Gap states in hydrogenated amorphous silicon: A comparison of photoemission and photoconductivity results

We report photoemission results from which we directly determined the density of states g(E) in the gap of a-Si:H between the top of the valence band E_v and the Fermi level. At 0.4 eV above E_v, g(E) was found to be ≈1×10²⁰ cm^-3 eV^-1 in the undoped film; P-doping increased g(E) in this region whereas annealing reduced it. The photoconductivity-derived optical absorption spectrum matched the shape of the photoemission spectrum, and thus supports the explanation that the photoconductivity shoulder at photon energies in the region of 1.3 eV is due to transitions from localized states above the valence band to the conduction band.     

Photoelectron spectroscopy measurements of the valence band structures of polymerized thin films of C60 and La0.1C60

The electronic valence band structures of polymerized thin films of C₆₀ and La_0.1C₆₀ have been studied by using ultra-violet photoelectron spectroscopy. Additionally, the films have been characterized by using Raman spectroscopy, X-ray photoelectron spectroscopy, and X-ray diffraction. The valence band of the C₆₀ film shows major peaks at binding energies of 2.6, 7.2, 10.3, and 12.6 eV. In the case of the doped film, we observe (i) an additional peak with a binding energy of 13.7 eV, (ii) evidence for redistribution of the density of electronic states due to hybridization between the 5d orbitals of La and the C₆₀ cage, and (iii) significantly higher density of the electronic states near the Fermi energy. The valence band spectra of the doped film are in good agreement with recent results of the density functional theory that support strong hybridization between the d-valence orbitals of La and the C₆₀ cage.     

FeS2多晶薄膜电子结构的实验研究

用磁控溅射方法制各纯Fe薄膜，并硫化合成FeS₂. 采用同步辐射X射线近边吸收谱与X射线光电子能谱研究了薄膜的电子结构. 结果表明，合成的FeS₂薄膜，在费米能级附近，有较强的Fe 3d态密度存在，同时，在价带谱中2—10eV处有强度较大的S 3p态密度存在；Fe的3d轨道在八面体配位场作用下分别为t_2g和e_g轨道，实验中由Fe的吸收谱计算得到两分裂能级之差为2.1eV;实验测得FeS₂价带结构中导带宽度约为2.4eV，导带上方仍存在第二能隙，其宽度约为2.8eV. 关键词： 磁控溅射 二硫化铁 X射线吸收近边结构 电子结构     

Resonant photoemission at the 3s threshold of Ni

A resonant enhancement of valence band photoemission features in Ni near the 3s threshold is presented. The emission behavior with photon energy of the Ni-3d band is characteristic of a Fano-type resonance. In addition to the main 3d-band emission and 6eV binding energy satellite, a weak satellite is observed at 7.2eV below the Fermi level with photon energies in the vicinity of the 3s threshold.     

Surface photovoltage spectroscopy of electronic surface states on cleaved germanium(111) surfaces

Surface photovoltage (SPV) measurements on UHV cleaved Ge(111) surfaces at 100 K are reported for photon energies 0.4 < ?ω < 1 eV. The SPV spectra are sensitive to surface treatment. Upon annealing to temperatures above 200°C, which is accompanied by a reconstruction change from the (2 × 1) to an (8) superstructure, the SPV spectrum shows 2 shoulders below band gap energy with threshold energies near 0.4 and 0.45 eV. These structures are interpreted in terms of electronic transitions from the valence band into empty surface state levels which are related to the (8) superstructure. Adsorbed oxygen and water vapor both cause new similar transitions from the valence band into empty surface states at 0.08 eV below the bottom of the conduction band.     

