Chemical modification of zeolite beta surface and its effect on gas permeation of mixed matrix membrane

Chemical modification of zeolite beta (BEA) with a series of organosilane compounds [R(CH₃)_nSiX_(3‐n), where X is a chloro or alkoxy group with n = 0 and 2, and R is an alkyl chain varying from CH₃ to C₁₈H₃₇] was investigated. The results of FT‐IR and ²⁹Si CP/MAS NMR indicated that the alkylsilyl species were covalently anchored onto the BEA surface. Grafting density of the alkylsilyl species was determined by CHN elemental analysis and thermogravimetric analysis (TGA). Evidently, it can be adjusted by varying the reaction time and organosilane concentration. The reaction kinetics was found to resemble the kinetics of the well‐known monolayer formation, i.e. SAMs. The kinetic plot illustrated two distinct regions, a rapid attachment followed by a gradual increase of grafting density. The degradation temperature at maximum rate (T_max) of the surface‐grafted BEA was observed in the range of 440–460°C. The modified BEA showed surface hydrophobic characteristic by having a strong affinity to the non‐polar n‐heptane. Good particle distribution and strong interfacial adhesion were observed in the mixed matrix membranes of the BEA grafted with C₃H₇ to C₁₈H₃₇. The grafted chain length was found to have an effect on gas permeability. Carbon dioxide, oxygen, and ethylene permeabilities of the membranes containing the unmodified BEA were comparable to those of the CH₃Si‐grafted BEA. Interestingly, the membranes containing the BEA grafted with C₃H₇ to C₁₈H₃₇ species showed enhancement of the carbon dioxide permeability. Affinity of the long alkyl chain to carbon dioxide probably caused the increase of carbon dioxide permeability. Copyright © 2008 John Wiley & Sons, Ltd.     

Five solvates of a multicomponent pharmaceutical salt formed by berberine and diclofenac

A multicomponent pharmaceutical salt formed by the isoquinoline alkaloid berberine (5,6‐dihydro‐9,10‐dimethoxybenzo[g]‐1,3‐benzodioxolo[5,6‐a]quinolizinium, BBR) and the nonsteroidal anti‐inflammatory drug diclofenac {2‐[2‐(2,6‐dichloroanilino)phenyl]acetic acid, DIC} was discovered. Five solvates of the pharmaceutical salt form were obtained by solid‐form screening. These five multicomponent solvates are the dihydrate (BBR–DIC·2H₂O or C₂₀H₁₈NO₄⁺·C₁₄H₁₀Cl₂NO₂^?·2H₂O), the dichloromethane hemisolvate dihydrate (BBR–DIC·0.5CH₂Cl₂·2H₂O or C₂₀H₁₈NO₄⁺·C₁₄H₁₀Cl₂NO₂^?·0.5CH₂Cl₂·2H₂O), the ethanol monosolvate (BBR–DIC·C₂H₅OH or C₂₀H₁₈NO₄⁺·C₁₄H₁₀Cl₂NO₂^?·C₂H₅OH), the methanol monosolvate (BBR–DIC·CH₃OH or C₂₀H₁₈NO₄⁺·C₁₄H₁₀Cl₂NO₂^?·CH₃OH) and the methanol disolvate (BBR–DIC·2CH₃OH or C₂₀H₁₈NO₄⁺·C₁₄H₁₀Cl₂NO₂^?·2CH₃OH), and their crystal structures were determined. All five solvates of BBR–DIC (1:1 molar ratio) were crystallized from different organic solvents. Solvent molecules in a pharmaceutical salt are essential components for the formation of crystalline structures and stabilization of the crystal lattices. These solvates have strong intermolecular O…H hydrogen bonds between the DIC anions and solvent molecules. The intermolecular hydrogen‐bond interactions were visualized by two‐dimensional fingerprint plots. All the multicomponent solvates contained intramolecular N—H…O hydrogen bonds. Various π–π interactions dominate the packing structures of the solvates.     

