Rapid communication Fabrication of nano-dot- and nano-ring-arrays by nanosphere lithography

We have applied the method of nanosphere lithography to fabricate arrays of nanometer-scale gold and cobalt particles. The individual cobalt particles were found to be in a single domain state as verified by magnetic force microscopy. By tuning the preparation conditions, we also successfully fabricated arrays of mesoscopic gold rings for the first time with potential application for persistent current experiments.     

Annealing study of two-dimensional patterned Ge nanostructures via nanosphere lithography

Experimental studies on patterning hexagonal Ge nanostructures have been conducted on Si substrates through deposition of Ge with colloidal particles as a mask. The deposited Ge thin film possesses, according to the X-ray diffraction measurements, in plane texture, being epitaxial and aligned with the (111) Si substrate. The size distribution of the patterned Ge nanostructures is narrow, as indicated by the atomic force microscopy and scanning electron microscopy measurements. We have obtained Ge nanostructures with lateral dimension of 490 nm (height 12 nm), 200 nm (height 6 nm) and 82 nm (height 6 nm) by using different sizes of polystyrene spheres. We have performed in depth studies of the Ge nanostructures’ behavior due to thermal and rapid thermal post-annealing processes. FT micro-Raman spectroscopy shows that there is no Si intermixing during the annealing process. In order to quantify the changes in the height and lateral dimension, we have performed atomic force microscopy and white light interferometry analysis. The changes in shape and the decrease in the area of a cross-section of Ge nanostructure will be discussed in respect to similar results shown in the literature for Ge thin films during the annealing process.     

Ordered magnetic multilayer nanobowl array by nanosphere template method

Ordered magnetic multilayer [Co/Pt]_n nanobowls have been fabricated over a silicon substrate based on a polystyrene (PS) monolayer film. The ordered PS monolayer was first prepared by the self-assembly technique, which was used as the template for the multilayer film [Co/Pt]_n deposition. The ordered magnetic multilayer [Co/Pt]_n nanobowl array was obtained after the transferring and the selective etching process. The nanobowls show a uniform size and smooth surfaces. The nanobowls stuck to the neighbors and notches were observed in the bowl brims because of the contact points between the closed-packed PS beads. The nanobowls could be separated from their neighbors by thinning the PS beads before the film deposition and no notches were observed anymore. Compared to the chemical method, this method showed more flexible choices of the material to fabricate the nanobowls, which extended the application scope of the nanobowls greatly.     

Fabrication of PECVD-grown fluorinated hydrocarbon nanoparticles and circular nanoring arrays using nanosphere lithography

Nanosphere lithography (NSL) masks were created by spin-coating of polystyrene particles onto silicon surfaces. Fluorinated hydrocarbon films were coated on the nanosphere lithography masks using plasma-enhanced chemical vapor deposition (PECVD) to obtain ordered arrays of fluorinated hydrocarbon. Atomic force microscope images show hexagonally ordered nanodots of dimension 225 ± 11 nm with a height of 23 ± 4 nm. Every hexagon encloses a circular ring of diameter 540 ± 24 nm having a height and width of 13.5 ± 0.6 nm and 203 ± 16 nm, respectively. FTIR analysis shows two distinct zones of atomic bonding of CH_x and CF_x in the plasma coated ordered fluorinated hydrocarbon films.     