Photoemission studies of single crystals of titanium carbide

The electron distribution in the valence band from single crystals of titanium carbide has been studied by photoelectron spectroscopy with photon energies h?ω = 16.8, 21.2, 40.8 and 1486.6 eV. The most conspicious feature of the electron distribution curves for TiC is a hybridization between the titanium 3d and carbon 2p states at ca. 3–4-eV binding energy, and a single carbon 2s band at ca. 10 eV. By taking into account the strong symmetry and energy dependence of the photoionization crosssections, as well as the surface sensitivity, we have identified strong emission from a carbon 2p band at ? 2.9-eV energy. Our results are compared with several recent energy band structure calculations and other experimental data. Results from pure titanium, which have been used for reference purposes, are also presented.The valence band from single crystals of titanium carbide have been studied by means of photoelectron spectroscopy, with photon energies ranging from 16.8 to 1486.6 eV.By taking into account effects such as the symmetry and energy dependence of the photoionization cross-sections and surface sensitivity, we have found the valence band of titanium carbide to consist of two peaks. The upper part of the valence band at 3–4 eV below the Fermi level consists of a hybridization between Ti 3d and C 2p states. The C 2p states observed in our spectra were mainly excited from a band about 2.9 eV below the Fermi level. The APW^5–9, MAPW¹⁰ and EPM¹¹ band structure calculations predict a flat band of p-character between the symmetry points X′₄ and K₃, most likely responsible for the majority of C 2p excitations observed. The C 2s states, on the other hand, form a single band centered around ?10.4 eV.The results obtained are consistent with several recent energy band structure calculations^{5–11, 13} that predict a combined bonding of covalent, ionic and metallic nature.     

Density of Electronic States in the Conduction Band of Ultrathin Films of Naphthalenedicarboxylic Anhydride and Naphthalenetetracarboxylic Dianhydride on the Surface of Oxidized Silicon

The results of examination of the electronic structure of the conduction band of naphthalenedicarboxylic anhydride (NDCA) films in the process of their deposition on the surface of oxidized silicon are presented. These results were obtained using total current spectroscopy (TCS) in the energy range from 5 to 20 eV above the Fermi level. The energy position of the primary maxima of the density of unoccupied states (DOUS) of an NDCA film was determined based on the experimental TCS data and calculated data and compared with the position of the DOUS maxima of a naphthalenetetracarboxylic dianhydride (NTCDA) film. The theoretical analysis involved calculating the energies and the spatial distribution of orbitals of the molecules under study at the B3LYP/6-31G(d) DFT (density functional theory) level and correcting the obtained energies in accordance with the procedure that was proven effective in earlier studies of the conduction band of films of small conjugated organic molecules. It was found that the DOUS maxima of the NTCDA film in the studied energy interval from 5 to 20 eV above the Fermi level are shifted toward lower electron energies by 1–2 eV relative to the corresponding DOUS maxima of the NDCA film Subdivision of the Ufa Federal Research Centre of the.

     

Conduction electrons in solid and liquid gallium

We have studied the photoemission properties of liquid, supercooled and crystalline gallium with photon energies up to 6.5 eV. The spectra of the liquid phase are well described by the free electron model, whereas in the solid the density of states is reduced near the Fermi level. The observed changes in the electronic structure at the melting point are explained by the essential change in the ionic short range order.     

MgCNi3的电子结构、光学性质与超导电性

用第一性原理的密度泛函能带计算方法研究了新近发现的超导体MgCNi3的电子能带结构.计算结果表明其电子结构的基本特征是：Ni的3d态和C的2p态的杂化组成了MgCNi3的导带，费米面附近的物理性质主要由来源于Ni的3d电子态决定.在费米能级(EF)以下30eV的范围内，Ni 3d态构成了能带色散微弱的密集电子态，EF恰好落在Ni 3dyz+zx和3d3z2-r2电子态密度.C 2p态分布在EF以下40—70eV的区域内，Mg主要是以二价离子Mg2+的形式存在.Mg原子的掺杂导致了Ni原子的3d态基本上全部占据，引起Ni原子磁矩的消失.费米能级EF处的态密度N(ＥＦ)是550(states/eV·cell)，由此得到的Sommerfeld常数γeal～445mJ/mol·K2.基于第一性原理的光学性质的计算结果表明：在0—12eV的范围内光吸收主要是从占据的Ni 3d态向C　2p和Ni4s的跃迁.根据这些结果得出结论：MgCNi3的超导电性基本上是强耦合的BCS电子-声子作用机理. 关键词： MgCNi3 高温超导体 电子结构 光学性质     

