Copper-doped AlN polycrystalline powders: A class of room-temperature ferromagnetic materials

Cu-doped AlN polycrystalline samples were synthesized by a solid-state reaction. X-ray diffraction analysis revealed the hexagonal structure of the doped samples. Photoluminescence measurements reveal the substitution of Cu for Al in the AlN lattice. Clear hysteresis loops are observed in the M-H curves for the samples at 300 K, revealing room temperature ferromagnetism of the samples. Our experimental results verify that room temperature ferromagnetism is an intrinsic property of Cu-doped AlN.     

Molecular dynamics simulations of AlN deposition on GaN substrate

ABSTRACT

In this work, we investigated the deposition of AlN film on GaN substrate by using molecular dynamics (MD) simulations. The effects of GaN substrate surface, growth temperature, and injected N: Al flux ratio on the growth of AlN film were simulated and studied. Consequently, the deposited AlN film on the (0001) Ga-terminated GaN surface achieves better surface morphology and crystallinity than that on the (000-1) N-terminated GaN surface due to the different diffusion ability of Al and N adatoms on two GaN surfaces. Furthermore, with the increase of growth temperature, the surface morphology and crystallinity of AlN film were improved owing to the enhanced mobility of adatoms. At the optimised injected N: Al flux ratio of 1, comparatively good surface morphology and crystallinity of deposited AlN films were realised. This method lays a foundation for the follow-up real-time study of defects and stress evolution of AlN on GaN and can be applied to film growth of other materials.     

AlGaN/AlN/GaN结构中二维电子气的输运特性

对使用金属有机物汽相沉积法生长的AlGaN/AlN/GaN结构进行的变温霍尔测量，测量结果指出在AlN/GaN界面处有二维电子气存在且迁移率和浓度在2K时分别达到了1.4×10⁴cm²·V^-1·s^-1和9.3×10¹²cm^-2，且在200K到2K范围内二维电子气的浓度基本不变，变磁场霍尔测量发现只有一种载流子(电子)参与导电.在2K温度下，观察到量子霍尔效应，Shubnikov-de Haas (SdH) 振荡在磁场约为3T时出现，证明了此结构呈现了典型的二维电子气行为.通过实验数据对二维电子气散射过程的半定量分析，推出量子散射时间为0.23ps，比以往报道的AlGaN/GaN结构中的散射时间长，说明引入AlN层可以有效减小合金散射，进一步的推断分析发现低温下以小角度散射占主导地位.     

Anomalous ferromagnetism and non-Fermi-liquid behavior in the Kondo lattice CeRuSi<Subscript>2</Subscript>

The structural, electronic and magnetic properties of the Kondo-lattice system CeRuSi₂ are experimentally investigated and analyzed in the series of other ternary cerium compounds. This system is shown to be an excellent model system demonstrating coexistence of the Kondo effect and anomalous ferromagnetism with a small magnetic moment which is confirmed by magnetic and μSR measurements. Data on specific heat, resistivity, heat conductivity and Seebeck coefficient are presented. Being deduced from the resistivity and specific heat data, a non-Fermi-liquid behavior is observed at low temperatures, which is unusual for a ferromagnetic Kondo system. A comparison with other magnetic Kondo lattices is performed.     

Preparation and characterization of the ZnO:Al/Fe65Co35/ZnO:Al multifunctional films

The ferromagnetic transparent conducting film is a multifunctional film which has high visible transmittance, low resistivity and room-temperature ferromagnetism, simultaneously. In this article, ferromagnetic transparent conducting ZnO:Al/Fe₆₅Co₃₅/ZnO:Al multilayer films were fabricated by inserting a middle magnetic Fe₆₅Co₃₅ layer into aluminum-doped zinc oxide (ZnO:Al) matrix using a magnetron sputtering apparatus at substrate temperature ranging from room temperature (RT) to 400^∘C. The total film thickness was about 400 nm and the middle Fe₆₅Co₃₅ alloy layer was 4 nm. The influences of substrate temperature (T _s ) on the structural, electrical, optical and magnetic properties of the multilayer films were systemically investigated. The results showed that the microstructure and performance of the composite multilayer films strongly depended on the substrate temperature. The present results also showed that the inserted middle Fe₆₅Co₃₅ alloy thin layer played an important role in providing the RT ferromagnetism and decreasing the resistivity of the multilayer films. Therefore, it is possible to obtain a multifunctional film material with the combination of good optical transparency, high electrical conductivity and RT ferromagnetism.     

