on copper and nickel: role of hydrogen in kinetics and structure

Understanding the chemical vapor deposition (CVD) kinetics of graphene growth is important for advancing graphene processing and achieving better control of graphene thickness and properties. In the perspective of improving large area graphene quality, we have investigated in real-time the CVD kinetics using CH(4)-H(2) precursors on both polycrystalline copper and nickel. We highlighted the role of hydrogen in differentiating the growth kinetics and thickness of graphene on copper and nickel. Specifically, the growth kinetics and mechanism is framed in the competitive dissociative chemisorption of H(2) and dehydrogenating chemisorption of CH(4), and in the competition of the in-diffusion of carbon and hydrogen, being hydrogen in-diffusion faster in copper than nickel, while carbon diffusion is faster in nickel than copper. It is shown that hydrogen acts as an inhibitor for the CH(4) dehydrogenation on copper, contributing to suppress deposition onto the copper substrate, and degrades quality of graphene. Additionally, the evidence of the role of hydrogen in forming C-H out of plane defects in CVD graphene on Cu is also provided. Conversely, resurfacing recombination of hydrogen aids CH(4) decomposition in the case of Ni. Understanding better and providing other elements to the kinetics of graphene growth is helpful to define the optimal CH(4)/H(2) ratio, which ultimately can contribute to improve graphene layer thickness uniformity even on polycrystalline substrates.     

One-Step Synthesis of Janus Fluorographene Derivatives

Fluorographene, a two-dimensional derivative of graphene, is an excellent starting material for the synthesis of graphene derivatives. In this work, a one-step, substrate-free method for the asymmetric functionalization of fluorographene layers with hydroxyl groups by a facile nucleophilic substitution reaction is reported. Such a chemical modification occurs in a biphasic aqueous–organic system under mild conditions, leading to Janus graphene nanosheets functionalized by hydroxyl groups on one side and retaining fluorine atoms on the other. The reported experimental route paves the way for two-dimensional bifacial graphene templates, thus broadening the application potential of graphene materials.     

Modeling of hydrogen and hydroxyl group migration on graphene

Density functional calculations of optimized geometries for the migration of single hydrogen and hydroxyl groups on graphene are performed. It is shown that the migration energy barrier for the hydroxyl group is three times larger than for hydrogen. The crucial role of supercell size for the values of the migration barriers is discussed. The paired migration of hydrogen and hydroxyl groups has also been examined. It could be concluded that hydroxyl group based magnetism is rather stable in contrast with unstable hydrogen based magnetism of functionalized graphene. The role of water in the migration of hydroxyl groups is also discussed, with the results of the calculations predicting that the presence of water weakens the covalent bonds and makes these groups more fluid. Increasing the number of water molecules associated with hydroxyl groups provides an increase of the migration energy.     

Density functional study of hydrogen adsorption and diffusion on Ni‐loaded graphene and graphene oxide

In this work, we performed density functional calculations to investigate the adsorption and diffusion of hydrogen on Ni‐loaded graphene and single layer graphene oxide (SLGO). We evaluated the feasibility of hydrogen spillover in the presence of Ni₄ cluster and the role of oxygen‐containing groups. Our calculations indicate that the hydrogen diffusion is difficult to take place on the Ni/graphene interface due to the stronger Ni? H bond strength. Further, the chemisorbed H atoms are also hard to diffuse freely on the graphene surface. For the SLGO surface, both hydroxyl and epoxide groups may not facilitate the hydrogen diffusion. Instead, they are readily attracted by the nearby Ni catalyst and hydrogenated to water molecules. © 2014 Wiley Periodicals, Inc.     

Negative sign of “through-space” electron coupled spin-spin interaction between protons and 19F nuclei

Negative signs are determined for the sizeable spin-spin coupling constants between hydroxyl protons and fluorine nuclei in derivatives of 2-fluorophenol and 2-hydroxybenzotrifluoride when the hydroxyl hydrogen lies near fluorine. These couplings are taken as examples of a through-space or fragment coupling mechanism and are briefly discussed in terms of semi-empirical molecular orbital predictions.     