Ultraviolet photoemission study of LiF

Photoemission from evaporated films of LiF were measured at photon energies of 10-27 eV. The photoelectron spectra exhibit features that can be identified as density-of-states structures in the valence and conduction bands of LiF. Regions of high density of states can be seen at ca. 3.3 and 7.8 eV above the vacuum level. The valence-band spectrum shows a doublet structure similar to the calculated density of states for the F^?2p band of LiF. The base width of this structure is found to be 4.6 ± 0.3 eV. The photoelectron spectra for photon energies > 15 eV indicate that the highest occupied states of the F^?2p band are located at 11.8 ± 0.3 eV below the vacuum level. The photoelectron spectra in the exciton region, however, show photo-emission from higher occupied states.     

Electronic structure of icosahedral alloys: The case of Al65Cu20Os15

Measurements with photoemission spectroscopy in the photon-energy range 35–130 eV have been used to determine the valence band of the stable icosahedral Al₆₅Cu₂₀Os₁₅. Resonant photoemission near the Os 5p 5d and 4f 5d transitions has been employed to show that the feature in the valence band with the maximum intensity at 1.5 (1) eV below the Fermi level is predominantly of the Os 5d character. This has been additionally verified by conducting the photoemission measurements in the constant-initial-state mode and by using the effect of the Cooper minimum in the photoionization cross section of the Os 5d orbitals. The valence band feature with the maximum intensity at 3.7 (1) eV below the Fermi level has been shown as being due mainly to the states of the Cu 3d character. The Os 5d and Cu 3d empirical partial density of states have been determined from the photoemission spectra. The decrease of intensity towards the Fermi level has been interpreted as being indicative of the presence of a theoretically predicted pseudogap around the Fermi level. It has been indicated, however, that the Fermi cut-off also contributes to the observed intensity decrease. It has been demonstrated that the energy resolution of the spectroscopic measurements performed so far on quasicrystals was not high enough to unambiguously determine the presence of such a pseudogap. No unusual features in the valence band of icosahedral Al₆₅Cu₂₀Os₁₅, which could be ascribed to its quasiperiodic nature, have been observed within the resolution of the experiment. High energy-resolution spectroscopic measurements were also shown to be essential to observe the theoretically predicted spikiness of the density of states in quasicrystals. A critical review of published spectroscopic data on the electronic structure of quasicrystals has also been presented.     

Electronic structure and reactivity of ultra-thin Fe films on a Rh(100) surface

The electronic structure and reactivity of ultra-thin Fe films on a Rh(100) surface have been investigated by angle-resolved ultraviolet photoelectron spectroscopy (ARUPS) and thermal desorption spectroscopy (TDS). The dispersion of d-bands of a clean Rh surface is consistent with the projection of the bulk band structure. One monolayer of Fe film shows a systematic shift of d-bands toward large binding energy by 0.4 eV and a large reduction in the density of states just below the Fermi level, in particular, around the M point. In accordance with the decrease in the density of states at the Fermi level, the bonding energy of hydrogen is greatly reduced to 245 kJ/mol on a 1 ML (ML = monolayer) Fe film, although the sticking coefficient is still in the range of 0.1–0.3. The successive increase in activation energy for the desorption of hydrogen with the increase of Fe film thickness from 1 to 3 ML is associated with a recovery of the density of states at the Fermi level.     

