Measurement of trace element concentration in a metal matrix using total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence spectroscopy (TXRF) has been used in combination with synchrotron radiation in order to determine detection limits and lowest limits of concentration of trace elements in metal matrices. Two applications on irradiated material are described, where the TXRF method has some advantages, as compared to other detection methods, because only few micrograms of material is needed for the measurements. The first application is devoted to radiation damage studies on first wall material of future fusion reactors. Therefore, metal foils were irradiated with 590 MeV protons at PSI and the transmutational elements produced in the foils were measured. The second application is the assessment of radiation damage of core components in a nuclear power plant, e.g. the reactor pressure vessel. This is performed by the determination of the fast neutron fluence on the components using an activation reaction of ⁹³Nb which is a trace element in most reactor steels. Detection limits of a few picograms have been found in the experiments.     

Recent trends in total reflection X-ray fluorescence spectrometry for biological applications

This review is focused on the application of total reflection X-ray fluorescence (TXRF) spectrometry in the field of biological research. In the last decade, most papers were published by authors who applied laboratory-scale TXRF equipments. The application of synchrotron radiation as excitation source (SR-TXRF) shows a slowly increasing tendency. In the cited papers the micro-, trace and multielement capability of these TXRF techniques was demonstrated in the clinical and medical laboratory practice, as well as in various plant physiological studies. For speciation of elements in biological matrices, the TXRF was used as element specific detector following an off-line separation step (e.g., thin layer chromatography, high performance liquid chromatography), however, these off-line methods are not competitive with the on-line coupled HPLC-inductively coupled plasma mass spectrometry.     

Determination of trace elements in bee honey,pollen and tissue by total reflection and radioisotope X-ray fluorescence spectrometry

Multielemental determinations in samples of various types of bee honey, pollen and bee tissue have been carried out using total reflection X-ray fluorescence spectrometry (TXRF) and radioisotope excited X-ray fluorescence spectrometry (XRF). The objective was to establish whether the elemental content of bee honey, in particular, correlates with any useful information about the environment, variety of honey, etc. An attempt has also been made to determine the X-ray techniques' ability to compete with atomic absorption spectrometry (AAS) and inductively coupled plasma-atomic emission spectrometry (ICP-AES), with regard to elemental sensitivity, accuracy, sample preparation procedures, and in particular, economic performance, which is very important in selecting an appropriate technique for the analysis of large numbers of samples. The results confirm the advantages of the TXRF method for trace element analysis, but only when utilising monochromatic excitation and selecting a proper sample preparation procedure. The radioisotope XRF technique, which does not require any sample preparation, is still very competitive in analysis of elements with concentrations above a few ten ppm. Preliminary results also confirm some correlations between the elemental content of honey and the status of the environment, and encourage further work in this direction     

Direct analysis of Al<Subscript>2</Subscript>O<Subscript>3</Subscript> powders by total reflection X-ray fluorescence spectrometry

A direct analysis procedure for the determination of trace impurities of Ca, V, Cr, Mn, Fe, Ni, Cu, Zn and Ga in Al₂O₃ ceramic powders by total reflection X-ray fluorescence spectrometry (TXRF) is described. The powders were analysed in the form of slurries containing 1–10 mg mL^–1 of powder. The use of the procedure in the case of powders with differing grain size and for different slurry concentrations was investigated. Three different quantification possibilities were compared, namely the use of Al as a matrix component, the use of Fe as a trace element contained in the sample or of Co added in concentrations of 200 g g^–1 as internal standard. The homogeneity of elemental distributions in sample layers deposited on the TXRF quartz carriers by evaporating 5 L of the 10 mg mL^–1 slurries was studied by scanning the 4- to 5-mm-diameter spots of two samples by synchrotron radiation TXRF at Hasylab. For powders with differing graininess but mainly finer than about a few 10 m, no systematic influence of the grain size on the accuracy of the determinations of Ca, V, Fe, Ni, Cu and Zn could be observed. The measurement precision, however, seemed to be limited by inhomogeneous distributions of the trace elements in the samples as testified by the synchrotron radiation TXRF scans. Detection limits of the developed TXRF procedure for Ca, V, Cr, Mn, Fe, Ni, Cu, Zn and Ga were found to be in the 0.3–7 g g^–1 range and were shown to increase slightly with the grain size of the samples. Quantification using Al (matrix) as internal standard led to systematically higher values out of the accuracy required, whereas the other two approaches in all cases led to reliable results.Dedicated to the memory of Wilhelm Fresenius     

