Photoluminescence characteristics of GaAsSbN/GaAs epilayers lattice-matched to GaAs substrates

The photoluminescence (PL) characteristics of GaAsSbN/GaAs epilayers grown by molecular beam epitaxy (MBE) are carefully investigated. The results show that antimony (Sb) incorporation into GaNAs material has less influence on the N-induced localization states. For the same N concentration, GaAsSbN material can reach an emission wavelength near 1.3 μm more easily than GaInNAs material. The rapid thermal annealing (RTA) experiment shows that the annealing induced rearrangement of atoms and related blueshift in GaAsSbN epilayers are smaller than those in GaNAs and GaInNAs epilayers. The GaAsSbN material can keep a longer emission wavelength near 1.3 μm-emission even after the annealing treatment. Raman spectroscopy analysis gives further insight into the structure stability of GaAsSbN material after annealing.     

Impurity lattice location and recovery of structural defects in semiconductors studied by emission channeling

Doping of semiconductors by ion implantation usually requires implantation doses below 10¹³ cm^–2 to obtain typical impurity concentrations of <10¹⁸ cm^–3. The lattice location of impurities as well as the defect recovery after such low dose implantations can be studied using the emission channeling technique. In this technique, single crystals are doped with radioactive probe atoms and the channeling effects of electrons, positrons or -particles emitted from these atoms are measured. We present a quantitative analysis of electron emission channeling measurements after heavy-ion implantation into Si and III–V compound semiconductors by comparison with calculated channeling profiles based on the dynamical theory of electron diffraction. For In atoms implanted into Si, complete substitutionality was found after rapid thermal annealing to 1200 K. For lower annealing temperatures, the observed channeling effects indicate small mean displacements (of about 0.2 Å) of the In atoms from substitutional sites, caused by residual implantation defects. For GaAs, GaP and InP implanted at low temperatures with In or Cd isotopes, pronounced recovery stages around 300, 400 and 350 K, respectively, were observed and substitutional fractions close to 100% were derived after annealing above the stage.     

Nitrogen implantation in GaAs1−xPx (x=0.4; 0.65)

Nitrogen ions were implanted in GaAs_1−xP_x (x=0.4; 0.65) at room temperature at various doses from 5×10¹² cm⁻² to 5×10¹⁵ cm⁻² and annealed at temperatures from 600°C up to 950°C using a sputtered SiO₂ encapsulation to investigate the possibility of creating isoelectronic traps by ion implantation. Photoluminescence and channeling measurements were performed to characterize implanted layers. The effects of damage induced by optically inactive neon ion implantation on photoluminescence spectrum were also investigated. By channeling measurements it was found that damage induced by nitrogen implantation is removed by annealing at 800°C. A nitrogen induced emission intensity comparable to the intensity of band gap emission for unimplanted material was observed for implanted GaAs_0.6P_0.4 after annealing at 850°C, while an enhancement of the emission intensity by a factor of 180 as compared with an unimplanted material was observed for implanted GaAs_0.35P_0.65 after annealing at 950°C. An anomalous diffusion of nitrogen atoms was found for implanted GaAs_0.6P_0.4 after annealing at and above 900°C.     

弹性反冲探测分析技术在材料氦行为研究中的应用

弹性反冲探测分析技术（ERDA）对轻元素的测定具有灵敏度高、包含深度信息的优势,因此在材料氦行为研究中发挥着重要作用。镍基哈氏N合金被认为是未来熔盐堆的结构材料,氦脆是其服役性能下降的主要因素之一。利用掠入射模式的ERDA,解析了哈氏N合金样品中的氦原子浓度及其分布,但仅局限于0~175 nm深度范围内。结果表明:在800℃的退火条件下,距离样品辐照表面~33 nm深度区域内,出现了氦原子逃逸现象。更高温度的退火（1 050℃）可加剧氦原子的逃逸,但样品中仍有氦原子滞留。另外,采用透射式的ERDA,极大地扩大了对氦原子分析的深度范围,得到了纯镍薄膜在0~950 nm深度区域内的氦原子浓度分布。这表明将块体材料制备成薄膜样品,利用透射模式的ERDA,将可以得到氦原子在更大范围内的扩散、逃逸行为。Since the elastic recoil detection analysis (ERDA) technique has the advantages of high sensitivity and deep information in analyzing the light elements, it plays an important role in the study of helium behavior in materials. Helium embrittlement is one of the main reasons for the degradation of the Hastelloy N alloy, which has been considered as the promising candidate structural material for the further molten salt reactor. In this work, the profile of helium concentrationin sample of Hastelloy N alloy was analyzed by ERDA experiments applying grazing-incidence geometry. However, the result was limited within the depth range of 0~175 nm, and it shown that helium atoms escaped in the range from the irradiated surface of the sample to the depth of ~33 nm when annealing the sample at 800℃ The annealing at higher temperature (1 050℃) increased the escape of helium atoms, but a small fraction of helium atoms still trapped in the sample. In addition, the profile of helium concentration was obtained in the helium-irradiated pure nickel film in the depth range of 0~950 nm, using the ERDA experiments in transmission geometry. This indicates that the diffusion behavior of helium atoms in bulk samples can be completely obtained using the ERDA experiments in tranmission geometry if the bulk material can be prepared into a thin film sample.     