Evidence for charge Kondo effect in superconducting Tl-doped PbTe

We report results of low-temperature thermodynamic and transport measurements of Pb1-xTlxTe single crystals for Tl concentrations up to the solubility limit of approximately x=1.5%. For all doped samples, we observe a low-temperature resistivity upturn that scales in magnitude with the Tl concentration. The temperature and field dependence of this upturn are consistent with a charge Kondo effect involving degenerate Tl valence states differing by two electrons, with a characteristic Kondo temperature T(K) approximately 6 K. The observation of such an effect supports an electronic pairing mechanism for superconductivity in this material and may account for the anomalously high T(c) values.     

Magnetic reversal mechanism in strong perpendicular magnetic anisotropic CoPt/AlN multilayer film

Magnetic reversal mechanism of the Sub/AlN5 nm/[CoPt2 nm/AlN5 nm]₅ nano multilayer film, which shows strong perpendicular magnetic anisotropy (K_u=6.7×10⁶ erg/cm³), has been studied. The angle-dependent magnetic hysteresis loops of this highly perpendicular anisotropic CoPt/AlN multilayer film were measured in the present work, applying a magnetic field along different angles φ with respect to the film normal. It demonstrates that the magnetic reversal of the CoPt ultrathin layers in the CoPt/AlN multilayer film is occurred by the reversible magnetization rotation and the irreversible displacement of domain walls. The φ-dependent part of coercive field is resulted from the internal stress according to the Kondorsky and Kersten model. The φ-independent part of coercive field implies some random and isotropy pinning centers (e.g., vacancies, dislocations, grain boundaries) in the ultrathin CoPt layers. Our work is useful for coercivity control of metal/ceramics layered structures, in particular the perpendicular magnetic tunneling junctions.     

溅射Al对AlN的“润湿”与钎焊

由于润湿性不佳, 难以实现金属钎料对陶瓷的无过渡层直接钎焊, 本文在研究了溅射Al薄膜对AlN的“润湿”作用的基础上, 通过磁控溅射的方法在AlN表面沉积Al基薄膜作为钎料, 在真空条件下对AlN陶瓷进行了直接钎焊. 采用高景深光学显微镜、扫描电子显微镜和X射线能量分散谱表征了钎焊接头和剪切断口的组织及形貌. 结果表明, 高能量溅射Al粒子对AlN的撞击可以形成只有850 ℃以上高温才可获得的Al-N化学键, 实现Al对AlN的“润湿”, 使Al基薄膜钎料能够在较低的温度(≥ 510 ℃)对AlN直接钎焊. 此方法获得的Al/AlN接头的剪切强度达到104 MPa, 含3.8 at.% Cu的Al合金钎料接头强度可进一步提高到165 MPa, 它们的剪切断裂都产生于钎缝金属之中; 增加钎料中的Cu含量至9.1 at.%后, Cu在钎缝与陶瓷界面的偏聚使接头的剪切强度降低为95 MPa. Al-20 at.% Ge合金可以将钎焊温度降低至510 ℃, 但Ge在钎缝与陶瓷界面的偏聚使接头在48 MPa发生断裂.     

纤锌矿AlGaN/AlN/GaN异质结构中光学声子散射影响的电子迁移率

对含有AlN插入层纤锌矿Al_xGa_1-xN/AlN/GaN异质结构,考虑有限厚势垒和导带弯曲的实际 异质结势,同时计入自发极化和压电极化效应产生的内建电场作用,采用数值自洽求解薛定谔方程和泊松方程, 获得二维电子气(2DEG)中电子的本征态和本征能级.依据介电连续模型和Loudon单轴晶体模型, 用转移矩阵法分析该体系中可能存在的光学声子模及三元混晶效应.进一步, 在室温下计及各种可能存在的光学声子散射,推广雷-丁平衡方程方法,讨论2DEG分布及二维电子迁移率的 尺寸效应和三元混晶效应.结果显示: AlN插入层厚度和Al_xGa_1-xN势垒层中Al组分的增加均会 增强GaN层中的内建电场强度,致使2DEG的分布更靠近异质结界面,使界面光学声子强于其他类型的 光学声子对电子的散射作用而成为影响电子迁移率的主导因素.适当调整AlN插入层的厚度和Al组分, 可获得较高的电子迁移率.     