Investigation of element distribution and homogeneity of TXRF samples using SR-micro-XRF to validate the use of an internal standard and improve external standard quantification

Total reflection X-ray fluorescence analysis (TXRF) offers a nondestructive qualitative and quantitative analysis of trace elements. Due to its outstanding properties TXRF is widely used in the semiconductor industry for the analysis of silicon wafer surfaces and in the chemical analysis of liquid samples. Two problems occur in quantification: the large statistical uncertainty in wafer surface analysis and the validity of using an internal standard in chemical analysis. In general TXRF is known to allow for linear calibration. For small sample amounts (low nanogram (ng) region) the thin film approximation is valid neglecting absorption effects of the exciting and the detected radiation. For higher total amounts of samples deviations from the linear relation between fluorescence intensity and sample amount can be observed. This could be caused by the sample itself because inhomogeneities and different sample shapes can lead to differences of the emitted fluorescence intensities and high statistical errors. The aim of the study was to investigate the elemental distribution inside a sample. Single and multi-element samples were investigated with Synchrotron-radiation-induced micro X-ray Fluorescence Analysis (SR-μ-XRF) and with an optical microscope. It could be proven that the microscope images are all based on the investigated elements. This allows the determination of the sample shape and potential inhomogeneities using only light microscope images. For the multi-element samples, it was furthermore shown that the elemental distribution inside the samples is homogeneous. This justifies internal standard quantification.     

Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology

The development of transistor manufacturing into the nanoscale regime is accompanied by a continuous awareness concern for contamination control. The ever-increasing demands for analysis sensitivity (in the sub-10⁹ at/cm² regime) combined with the introduction of new materials (i.e. non-silicon based) put severe challenges on the application of analytical techniques for atomic level contamination monitoring. Since many years, total reflection X-ray fluorescence spectrometry (TXRF) has developed as a preferred technique, ideally suitable due to the excellent reflectivity and flatness of the starting Si substrates. Driven by performance enhancement requirements, many new materials are being introduced at the substrate level (Ge, III/V compounds for higher mobility), gate stack (alternative dielectric materials and gate electrodes for capacitance scaling) and interconnect level (low-k and copper for faster switching). This paper reviews some recent developments in the state-of-the-art TXRF developments for semiconductor applications. Among the focus areas are the expansion of the elemental range (through multi-excitation line selection or multi-excitation source to excite low Z as well as high Z elements in one analysis sweep) and dynamic range (by pre-concentration techniques, synchrotron radiation analysis and detector developments). Further, emphasis is also focused towards quantification issues—whereby the three methodologies (micro-droplet, film and bulk type standards) are critically reviewed. Also, a recent development of sweeping TXRF, suitable for fast screening of large surface areas is being discussed. The applications of TXRF in a semiconductor environment are being reviewed. Finally, the performance of TXRF for the various semiconductor applications is assessed with respected to competitive techniques.     

Synchrotron radiation total reflection X-ray fluorescence and energy dispersive X-ray fluorescence analysis on AP1™ films applied to the analysis of trace elements in metal alloys for the construction of nuclear reactor core components: a comparison

Synchrotron radiation induced total reflection X-ray fluorescence and conventional 45° energy dispersive X-ray fluorescence analysis using a 150-nm-thick AP1™ film as sample carrier have been exploited for the elemental analysis of traces in alloys used for the construction of reactor core components of nuclear power plants. Both techniques are well suited for the analysis since they require a low amount of sample (μl), important on one hand because of the limited disposal and on the other hand because of its high specific activity. The methods provide a very low background due to the total reflection phenomenon in TXRF and the thin AP1™ film sample support, respectively. The employment of synchrotron radiation was necessary since there are no laboratory sources which can deliver a collimated beam of the energy and intensity needed to excite the K-shell of the rare earth elements, allowing the achievement of minimum detection limits relevant for the proposed purpose (ng/g range). Moreover, the linear polarization of synchrotron radiation combined with a side-looking detection geometry manages to reduce the scattering due to the remaining matrix of the analyzed samples. Detection limits for Nb and for some of the rare earth elements (pg range for absolute detection limits and ng–μg/g range for concentration detection limits) obtained with the two techniques are presented and the two approaches are compared.     