热退火对Mn离子注入非故意掺杂GaN微结构、光学及磁学特性的影响

通过Mn离子注入非故意掺杂GaN外延层制备了GaN:Mn薄膜,并研究了退火温度对GaN:Mn薄膜的微结构、光学及磁学特性的影响.对不同退火温度处理后的GaN:Mn薄膜的拉曼谱测试显示,出现了由与离子注入相关的缺陷的局域振动(LV)和(Ga,Mn)N中Mn离子的LV引起的新的声子模.在GaN:Mn薄膜的光致发光谱中观察到位于2.16,2.53和2.92 eV处的三个新发光峰(带),其中位于2.16 eV处的新发光带不能排除来自Mn相关辐射复合的贡献.对GaN:Mn薄膜的霍尔测试显示,退火处理后样品表现出n型体材料特征.对GaN:Mn薄膜的振动样品磁强计测试显示,GaN:Mn薄膜具有室温铁磁性,其强弱受Mn相关杂质带中参与调节磁相互作用的空穴浓度的影响.     

Structural and luminescent characteristics of non-stoichiometric ZnO films by various sputtering and annealing temperatures

ZnO thin films were prepared by reactive RF magnetron sputtering at various deposition temperatures. They were annealed in oxygen ambient at various annealing temperatures. The microstructures and photoluminescence characteristics of ZnO films were investigated. The grain size of the ZnO thin film that was deposited at room temperature (RT) after annealing exceeded that of the film that was deposited at . Excess Zn atoms were considered to be present in the ZnO film that was deposited at RT, so the film was non-stoichiometric ZnO. No visible emission of either of the ZnO films deposited at the two temperatures was observed before annealing. Following annealing at high temperature, the green emission from the ZnO film that was deposited at RT was stronger than that of the film that was deposited at . The relationship between the non-stoichiometry of the thin film and the visible emission was discussed. The luminescent centers that correspond to green emission are defects; the concentration of defects was higher in the ZnO thin film that was deposited at RT than in the film that was deposited at .     

GaAsN/GaAs量子阱在1 MeV电子束辐照下的退化规律

为研究GaAsN/GaAs量子阱在电子束辐照下的退化规律与机制,对GaAsN/GaAs量子阱进行了不同注量(1×10¹⁵,1×10¹⁶ e/cm²)1 MeV电子束辐照和辐照后不同温度退火(650,750,850℃)试验,并结合Mulassis仿真和GaAs能带模型图对其分析讨论。结果表明,随着电子注量的增加,GaAsN/GaAs量子阱光学性能急剧降低,注量为1×10¹⁵ e/cm²和1×10¹⁶ e/cm²的电子束辐照后,GaAsN/GaAs量子阱PL强度分别衰减为初始值的85%和29%。GaAsN/GaAs量子阱电子辐照后650℃退火5 min,样品PL强度恢复到初始值,材料带隙没有发生变化。GaAsN/GaAs量子阱辐照后750℃和850℃各退火5 min后,样品PL强度随退火温度的升高不断减小,同时N原子外扩散使得样品带隙发生约4 nm蓝移。退火温度升高没有造成带隙更大的蓝移,这是由于进一步的温度升高产生了新的N—As间隙缺陷...     

CVD两步法生长ZnO薄膜及其光致发光特性

用CVD两步法在常压下于p型Si(100)衬底上沉积出具有较好择优取向的多晶ZnO薄膜。在325nm波长的光激发下,室温下可观察到显著的紫外光发射(峰值波长381nm)。高温退火后氧空位缺陷浓度增加,出现了一个450~600nm的绿光发光带,发光峰值在510nm。作为比较,用一步法生长的ZnO薄膜结晶质量稍差。在其PL谱中不仅有峰值波长389nm的紫外发射而且还出现了一个很强的蓝光发光中心(峰值波长437nm),退火后同样产生绿光发光带。对这两种绿光发光带的发光机制进行了研究,认为前者源于VO,而后者与O_Zn有密切的关系。     

Phase transformations and structure of Ni–Mn–In alloys with varying ratio Ni/Mn

The fine structure of Ni–Mn–In alloys has been studied when manganese atoms are substituted for nickel atoms in an annealing state. The concentration dependence of the critical temperatures and the structures of the alloys have been discussed. It has been found that, as manganese atoms replace nickel atoms, the structure after annealing is changed from a two-phase (L2₁ + martensite) to single-phase L2₁ structure. The martensitic transformation in Ni₄₇Mn₄₂In₁₁ alloy is accompanied by the formation of modulated 14M martensite.     

