Investigation and simulation of the structural and electronic properties of LiF:Mg,LiF:Cu,LiF:P nano-layer dosimeters

In this study, electronic structure of lithium fluoride thin films in pure state and doped with magnesium (Mg), copper (Cu) and phosphorus (P) impurities was studied using WIEN2K Code. The structural and electronic properties of two LiF thin films with 1.61 and 4.05?nm thicknesses were studied and compared. Results show that the distance of atoms in the surface and central layers of pure LiF are 1.975 and 2.03?nm, respectively. Electronic density of the valence band around the surface atoms is greater than that around middle atoms of the supercell. The band gap of bulk LiF is 9?eV. But, in the case of thin films, it is reduced to 2?eV. Electronic and hole-traps were not observed in composition of LiF thin films doped with Mg and P with 1.61 and 4.05?nm thickness and in fact, metallic properties were observed. When Cu atoms were doped in composition of an LiF thin film, the thin film was converted to semiconductor.     

Electronic and optical properties of black phosphorus doped with Au,Sn and I atoms

In this study, the electronic and the optical properties of monolayer black phosphorus (BP) doped with Gold (Au), Tin (Sn) and Iodine (I) atoms have been investigated by the density-functional theory (DFT) method. In the calculations, the electronic and the optical properties of monolayer BP have been substantially changed with doping. Monolayer BP has a narrow bandgap as 0.85 eV, BP doped with these atoms, results in a metallic behaviour and nearly spin gapless band gap behaviour. The dielectric constant of BP which shows anisotropic optical properties due to different edge states as zigzag and armchair has been changed with doping especially with Au.     

Effects of oxygen partial pressure on the ferroelectric properties of pulsed laser deposited Ba0.8Sr0.2TiO3 thin films

The Ba_0.8Sr_0.2TiO₃ thin films were grown on the Pt–Si substrate at 700 °C by using a pulsed laser deposition technique at different oxygen partial pressure (PO₂) in the range of 1–20 Pa and their properties were investigated. It is observed that the PO₂ during the deposition plays an important role on the tetragonal distortion ratio, surface morphology, dielectric permittivity, ferroelectric polarization, switching response, and leakage currents of the films. With an increase in PO₂, the in-plane strain for the BST films changes from tensile to compressive. The films grown at 7.5 Pa show the optimum dielectric and ferroelectric properties and also exhibit the good polarization stability. It is assumed that a reasonable compressive strain, increasing the ionic displacement, and thus promotes the in-plane polarization in the field direction, could improve the dielectric permittivity. The butterfly features of the capacitance–voltage (C–V) characteristics and the bell shape curve in polarization current were attributed to the domain reversal process. The effect of pulse amplitude on the polarization reversal behavior of the BST films grown at PO₂ of 7.5 Pa was studied. The peak value of the polarization current shows exponential dependence on the electric field.     

Cu-Fe共掺杂ZnO电子结构与光学性质的第一性原理计算研究

基于密度泛函理论的第一性原理平面波超软赝势方法,计算了本征ZnO,Cu、Fe单掺杂和Cu-Fe共掺杂ZnO的电子结构和光学性质.计算结果显示:Cu掺杂属于p型掺杂,Fe掺杂属于n型掺杂,单掺杂时Cu-3d态电子和Fe-3d态电子均在禁带形成杂质能级,从而提高ZnO的载流子浓度,改善ZnO的导电性能,而Cu-Fe共掺杂时ZnO半导体进入简并态,呈现金属特性.掺杂后的ZnO介电函数虚部变化主要集中在低能量区域,光谱吸收系数及反射率曲线发生红移,其中本征ZnO对太阳光谱有较好的透射性,Fe单掺杂和Cu-Fe共掺杂ZnO对可见光谱有相似的吸收效果,而Fe单掺杂ZnO对近紫外区域的光谱透射率更小,适用于制备防紫外线薄膜.     

The effect of annealing temperature on structural and optical properties of undoped and Cu doped CdS thin films

Cadmium sulphide (CdS) thin films were prepared chemical bath deposition technique. The films were doped with copper using the direct method consisting in the addition of a copper salt in the deposition bath of CdS. The doped films were annealed in air, at 250, 300 and 350 °C, for 1 h. The deposition films were characterized with X-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive analysis by X-rays (EDAX) and optical properties of CdS thin films before and after Cu doping. XRD analysis shows that the films are polycrystalline in nature with cubic crystalline structure. The various parameters such as crystallite size, micro strain and dislocation density were evaluated. SEM study shows that the total substrate surface is well covered by uniformly distributed spherical shaped grains. Optical transmittance study shows the presence of direct transition with band gap energy decrease 2.5–2.2 eV.     