基于直接胶体晶体刻蚀技术的高度有序纳米硅阵列的尺寸及形貌控制

以自组装单层胶体小球阵列为掩模，采用直接胶体晶体刻蚀技术在硅表面制备二维有序尺寸可控的纳米结构.在样品制备过程中，首先通过自组装法在硅表面制备了直径200nm的单层聚苯乙烯(PS)胶体小球的二维有序阵列；然后对样品直接进行反应离子刻蚀(RIE)，以氧气为气源，利用氧等离子体对聚苯乙烯小球和对硅的选择性刻蚀作用，通过改变刻蚀时间，制备出不同尺寸的PS胶体小球的有序单层阵列；接着以此二维PS胶体单层膜为掩模，以四氟化碳为气源对样品进行刻蚀；最后去除胶体球后得到二维有序的硅柱阵列.SEM和AFM的测量结果表明：改变氧等离子体对胶体球的刻蚀时间和四氟化碳对硅的刻蚀时间，可以控制硅柱的尺寸以及形貌，而硅柱阵列的周期取决于原始胶体球的直径. 关键词： 胶体晶体刻蚀 纳米硅柱阵列     

花状纳米金结构阵列的工艺制备与拉曼增强研究

基于纳米球光刻技术制备了一种花状纳米金结构阵列,经过PS509 nm球旋凃和ICP氧刻蚀,再通过镀金膜与高温退火工艺,纳米球阵列的表面被粗糙化,进而形成了一种鳞状的花状阵列 。FDTD仿真结果表明,制备的这种阵列具备很高的电磁场增强特性,主要的增强集中于纳间隙的边缘处。以罗丹明 6G染料为探针分子测试基底的拉曼效应,与金基底的拉曼信号相比,该纳米结构阵列拉曼增强效应明显,对罗丹明 6G的检测极限达到了10-6 mol/L的水平。     

花状纳米金结构阵列的工艺制备与拉曼增强研究

基于纳米球光刻技术制备了一种花状纳米金结构阵列,经过PS509 nm球旋凃和ICP氧刻蚀,再通过镀金膜与高温退火工艺,纳米球阵列的表面被粗糙化,进而形成了一种鳞状的花状阵列 。FDTD仿真结果表明,制备的这种阵列具备很高的电磁场增强特性,主要的增强集中于纳间隙的边缘处。以罗丹明 6G染料为探针分子测试基底的拉曼效应,与金基底的拉曼信号相比,该纳米结构阵列拉曼增强效应明显,对罗丹明 6G的检测极限达到了10-6 mol/L的水平。     

纳米压印多孔硅模板的研究

纳米压印模板通常采用极紫外光刻、聚焦离子束光刻和电子束光刻等传统光刻技术制备,成本较高.寻找一种简单、低成本的纳米压印模板制备方法以提升纳米压印光刻技术的应用成为研究的重点与难点.本文以多孔氧化铝为母模板,采用纳米压印光刻技术对纳米多孔硅模板的制备进行了研究.在硅基表面成功制备出纳米多孔阵列结构,孔间距为350—560 nm,孔径在170—480 nm,孔深为200 nm.在激发波长为514 nm时,拉曼光谱的测试结果表明,相对于单面抛光的硅片,纳米多孔结构的硅模板拉曼光强有了约12倍左右的提升,对提升硅基光电器件的应用具有重要的意义.最后,利用多孔硅模板作为纳米压印母模板,通过热压印技术,成功制备出了聚合物纳米柱软模板.     

纳米球刻蚀法制备的二维有序的CdS纳米阵列及其光学性质的研究

采用纳米球刻蚀(nanosphere lithography)技术,以自组装的聚苯乙烯纳米小球(polystyrene,PS小球)的单层膜为掩模,制备出二维有序的CdS纳米阵列.利用扫描电子显微镜(SEM)对样品结构进行了表征,用紫外—可见分光光度计对样品光学性质进行了分析.结果表明：制备的二维CdS纳米阵列是高度有序的,且与作为掩模的纳米小球的原始尺寸及排布结构一致;禁带宽度为2.60eV,相对于体材料的2.42eV,向短波长蓝移了0.18eV,表现出CdS材料在纳米结构点阵中的量子尺寸效应;CdS纳米 关键词： 纳米球刻蚀 二维CdS纳米有序阵列     

Morphology control and electron field emission properties of high-ordered Si nanoarrays fabricated by modified nanosphere lithography

High-ordered silicon nanoarrays were prepared using direct nanosphere lithography combined with thermal oxidation. Atomic force microscope (AFM) images of the silicon arrays show that the patterns of polystyrene (PS) template are well transferred to the silicon surface. The size and morphology of the nanoarrays can be controlled effectively by varying the plasma-therm reactive ion etching (RIE) or thermal oxidation parameters. The field emission studies revealed that the typical turn-on field was about 7-8 V/μm with emission current reached 1 μA/cm². It is also found that the field emission current is highly dependent on the morphology of these Si nanoarrays.     

