Giant Hall effect in (GaAs)Fe granular films

A series of (GaAs)_1 − xFe_x (x: volume fraction) films with Fe granules embedded in GaAs matrix were prepared by magnetron sputtering. Hall Effect of the films was characterized. The largest saturated Hall resistivity of was observed in (GaAs)₃₀Fe₇₀ film at room temperature, which is over 2 orders larger than that of pure Fe, about 1 order larger than that of (NiFe)–(Al₂O₃) and (NiCo)–(SiO₂) granular films prepared under the same preparation conditions, and 150% larger than that of Ge₃₀Fe₇₀.     

Effect of post annealing temperature on structural and optical properties of ZnCdO thin films deposited by sol–gel method

Ternary ZnCdO thin films oriented along c-axis have been successfully deposited on p-Si (1 0 0) substrates using sol–gel spin coating route. To optimize most suitable annealing temperature for the Zn_1−xCd_xO thin films; these films with selected cadmium content x = 0.10 were treated at annealing temperatures from 300 °C up to 800 °C in oxygen ambient after deposition. The structural and optical properties of deposited thin films have been characterized by X-ray diffraction, energy dispersive spectroscopy, atomic force microscopy, UV–Vis spectroscopy, and photoluminescence spectra. The results show that the obtained films possess high crystallinity with wurtzite structure. The crystallite size, lattice parameters, lattice strain and stress in the deposited films are determined from X-ray diffraction analysis. The band gap energy increased as a function of annealing temperatures as observed from optical reflectance spectra of samples. The presence of Cd in the deposited films is confirmed by energy dispersive spectrum and it is observed that Cd re-evaporate from the lattice with annealing. The photoluminescence measurements as performed at room temperature did not exhibit any luminescence related to oxygen vacancies defects for lower annealing temperatures, as normally displayed by ZnO films. The green yellow luminescence associated to these defects was observed at higher annealing temperatures (≥700 °C).     

Dielectric properties of SrZrO3 thin films prepared by pulsed laser deposition

SrZrO₃ (SZO) thin films have been prepared on Pt-coated silicon substrates and directly on Si substrates by pulsed laser deposition (PLD) using a ZrSrO target at a substrate temperature of 400 °C in 20 Pa oxygen ambient. X-ray –2 scans showed that the as-deposited films remain amorphous at a substrate temperature of 400 °C. The dielectric constant of SZO has been determined to be in the range 24–27 for the Pt/SZO/Pt structure. Capacitance–voltage (C–V) characteristics of a metal-oxide-semiconductor (MOS) structure for SZO films deposited in 20 Pa oxygen ambient and 20 Pa nitrogen ambient (SZON) indicated that incorporation of nitrogen during the substrate heating and film deposition can suppress the formation of an interfacial SiO₂ layer, and the SZON films have a lower equivalent oxide thickness (EOT) than that of the SZO films. However, the leakage current of the SZON films is larger than that of the SZO films. The EOT is about 1.2 nm for a 5-nm SZON film deposited at 400 °C. The leakage-current characteristics of as-deposited SZON films and SZON films post-annealed in oxygen ambient by rapid thermal annealing (RTA) have been studied comparatively. The films post-annealed with RTA have a lower leakage current than the as-deposited SZON films. Optical transmittance measurements showed that the band gap of the films is about 5.7 eV. It is proposed that SrZrO₃ films prepared at 400 °C are potential materials for alternative high-k gate-dielectric applications. PACS 77.84.Bw; 77.84.-s; 77.55.+f     

Interaction of excitons in indirect solid solutions of In1−xGaxP at high levels of excitation

The cathode luminescence spectra of GaP and solid solutions of In_1–xGa_xP (with an indirect energy band structure) obtained by liquid-phase epitaxy are investigated at T=77 and 9°K. It is established that the recombination of excitons on neutral donors and the pure exciton recombination with the participation of TA (=13±1 meV), LA (=31±1 meV), and TO (=43±2 meV) phonons. dominate in the low-temperature luminescence spectra of GaP and In_1–xGa_xP with a small concentration of photon impurities. The complex luminescence band that arises for sufficiently high levels of excitation and at T = 9°K is attributed to the luminescence of an electron-hole drop (EHD). The transformation of spectral form of the EHD band with the transition from GaP to In_1–xGa_xP is attributed to a simultaneous reduction in the contribution of the TA and TO replicas and to the appearance of a phononless component in the luminescence of the EHD.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 37–40, September, 1985.     