Surface modification of ethylene‐co‐tetrafluoroethylene films by remote plasmas

The surface modifications of ethylene‐co‐tetrafluoroethylene (ETFE) surfaces by six plasmas (direct H₂, Ar, and O₂ plasmas and remote H₂, Ar, and O₂ plasmas) were investigated with two questions in mind: (1) what plasma could effectively modify ETFE surfaces and (2) which of the CF₂? CF₂ and CH₂? CH₂ components in ETFE was selectively modified? The plasma exposure led to a weight loss from the ETFE surfaces and changes in the chemical composition on ETFE surfaces. The weight‐loss rate showed a strong dependence on what plasma was used for the modification. The remote H₂ plasma led to the lowest rate of weight loss in the six plasma exposures, and the direct O₂ plasma led to the highest rate of weight loss. During exposure to the plasmas, defluorination occurred, and two new C_1s components [? CH₂? CHF? CH₂? and ? CH₂? CH(O? R)? CF_x? , and ? CH₂? CHF? CF₂? , ? CH₂? C(O)? CF_x? , and ? CF_x? C(O)? O? ] were formed on the modified ETFE surfaces. Defluorination was strongly influenced by what plasma was used for the modification. The remote H₂ and Ar plasmas showed high defluorinations of 55 and 51%, respectively. The remote O₂ plasma showed a low defluorination of only 25%. Conclusively, the remote H₂ and Ar plasma exposure effectively modified ETFE surfaces. With the exposure of these surfaces to the remote H₂ plasma, the CF₂? CF₂ component was predominantly modified, rather than the CH₂? CH₂ component. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 2871–2882, 2002     

Alkyl Monolayer Passivated Metal–Semiconductor Diodes: 2: Comparison with Native Silicon Oxide

To understand the electrical properties at passivated metal–semiconductor interfaces, two types of mercury–insulator–silicon (n‐type) junctions, Hg|C₁₀H₂₁? Si and Hg|SiO₂? Si, were fabricated and their current–voltage and capacitance–voltage characteristics compared. Both of them exhibited near‐ideal rectifying characteristics with an excellent saturation current at reverse bias, which is in contrast to the previously reported ohmic behavior of an unmodified mercury–silicon junction. The experimental results also indicated that the n‐decyl monolayer passivated junction possesses a higher effective barrier height, a lower ideality factor (that is, closer to unity), and better reproducibility than that of native silicon oxide. In addition, the dopant density and build‐in potential, extracted from capacitance–voltage measurements of these passivated mercury–silicon junctions, revealed that alkyl monolayer derivatization does not alter the intrinsic properties of the silicon substrate. The calculated surface state density at the alkyl monolayer|silicon interface is lower than that of the silicon oxide|silicon interface. The present study increases the possibility of using advanced organic materials as ultrathin insulator layers for miniaturized, silicon‐based microelectronic devices.     

Detailed Structural Examinations of Covalently Immobilized Gold Nanoparticles onto Hydrogen‐Terminated Silicon Surfaces

The modification of flat semiconductor surfaces with nanoscale materials has been the subject of considerable interest. This paper provides detailed structural examinations of gold nanoparticles covalently immobilized onto hydrogen‐terminated silicon surfaces by a convenient thermal hydrosilylation to form Si? C bonds. Gold nanoparticles stabilized by ω‐alkene‐1‐thiols with different alkyl chain lengths (C₃, C₆, and C₁₁), with average diameters of 2–3 nm and a narrow size distribution were used. The thermal hydrosilylation reactions of these nanoparticles with hydrogen‐terminated Si(111) surfaces were carried out in toluene at various conditions under N₂. The obtained modified surfaces were observed by high‐resolution scanning electron microscopy (HR‐SEM). The obtained images indicate considerable changes in morphology with reaction time, reaction temperature, as well as the length of the stabilizing ω‐alkene‐1‐thiol molecules. These surfaces are stable and can be stored under ambient conditions for several weeks without measurable decomposition. It was also found that the aggregation of immobilized particles on a silicon surface occurred at high temperature (> 100 °C). Precise XPS measurements of modified surfaces were carried out by using a Au–S ligand‐exchange technique. The spectrum clearly showed the existence of Si? C bonds. Cross‐sectional HR‐TEM images also directly indicate that the particles were covalently attached to the silicon surface through Si? C bonds.     

Disilynes. III [1] A Relatively Stable Disilyne RSi≡SiR (R = SiMe(SitBu3)2)

The disilyne R**Si≡SiR** (R** = SiMe(SitBu₃)₂), prepared as the first isolable and realtively stable silicon compound with a SiSi triple bond two years ago by dehalogenation of trans‐R**ClSi=SiClR** with LiC₁₀H₈ in thf at ‐78 °C (calc.: Si≡Si distance 2.072Å, Si‐Si≡Si bond angle 148°), forms with CH₂=CH₂ a [2+2] and with CH₂=CH‐CH=CH₂ a [2+4] cycloadduct. The ethene adduct takes up oxygen very easily with change of the Si=Si group into a SiOSiO ring with formation of R**Si(μ‐O)(μ‐O)(μ‐C₂H₄)SiR**. By heating the disilyne in heptane to ca. 50 °C in the presence of traces of thf it transforms into a monoxide of the ethene adduct with formation of R**Si(μ‐O)(μ‐C₂H₄)SiR**. In thf, the disilyne rearranges at r.t. and below by migration of a SitBu₃ group with formation of a silyl substituted cyclotrisilene. X‐ray structure determinations of the ethene adduct and its mono‐ and dioxide are presented.     