注入Ar+的蓝宝石晶体退火前后光致发光谱的分析

对注入Ar⁺后不同晶面取向的蓝宝石晶体在不同退火条件下的光致发光谱进行了分析.分析结果表明:三种晶面取向的蓝宝石样品经Ar⁺注入后,其光致发光谱中均出现了新的位于506nm处的发光峰;真空和空气气氛下的退火均对样品在506nm处的发光有增强作用,不同晶面取向的样品发光增强程度不同,且发光增强至最大时的退火温度也不同,空气气氛下的退火使样品发光增强程度更为显著.由此可以看出,退火气氛、退火温度和晶面取向均对样品发光峰强度有影响. 关键词： 2O₃')" href="#">Al₂O₃ 离子注入 退火 光致发光谱     

High efficiency white luminescence of alumina doped ZnO

The application of alumina-doped ZnO (AZO) films as luminescent material for large area lighting sources has been evaluated. Thin films were grown on quartz using magnetron sputtering and subsequently annealed under argon atmosphere in a rapid thermal annealing experiment. Below 550 °C, red-shift of the optical band gap and increase of the visible emission are observed in agreement with Al diffusion and formation of interstitial oxygen atoms. At temperatures higher than 800 °C, diffusion is activated and Ostwald ripening leads to the formation of larger grains and an increase of the crystalline phase. The photoluminescence (PL) intensity is enhanced, specifically in the UV range. As a result the emission spectrum of AZO thin films can be adjusted by the annealing conditions, with equal contributions from the UV and orange parts of the PL spectrum resulting in an efficient white emission as quantified using the color space map of the Commission Internationale de l'Éclairage.     

Experimental study of the amorphous phases of group-IV semiconductors by the119mSn Mössbauer probe

The amorphous phases of silicon, germanium, and -tin have been studied by Mössbauer emission spectroscopy on ion-implanted, radioactive^119mSn. Amorphous samples have been produced by ion implantations of various elements and by vacuumevaporation techniques. The same well-defined type of complex spectrum is observed for all investigated amorphous samples. These spectra are characterized by an increase in average isomer shift of (0.15±0.03) mm/s, a line broadening of 20±2%, and the same Debye temperature as compared with spectra of substitutional Sn in the respective crystalline host lattices. The spectra are proposed to originate from Sn atoms incorporated substitutionally in the amorphous host with distorted local surroundings. The recrystallization of the amorphous phase upon thermal and laser annealing has been monitored. After appropriate annealing, spectra characteristic of crystalline materials are observed for most samples. An exception are high-dose, inert-gas implanted samples where different complex defects seem to be formed in the annealing process.     

Surface modification by vacuum annealing for field emission from heavily phosphorus-doped homoepitaxial (1 1 1) diamond

The relationship between field emission properties and C 1s core level shifts of heavily phosphorus-doped homoepitaxial (1 1 1) diamond is investigated as a function of annealing temperature in order to optimize surface carbon bonding configurations for device applications. A low field emission threshold voltage is observed from surfaces annealed at 800 °C for hydrogen-plasma treated surface, while a low field emission threshold voltage of wet-chemical oxidized surface is observed after annealing at 900 °C. The C 1s core level by X-ray photoelectron spectroscopy (XPS) showed a shoulder peak at 1 eV below the main peak over 800 and 900 °C annealing temperature for hydrogen-plasma treated and wet-chemical oxidized surfaces, respectively. When the shoulder peak intensity is less than 10% of the main peak intensity, lower threshold voltages are observed. This is due to the carbon-reconstruction which gives rise to a small positive electron affinity. By increasing annealing temperature, the shoulder peak ratios also increase, which indicates that a surface graphitization takes place. This leads to higher threshold voltages.     

退火处理对SnO2薄膜光致发光性质的影响

实验研究表明,SnO2薄膜经过退火处理后其光致发光谱有明显的变化。在氧和氮两种不同气氛中进行热处理,其变化也有差异。这种变化主要是由于SnO2膜中氧空位和自由载流于浓度变化所致。     