Trace elements in PM2.5 in Gothenburg,Sweden

Ambient aerosol particles smaller than 2.5 µm (PM_2.5) are getting more and more attention worldwide. While legal focus is mainly on sample mass, the composition of the particles is an important research field gaining increased interest. The interest is not only connected to possible health effects of the elemental content of the particles, but the elemental determination can also add valuable information for source apportionment. Samples were collected during 20 days in November 2007 at the campus of the Chemistry Department, University of Gothenburg, Gothenburg, Sweden. The particles were collected using a cyclone that separates the PM_2.5 particles from the air stream and impacts them on polycarbonate filters. Filters were changed at early afternoon. The samples were analyzed for particulate mass, black carbon (BC) and the elements S, Cl, K, Ca, Ti, Cr, Mn, Fe, Ni, Cu, As, Br, Cd and Pb. Several of the elements were above detection limit in only a few of the samples. Total reflection X-ray fluorescence (TXRF) spectrometer based on the Wobi TXRF module supplied by the International Atom Energy Agency (IAEA) has been used for the determination of most trace elements in the samples. A Graphite Furnace Atomic Absorption Spectrometer (GF-AAS) was used for complementary trace element analysis and a reflectometer was used to analyze black carbon. Before elemental analysis the filters were digested using a microwave digestion system with temperature and pressure control. The results showed a large variation in sample mass, BC and analyzed elemental concentrations. The variation of the different constituents did not show the same pattern. This added to the picture of different sources for different pollutants. The highest S concentration was noted on a day when the air masses were determined to come from the southeast, i.e. Poland and some other Eastern European countries. From the results it can be concluded that more work is needed on the TXRF spectrometer to optimize it for determination of the EU legally regulated elements As, Ni, Pb and Cd. Despite this the study shows that there is no problem in meeting the AAQS limits for Cd and Pb in Gothenburg.     

Synchrotron radiation induced μ-X-ray fluorescence spectroscopy on municipal solid waste fly ashes

The high brightness of synchrotron radiation sources of the 3rd generation and the development of focusing optical elements for X-rays make it possible to create beams of micrometer size with high intensity. These beams can be used to reveal spatially resolved information about structural and chemical properties of particles. Here, the possibility of using synchrotron radiation micro-X-ray fluorescence (μ-SRXRF) for the determination of the major and minor components and their distribution within municipal solid waste (MSW) fly ashes has been investigated. By using an excitation energy of 27.0 keV, trace elements of environmental concern, like Cd, Pb and Zn can be detected to their low concentrations (ppm) routinely. The aim of the work was to gain a better understanding of the factors that determine the environmental mobility of each trace element and, in particular, the potential for their dissolution and leaching. Such detailed investigation of the content and distribution of toxic metals on/in individual particles is a valuable complement to the usual elemental analysis of bulk samples.     

Applications of total reflection X-ray fluorescence spectrometry in trace element and surface analysis

Total reflection X-ray fluorescence spectrometry (TXRF) is presented as a genuine surface analytical technique. Its low information depth is shown to be the characteristic feature differentiating it from other energy dispersive X-ray fluorescence methods used for layer and surface analysis. The surface sensitivity of TXRF and its analytical capability together with the limitations of the technique are discussed here using typical applications including the contamination control of silicon wafers, thin layer analysis and trace element determination. For buried interfaces and implantation depth profiles in silicon a combination of TXRF and other techniques has been applied successfully. The TXRF method has the particular advantage of being calibrated without the need for standards. This feature is demonstrated for the example of the element arsenic.     

Environmental trace-element analysis using a benchtop total reflection X-ray fluorescence spectrometer.

Total reflection X-ray fluorescence (TXRF) analysis is an established technique for trace-element analysis in various types of samples. Though expensive large-scale systems restricted the applications in the past, in this study the capability of a benchtop system for trace elemental analysis is reported. The suitability of this system for the mobile on-site analysis of heavy metal contaminated soils and sediments is reported as well as the possibilities and restrictions of TXRF for additional applications, including trace-element analysis of water, glass and biological samples.     

Trace analysis for 300 mm wafers and processes with total reflection X-ray fluorescence

Total reflection X-ray fluorescence (TXRF) is essential for 300-mm silicon wafer production and fabrication of semiconductor devices. The 300-mm TXRF enables non-destructive contamination analysis on wafers for process development and process control. The TXRF system shows a very stable continuous operation, which allows accurate trace and ultra trace analysis on the silicon surface. It is equipped with two excitation sources covering the requirements of very sensitive measurement and wide element range. The TXRF is a key technology for contamination control during wafer reclaim. For this purpose we show that the system is able to examine the wafers during different processing states of reclaim. The system sensitivity is influenced by the surface of the wafer. For important processing steps, e.g. double side polishing, the sensitivity is as good as for measurements on hazefree polished wafers. We show with TXRF that cross-contamination with copper during double side polishing is suppressed.     