Properties of reactively sputtered Mo1−x O x films

Molybdenum oxide (Mo_1–xO_x) films were prepared by reactive rf sputtering of a Mo target in O₂/Ar plasma. The dependence of film properties on various sputtering parameters is investigated. The atomic percentage of oxygen (x) in the Mo_1–xO_x films decreases with sputtering power and increases with the partial pressure of oxygen. Mo_1–xO_x films that exhibit metallic conductivities can be obtained over a wide range of sputtering conditions. The intrinsic film stress of conducting Mo_1–xO_x is compressive. Such M_1–xO_x films were shown by backscattering spectrometry to be excellent diffusion barriers between Al and Si up to 600 °C annealing for 30 min.     

Integration of GaN thin films to SiO2–Si(100) substrates by laser lift-off and wafer fusion method

A process methodology has been adopted to bond GaN thin films to Si(100) substrates using the combination of laser lift-off and direct wafer fusion. Using optimum excimer laser conditions, 2–10 μm of GaN is lifted-off from sapphire. The lifted-off thin film is cleared from gallium residual and then suitably treated in a hydrofluoric, nitric and acetic acid mixture to render the surface hydrophilic. This treatment provides van der Waals bonds to immediately contact bond with SiO₂–Si(100) substrate at room temperature. The bonds are further strengthened by a high temperature annealing at 650 C for 2 h. The structural and mechanical characteristics of the bonded structure reveal uniform and high quality bonding. The optical characteristics of the transferred bonded film on SiO₂–Si(100) substrate exhibit similar properties to that of GaN on sapphire. In a similar manner, high-brightness blue LEDs were transferred from sapphire to SiO₂–Si(100) substrate with no deterioration in the electrical and optical performance of the device.     

Properties of RF sputtered ZnxCd1−xS thin films

Zn _x Cd_1–x S thin films (0x0.20) were prepared using rf sputtering in argon atmosphere and characterized using X-ray diffraction, optical transmission, electrical resistivity and photoconductive decay measurements. The films were found to possess hexagonal structure. The crystallite size and degree of preferential orientation were found to decrease with the increase ofx and to improve upon annealing in vacuum at 250 °C. The transmission edge shifted towards shorter wavelengths with the increase ofx in agreement with the expected shift in the energy band gap. The films were found to exhibit room temperature resistivity in the range 100–1000 cm. The obtained values of long wavelength transmission (70–80%) and minority carrier diffusion length (30 m) are high enough for the application of these films in the field of solar cells.     

An X-ray diffraction and Mössbauer spectroscopic study on thec-axis texture YBa2(Cu1−x Fe x )3O7−y thick films

YBa₂(Cu_1–x Fe _x )₃O_7–y thick films (x=0, 0.01, 0.02, 0.03) on ceramic substrate were prepared. X-ray diffraction determinations show the formation of partialc-axis texture perpendicular to the surface of the ceramic substrate in the preparation process. The⁵⁷Fe Mössbauer spectra were measured at 300 K, where the angle between the incidence-ray beam and the surface of the film is 90° and 36°, respectively. The⁵⁷Fe Mössbauer spectra with=90° possess four sets of asymmetrical doublets.     