Influence of interstitials and non magnetic impurities on the Kondo effect

The influence of interstitials and non magnetic impurities on the anomalous resistivity, thermopower and Kondo temperature of dilute magnetic alloys was investigated generalizing a model proposed by Bohnen and Fischer. Numerical results are given as a function of the distance between the interstitial (or non magnetic impurity) and the magnetic impurity using their scattering phase shifts as parameters. The Kondo anomalies are altered considerably, if the magnetic impurity is very close to the non magnetic scattering potential, e.g. if it is part of an interstitial dumbbell.This work is part of a doctoral thesis of G.Wehr at the Technische Universität München     

Low temperature resistivity minimum and its correlation with magnetoresistance in La0.67Ba0.33MnO3 nanomanganites

A systematic investigation of structural, magnetic and electrical properties of nanocrystalline La_0.67Ba_0.33MnO₃ materials, prepared by citrate gel method has been undertaken. The temperature-dependant low-temperature resistivity in ferromagnetic metallic (∼50 K) phase shows upturn behavior and is suppressed with applied magnetic field. The experimental data (<75 K) can be best fitted in the frame work of Kondo-like spin-dependant scattering, electron-electron and electron-phonon interactions. It has been found that upturn behavior may be attributed to weak spin disorder scattering including both spin polarization and grain boundary tunneling effects, which are the characteristic features of extrinsic magnetoresistance behavior, generally found in nanocrystalline manganites. The variation of electrical resistivity with temperature in the high temperature ferromagnetic metallic part of electrical resistivity (75K<T<T_P) has been fitted with grain/domain boundary, electron-electron and magnon scattering mechanisms, while the insulating region (T>T_P) of resistivity data has been explained based on adiabatic small polaron hopping mechanism.     

Implication of local moment at Ti and Fe sites for the electrical and magneto-transport properties of degenerate semiconducting Ti?-xFexO?-d epitaxial films

We have investigated the effect of local magnetic moment on the electrical and magneto-transport properties of thin films of the degenerate semiconductor Ti(1-x)Fe(x)O(2-d) (x = 0,0.04). The electrical measurements of these films reveal high temperature metallic behavior and resistivity minima. The behavior below the resistivity minimum temperature is ascribed to Kondo like scattering. The coupling between the local moment and the charge carriers is reflected in the magnetoresistance measurements in these films. This work indicates competition between the magnetic ordering mechanism by J(RKKY) and the moment screening mechanism by J(Kondo). Accordingly the role of carrier density in achieving the magnetic ordering in such materials either by defect engineering or by transition metal doping is discussed.     

AlN插入层对AlxGa1-xN/GaN界面电子散射的影响

本文研究AlN作为Al_xGa_1-xN/GaN插入层引起的电子输运性质的变化, 考虑了Al_xGa_1-xN和AlN势垒层的自发极化、压电极化对Al_xGa_1-xN/AlN/GaN双异质结高电子迁移率晶体管(HEMT)中极化电荷面密度、二维电子气(2DEG) 浓度的影响, 分析了AlN厚度与界面粗糙度散射和合金无序散射的关系; 结果表明, 2DEG 浓度、界面粗糙度散射和合金无序散射依赖于AlN层厚度, 插入一层1–3 nm薄的AlN层, 可以明显提高电子迁移率.     

AlN/Al dual protective coatings on NdFeB by DC magnetron sputtering

AlN/Al dual protective coatings were prepared on NdFeB by DC magnetron sputtering in a home-made industrial apparatus. Comparing with Al coating, AlN/Al coatings have a denser structure of an outmost AlN amorphous layer following an inner Al columnar crystal layer. The coatings and NdFeB substrate combine well, and moreover, there is occurrence of metallurgy bonding in the interface layer. Both Al and AlN/Al coatings have a good protective ability to NdFeB. Especially, the corrosion resistance of AlN/Al coated NdFeB is improved largely. AlN/Al and Al protective coatings not only do not deteriorate the magnetic properties of NdFeB, but contribute to their slight increase.     