电阻热蒸发镀膜与电子束蒸发镀膜对纳米球刻蚀方法制备二维银纳米阵列结构的影响

在使用纳米球刻蚀法制备二维银纳米点阵的过程中,使用不同的镀膜方法在同样的模板上得到了不同形貌的银纳米阵列结构.使用电阻热蒸发镀膜方法获得了六角排列的银纳米三角形阵列结构,使用电子束蒸发镀膜方法则获得了六角排列的银纳米环阵列结构.研究表明,沉积纳米粒子的粒径、表面纳米曲率效应和热能是形成不同结构形貌的纳米阵列结构的关键因素. 关键词： 银纳米阵列 电阻热蒸发 电子束蒸发 纳米球刻蚀     

亚微米投影光刻物镜光学制造技术

本文报告亚微米光刻５倍ｇ线与ｉ线投影光刻物镜的光学制造技术。讨论超高精度要求的球面曲率半径、透镜中心厚度、球面面形与透镜偏心差等各项指标的综合控制技术与检测方法。着重介绍了作者所发展的大口径高精度双胶合透镜的计算机辅助无变形胶合技术。给出了加工检测结果以及镜头的主要性能指标。     

用于数字光刻的非对称式投影物镜设计

针对DMD数字光刻,利用ZEMAX光学设计软件,设计出了一套适用于型号 0.7XGA DMD的10片式光刻投影物镜。该物镜采用非对称性结构,前组为改进的三分离物镜,后组为匹兹伐物镜加平像场镜,分辨率为2 m,近轴放大倍率为-0.15,像方数值孔径NA为0.158,全视场波像差小于/20 ,畸变小于0.014%,焦深为20 m,通过各项评价可知系统已经达到了衍射极限。在对该镜头进行公差分析后,利用Monte Carlo方法,模拟组装加工了100组镜头,得到90%的镜头MTF＞0.46,50%的镜头MTF＞0.51,证明了这种非对称性结构加工和校装的可能性。     

Effect of chromium interlayer deposition on periodic silver nanoparticle array structure fabricated by nanosphere lithography

Effect of chromium interlayer deposition on 2-dimensional, periodic silver nanoparticle array structure was systematically investigated. The silver nanoparticle array was fabricated by nanosphere lithography with assembled polystyrene nanospheres being as a deposition mask. The chromium interlayer was deposited by thermal evaporation either on the nanosphere mask or directly on the silicon substrate. The structures of the achieved silver nanoparticle arrays were characterized by scanning electron microscope and were compared with that of silver nanoparticle array without the interlayer. With analysis of the anomalies among the structures the critical role of the interlayer in the periodic nanoparticle array fabrication was revealed.     

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography

We present a fabrication procedure that can form large-scale periodic silicon nanopillar arrays for 2D nanomold which determines the feature size of nanoimprint lithography, using modified nanosphere lithography. The size of silicon nanopillars can be easily controlled by an etching and oxidation process. The period and density of nanopillar arrays are determined by the initial diameter of polystyrene (PS) spheres. In our experiment, the smallest nanopillar has a full width half maximum (FWHM) of approximately 50 nm, and the density of silicon pillar is ∼10⁹/cm². Using this approach, it is possible to fabricate 2D nanoimprint lithography mask with 50 nm resolution.     