Decomposition of Fluorinated Graphene under Heat Treatment

Fluorination modifies the electronic properties of graphene, and thus it can be used to provide material with on‐demand properties. However, the thermal stability of fluorinated graphene is crucial for any application in electronic devices. Herein, X‐ray photoelectron spectroscopy (XPS), temperature‐programmed desorption (TPD), and Raman spectroscopy were used to address the impact of the thermal treatment on fluorinated graphene. The annealing, at up to 700 K, caused gradual loss of fluorine and carbon, as was demonstrated by XPS. This loss was associated with broad desorption of CO and HF species, as monitored by TPD. The minor single desorption peak of CF species at 670 K is suggested to rationalize defect formation in the fluorinated graphene layer during the heating. However, fluorine removal from graphene was not complete, as some fraction of strongly bonded fluorine can persist despite heating to 1000 K. The role of intercalated H₂O and OH species in the defluorination process is emphasised.     

Reactivity of Defective Hexagonal Boron Nitride Monolayers

Russian Journal of Physical Chemistry A - The results are presented from quantum-chemical modeling of the chemisorption of atomic hydrogen and fluorine on the surface of a hexagonal boron nitride...     

Adsorption of nitrogen oxides on graphene and graphene oxides: insights from density functional calculations

The interactions of nitrogen oxides NO(x) (x = 1,2,3) and N(2)O(4) with graphene and graphene oxides (GOs) were studied by the density functional theory. Optimized geometries, binding energies, and electronic structures of the gas molecule-adsorbed graphene and GO were determined on the basis of first-principles calculations. The adsorption of nitrogen oxides on GO is generally stronger than that on graphene due to the presence of the active defect sites, such as the hydroxyl and carbonyl functional groups and the carbon atom near these groups. These active defect sites increase the binding energies and enhance charge transfers from nitrogen oxides to GO, eventually leading to the chemisorption of gas molecules and the doping character transition from acceptor to donor for NO(2) and NO. The interaction of nitrogen oxides with GO with various functional groups can result in the formation of hydrogen bonds OH???O (N) between -OH and nitrogen oxides and new weak covalent bonds C???N and C???O, as well as the H abstraction to form nitrous acid- and nitric acidlike moieties. The spin-polarized density of states reveals a strong hybridization of frontier orbitals of NO(2) and NO(3) with the electronic states around the Fermi level of GO, and gives rise to the strong acceptor doping by these molecules and remarkable charge transfers from molecules to GO, compared to NO and N(2)O(4) adsorptions on GO. The calculated results show good agreement with experimental observations.     

When,in the context of drug design,can a fluorine atom successfully substitute a hydroxyl group?

In this article, we deal with the question of whether a fluorine atom can substitute a hydroxyl group in such a way that will lead to a compound showing a desired biologic activity, that is, a potential new drug. It is obvious that a fluorine atom differs from a hydroxyl group, as it cannot donate hydrogen bonds. However, it can accept them. Moreover, both fluorine and oxygen are of similar size and are the most electronegative elements. Therefore, a fluorine atom is thought to be a good substitute for a hydroxyl group. However, it was shown that for conformationally labile aliphatic compounds a replacement of a hydroxyl by a fluorine increases conformational diversity, so the fluorine‐containing aliphatic molecules are present in equilibrium at room temperature as a mixture of several different conformers. In contrast, for cyclic compounds the substitution of an OH group by an F atom does not much change shape and electrostatic potential around corresponding conformers. Moreover, these compounds are present in equilibrium at room temperature in aqueous solution as a mixture of the same most favored structures. © 2002 Wiley Periodicals, Inc. Int J Quantum Chem, 2002     

Computational studies for reduced graphene oxide in hydrogen-rich environment

We employ molecular dynamic simulations to study the reduction process of graphene oxide (GO) in a chemically active environment enriched with hydrogen. We examine the concentration and pressure of hydrogen gas as a function of temperature in which abstraction of oxygen is possible with minimum damage to C-sp(2) bonds, hence preserving the integrity of the graphene sheet. Through these studies we find chemical pathways that demonstrate beneficiary mechanisms for the quality of graphene including formation of water as well as suppression of carbonyl pair holes in favor of hydroxyl and epoxide formation facilitated by hydrogen gas in the environment.     

Hydrogenation and Fluorination of Graphene Models: Analysis via the Average Local Ionization Energy

We have investigated the use of the average local ionization energy, I?(S)(r), as a means for rapidly predicting the relative reactivities of different sites on two model graphene surfaces toward the successive addition of one, two, and three hydrogen or fluorine atoms. The I?(S)(r) results were compared with directly computed interaction energies, at the B3LYP/6-311G(d,p) level. I?(S)(r) correctly predicts that the edges of graphene sheets are more reactive than the interior portions. It shows that added hydrogens activate the adjoining (ortho) sites and deactivate those that are separated by one site (meta). Overall, I?(S)(r) is effective for rapidly (single calculations) estimating the relative site reactivities of these large systems, although it reflects only the system prior to an interaction and cannot take into account postinteraction factors, e.g., structural distortion.     