Interfacial Water Structure in Langmuir Monolayer and Gibbs Layer Probed by Sum Frequency Generation Vibrational Spectroscopy

Langmuir monolayer and Gibbs layer exhibit surface‐active properties and it can be used as simple model systems to investigate the physicochemical properties of biological membranes. In this report, we presented the OH stretching vibration of H₂O in the 4′′‐n‐pentyl‐4‐cyano‐p‐terphenyl (5CT), nonadecanenitrile (C₁₈CN) Langmuir monolayer and compared them with CH₃CN Gibbs layer at the air/water interface with polarization SFG‐VS. This study demonstrated that the hydrogen bond network is different in the Langmuir monolayer of 5CT, C₁₈CN from CH₃CN Gibbs layer at the air/water interface which showed two different water structures on the different surface layer. The results provided a deeper insight into understanding the hydrogen bond on the interfaces.     

Kinetics and mechanism associated with the reactions of hydroxyl radicals and of chlorine atoms with 1‐propanol under near‐tropospheric conditions between 273 and 343 K

Rate constants for the reactions of OH radicals and Cl atoms with 1‐propanol (1‐C₃H₇OH) have been determined over the temperature range 273–343 K by the use of a relative rate technique. The value of k(Cl + 1‐C₃H₇OH) = (1.69 ± 0.19) × 10^?12 cm³ molecule^?1 s^?1 at 298 K and shows a small increase of 10% between 273 and 342 K. The value of k(OH + 1‐C₃H₇OH) increases by 14% between 273 and 343 K with a value of (5.50 ± 0.55) × 10^?12 cm³ molecule^?1 s^?1 at 298 K, and further when combined with a single independent experimentally determined value at 753 K gives k(OH + 1‐C₃H₇OH) = 4.69 × 10^?17T^1.8 exp(422/T) cm³ molecule^?1 s^?1, which fits each data point to better than 2%. Two well‐established structure–activity relationships for H abstraction by OH radicals give accurate predictions of the rate constant for OH + 1‐C₃H₇OH, provided the β‐CH₂ group is given an increased reactivity of a factor of about 2 over that for the structurally equivalent CH₂ group in alkanes at 298 K. A quantitative product analysis was carried out at 298 K for the Cl‐initiated photooxidation of 1‐C₃H₇OH, using both FTIR and gas chromatography. HCHO, CH₃CHO, and C₂H₅CHO were the only major organic primary products observed, although HCOOH was found in much smaller amounts as a secondary product. A key characteristic of the analysis was that the initial values of the product ratio [CH₃CHO]/[C₂H₅CHO] were effectively constant for NO pressures between 0.15 and 0.3 Torr, but fell by about 35% as the pressure fell to 0.0375 Torr. From a detailed consideration of the mechanism for the oxidation, it is suggested that C₂H₅CHO, CH₃CHO (+HCHO), and 3 molecules of HCHO are formed uniquely from CH₃CH₂CHOH, CH₃CHCH₂OH, and CH₂CH₂CH₂OH radicals, respectively. On this basis, use of the product yields gives the branching ratios of 56, 30, and 14% for Cl atom reaction at the α‐, β‐, and γ‐C? H positions in 1‐C₃H₇OH at 298 K. Given the very low temperature coefficients involved, little change will occur over tropospheric temperature ranges. © 2001 John Wiley & Sons, Inc. Int J Chem Kinet 34: 110–121, 2002     

Tailoring the wettability of TiO2 nanotube layers

Self-organized TiO₂ nanotube layers were grown on Ti by electrochemical anodization. As prepared, these layers showed a super-hydrophilic wetting behaviour. When modified with organic molecules, octadecylsilane (C₁₈H₃₇SiH₃) or octadecylphosphonic acid (C₁₈H₃₇PO(OH)₂), the layers show a super-hydrophobic behaviour. We demonstrate how the tubular geometry of the TiO₂ layers combined with UV induced decomposition of the organic monolayers (SAM) can be used to adjust the surface wetting properties to any desired degree from super-hydrophobic to super-hydrophilic.     