氮气氛中高温退火对ZnO薄膜发光性质的影响

以二乙基锌和水汽分别作为锌源和氧源,用LP-MOCVD方法在p型Si(100)衬底上生长了单一取向的ZnO薄膜。对得到的样品在氮气气氛中进行高温热处理,退火温度分别为900,1000,1100℃。利用室温PL谱、XRD、AFM、XPS等方法对样品的性质进行了研究。研究表明:(1)随着退火温度的升高,样品的结晶性质也逐渐提高,从表面形貌观察到晶粒尺寸逐渐增大;(2)当退火温度从900℃升高至1000℃时,样品的光致发光谱中可见光波段的发光强度有所减弱,而紫外波段的发光强度明显增强;当退火温度升高至1100℃时,可见光波段的发光几乎完全被抑制,而紫外波段的发光强度急剧增强。分析认为,高温退火改善晶体结晶质量的同时调制了样品的Zn/O比,氮气气氛下的热处理使得样品内的氧原子逸出,来自受主缺陷OZn的可见发射随温度升高逐渐减弱,而当退火温度达到1000℃以上时样品成为富锌状态,此时与施主缺陷Zni有关的紫外发射急剧增强。     

Spectroscopy and dynamics of neutral atoms in superfluid helium

Optical spectra and radiative lifetimes of neutral atoms in superfluid helium have been studied. The absorption and emission spectra of Ag, Mg, Yb, Al, Ga, and In were found to exhibit shifts and broadening typical of atoms residing in microscopic He bubbles, showing that this type of trapping is fairly general. The radiative lifetimes measured for these atoms are close to the free space values, indicating that the surrounding bubble hardly perturbs the electronic orbitals during photo emission. One exception observed in Sr is discussed, where competing autoionization substantially decreases the lifetime of a high excited triplet state. A transient non-bubble state with sharp, free atom like spectra is seen during the first few s after dispersion for many atomic species. The dynamics of this state are unusual, with for example very short radiative lifetimes measured for light alkali atoms.     

Effect of Rapid Thermal Annealing on the Formation of In-N Clusters in Strained InGaNAs

A model for the effect of rapid thermal annealing on the formation of In-N clusters in strained GalnNAs is developed according to thermodynamics. In the model, the lowest annealing temperature influencing the redistribution of atoms is introduced. The average variation of energy for formation per In-N bond is obtained by fitting the experimental values. Using the present model, we calculate the average number of nearest-neighbor In atoms per N atom after annealing. The obtained results are compared with the experiment. The qualitative analysis and quantitative analysis are in good agreement with each other. The model is helpful to explain the essence of the blueshift caused by annealing.     

Effect of S- and Sn-doping to the optical properties of ZnO nanobelts

In this study, the optical properties of S- and Sn-doped ZnO nanobelts, grown by thermal evaporation, were investigated. The sulfur and tin contents in the nanobelts were about 12% and 8% (atomic), respectively. The average widths of the S- and Sn-doped ZnO nanobelts were 73 and 121 nm, respectively. Room temperature photoluminescence (PL) spectroscopy exhibits significantly different optical properties for the two types of nanobelts. The PL result of the S-doped ZnO nanobelts shows the broad visible emission with no detectable ultraviolet (UV) peak, while the PL result of the Sn-doped sample shows two emission bands, one related to UV emission with a strong peak at 376 nm that is blue-shifted by 4 nm in comparison to pure ZnO nanobelts, and another related to green emission with a weak peak. A weak peak in the UV region at 383 nm appeared after annealing the S-doped ZnO nanobelts at 600 °C. Additionally, the annealed S-doped nanobelts show a stronger peak in the visible emission region in comparison to that observed prior to annealing. The Sn-doped ZnO nanobelts are also affected by annealing, as the UV emission peak is blue-shifted to 372 nm after annealing.     

Effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition

The effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition was investigated using atomic force microscopy, Raman spectroscopy, and deep ultra-violet photoluminescence(PL) with the excitation wavelength as short as ～ 177 nm. Annealing experiments were carried out in either N2 or vacuum atmosphere with the annealing temperature ranging from 1200℃ to 1600℃. It is found that surface roughness reduced and compressive strain increased with the annealing temperature increasing in both annealing atmospheres. As to optical properties,a band-edge emission peak at 6.036 eV and a very broad emission band peaking at about 4.7 eV were observed in the photoluminescence spectrum of the as-grown sample. After annealing, the intensity of the band-edge emission peak varied with the annealing temperature and atmosphere. It is also found that a much stronger emission band ranging from 2.5 eV to 4.2 eV is superimposed on the original spectra by annealing in either N2 or vacuum atmosphere. We attribute these deep-level emission peaks to the VAL–ONcomplex in the AlN material.     

Laser action of C,N, O,F, Cl,and Br in hollow cathode discharges

C, N, O, F, Cl, and Br red and infrared laser emission was investigated using hollow cathode discharges in gas mixtures of helium and molecules containing the corresponding atoms. A total of 33 laser lines with wavelengths from 0.7 to 2.0m was observed. Three laser lines of atomic C, five laser lines of atomic N, two laser lines of atomic Cl and five laser lines of atomic Br were observed for the first time. Dissociation charge transfer and dissociative excitation transfer are suggested as being responsible for populating the upper laser levels.