A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry using synchrotron radiation

Currently, the only apparent means to enhance the detection power of the TXRF technique would be to increase the intensity of the primary beam. Using synchrotron radiation, the most powerful X-ray source available, unfortunately, not only the fluorescence signal of the contaminant elements is increased, but also in equal measure, the intensities of the Si–K radiation from the wafer together with the scattered radiation. This results in an overloading of the energy-dispersive Si (Li) detector systems used hitherto, with the effect that the available primary intensity cannot be fully exploited. Wavelength-dispersive systems are free of such problems; they generate less detector background and can withstand higher count rates. Due to their small angle of acceptance, however, their detection efficiency is quite low. In this contribution we propose a wavelength-dispersive TXRF solution, which is optimized with regard to higher efficiency on the basis of large area multilayer mirrors in combination with a position-sensitive detector. The count rates in relation to energy-dispersive instruments and the energy resolution of the new system have been calculated using ray-tracing techniques.     

An electrochemical enrichment procedure for the determination of heavy metals by total-reflection X-ray fluorescence spectroscopy

An electrolytic separation and enrichment technique was developed for the determination of trace elements by total-reflection X-ray fluorescence spectroscopy (TXRF). The elements of interest are electrodeposited out of the sample solution onto a solid, polished disc of pure niobium which is used as sample carrier for the TXRF measurement. The electrochemical deposition leads to a high enrichment of the analytes and at the same time to a removal of the matrix. This results in substantially improved detection limits in the lower picogram per gram region. The deposited elements are directly measured by TXRF without any further sample preparation step. The homogeneous thin layer of the analytes is an ideal sample form for TXRF, because scattered radiation from the sample itself is minimized. The proposed sample preparation method is useful particularly for the analysis of heavy metals in liquid samples with for TXRF disturbing matrices, e.g. sea water.     

Quo Vadis total reflection X-ray fluorescence?

The multielement trace analytical method ‘total reflection X-ray fluorescence’ (TXRF) has become a successfully established method in the semiconductor industry, particularly, in the ultra trace element analysis of silicon wafer surfaces. TXRF applications can fulfill general industrial requirements on daily routine of monitoring wafer cleanliness up to 300 mm diameter under cleanroom conditions. Nowadays, TXRF and hyphenated TXRF methods such as ‘vapor phase decomposition (VPD)-TXRF’, i.e. TXRF with a preceding surface and acid digestion and preconcentration procedure, are automated routine techniques (‘wafer surface preparation system’, WSPS). A linear range from 10⁸ to 10¹⁴ [atoms/cm²] for some elements is regularly controlled. Instrument uptime is higher than 90%. The method is not tedious and can automatically be operated for 24 h/7 days. Elements such as S, Cl, K, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, As, Br, Sn, Sb, Ba and Pb are included in the software for standard peak search. The detection limits of recovered elements are between 1×10¹¹ and 1×10⁷ [atoms/cm²] depending upon X-ray excitation energy and the element of interest. For the determination of low Z elements, i.e. Na, Al and Mg, TXRF has also been extended but its implementation for routine analysis needs further research. At present, VPD-TXRF determination of light elements is viable in a range of 10⁹ [atoms/cm²]. Novel detectors such as silicon drift detectors (SDD) with an active area of 5 mm², 10 mm² or 20 mm², respectively, and multi-array detectors forming up to 70 mm² are commercially available. The first SDD with 100 mm² (!) area and integrated backside FET is working under laboratory conditions. Applications of and comparison with ICP-MS, HR-ICP-MS and SR-TXRF, an extension of TXRF capabilities with an extremely powerful energy source, are also reported.     

Characterization of nuclear materials by total reflection X-ray fluorescence spectrometry

Nuclear energy is one of the available energy options for long term energy security of world. In order to produce electricity using this mode of energy generation in an efficient and safe manner, it is necessary that the materials used for such energy generation comply with the specifications assigned. The major and trace composition of these materials is an important specification for their quality control. Different analytical techniques are used for such quality control. Total reflection X-ray fluorescence (TXRF) is a comparatively new technique having several features well suited for trace and major element determinations in nuclear materials. However, this technique has not been used so far extensively for characterization of nuclear materials. The present paper gives a brief introduction of TXRF, its suitability for nuclear material characterization and some details of the TXRF studies made in our laboratory for the characterization of nuclear materials.     

