Automated nanoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples

In this study, a BioDot BioJet dispensing system was investigated as a nanoliter sample deposition method for total reflection X-ray fluorescence (TXRF) analysis. The BioDot system was programmed to dispense arrays of 20 nL droplets of sample solution on Si wafers. Each 20 nL droplet was approximately 100 μm in diameter. A 10 × 10 array (100 droplets) was deposited and dried in less than 2 min at room temperature and pressure, demonstrating the efficiency of the automated deposition method. Solutions of various concentrations of Ni and Ni in different matrices were made from stock trace element standards to investigate of the effect of the matrix on the TXRF signal. The concentrations were such that the levels of TXRF signal saturation could be examined. Arrays were deposited to demonstrate the capability of drying 100 μL of vapor phase decomposition-like residue in the area of a typical TXRF detector.     

Total-reflection X-ray fluorescence study of electrochemical deposition of metals on a glass-ceramic carbon electrode surface

The features of electrochemical deposition and co-deposition of copper, cadmium and lead from aqueous solutions on disc glass-ceramic carbon (GCC) electrode surfaces were studied by total-reflection X-ray fluorescence analysis (TXRF). This method was found to be highly sensitive to the varieties of electrodeposit morphology and depth distribution of elements on the electrode surface. It allows identification of the mechanisms of metal nucleation and growth of thin film electrodeposits. The results of the TXRF study are in good agreement with the recent data of a number of spectroscopic and microscopic methods of solid surface analysis. The polished GCC was shown to be an excellent material for preparation of the sample carriers for TXRF analysis.     

A method for trace element determination of marine periphyton communities on discs of float glass (without sample preparation) using total-reflection X-ray fluorescence spectrometry

A quick method for trace element determination of marine periphyton communities on soda float glass discs is presented. After addition of an internal standard, the community is measured by total-reflection X-ray fluorescence (TXRF) spectrometry. No sample preparation is required except a gentle wash with distilled water. The soda glass disc on which the periphyton community grows is used directly as the sample reflector in TXRF. The method was evaluated by the analysis of a certified reference material of plankton (CRM 414) and by comparison to a wet digestion method. Recovery rates for 13 and 130 μg-samples of CRM 414 are reasonable: between 0.6 and 1.4 for the elements K, Ca, Mn, Fe, Ni, Cu, Zn, As, Rb and Sr. Relative standard deviations for 130 μg-samples are 10% or less for most of these elements. In the comparison to wet digestion, natural periphyton samples were used and the two methods showed a good agreement.The different steps used in the quantification, such as accounting for the contribution from the glass to the TXRF spectrum, and the calculation of the sample mass from the spectrum, are described. It is shown that complicating factors, such as the required water wash and the influence of an inhomogeneous spatial distribution of the periphyton on the glass disc, do not adversely affect the quantification.     

Calibration of reference materials for total-reflection X-ray fluorescence analysis by heavy ion backscattering spectrometry

Total-reflection X-ray fluorescence (TXRF) is widely used for the control of metallic contamination caused by surface preparation processes and silicon materials. At least three companies supply a variety of TXRF systems to the silicon integrated circuit (IC) community, and local calibration of these systems is required for their day to day operation. Differences in local calibration methods have become an issue in the exchange of information between IC manufacturers' different FABs (Fabrication Facility) and also between silicon suppliers and IC FABs. The question arises whether a universal set of fluorescence yield curves can be used by these different systems to scale system sensitivity from a single element calibration for calculation of elemental concentrations. This is emphasized by the variety of experimental conditions that are reported for TXRF data (e.g. different angles of incidence for the same X-ray source, different X-ray sources, etc.). It appears that an instrumental factor is required. We believe that heavy ion backscattering spectrometry (HIBS) provides a fundamental method of calibrating TXRF reference materials, and can be used in calculating this instrumental factor. In this paper we briefly describe the HIBS system at the Sandia National Laboratories HIBS User Facility and its application to the calibration of TXRF reference materials. We will compare HIBS and TXRF mapping capabilities and discuss the issues associated with the restrictions of some older TXRF sample stages. We will also discuss Motorola's cross-calibration of several TXRF systems using different elements as references.     