Effects of hydroxyl group on H2 dissociation on graphene: A density functional theory study

Graphene-based materials are promising for hydrogen production and storage. In this work, using density functional theory calculations, we explored how a hydroxyl group influences H₂ dissociation on graphene. Presence of the hydroxyl group makes the binding of H atom with graphene stronger, as the binding energy of H atom with the hydroxyl-modified graphene is higher than that with the pristine graphene. The para-site is the most favorable site for H₂ dissociation on both the pristine and hydroxyl-modified graphene. The energy barrier of H₂ dissociation at para-site on the pristine graphene is 3.10 eV whereas that on the hydroxyl-modified graphene is 2.46 eV, indicating a more facile H₂ dissociation on the hydroxyl-modified graphene.     

Hydrogen abstraction from copolymers of fluorinated olefins and allyl or vinyl ethers by hydroxyl radicals: a computational quantum semi-empirical study

The theoretical study of hydrogen abstraction by hydroxyl radicals on two substrates (copolymers of fluorinated olefins and allyl or vinyl ethers) was carried using the MNDO, AM1 and PM3 quantum semi-empirical methods. This study was performed as a function of the site of hydrogen abstraction and of the computational method. The results of the calculations clearly show that the transition state is early along the reaction coordinate and pinpoint that the reactions are not under enthalpic control. The results provide evidence of the importance of the polar effects due to the fluorine atoms.     

Embedded cluster model studies of impurities at metal surfaces

A knowledge of the electronic properties of impurities at metal surfaces is of great value in the understanding of such important phenomena as chemisorption and surface segregation in alloys. We have adopted here a unified approach based on an Embedded Cluster model to study the properties of surface impurities. We have mainly concentrated on hydrogen impurities either adsorbed above the surface or incorporated into the bulk of metals. We have also considered the case of substitutional metal impurities at the surface of host metals.For hydrogen chemisorption we have considered such substrates as free-electron, transition and noble metals as well as bimetallic substrates composed of a single metal impurity in a host matrix or a metallic overlayer on a metal support. The electronic structure of the chemisorbed system is compared to photoemission data when available, from which interpretation of the details of the experimental spectra may be made. It is found that hydrogen adsorption on transition and noble metals results in the formation of a pair of bonding/antibonding resonances on either side of the metal d-band, while for hydrogen on free-electron metals a single hydrogen induced resonance is observed. One-electron energy differences between the H on jellium and H on metal systems are estimated and trends in such energies across the 3d and 4d transition series are compared to the trends in experimental chemisorption energies for H on these metals. The change in hydrogen chemisorption capacity of an inert substrate due to the introduction of chemically active impurities is investigated. The different properties of Pd overlayers with respect to Pd surfaces are also investigated. Interaction energies between adatoms on surfaces are estimated in order to predict the geometry of ordered structures on surfaces.One-electron heats of segregation for binary alloys are calculated. These show a strong solute surface segregation for noble metal impurities in group VIII metals, which is due to the higher d-band occupancy of the noble metal.     

Spatially Resolved Bottom‐Side Fluorination of Graphene by Two‐Dimensional Substrate Patterning

Patterned functionalization can, on the one hand, open the band gap of graphene and, on the other hand, program demanding designs on graphene. The functionalization technique is essential for graphene‐based nanoarchitectures. A new and highly efficient method was applied to obtain patterned functionalization on graphene by mild fluorination with spatially arranged AgF arrays on the structured substrate. Scanning Raman spectroscopy (SRS) and scanning electron microscopy coupled with energy‐dispersive X‐ray spectroscopy (SEM‐EDS) were used to characterize the functionalized materials. For the first time, chemical patterning on the bottom side of graphene was realized. The chemical nature of the patterned functionalization was determined to be the ditopic scenario with fluorine atoms occupying the bottom side and moieties, such as oxygen‐containing groups or hydrogen atoms, binding on the top side, which provides information about the mechanism of the fluorination process. Our strategy can be conceptually extended to pattern other functionalities by using other reactants. Bottom‐side patterned functionalization enables utilization of the top side of a material, thereby opening up the possibilities for applications in graphene‐based devices.     