UV absorption in metal decorated boron nitride flakes: a theoretical analysis of excited states

The excited states of single metal atom (X = Co, Al and Cu) doped boron nitride flake (MBNF) B₁₅N₁₄H₁₄-X and pristine boron nitride (B₁₅N₁₅H₁₄) are studied by time-dependent density functional theory. The immediate effect of metal doping is a red shift of the onset of absorption from about 220 nm for pristine BNF to above 300 nm for all metal-doped variants with the biggest effect for MBNF-Co, which shows appreciable intensity even above 400 nm. These energy shifts are analysed by detailed wavefunction analysis protocols using visualisation methods, such as the natural transition orbital analysis and electron-hole correlation plots, as well as quantitative analysis of the exciton size and electron-hole populations. The analysis shows that the Co and Cu atoms provide strong contributions to the relevant states whereas the aluminium atom is only involved to a lesser extent.     

Thermochromic properties of W-doped VO2 thin films deposited by aqueous sol-gel method for adaptive infrared stealth application

The W doped VO₂ thin films with various W contents were successfully deposited by aqueous sol-gel method followed by a post annealing process. The derived thin films were characterized by X-ray diffraction, Raman spectra, scanning electron microscopy and atomic force microscopy. Besides, the resistance-temperature relationship and infrared emissivity in the waveband 7.5–14 μm were analyzed, and the effects of W doping on the thermochromic properties of VO₂ thin films were studied. The results show that W atoms enter the crystal lattice of VO₂ and the transition temperature decreases gradually with increasing doping amount of W. The emissivity of VO₂-W-4% thin films has dropped to 0.4 when its real temperature is above 30 °C. The thermal infrared images were also examined under different temperature by thermal imager. The results indicate that the temperature under which W doped VO₂ thin films begin to have lower emissivity decreases gradually with increasing doping amount of W. W doped VO₂ thin films can control its infrared radiation intensity actively at a lower temperature level of 30 °C, which has great application prospects in the adaptive infrared stealth technology.     

W-Cu共掺杂ZnO电子结构和光学性质

采用了基于密度泛函理论(DFT)的第一性原理平面波超软赝势方法,计算了本征ZnO, W单掺杂ZnO, Cu单掺杂ZnO,以及W-Cu共掺杂ZnO电子结构和光学性质.计算结果表明:W掺杂属于n型掺杂, Cu掺杂属于p型掺杂,单掺杂均可以提高ZnO的载流子浓度,从而改善ZnO的导电性. W-Cu共掺杂时ZnO进入简并状态,呈现金属性质.三种掺杂ZnO的吸收光谱均发生红移,其中W-Cu共掺杂时, ZnO对太阳光谱的吸收效果最好.     

Layer‐by‐layer AuCl3 doping of stacked graphene films

We investigated the effect of layer‐by‐layer AuCl₃ doping on the electrical and optical properties of stacked graphene films. Graphene grown by the chemical‐vapor deposition method on a Cu‐foil was chemically doped by AuCl₃ solution with a concentration of 20 mM. Eight different configurations were prepared and analyzed by using four‐point probe measurements, optical transmittance measurements, scanning electron microscopy, and micro‐Raman spectroscopy to compare the optical and electrical characteristics of the different graphene samples. In our study, the top‐layer doping method was very effective because better performances considering both sheet resistance and optical transmittance were observed from the configurations with the top‐layer doped. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Synthesis,Photophysical, Electrochemical and Thermal Investigation of Anthracene Doped 2-Naphthol Luminophors and their Thin Films for Optoelectronic Devices

A series of novel luminophors of 2-naphthol by doping anthracene were prepared using conventional solid state reaction technique. The photophysical, electrochemical and thermal properties were studied by Fluorescence spectroscopy, XRD, SEM, TGA-DSC and by Cyclic Voltammetry techniques. The thin films were characterized by Fluorescence spectroscopy. XRD study of fine grained powders exhibited sharp peaks which specify crystallinity and homogeneity of the doped luminophors. The fluorescence spectra of doped 2-naphthol exhibited emission of anthracene at 413 nm i.e. blue emission with instantaneous fluorescence quenching of 2-NP due to excitation energy transfer (EET). Electrochemical data specify that the HOMO and LUMO energy levels of the synthesized luminophors are in the range of 5.55–5.71 eV and 3.03–3.24 eV, respectively. TGA-DSC study confirmed thermal stability of prepared luminophors. Hence, overall study proposes that these luminophors seems applicable to be used as n-type materials for Optoelectronic devices.     