An electrochemical enrichment procedure for the determination of heavy metals by total-reflection X-ray fluorescence spectroscopy

An electrolytic separation and enrichment technique was developed for the determination of trace elements by total-reflection X-ray fluorescence spectroscopy (TXRF). The elements of interest are electrodeposited out of the sample solution onto a solid, polished disc of pure niobium which is used as sample carrier for the TXRF measurement. The electrochemical deposition leads to a high enrichment of the analytes and at the same time to a removal of the matrix. This results in substantially improved detection limits in the lower picogram per gram region. The deposited elements are directly measured by TXRF without any further sample preparation step. The homogeneous thin layer of the analytes is an ideal sample form for TXRF, because scattered radiation from the sample itself is minimized. The proposed sample preparation method is useful particularly for the analysis of heavy metals in liquid samples with for TXRF disturbing matrices, e.g. sea water.     

Quo Vadis total reflection X-ray fluorescence?

The multielement trace analytical method ‘total reflection X-ray fluorescence’ (TXRF) has become a successfully established method in the semiconductor industry, particularly, in the ultra trace element analysis of silicon wafer surfaces. TXRF applications can fulfill general industrial requirements on daily routine of monitoring wafer cleanliness up to 300 mm diameter under cleanroom conditions. Nowadays, TXRF and hyphenated TXRF methods such as ‘vapor phase decomposition (VPD)-TXRF’, i.e. TXRF with a preceding surface and acid digestion and preconcentration procedure, are automated routine techniques (‘wafer surface preparation system’, WSPS). A linear range from 10⁸ to 10¹⁴ [atoms/cm²] for some elements is regularly controlled. Instrument uptime is higher than 90%. The method is not tedious and can automatically be operated for 24 h/7 days. Elements such as S, Cl, K, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, As, Br, Sn, Sb, Ba and Pb are included in the software for standard peak search. The detection limits of recovered elements are between 1×10¹¹ and 1×10⁷ [atoms/cm²] depending upon X-ray excitation energy and the element of interest. For the determination of low Z elements, i.e. Na, Al and Mg, TXRF has also been extended but its implementation for routine analysis needs further research. At present, VPD-TXRF determination of light elements is viable in a range of 10⁹ [atoms/cm²]. Novel detectors such as silicon drift detectors (SDD) with an active area of 5 mm², 10 mm² or 20 mm², respectively, and multi-array detectors forming up to 70 mm² are commercially available. The first SDD with 100 mm² (!) area and integrated backside FET is working under laboratory conditions. Applications of and comparison with ICP-MS, HR-ICP-MS and SR-TXRF, an extension of TXRF capabilities with an extremely powerful energy source, are also reported.     

Optimization of TXRF measurements by variable incident angles

Variable incident angles in TXRF instrumentation open up new possibilities in the field of analytical quality assurance of TXRF measurements as well as the possibility of optimizing the measurement angle with respect to the sample carrier. Measurements on the same sample with different incident angles allow a check to be made on the behavior of the internal standard and the elements under investigation within the sample, which makes quantification more reliable, even for difficult samples. This is demonstrated on the example of standard reference material NIST 1633a comparing the relative fluorescence intensities of the elements K, Ti and Fe obtained from a sample prepared from a suspension and a digestion of the SRM material, respectively. Furthermore, it will be shown how the measurement conditions for different sample carrier materials such as quartz and acrylic glass can be optimized by measuring angular-dependent signal and background intensities.     