Nitrogen,Phosphorus, and Fluorine Tri‐doped Graphene as a Multifunctional Catalyst for Self‐Powered Electrochemical Water Splitting

Electrocatalysts are required for clean energy technologies (for example, water‐splitting and metal‐air batteries). The development of a multifunctional electrocatalyst composed of nitrogen, phosphorus, and fluorine tri‐doped graphene is reported, which was obtained by thermal activation of a mixture of polyaniline‐coated graphene oxide and ammonium hexafluorophosphate (AHF). It was found that thermal decomposition of AHF provides nitrogen, phosphorus, and fluorine sources for tri‐doping with N, P, and F, and simultaneously facilitates template‐free formation of porous structures as a result of thermal gas evolution. The resultant N, P, and F tri‐doped graphene exhibited excellent electrocatalytic activities for the oxygen reduction reaction (ORR), oxygen evolution reaction (OER), and hydrogen evolution reaction (HER). The trifunctional metal‐free catalyst was further used as an OER–HER bifunctional catalyst for oxygen and hydrogen gas production in an electrochemical water‐splitting unit, which was powered by an integrated Zn–air battery based on an air electrode made from the same electrocatalyst for ORR. The integrated unit, fabricated from the newly developed N, P, and F tri‐doped graphene multifunctional metal‐free catalyst, can operate in ambient air with a high gas production rate of 0.496 and 0.254 μL s⁻¹ for hydrogen and oxygen gas, respectively, showing great potential for practical applications.     

贵金属原子与点缺陷石墨烯的键增强作用

通过密度泛函理论研究了Ag、Au、Pt原子在完美和点缺陷(包括N掺杂、B掺杂、空位点缺陷)石墨烯上的吸附以及这些体系的界面性质.研究表明Ag、Au不能在完美的石墨烯上吸附,N、B掺杂增强了三种金属与石墨烯之间的相互作用.而空位点缺陷诱发三种金属在石墨烯上具有强化学吸附作用.通过电子结构分析发现,N掺杂增强了Au、Pt与C形成的共价键,而Au、Ag与B形成了化学键.空位点缺陷不仅是金属原子的几何固定点,同时也增加了金属原子和碳原子之间的成键.增强贵金属原子和石墨烯相互作用的顺序是:空位点缺陷>>B掺杂>N掺杂.     

Nitrogen,Phosphorus, and Fluorine Tri‐doped Graphene as a Multifunctional Catalyst for Self‐Powered Electrochemical Water Splitting

Electrocatalysts are required for clean energy technologies (for example, water‐splitting and metal‐air batteries). The development of a multifunctional electrocatalyst composed of nitrogen, phosphorus, and fluorine tri‐doped graphene is reported, which was obtained by thermal activation of a mixture of polyaniline‐coated graphene oxide and ammonium hexafluorophosphate (AHF). It was found that thermal decomposition of AHF provides nitrogen, phosphorus, and fluorine sources for tri‐doping with N, P, and F, and simultaneously facilitates template‐free formation of porous structures as a result of thermal gas evolution. The resultant N, P, and F tri‐doped graphene exhibited excellent electrocatalytic activities for the oxygen reduction reaction (ORR), oxygen evolution reaction (OER), and hydrogen evolution reaction (HER). The trifunctional metal‐free catalyst was further used as an OER–HER bifunctional catalyst for oxygen and hydrogen gas production in an electrochemical water‐splitting unit, which was powered by an integrated Zn–air battery based on an air electrode made from the same electrocatalyst for ORR. The integrated unit, fabricated from the newly developed N, P, and F tri‐doped graphene multifunctional metal‐free catalyst, can operate in ambient air with a high gas production rate of 0.496 and 0.254 μL s^?1 for hydrogen and oxygen gas, respectively, showing great potential for practical applications.     

A MO-SCF study of hydroxyl binding and hydroxyl diffusion in pure and fluorine-containing hydroxyapatite

Hydroxyl diffusion and interhydroxyl binding in hydroxyapatite has been studied. LCGO -MO -SCF calculations have been carried out on groups of hydroxyl ions in a perfect and a vacancy-containing crystal. Electrostatic crystal effects were accounted for by including the crystal potential field in the SCF calculations. Nearest-neighbour interactions were calculated to first order. Effects exerted by fluorine impurities were considered for the vacancy-containing crystal. The calculations indicate that narrow bandwidths obtained in nmr experiments on biological hydroxyapatite may be caused by a hydroxyl displacement mechanism and that no interhydroxyl hydrogen bonds exist in hydroxyapatite. The suggestion that the caries-inhibiting properties of fluorine impurities in human dental enamel is caused by a diffusion-binding mechanism is supported by the results.