Optoelectronics properties of TiO<Subscript>2</Subscript>:Cu thin films obtained by sol gel method

In this research, Cu-doped TiO₂ thin films have been successfully deposited onto a glass substrate by Sol–gel technique using dip coating method. The films were annealed at different annealing temperatures (400–500 °C) for 1 h. The structural, optical and electrical properties of the films were investigated and compared using X-ray Diffraction, UV–visible spectrophotometer and 4-point probe method. Optical analysis by mean transmittance T(λ) and absorption A(λ) measurements in the wavelength range between 300 to 800 nm allow us to determine the indirect band gap energy. DRX analysis of our thin films of TiO₂:Cu shows that the intensities of the line characteristic of anatase phase increasing in function of the temperature.     

Theoretical and experimental investigation on structural and electronic properties of Al/O/Al,O-doped WS2

Effects of the doping atom (O, Al, and (Al, O)) on structural and electronic properties of the monolayer WS₂ have been studied by using first-principles calculations. Results show that the covalent character of W–S bonding has been enhanced after doping. Meanwhile, W–O, Al–S and W–S bonds of (Al, O) co-doped WS₂ monolayer have higher covalent character compared with O-doped and Al-doped WS₂ monolayer of this work. After doping with Al (or Al, O) atoms, Fermi level moves close to the valence band and the dopant atoms produce the defect energy levels, indicating that Al doped and (Al, O) co-doped WS₂ monolayer both have p-type conductivity. O-doped and (Al, O) co-doped WS₂ ultrathin films was prepared on Si substrates. Results of Raman spectra show the formation of the O-doped and (Al, O) co-doped WS₂ films. Moreover, compared with the pure WS₂, the approximate reduction of 0.43 eV and 0.46 eV for W 4f and S 2p in binding energy after (Al, O) co-doped shows that p-type doping of (Al, O) co-doped WS₂ has been verified.     

Structural phase modification in Cu incorporated nanostructured zinc sulfide thin films

Cu incorporated zinc sulfide (ZnS) films are prepared by a RF magnetron sputtering technique and the influence of Cu doping concentration on the structural, morphological and optical properties is systematically analyzed using techniques like grazing incidence X-Ray diffraction (GIXRD), micro-Raman spectroscopy, atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDS) and UV–vis spectroscopy. XRD examination of the as-prepared films revealed the presence of polycrystalline structure with co-existence of cubic and hexagonal phases in the pure and lower Cu incorporated films. Increase in Cu doping concentration causes a gradual phase transformation from mixed phase to cubic phase. Micro-Raman spectra further confirms the structural phase modifications with the addition of Cu in ZnS. Morphological analysis shows compact distribution of elongated grain geometry with good connectivity and detectable grain boundary in the pure and Cu incorporated films. Increase in Cu incorporation results in the systematic reduction of RMS surface roughness. EDS analysis confirms the incorporation of Cu and surface vacancy defects in the doped films. All the films are transparent in the visible region and band gap calculation by Tauc plot shows that increase in Cu incorporation results in band gap renormalization.     

Structural, optical and electrical properties of ZnO:Al thin films for optoelectronic applications

Undoped and aluminum-doped ZnO thin films are prepared by the sol–gel spin-coating process. Zinc acetate dihydrate, ethanol and mono-ethanolamine are used as precursor, solvent and stabilizer, respectively. The atomic percentage of dopant in solution were [Al/Zn] = 1 %, 2 % and 3 %. The effect of Al doping on the optical and electrical properties of ZnO films was investigated by X-ray diffraction (XRD), Four-Point probe technique and UV–visible spectrophotometery. The results from the X-ray diffraction show that the pure ZnO thin films had a polycrystalline structure of the hexagonal Wurtzite Type. A minimum resistivity of $3.3 \times 10^{-3} \Omega \cdot \mathrm{cm}$ was obtained for the film doped with 2 mol % Al. Optical transmissions reveal a good transmittance within the visible wavelength spectrum region for all of the films. The value of the band gap is enhanced from 3.21 eV (undoped ZnO) to 3.273 eV (Al/Zn = 3 %), the increase in the band gap can be explained by the Burstein–Moss effect.     

Effects of copper concentration on electro-optical and structural properties of chemically deposited nanosized (Zn-Cd)S:Cu films

Nanocrystalline (Zn-Cd)S films have been co-deposited on glass slide substrates by chemical bath deposition (CBD) technique at 70 °C for 75 min. Electroluminescent (EL), photoluminescent (PL) and structural characteristics of these films doped with Cu have been investigated. Cu doping has significant effects on the growth, structural and optical properties of the deposited (Zn-Cd)S films. EL studies show the essentiality of copper for EL emission. The effect of Cu concentration is examined on XRD, SEM, UV-vis spectroscopy, etc. The morphology of these films investigated with SEM and XRD is used to determine crystalline nature of the films. The optical absorption coefficient of the films has been found to increase with increase in Cu concentration. Voltage and frequency dependence shows the effectiveness of acceleration-collision mechanism. The trap-depth values are calculated from temperature dependence of EL brightness.     