TXRF法测定松花粉中的9种生命元素

建立了微波消解前处理,全反射X射线荧光法(TXRF)同时测定松花粉中K、Ca、Ti、Mn、Fe、Ni、Cu、Zn和Rb9种生命元素含量的分析方法.松花粉原料经过微波消解前处理后,采用全反射X射线荧光光谱净计数、QXAS分析软件解谱和单一内标法进行定量分析.比较了干灰化法、湿消解法和微波消解法3种前处理方法的效果,并确立微波消解法作为样品前处理方法.用微波消解- TXRF法测定了花粉标准物质中的上述9种元素,并计算得到其仪器检出限(LLD)为0.002～0.054 mg/L,方法检出限(LDM)为0.004～0.122 mg/kg.TXRF法测定各元素的相对标准偏差(RSDs)为1.0％～5.5％.该方法操作简单、样品用量少、检出限低,对实际样品松花粉的测定结果与ICP - MS法无显著性差异.     

Total reflection X-ray fluorescence analysis of fly ash from Bulgarian coal-fired power plants

The contents of Cl, Ca, K, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, As, Se, Rb, Sr, Ba and Pb in raw coal fly ash from five Bulgarian power plants were determined by total reflection X-ray fluorescence (TXRF), using gallium as the internal standard. The samples were analysed as in slurry form in Triton? X-114. The experimental parameters, such as grain size, concentrations of fly ash slurry and excitation time were optimised. For validation of the method, the certified reference material BCR-176R fly ash was used. The precision of the results obtained is characterised by a relative standard deviation of approximately 10%. The resulting data confirm the suitability of TXRF for the simultaneous determination of major, minor and trace elements in coal fly ash samples. Further advantages provided by TXRF are easy sample preparation (no sample dissolution) and the small sample amount required for analysis.     

Picoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples

A deposition system capable of delivering picoliter quantities of solution in programmable arrays was investigated as a method for sample preparation for total reflection X-ray fluorescence (TXRF) spectroscopy. Arrays of trace metals in solution were deposited on Si wafers. The array deposits provide a capability of depositing closely spaced (100 μm or less), typically 5–20 μm diameter droplets in an area that can be matched to the analysis spot of the TXRF detector. The dried depositions were physically characterized and the effect of deposition type and matrix on the TXRF signal was investigated.     

Nanoliter deposition unit for pipetting droplets of small volumes for Total Reflection X-ray Fluorescence applications

A nanoliter droplet deposition unit was developed and characterized for application of sample preparation in TXRF. The droplets produced on quartz reflectors as well as on wafers show a good reproducibility, also the accuracy of the pipetted volume could be proved by a quantitative TXRF analysis using an external standard. The samples were found to be independent of rotation of the sample carrier. Angle scans showed droplet residue behavior, and the fluorescence signal is relatively invariant of the angle of incidence below the critical angle, which is useful for producing standards for external calibration for semiconductor surface contamination measurements by TXRF. Further it could be demonstrated that the nanoliter deposition unit is perfectly able to produce patterns of samples for applications like the quantification of aerosols collected by impactors.     

Sapphire sample carriers for silicon determination by total-reflection X-ray fluorescence analysis

Sapphire is presented as a new sample carrier material for total-reflection X-ray fluorescence spectrometry (TXRF). A comparison with conventional sample carrier materials such as quartz glass, Perspex®, glassy carbon and boron nitride demonstrates that sapphire has all the physical and chemical properties required for TXRF micro and trace analysis. Moreover, sapphire sample carriers allow the determination of silicon in many matrices in a comparatively simple way. Especially for airborne particulate matter, acid digestion can be avoided by cool-plasma ashing of suitable filter materials directly on the sample carrier. This technique has been successfully applied to environmental samples.     

Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

An analysis methodology for the metallic contamination control of Ge wafer substrates has been developed and evaluated for six elements (K, Ca, Cr, Fe, Ni and Zn). Detection limits (DL) of Direct-total reflection X-ray fluorescence spectrometry (D-TXRF) analysis on Ge wafers have been determined and found to be at the E10 at/cm² level. The values have been found to be a factor between 1 and 3 higher than on Si wafers, exclusively caused by differences in the background intensity. Additionally, a preconcentration procedure based on the Droplet sandwich etch (DSE) method has been developed. This method relies on the transfer of the surface and subsurface contaminants from the wafer to the liquid phase by wet chemical etching. Application of the DSE method on reference Ge wafers followed by analysis of the etch liquid by TXRF resulted in recovery rates (RR) of 40%. In an optimization study, it was found that the main DSE method parameters had limited influence on the RR. However, a detection efficiency study clearly demonstrated an underestimation by the TXRF analysis. An independent analysis for Ca, Cr, Fe and Zn by GF-AAS resulted in RR varying at approximately 100%. By internal standardization with the element La for the TXRF analysis, recovery rates could be increased to the 60% level. This underestimation by TXRF may find an origin in a matrix effect caused by the Ge etch products. By application of the developed DSE-TXRF method, DL at the E9 at/cm² level could be realized, with values, which are at least one order of magnitude lower compared to the DL of D-TXRF on Ge wafers.     

Applicability of direct total reflection X-ray fluorescence analysis in the case of human blood serum samples

Total Reflection X-Ray Fluorescence (TXRF) is a well-established method, mainly applied in the analysis of liquid samples, offering very low detection limits in most of the cases. Direct application of the TXRF method is not so efficient in blood serum analysis, since the high content of the organic matrix increases significantly the background due to Compton scattering. Chemical treatment of the blood serum samples and related preconcentration techniques have been suggested in the literature, but they are time consuming and increase the possibility of adding contaminants in the sample. In this paper, the applicability of direct TXRF analysis in blood serum samples is examined. The insertion of a Mo filter, after the cut-off reflector, has been found to improve significantly the peak-to-background ratio, especially for the elements of interest such as Cu, Zn, Se and Br. The influence of self-absorption phenomena in the quantification procedure was also investigated with respect to the internal standard used and the sample mass analyzed. Precision and accuracy in the analysis was found to be approximately 4% over the whole atomic number range.     

Analytical approaches for Hg determination in wastewater samples by means of total reflection X-ray fluorescence spectrometry

At present, there is a considerable interest in Hg monitoring in wastewater samples due to its widespread occurrence and the high toxicity of most of its compounds. Hg determination in water samples by means of total reflection X-ray fluorescence spectrometry (TXRF) entails some difficulties due to the high vapor pressure and low boiling point of this element that produce evaporation and loss of Hg from the surface of the reflector during the drying process, commonly used for sample preparation in TXRF analysis.The main goal of the present research was to develop a fast and simple chemical strategy to avoid Hg volatilization during the analysis of wastewater samples by TXRF spectrometry. Three different analytical procedures were tested for this purpose: (i) increasing the viscosity of the wastewater sample by adding a non-ionic surfactant (Triton^® X-114), (ii) Hg immobilization on the quartz reflectors using the extractant tri-isobutylphosphine (Cyanex 471X) and (iii) formation of a stable and non-volatile Hg complex into the wastewater sample. The best analytical strategy was found to be the formation of a Hg complex with thiourea (pH = 10) before the deposition of 10 μL of sample on the reflector for following TXRF analysis. Analytical figures of merit such as linearity, limits of detection, accuracy and precision were carefully evaluated. Finally, the developed methodology was applied for the determination of Hg in different types of wastewater samples (industrial effluents, municipal effluents from conventional systems and municipal effluents from constructed wetlands).     

Total-reflection X-ray fluorescence imaging

A new experimental technique for surface imaging using total-reflection X-ray fluorescence (TXRF) is described. Although TXRF has so far been used to analyze the average chemical composition of rather large sample areas in the order of centimeters squared, a new opportunity to obtain spatial information has arisen through the combination of conventional TXRF and position-sensitive measurement using a collimator and a CCD camera. The most significant point here is that the extremely close detector sample geometry of TXRF measurement fits very well with the present imaging procedure. Scanning of the sample and/or incident beam is not necessary, and therefore the exposure time is reasonably short, typically 3–10 min. The number of pixels is approximately 1 million, and the spatial resolution obtained was several tens of microns in the present preliminary case. The selective-excitation capability of tunable monochromatic synchrotron radiation enhances the present imaging technique. Changing the energy of incident photons makes it possible to distinguish the elements, and one can obtain a surface image of the specific elements.     