Control of ZnO nanowire arrays by nanosphere lithography (NSL) on laser-produced ZnO substrates

Nanosphere lithography (NSL) is a successful technique for fabricating highly ordered arrays of ZnO nanowires typically on sapphire and GaN substrates. In this work, we investigate the use of thin ZnO films deposited on Si by pulsed laser deposition (PLD) as the substrate. This has a number of advantages over the alternatives above, including cost and potential scalability of production and it removes any issue of inadvertent n-type doping of nanowires by diffusion from the substrate. We demonstrate ordered arrays of ZnO nanowires, on ZnO-coated substrates by PLD, using a conventional NSL technique with gold as the catalyst. The nanowires were produced by vapor phase transport (VPT) growth in a tube furnace system and grew only on the areas pre-patterned by Au. We have also investigated the growth of ZnO nanowires using ZnO catalyst points deposited by PLD through an NSL mask on a bare silicon substrate.     

铬过渡层位置及金属沉积角度对纳米球刻蚀法制备二维银纳米点阵结构的影响

利用纳米球刻蚀法制备了二维六角密排三角形银纳米阵列, 通过加入铬过渡层并改变其位置和改变金属沉积角度, 研究它们对点阵结构的影响. 实验发现, 加入铬过渡层所形成的银纳米点阵结构较无铬层有很大改善, 三角形角部更加尖锐, 更能满足传感器对信号检测的要求. 同时, 该过渡层应蒸镀在模板球排列之后, 才能获取更大面积的二维银纳米点阵结构. 在沉积角度对制备二维银纳米点阵的实验中, 基片没有旋转, 采用垂直镀膜方式更容易得到结构完整、结合较牢固、且面积较大、角部尖锐的二维银纳米点阵. 吸收光谱测量进一步验证了铬过渡层对二维银纳米点阵形貌结构的改善作用. 这些为下一步的生物修饰以及生物化学传感器的制备提供了先决条件.     

Aqueous phase Ag nanoparticles with controlled shapes fabricated by a modified nanosphere lithography and their optical properties

We have developed a modified nanosphere lithography (NSL) process to fabricate surface-confined Ag nanoparticles (NPs) with controlled shapes. NPs with different shapes, such as triangular, quadrilateral, pentagon or trapezoidal with rounded tips or edges, can be fabricated by this process. These Ag NPs can be dislodged into water forming NPs in an aqueous environment. The developed process results in better NP shape retaining than those obtained using the routine NSL process. The UV-vis absorption of the surface-confined Ag NPs show distinct blue shift and reduced intensity after surface modification. The NPs produced by the modified NSL and dislodged in water have significantly less density of debris as observed by transmission electron microscopy and UV-vis absorption spectrum.     

Fabrication of double quantum dots by combining afm and e-beam lithography

In recent years several attempts have been made to fabricate coupled quantum dots as a crucial element of quantum computing devices. One important challenge is to achieve a reliable control of the interdot tunneling. For this purpose we have combined direct nanolithography by local anodic oxidation (LAO) with standard electron-beam lithography. LAO is used to produce parallel double quantum dots. Additional metallic split gates are responsible for the control of the interdot coupling. We describe our fabrication scheme and demonstrate the function in low-temperature transport measurements.     

Freeform lens for off-axis illumination in optical lithography system

A method of designing a freeform lens for off-axis illumination (OAI) in an optical lithography system is proposed in this paper. Based on the Snell's law and conservation law of energy, a series of first-order partial differential equations are deduced. Coordinate relations are established with the energy mapping relations by the characteristics of the incident beam and the predetermined irradiance distribution on the target plane. The contours of the freeform lens are calculated by solving partial differential equations numerically. Moreover, the optical performance for OAI is simulated and analyzed. Simulation results show that the irradiance distributions can be well controlled with a maximum uniformity of 95.71% and a maximum efficiency of 99.04%. Tolerance analysis shows that the angular errors of the freeform lens are more sensitive than the coordinate errors.