Synthesis,Structure, and Fluxionality of Strained Hypercoordinate Silicon‐Bridged [1]Ferrocenophanes

The first hypercoordinate sila[1]ferrocenophanes [fcSiMe(2‐C₆H₄CH₂NMe₂)] ( 5 a ) and [fcSi(CH₂Cl)(2‐C₆H₄CH₂NMe₂)] ( 5 b ) (fc=(η⁵‐C₅H₄)Fe(η⁵‐C₅H₄)) were synthesized by low‐temperature (?78 °C) reactions of Li[2‐C₆H₄CH₂NMe₂] with the appropriate chlorinated sila[1]ferrocenophanes ([fcSiMeCl] ( 1 a ) and [fcSi(CH₂Cl)Cl] ( 1 d ), respectively). Single‐crystal Xray diffraction studies revealed pseudo‐trigonal bipyramidal structures for both 5 a and 5 b , with one of the shortest reported Si???N distances for an sp³‐hybridized nitrogen atom interacting with a tetraorganosilane detected for 5 a (2.776(2) Å). Elongated Si? C_ipso bonds trans to the donating NMe₂ arms (1.919(2) and 1.909(2) Å for 5 a and 5 b , respectively) were observed relative to both the non‐trans bonds ( 5 a : 1.891(2); 5 b : 1.879(2) Å) and the Si? C_ipso bonds of the non‐hypercoordinate analogues ([fcSiMePh] ( 1 b ): 1.879(4), 1.880(4) Å; [fcSi(CH₂Cl)Ph] ( 1 e ): 1.881(2), 1.884(2)). Solution‐state fluxionality of 5 a and 5 b , suggestive of reversible coordination of the NMe₂ group to silicon, was demonstrated by means of variable‐temperature NMR studies. The ΔG^≠ of the fluxional processes for 5 a and 5 b in CD₂Cl₂ were estimated to be 35.0 and 37.6 kJ mol^?1, respectively (35.8 and 38.3 kJ mol^?1 in [D₈]toluene). The quaternization of 5 a and 5 b by MeOTf, to give [fcSiMe(2‐C₆H₄CH₂NMe₃)][OTf] ( 7 a‐ OTf) and [fcSi(CH₂Cl)(2‐C₆H₄CH₂NMe₃)][OTf] ( 7 b‐ OTf), respectively, supported the reversibility of NMe₂ coordination at the silicon center as the source of fluxionality for 5 a and 5 b . Surprisingly, low room‐temperature stability was detected for 5 b due to its tendency to intramolecularly cyclize and form the spirocyclic [fcSi(cyclo‐CH₂NMe₂CH₂C₆H₄)]Cl ( 9 ‐Cl). This process was observed in both solution and the solid state, and isolation and Xray characterization of 9 ‐Cl was achieved. The model compound, [Fc₂Si(2‐C₆H₄CH₂NMe₂)₂] ( 8 ), synthesized through reaction of [Fc₂SiCl₂] with two equivalents of Li[2‐C₆H₄CH₂NMe₂] at ?78 °C, showed a lack of hypercoordination in both the solid state and in solution (down to ?80 °C). This suggests that either the reduced steric hindrance around Si or the unique electronics of the strained sila[1]ferrocenophanes is necessary for hypercoordination to occur.     

Thermally Induced Silane Dehydrocoupling on Silicon Nanostructures

Organic trihydridosilanes can be grafted to hydrogen‐terminated porous Si nanostructures with no catalyst. The reaction proceeds efficiently at 80 °C, and it shows little sensitivity to air or water impurities. The modified surfaces are stable to corrosive aqueous solutions and common organic solvents. Octadecylsilane H₃Si(CH₂)₁₇CH₃, and functional silanes H₃Si(CH₂)₁₁Br, H₃Si(CH₂)₉CH=CH₂, and H₃Si(CH₂)₂(CF₂)₅CF₃ are readily grafted. When performed on a mesoporous Si wafer, the perfluoro reagent yields a superhydrophobic surface (contact angle 151°). The bromo‐derivative is converted to azide, amine, or alkyne functional surfaces via standard transformations, and the utility of the method is demonstrated by loading of the antibiotic ciprofloxaxin (35 % by mass). When intrinsically photoluminescent porous Si films or nanoparticles are used, photoluminescence is retained in the grafted products, indicating that the chemistry does not introduce substantial nonradiative surface traps.     