Influence of inserting AlN between AlSiON and 4H-SiC interface for the MIS structure

A control of interface between gate insulating film and semiconductor is required to achieve high-power field effect transistors (FET) using SiC. To improve the interface between the high-k layer and SiC, we propose inserting an AlN layer as an interfacial layer. The reason for selecting AlN film is that it has a wide bandgap, as well as almost the same lattice constant as that of 4H-SiC. The insertion of AlN film between 4H-SiC and the insulating film effectively reduces the interfacial roughness. The roughness of the interface between AlN and SiC can be suppressed compared with that of the thermal oxidized SiC. Moreover, the AlSiON film was deposited on the AlN layer as a high dielectric gate insulating film with low leakage current at high temperature and low space charge. The C-V characteristics of the AlSiON/AlN/SiC MIS structure with an AlN buffer layer are improved by increasing the deposition temperature of the AlN film. This demonstrates that AlSiON/AlN/SiC is one of attractive MIS structures for SiC devices.     

Electronic Structure and Magnetic Properties of Cr-Doped AlN

To understand the electronic and magnetic properties, we have studied Cr-doped zinc-blende AlN system in detail by applying a first-principle plane wave pseudopotential method based on the density functional theory within the local spin density approximation. The analyses of the band structures, density of states, exchange interactions, and magnetic moments show that Al1-xCrxN alloys may exhibit a half-metallic ferromagnetism character, that Cr in the diluted doping limit forms near-midgap deep levels, and that the total magnetization of the cell is 3μB per Cr atom, which does not change with Cr concentration. Moreover, we have succeeded in predicting that Al1-xCrzN alloys in x = 0.0625 has a very high Curie temperature, and lind that ferromagnetic exchange interaction between magnetic dopants is short-ranged.     

MgO(111)上NbN和AlN薄膜的生长研究

在制备NbN/AlN/NbN隧道结的工艺过程中,为了获得具有优质单晶结构的NbN薄膜,我们在MgO(111)基片上探索了直流溅射法制备NbN薄膜的生长工艺条件,XRD研究分析表明,我们获得了单晶结构良好的NbN薄膜;为了支持作为上电极的NbN薄膜的生长,也需要良好的AlN薄膜用作势垒层,我们采用射频磁控溅射设备和纯净的Al靶对AlN薄膜进行了制备研究.实验结果表明,所获得的AlN薄膜具有六方c-轴取向,并讨论了衬底和薄膜界面处可能的结构情况.     

The effect of magnetic impurity scattering in Au films

The magnetic impurity scattering plays an important role in the phase coherence behavior of thin films.By using the thickness and disorder dependences of the low temperature logarithmic anomaly in resistivity we are able to determine the concentration of magnetic impurities in Au films and demonstrate that the low temperature saturation or plateau in phase decoherence time is closely related with the Kondo effect.     

Influence of temperature on strain-induced polarization Coulomb field scattering in AlN/GaN heterostructure field-effect transistors

Electron mobility scattering mechanism in AlN/GaN heterostuctures is investigated by temperature-dependent Hall measurement, and it is found that longitudinal optical phonon scattering dominates electron mobility near room temperature while the interface roughness scattering becomes the dominant carrier scattering mechanism at low temperatures(～100 K).Based on measured current–voltage characteristics of prepared rectangular AlN/GaN heterostructure field-effect transistor under different temperatures, the temperature-dependent variation of electron mobility under different gate biases is investigated. The polarization Coulomb field(PCF) scattering is found to become an important carrier scattering mechanism after device processing under different temperatures. Moreover, it is found that the PCF scattering is not generated from the thermal stresses, but from the piezoelectric contribution induced by the electrical field in the thin AlN barrier layer. This is attributed to the large lattice mismatch between the extreme thinner AlN barrier layer and GaN, giving rise to a stronger converse piezoelectric effect.     

Transport studies of Kondo behavior,ferromagnetic and antiferromagnetic order in U1−xThxSb

We report electrical resistivity, Hall effect and magnetization measurements in the system U_1?xTh_xSb for magnetic fields up to 100 kOe. In U_0.14Th_0.86Sb a Kondo-like behavior of the resistivity is detected and the interaction J_df between the conduction d electrons and the uranium f electrons is found to be about ?0.2 eV. The dilution of USb by ThSb leads to large modifications of the electrical transport properties, reflecting the change from antiferromagnetism to ferromagnetism and simultaneously a decrease of the ordered magnetic moment per uranium atom occurs. A simple model is presented which accounts for this decrease assuming that all the conduction electrons added by thorium are polarized antiparallel to the remaining uranium f electrons due to the negative J_df. The Kondo temperature is used to estimate the band width and the binding energy of the 5f state.