二维应变作用下超导薄膜LiFeAs的磁性和电子性质

基于密度泛函理论的第一性原理计算,研究了二维应变作用下LiFeAs超导薄膜的磁性结构、电子能带和态密度变化,分析了应变对其超导电性的作用.结果显示,对体系施加1%—6%的二维平面张、压应变均不改变其基态条形反铁磁性结构,费米面附近的电子态密度主要来自于Fe-3d轨道电子以及少量的As-4p电子.研究发现,与无应变情形相比,当施加压应变时,体系中Fe离子的反平行的电子自旋局域磁矩减小,薄膜反铁磁性受到抑制,费米面上电子态密度增加,超导电性来自于以反铁磁超交换耦合作用为媒介的空穴型费米面和电子型费米面间嵌套的Cooper电子对.而在张应变作用时,局域反铁磁性增强,费米面上电子态密度减小,金属性减弱,特别是张应变时费米面上空穴型能带消失, Cooper电子对出现概率显著降低,将抑制超导相变.     

X-ray photoemission studies of the electronic structure of single-crystalline CdO(100)

The electronic structure of single-crystalline CdO is investigated using X-ray photoemission spectroscopy. The surface is prepared by in situ Ar⁺ ion bombardment and annealing (IBA). The core level spectra before and after the IBA are presented, and reveal a dramatic reduction in the surface contamination. The semi-core Cd 4d level and valence band region following the IBA are also shown. The surface Fermi level is pinned 1.3±0.10 eV above the valence band maximum.     

The electronic structures of epitaxial CrSi2 film prepared on Si(111) substrate

The valence band (VB) electronic structures of CrSi₂ were studied by synchrotron radiation photoemission. Overall features of the VB photoemission spectra measured at room temperature (RT) and 20 K by using synchrotron radiation (photon energy, hν=20–120 eV) were similar. Two characteristic emissions were observed corresponding to the bonding and the nonbonding Cr-d partial density of states (PDOS) in the CrSi₂. The onset of the VB photoemission measured at 20 K was located at about 0.32 eV below Fermi level, due to the energy band gap of CrSi₂ more than 0.32 eV.     

Photoemission studies of the electronic structure of III–V semiconductor surfaces

The photoemission technique using synchroton radiation in the photon energy range 5–450 eV has been applied to the study of the electronic structure of some III–V semiconductor surfaces, prepared by cleavage in situ under ultrahigh vacuum conditions, ? 10^?11 Torr. For p-type GaAs(110), the Fermi level is pinned at the top of the valence band and thus no filled surface states extend into the band-gap. The situation is more complicated for n-type GaAs(110), where band bending easily can be introduced by extrinsic effects (impurities, cleavage quality, etc.) and push the Fermi level down to about midgap. Chemical shifts of inner core levels (3d for Ga and As) are used to obtain information on the bonding site of oxygen on the (110) surface. GaAs(110) can be exposed to atmospheric pressure of molecular oxygen without breaking the bonds between the surface atoms and the bulk. Oxygen is predominantly bonded to the As atoms on the surface. The oxidation behavior is strikingly different for GaSb(110) with formation of gallium and antimony oxides on the surface directly upon oxygen exposure. Heavier oxidation of GaAs(110) and breaking of the surface bonds will also be reported.     

Electron spectroscopic studies of clean and oxidized iron

X-ray photoelectron spectroscopy (XPS) and soft X-ray appearance potential spectroscopy (APS) together with Auger electron spectroscopy (AES) were used to study the electronic properties of clean and oxidized (Fe₃O₄) iron surfaces. The features arising from excitations of electrons from Fe 2p core levels are discussed consistently within the common one-electron picture (i.e. neglecting final state effects). For pure Fe the shape of the APS L₃ peak is evaluated taking into consideration the theoretical density of states above the Fermi level and is found to agree well with that observed. As a consequence it is shown that in this case the appearance potential is about 1 eV larger than the threshold energy for the excitation of a core electron to the Fermi level. Thus for $\text{2p}{}_{\mathrm{<mtext>3</mtext><mtext>2</mtext>}}$ electrons this quantity results to be 704.8 eV from both XPS and APS techniques. Successive oxidation at 500°C leads to an increase of the appearance potentials of the Fe 2p levels by only 0.5 eV, whereas the positions of the corresponding XPS peaks are shifted by as much as 3.5 eV. However this apparent disagreement can be eliminated by taking into account the above mentioned effect concerning the appearance potentials from pure Fe and the fact that the threshold energies (which determine the appearance potentials) of the XPS signals are shifted only by 1.7 eV. This example demonstrates that considerable care has to be taken in discussing “binding energies” or “chemical shifts” as derived from different electron spectroscopic techniques. The observed splitting of the MVV Auger transition of Fe at 47 eV upon oxidation is interpreted in terms of the qualitative features of the valence band structure of Fe₃O₄ and ascribed to the participation of a cross-transition between O 2p and Fe 3p states.     