In-plane dielectric characterization of sol–gel derived PLZT (9/65/35) thin films using an interdigital electrode configuration

Lead lanthanum zirconate titanate (PLZT 9/65/35) thin films were deposited on MgO (00l) substrates using a sol–gel method. X-ray diffraction measurements reveal that the PLZT film has epitaxially grown on the substrate and has a pure perovskite structure. Using gold interdigital electrodes the in-plane dielectric properties of the films were measured as a function of frequency (1 kHz to 10 GHz), temperature (293–435 K) and dc electric field (0–20 MV/m). The PLZT (9/65/35) thin film exhibits a diffuse phase transition, which indicates a relaxor-like ferroelectric behavior. The temperature dependence of the characteristic relaxation time was analyzed in terms of the Vögel–Fulcher relation. The relative permittivity has a high tunability of 34–42% in the frequency range of 10 MHz to 1 GHz.     

Conducting properties of In2O3:Sn thin films at low temperatures

Electrical conductivity, Hall effect and magnetoresistance of In₂O₃:Sn thin films deposited on a glass substrates at different temperatures and oxygen pressures, have been investigated in the temperature range 4.2–300 K. The observed temperature dependences of resistivity for films deposited at 230 °C as well as at nominally room temperatures were typical for metallic transport of electrons except temperature dependence of resistivity of the In₂O₃:Sn film deposited in the oxygen deficient atmosphere. The electrical measurements were accompanied by AFM and SEM studies of structural properties, as well as by XPS analysis. It is established that changes of morphology and crystallinity of ITO films modify the low-temperature behavior of resistivity, which still remains typical for metallic transport. This is not the case for the oxygen deficient ITO layer. XPS analysis shows that grown in situ oxygen deficient ITO films have enhanced DOS between the Fermi level and the valence band edge. The extra localized states behave as acceptors leading to a compensation of n-type ITO. That can explain lower n-type conductivity in this material crossing over to a Mott-type hopping at low temperatures. Results for the low temperature measurements of stoichiometric ITO layers indicate that they do not show any trace of metal-to-insulator transition even at 4.2 K. We conclude that, although ITO is considered as a highly doped wide-band gap semiconductor, its low-temperature properties are very different from those of conventional highly doped semiconductors.     

The effect of Mg doping on the dielectric and tunable properties of Pb0.3Sr0.7TiO3 thin films prepared by sol–gel method

Mg doped Pb_0.3Sr_0.7TiO₃ (PST) thin films were fabricated by the sol–gel method on a Pt/Ti/SiO₂/Si substrate. The microstructure, surface morphology, dielectric and tunable properties of PST thin films were investigated as a function of Mg concentration. It is found that proper Mg doping dramatically improves the dielectric loss (0.0088 @ 1 MHz), furthermore, the crystallinity, dielectric constant, and tunability of films simultaneously decrease with the increase of Mg content. The 2 mol% Mg doped PST thin film shows the highest figure of merit (FOM) value of 36.8 for its the smallest dielectric loss and upper tunability. The dependence of Rayleigh coefficient on the doping concentration was examined, which indicated that the reduction of dielectric constant and tunability of films should be related to the $\mathrm{Mg}''_{\mathrm{Ti}}$ – $\mathrm{V}_{\mathrm{O}}^{\bullet\bullet}$ defect dipoles pinning the domain wall motion of residual polar clusters in PST.     

Synthesis, structural, optical and electrical properties of metal nanoparticle–rare earth ion dispersed in polymer film

Cu-nanoparticles have been prepared by ablating a copper target submerged in benzene with laser pulses of Nd:YAG (wavelength: 355, 532 nm and 1,064 nm). Colloidal nanoparticles have been characterized by UV–Vis spectroscopy and transmission electron microscopy. The obtained radius for the nanoparticles prepared using 1,064 nm irradiation lies in the range 15–30 nm, with absorption peak at 572 nm. Luminescence properties of Tb³⁺ ions in the presence and absence of Cu-nanoparticles have been investigated using 355 nm excitation. An enhancement in luminescence of Tb³⁺ by local field effect causing increase in lifetime of ⁵D₄ level of Tb³⁺ ion has been observed. Frequency and temperature-dependent conductivity of Tb³⁺ doped PVA thin films with and without Cu-nanoparticles have been measured in the frequency range 20 Hz–1 MHz and in the temperature range 318–338 K (well below its melting temperature). Real part of the conductivity spectra has been explained in terms of power law. The electrical properties of the thin films show a decrease in dc conductivity on incorporation of the Cu-nanoparticles.