Towards perfunctionalized dodecahedranes--en route to C20 fullerene

“One‐pot” substitution of the twenty hydrogen atoms in pentagonal dodecahedrane (C₂₀H₂₀) by OH, F, Cl, and Br atoms is explored. Electrophilic insertion of oxygen atoms with DMDO and TFMDO as oxidizing reagents ended, far off the desired C₂₀(OH)₂₀, in complex polyol mixtures (up to C₂₀H₁₀(OH)₁₀ decols, a trace of C₂₀H(OH)₁₉?). Perfluorination was successful in a NaF matrix but (nearly pure) C₂₀F₂₀ could be secured only in very low yield. “Brute‐force” photochlorination (heat, light, pressure, time) provided a mixture of hydrogen‐free, barely soluble C₂₀Cl₁₆ dienes in high yield and C₂₀Cl₂₀ as a trace component. Upon electron‐impact ionization of the C₂₀Cl₁₆ material sequential loss of the chlorine atoms was the major fragmentation pathway furnishing, however, only minor amounts of chlorine‐free C₂₀⁺ ions. “Brute‐force” photobrominations delivered an extremely complex mixture of polybromides with C₂₀HBr₁₃ trienes as the highest masses. The MS spectra exhibited exclusive loss of the Br substituents ending in rather intense singly, doubly, and triply charged C₂₀H_4–0^+(2+)(3+) ions. The insoluble ～C₂₀HBr₁₃ fraction (C₂₀Br₁₄ trienes as highest masses) obtained along a modified bromination protocol, ultimately allowed the neat mass selection of C₂₀^? ions. The C₂₀Cl₁₆ dienes and C₂₀H_0–3Br_14–12 tri‐/tetraenes, in spite of their very high olefinic pyramidalization, proved resistant to oxygen and dimerization (polymerization) but added CH₂N₂ smoothly. Dehalogenation of the respective cycloaddition products through electron‐impact ionization resulted in C_22–24H_4–8⁺⁽²⁺⁾ ions possibly constituting bis‐/tris‐/tetrakis‐methano‐C₂₀ fullerenes or partly hydrogenated C₂₂, C₂₃, and C₂₄ cages.     

Radiative Striations of Spin-Coating Films: Surface Roughness Measurement and in-situ Observation

Silica gel films were prepared by spin-coating from Si(OC₂H₅)₄-HNO₃-H₂O-ROH solutions and heated at 200°C where ROH = CH₃OH, C₂H₅OH, CH₃OC₂H₄OH and CH₃CH(OH)CH₂OH. Striations were observed with an optical microscope, and quantitatively evaluated by surface roughness measurement. A decrease in height and an increase in spacing of the striations were observed when alcohols of high boiling points were used. However, even when the boiling point of the alcohols was high, an evolution of the striations did occur on spin-coating films, which disappeared while keeping the film in the ambient atmosphere. Convections, which might be the source of the striations, were observed in sol layers placed on a stationary substrate irrespective of the boiling point of the alcohols.     

Syntheses and structures of four new mixed‐amide phosphoric triamides

Phosphoric triamides have extensive applications in biochemistry and are also used as O‐donor ligands. Four new mixed‐amide phosphoric triamide structures, namely rac‐N‐tert‐butyl‐N′,N′′‐dicyclohexyl‐N′′‐methylphosphoric triamide, C₁₇H₃₆N₃OP, (I), rac‐N,N′‐dicyclohexyl‐N′‐methyl‐N′′‐(p‐tolyl)phosphoric triamide, C₂₀H₃₄N₃OP, (II), N,N′,N′′‐tricyclohexyl‐N′′‐methylphosphoric triamide, C₁₉H₃₈N₃OP, (III), and 2‐[cyclohexyl(methyl)amino]‐5,5‐dimethyl‐1,3,2λ⁵‐diazaphosphinan‐2‐one, C₁₂H₂₆N₃OP, (IV), have been synthesized and studied by X‐ray diffraction and spectroscopic methods. Structures (I) and (II) are the first diffraction studies of acyclic racemic mixed‐amide phosphoric triamides. The P—N bonds resulting from the different substituent –N(CH₃)(C₆H₁₁), (C₆H₁₁)NH–, 4‐CH₃‐C₆H₄NH–, (tert‐C₄H₉)NH– and –NHCH₂C(CH₃)₂CH₂NH– groups are compared, along with the different molecular volumes and electron‐donor strengths. In all four structures, the molecules form extended chains through N—H…O hydrogen bonds.     