Determination of fluorine by total reflection X-ray fluorescence spectrometry

There is a growing interest in determination of low Z elements, i.e. carbon to phosphorus, in various samples. Total reflection X-ray fluorescence spectrometry (TXRF) has been already established as a suitable trace element analytical method with low sample demand and quite good quantification limits. Recently, the determinable element range was extended towards Z = 6 (carbon).     

A novel total reflection X-ray fluorescence procedure for the direct determination of trace elements in petrochemical products

A total reflection X-ray fluorescence (TXRF) procedure was developed for the determination of metal traces in petrochemical end products or intermediates for surfactant synthesis. The method combines a fast and straightforward sample preparation, i.e. deposition on the sample holder and evaporation of the sample matrix, with an efficient quantification method based on internal standardization (organic gallium standard). The method developed showed detection limits below 0.05 μg g^-1 and in most cases below 0.005 μg g^-1. Fifteen elements (Ca, Cd, Co, Cr, Cu, Fe, Mn, Mo, Ni, Pb, Rh, Sn, Sr, V and Zn) were determined in matrices such as paraffins, n-olefins, linear alkylbenzenes, long-chain alkyl alcohols and esters: typical metal contents were below 1 μg g^-1. The results were compared with the reference method ASTM D5708 (test method B) based on inductively coupled plasma optical emission spectroscopy: advantages and drawbacks of the two procedures were critically evaluated. The TXRF method developed showed comparable precision and absence of bias with respect to the reference method. A comparison of the performances of the two methods is presented.     

Bulk determination of uranium and thorium in presence of each other by Total Reflection X-ray Fluorescence spectrometry

A study to assess the applicability of Total Reflection X-ray Fluorescence (TXRF) spectrometry as a microanalytical technique for the determination of uranium and thorium as major elements in presence of each other has been made. Effect of dilution of the sample on the analytical results has been investigated. It has been found that dilution of the sample does not affect the analytical results significantly. Also the analytical results of uranium and thorium are similar with different internal standards e.g. cobalt, gallium and yttrium. With a sample size of 10 μL and the concentrations of the analytes in the range of 1–50 μg/mL and total matrix concentration less than 200 μg/mL, the precision and accuracy of the method were found to be better than 3% (1 s) and 4%, respectively. For higher concentration ranges of the analyte (up to about 700 μg/mL), the precision and accuracy values were better than 6% (1 s) and 5%, respectively. The TXRF method has an advantage of using small sample volume of about 10 μL, produces very small radioactive waste and is nondestructive but requires dissolution of the sample.     

Performance of total reflection and grazing emission X-ray fluorescence spectrometry for the determination of trace metals in drinking water in relation to other analytical techniques

An intercomparison survey has been carried out in order to evaluate the performance of two related X-ray fluorescence techniques as compared to the achievements of several other analytical techniques applied for trace elements determination in drinking water. A relatively new technique, total reflection X-ray fluorescence (TXRF) and a novel related technique, grazing emission X-ray fluorescence (GEXRF) have been used for the analysis of a mineral water sample. The concentrations of the following elements have been determined: Na, Mg, K, Ca, Ni, Cu, Zn and Sr. The mineral water sample has also been analyzed by a number of other analytical techniques, routinely utilized in drinking water quality control. The analyses were performed in eleven laboratories which reported 286 individual determinations producing 75 laboratory means. From the obtained results, it can be concluded that the TXRF technique is suitable for a direct determination of heavy elements in drinking water (above potassium, Z = 19). This technique can compete with other analytical techniques routinely used in water quality monitoring. First results obtained with GEXRF spectrometry show that this technique can be successfully applied for the determination of low-Z elements in drinking water. However, results for sodium and magnesium were systematically too low, indicating that modifications of the quantification procedure may be required to improve the accuracy of determination for these light elements.