Study of the interface Si-nc/SiO2 by infrared spectroscopic ellipsometry and X-ray photoelectron spectroscopy

SiO_x films (1<x<2), 0.5 μm thick, have been elaborated by electron-gun evaporation. A thermal annealing of these films induced a phase separation leading to the formation of Si nanocrystals embedded in a SiO₂ matrix. These films have been studied by infrared spectroscopic ellipsometry and by X-ray photoelectron spectroscopy (XPS). The effective dielectric function of the thin films has been extracted in the 600–5000 cm⁻¹ range which allowed us to deduce the dielectric function of the matrix surrounding the Si-nc. A study of the Transverse Optical (TO) vibration mode has revealed the presence of SiO_x into the matrix. Before XPS measurements, the films have been etched in fluorhydric acid to remove the superficial SiO₂ layer formed during air exposure. The Si 2p core-level emission has been recorded. The decomposition of the Si 2p peak into contributions of the usual five tetrahedrons Si-(Si_4−nO_n) (n=0–4) has also revealed the presence of a SiO_x phase. Consistency between infra-red and XPS results is discussed.     

Correlation of charge trapping and electroluminescence in highly efficient Si-based light emitters

In this paper we report on recent results on charge trapping and electroluminescence (EL) from Ge rich SiO₂ layers. Thermally grown 80 nm thick SiO₂ layers were implanted with Ge ions at energies of 30–50 keV to peak concentrations of 1–6 at%. Subsequently rapid thermal annealing was performed at 1000°C for 6, 30 and 150 s under a nitrogen atmosphere in order to form luminescence centers. A combination of capacitance–voltage (CV) and current–voltage (IV) methods was used for the investigation of the trapping properties. It was found that at electric fields <8 MV/cm electron trapping dominates while at higher electric fields which are typically required for the EL operation of the devices positive charge trapping occurs. It is assumed, that the trapping sites which are responsible for the trapping of the positive charge are in strong relation to the defects causing the luminescence.     

Effects of post-thermal annealing temperature on the optical and structural properties of gold particles on silicon suboxide films

In this work, silicon suboxide (SiO_x) thin films were deposited using a RF magnetron sputtering system. A thin layer of gold (Au) with a thickness of about 10 nm was sputtered onto the surface of the deposited SiO_x films prior to the thermal annealing process at 400 °C, 600 °C, 800 °C and 1000 °C. The optical and structural properties of the samples were studied using scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), X-ray diffractometry (XRD), Fourier transform infrared spectroscopy (FTIR) and optical transmission and reflection spectroscopy. SEM analyses demonstrated that the samples annealed at different temperatures produced different Au particle sizes and shapes. SiO_x nanowires were found in the sample annealed at 1000 °C. Au particles induce the crystallinity of SiO_x thin films in the post-thermal annealing process at different temperatures. These annealed samples produced silicon nanocrystallites with sizes of less than 4 nm, and the Au nanocrystallite sizes were in the range of 7-23 nm. With increased annealing temperature, the bond angle of the Si-O bond increased and the optical energy gap of the thin films decreased. The appearance of broad surface plasmon resonance absorption peaks in the region of 590-740 nm was observed due to the inclusion of Au particles in the samples. The results show that the position and intensity of the surface plasmon resonance peaks can be greatly influenced by the size, shape and distribution of Au particles.     

Photoluminescence of AlxGa1−xAs/GaAs quantum well heterostructures grown by molecular beam epitaxy

Low-temperature photoluminescence measurements on nominally undoped Al_xGa_1–xAs/GaAs quantum well heterostructures (QWHs) grown by molecular beam epitaxy (MBE) exemplified the exclusivelyintrinsic free-exciton nature of the luminescence under moderate excitation conditions. Neither any spectroscopic evidence for alloy clustering in the Al_xGa_1–xAs barriers nor any extrinsic luminescence due to recombination with residual acceptors has been detected in single and double QWHs when grown at 670 °C under optimized MBE growth conditions. Carrier confinement in Al_xGa_1–xAs/GaAs QWHs starts at a well width ofL _z30 nm when x0.25. The minor average well thickness fluctuation ofL _z=4×10^–2nm as determined from the excitonic halfwidth allowed the realization of well widths as low asL _z=1 nm and thus a shift of the free-exciton line as high as 2.01 eV which is close to the conduction band edge of the employed Al_0.43Ga_0.57As confinement layer. The measurements further revealed a strongly enhanced luminescence efficiency of the quantum wells as compared to bulk material which is caused by the modified exciton transition probabilities due to carrier localization.     