Surface photovoltage,band-bending and surface states on a-Si : H

We have measured the surface photovoltage (SPV) of intrinsic (i.e., undoped) and phosphorus-doped amorphous Si : H between ?168 and 25°C in the spectral range from 0.5 to 2.5 eV. The a-Si : H was grown in a silane glow discharge. Vibrating Kelvin probe techniques were used for the SPV measurements; Auger spectroscopy was used for monitoring surface cleanliness and chemistry. At all temperatures and for both materials, (1) the SPV was invariably negative, (2) there was no correlation between the spectral, thermal and response-time properties of the SPV and the bulk photoconductivity, and (3) surface treatments such as sputtering and oxygen physisorption strongly affected the SPV but not the photoconductivity. These facts indicated that the SPV was due to the emptying of surface-states via surface transitions, and corresponded to the flattening of bands which, when unilluminated, were bent upwards. Intrinsic material showed a maximum SPV of about 0.2 V. The SPV was characterized at ?168°C by strong electronic isolation between surface-states and valence band (i.e., once light was removed, there was no surface-state refilling or decay of the SPV), slow rise times (～min), saturation at photon fluxes of about 10¹¹/cm² · s, and a SPV spectral threshold occurring at 0.7 eV. At 25°C, all SPV responses were much faster (<0.5 s) and the optical threshold was 0.9 eV. The thermal activation energies associated with the SPV were 0.11 eV for surface-state emptying and 0.22 eV for surface-state refilling. For P-doped material the maximum SPV at ?168°C was 0.3 V and its properties indicated less electronic isolation between surface-states and valence band. There was no SPV at room temperature. Our results are discussed in terms of an energy level scheme which contains a distribution of filled surface states isolated from both conduction and valence bands. The surface-state density is estimated to be about (1?2) × 10¹¹/ cm², a relatively low value which is consistent with the observed lack of Fermi level pinning. In both materials there is a very fast component of the SPV which suggests the presence of additional surface states below the valence band edge.     

Valence band structure of single crystal titanium carbide,studied by soft X-ray and ultraviolet photoelectron spectroscopy

Valence states of single crystal titatium carbide (TiC_x, X?0.88) have been studied with photon energies ranging from far ultraviolet (u.v.) to soft X-ray. The valence band consists of two peaks located at 3 and 10 eV below the Fermi level. This is in good agreement with recent APW band structure calculations that predict a strong hybridization of the Ti 3d and C 2p bands and a C 2s band at lower energy.     

Ab-initio calculations of electronic structure and optical properties of TiAl alloy

The electronic structures and optical properties of TiAl intermetallic alloy system are studied by the first-principle orthogonalized linear combination of atomic orbitals method. Results on the band structure, total and partial density of states, localization index, effective atomic charges, and optical conductivity are presented and discussed in detail. Total density of states spectra reveal that (near the Fermi level) the majority of the contribution is from Ti-3d states. The effective charge calculations show an average charge transfer of 0.52 electrons from Ti to Al in primitive cell calculations of TiAl alloy. On the other hand, calculations using supercell approach reveal an average charge transfer of 0.48 electrons from Ti to Al. The localization index calculations, of primitive cell as well as of supercell, show the presence of relatively localized states even above the Fermi level for this alloy. The calculated optical conductivity spectra of TiAl alloy are rich in structures, showing the highest peak at 5.73 eV for supercell calculations. Calculations of the imaginary part of the linear dielectric function show a prominent peak at 5.71 eV and a plateau in the range 1.1-3.5 eV.