X-ray fluorescent analysis using synchrotron radiation: Subjects of research

The brief review has been presented about the application of X-ray fluorescent analysis using synchrotron radiation (storage ring VEPP-3, BINP SB RAS) for determination of elemental composition of the samples of different nature–biological and geological samples, objects of environment, archeological objects, and new materials. The feature of the presented research is the employment of the unique properties of synchrotron radiation, which allow analyzing samples of small mass (of the order of several milligrams), and also scanning core of bottom sediments with high resolution (less than 1 mm) that is not practical to realize by traditional analysis methods.     

TXRF, PIXE, SYXRF; Principles, critical comparison and applications

Summary At first glance X-Ray fluorescence analysis seems to be a very sensitive and effectful method to detect element traces in the multielement mode. But in praxi the application range is restricted, if X-Ray tubes are used as excitation sources. To overcome this situation, it is necessary to improve the conditions of excitation and to reduce the background, produced by different scattering effects. TXRF, PIXE and SYXRF, which allow multielement analysis in the trace- and ultratrace region are using this strategy. In the case of TXRF a remarkable background reduction is achieved if the sample is prepared as a thin amorphous film on a planar sample holder and the excitation beam of a X-Ray tube is totally reflected on its surface. In the case of PIXE a particle beam of high intensity is used as excitation source, improving the conditions of excitation and giving the opportunity of spatial resolved analyses. In the case of SYXRF the X-Ray fraction of synchrotron radiation is used as excitation source, giving the opportunity, to improve the conditions of excitation as well as to reduce the background by using the high polarisation of the beam. In this case, too, spatial resolved analysis are possible. The principles of the three methods are described, their advantages and disadvantages are critically compared and advanced applications from different analytical fields are presented.     

Calibration of reference materials for total-reflection X-ray fluorescence analysis by heavy ion backscattering spectrometry

Total-reflection X-ray fluorescence (TXRF) is widely used for the control of metallic contamination caused by surface preparation processes and silicon materials. At least three companies supply a variety of TXRF systems to the silicon integrated circuit (IC) community, and local calibration of these systems is required for their day to day operation. Differences in local calibration methods have become an issue in the exchange of information between IC manufacturers' different FABs (Fabrication Facility) and also between silicon suppliers and IC FABs. The question arises whether a universal set of fluorescence yield curves can be used by these different systems to scale system sensitivity from a single element calibration for calculation of elemental concentrations. This is emphasized by the variety of experimental conditions that are reported for TXRF data (e.g. different angles of incidence for the same X-ray source, different X-ray sources, etc.). It appears that an instrumental factor is required. We believe that heavy ion backscattering spectrometry (HIBS) provides a fundamental method of calibrating TXRF reference materials, and can be used in calculating this instrumental factor. In this paper we briefly describe the HIBS system at the Sandia National Laboratories HIBS User Facility and its application to the calibration of TXRF reference materials. We will compare HIBS and TXRF mapping capabilities and discuss the issues associated with the restrictions of some older TXRF sample stages. We will also discuss Motorola's cross-calibration of several TXRF systems using different elements as references.     

A new non-destructive method for chemical analysis of particulate matter filters: the case of manganese air pollution in Vallecamonica (Italy)

Total Reflection X-ray Fluorescence (TXRF) is a well-established technique for chemical analysis, but it is mainly employed for quality control in the electronics semiconductor industry. The capability to analyze liquid and uniformly thin solid samples makes this technique suitable for other applications, and especially in the very critical field of environmental analysis. Comparison with standard methods like inductively coupled plasma (ICP) and atomic absorption spectroscopy (AAS) shows that TXRF is a practical, accurate, and reliable technique in occupational settings. Due to the greater sensitivity necessary in trace heavy metal detection, TXRF is also suitable for environmental chemical analysis. In this paper we show that based on appropriate standards, TXRF can be considered for non-destructive routine quantitative analysis of environmental matrices such as air filters. This work has been developed in the frame of the EU-FP6 PHIME (Public Health Impact of long-term, low-level Mixed element Exposure in susceptible population strata) Integrated Project (www.phime.org). The aim of this work was to investigate Mn air pollution in the area of Vallecamonica (Italy).