X‐Ray Luminescence of Thin Oxide Films Containing Lead and Bismuth

We obtained thin films of the Bi₄Ge₃O₁₂, Bi₄Si₂O₁₂, PbWO₄, and Bi₂WO₆ scintillators and investigated their luminescence properties on xray excitation. We measured the xray luminescence spectra and established the linear character for the dependence of the luminescence intensity on the power of the dose of xray irradiation within the limits of up to 3·10^–3 A/kg. We investigated the radiation stability of the films obtained. The possibility of their application for detecting ionizing radiation is investigated. The films based on Bi₄Ge₃O₁₂ with an admixture of the Ge and Si or Mn activator of up to 1.5 mol.% are most suitable.     

The effects of ambient oxygen pressure on the 1.54 μm photoluminescence of Er-doped silicon-rich silicon oxide films grown by laser ablation of a Si+Er target

We fabricated Er-doped silicon-rich silicon oxide (SRSO:Er) films by pulsed laser deposition. A Si+Er target consisting of an Er metallic strip and a silicon disk was adopted with a goal to achieve a convenient control of the Er and oxygen density in the film. We found that the photoluminescence (PL) at 1.54 m is highly dependent on the ambient oxygen pressure, which determines the relative ratio of Si-Si, SiO_x, and SiO₂ phase in the film. The PL intensity increased drastically with increase in the annealing temperature and reached the maximum intensity at 500 °C. PACS 81.15.Fg; 81.07.-b     

A new structure of In-based ohmic contacts ton-type GaAs

Electrical, structural and reaction characteristics of In-based ohmic contacts ton-GaAs were studied. Attempts were made to form a low-band-gap interfacial phase of InGaAs to reduce the barrier height at the metal/semiconductor junction, thus yielding low-resistance, highly reliable contacts. The contacts were fabricated bye-beam sputtering Ni, NiIn and Ge targets on VPE-grownn ⁺-GaAs film (1 m, 2 × 10¹⁸ cm^–3) in ultrahigh vacuum as the structure of Ni(200 Å)/ NiIn(100 Å)/Ge(40 Å)/n ⁺-GaAs/SI-GaAs, followed by rapid thermal annealing at various temperatures (500–900°C). In this structure, a very thin layer of Ge was employed to play the role of heavily doping donors and diffusion limiters between In and the GaAs substrate. Indium was deposited by sputtering NiIn alloy instead of pure In in order to ensure In atoms to be distributed uniformly in the substrate; nickel was chosen to consume the excess indium and form a high-temperature alloy of Ni₃ln. The lowest specific contact resistivity ( _c) of (1.5 ± 0.5) × 10^–6 cm² measured by the Transmission Line Method (TLM) was obtained after annealing at 700°C for 10 s. Auger sputtering depth profile and Transmission Electron Microscopy (TEM) were used to analyze the interfacial microstructure. By correlating the interfacial microstructure to the electronical properties, In _x Ga_{1– x}As phases with a large fractional area grown epitaxially on GaAs were found to be essential for reduction of the contact resistance.This work was supported by the National Natural Sciences Foundation of China (NSFC)     

Abnormal optical changes with the formation of Pt nanoclusters

We have investigated the effect of the annealing time on the structural and abnormal optical changes of amorphous platinum oxide thin films on quartz glass substrate by dc magnetron sputtering by using a pure platinum target. With increasing the annealing time, the decomposition phenomenon of a-PtO_x and the formation of Pt nanoclusters were also observed. X-ray diffraction and Raman scattering measurements confirmed that the change derives from the formation of Pt nanoclusters due to the thermal decomposition. A transmittance measurement of a-PtO_x thin films annealed at 600 °C for 0–4 min demonstrated abnormal optical changes.     

Light emissions from a silicon nanocrystal thin film prepared by phase separation of hydrogen silsesquioxane

We report a facile method to prepare thin film of Si nanocrystals embedded SiO₂ (Si-NC:SiO₂) by annealing a photoresist of hydrogen silsesquioxane (HSQ) at 1100 °C in nitrogen via a phase separation process. The spatial density, photoluminescence intensity, the photoluminescence efficiency and electroluminescence intensity of Si-NC of the sample made from HSQ, or HSQ sample, were 15.0, 5.5, 1.5 and 7.9 times as large as those of the sample made by a traditional method of annealing SiO_x (1<x<2), or SiO_x sample, respectively. Meanwhile, the turn-on voltage of electroluminescence of the HSQ sample was only 3.8 eV, which was more than 2 times smaller than that of the SiO_x sample. The results of this work may find application in developing high brightness Si light sources.     

Oxygen content of superconducting Ba2YCu3O6.5+x

Single-phase non-stoichiometric Ba₂YCu₃O_6.5+x with –0.248x0.300 can be obtained by annealing prereacted samples at 0.01–1 bar oxygen partial pressure. Samples withx=–0.248 are semiconducting, samples at 0.239x0.300 are metallic withT _c increasing from 92.2 to 94.0 K for annealing in 0.02–1 bar O₂.     

Different characteristics of high-temperature superconducting infrared detectors with granular and epitaxial films

We describe the measurements of infrared detection in granular and epitaxial films of YBa₂Cu₃O_7– . The experimental frequency response measurements stated that the response voltage of detector for epitaxial film decreased much more rapidly than that for granular film. Different relationship of infrared response and bias current for detectors from two types of films has been demonstrated. We attribute the descrapency to the characters of detectors associated with different types of film structures.     

Effects of x and R3+ on the luminescent properties of Eu3+ in nanocrystalline YVxP1-xO4:Eu3+ and RVO4:Eu3+ thin-film phosphors

Using inorganic oxides and salts instead of alkoxides as the main starting materials, we prepared nanocrystalline YV_xP_1-xO₄:Eu³⁺ and RVO₄:Eu³⁺ (0x1; R=Y,La,Gd) thin-film phosphors by the Pechini sol–gel dip-coating process. The resulting films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), and photoluminescence excitation and emission spectra as well as luminescence decay. The results of XRD showed that a solid solution formed in the YV_xP_1-xO₄:Eu³⁺ film series from x=0 to x=1 with zircon structure. The same structure also held for the GdVO₄:Eu³⁺ film, but the LaVO₄:Eu³⁺ film crystallized with a different structure, monazite. AFM and SEM studies revealed that the phosphor films consisted of spherical particles ranging from 90 to 400 nm depending on the film compositions. With the increase of x values in YV_xP_1-xO₄:Eu³⁺ films, the integrated emission intensity and the red (⁵D₀–⁷F₂)-to-orange (⁵D₀–⁷F₁) intensity ratio of Eu³⁺ increase due to the increased energy-transfer probability from VO₄^3- to Eu³⁺ and the increased polarizability of the surrounding oxygen ions, respectively. The x values also have an influence on the decay behavior of Eu³⁺. The YVO₄:Eu³⁺ and GdVO₄:Eu³⁺ films showed very similar luminescence properties due to their same crystal structures. However, the LaVO₄:Eu³⁺ film exhibited a much different emission property from those of the YVO₄:Eu³⁺ and GdVO₄:Eu³⁺ films due to the structural effects. PACS 73.63.Bd; 78.55.Hx; 78.66.Nk; 81.15.Lm; 81.20.Fw