New alkylated and perfluoroalkylated phosphonic acids: Synthesis, adhesive and water-repellent properties on aluminum substrates

This paper describes the synthesis of phosphonic acids (R-S-(CH₂)₂-PO(OH)₂) containing a perfluoroalkylated chain (R = C₆F₁₃-(CH₂)₂, C₈F₁₇-(CH₂)₂) or an alkyl group (R = C₁₂H₂₅, C₁₈H₃₇). These compounds, obtained in excellent yield by telomerization of vinyl phosphonic acid in the presence of alkylated or perfluorinated mercaptans used as transfer agents, were characterized by ¹H, ¹⁹F and ³¹P nuclear magnetic resonance. Thermal characterization by differential scanning calorimetry (DSC) showed the presence of mesophases for compounds containing C₈F₁₇ and C₁₈H₃₇ end groups. A lamellar structure with a layered or bilayered organization was identified by small angle X-ray scattering (SAXS). Adhesion of these compounds on aluminum surfaces is improved by the presence of phosphonic groups. Hydrophobic properties of coated aluminum surfaces are enhanced by fluorinated groups.     

A New Approach to the Design of Neutral 10‐C‐5 Trigonal‐Bipyramidal Carbon Compounds: A “π‐Electron Cap” Effect

DFT (B3LYP, M06‐2X) and MP2 methods are applied to the design of a wide series of the potentially 10‐C‐5 neutral compounds based on 6‐azabicyclotetradecanes: XC¹(YCH₂CH₂CH₂)₃N 1 – 3 , XC¹(YC₆H₄CH₂)₃N 4 – 6 , XC¹[Y(tBuC₆H₃)CH₂]₃N 7 – 9 and carbatranophanes 10 – 25 (X=Me, F, Cl; Y=O, NH, CH₂, SiH₂; Z=O, CH₂, (CH₂)₂, (CH₂)₃). Carbatranophanes 10 – 25 are characterized by a sterical compression of their axial 3c–4e XC¹←N fragment with respect to that in the parent molecules 4 – 6 . A magnitude of the revealed effect depends on a valence surrounding of the central carbon atom C¹, the size and the nature of the side chains (Z) that link the “π‐electron cap” with a tetradecane backbone. This circumstance allowed us to obtain 10‐C‐5 structures with the configuration of the bonds around the C¹ atom, which corresponds to practically an ideal trigonal bipyramid. In these compounds, the values of the covalence ratio χ of approximately 0.6 for the coordination C¹←N contacts with a covalent contribution (atoms in molecules (AIM) and natural bond orbital (NBO)) are record in magnitude. These values lie close to a low limit of the interval of the χ_Si←D change (0.6–0.9) being characteristic of the dative and ionic‐covalent (by nature) Si←D bond (D=N, O) in the known 10‐Si‐5 silicon compounds.     

The Reaction of Molybdenum with 2,3-Dihydroxynaphthalene

[H2N（CH2）3NH312[MoO2（C10H6O2）2] （1） was synthesized by the 2,3-dihydroxynaphthalene in the mixed solvent of CH3OH, CH3CN reaction of （n-Bu4N）4[Mo8O26] with and 1,3-propanediarnine. （C5HllN2）2- [HeN（CH2）3NH2][MoO2（CloH6O2）2] （2） was obtained by the reaction of Na2MoO4.2H20 with 2,3-dihydroxynaphthalene in the same solvent above. Both of the complexes possess complex anion [Mo（VI）O2（OC10H6O）2]^2- which shows pseudo-octahedrally coordinated fashion, while the counterions are two protonated 1,3-propanediamine in complex 1 and （CsH11N2）^＋ in complex 2. （C5H11N2）＋ is the byproduct of reaction 2, which results from combination of acetonitrile with 1,3-propanediamine. Packing diagrams of the two complexes are also different. There is anti-parallel-aligned-double-meso-bilayer unit in complex 1. However there are four chiral anions arranged in anticlockwise orientation in complex 2.     

Forming Lipid Bilayer Membrane Arrays on Micropatterned Polyelectrolyte Film Surfaces

A novel method of forming lipid bilayer membrane arrays on micropatterned polyelectrolyte film surfaces is introduced. Polyelectrolyte films were fabricated by the layer‐by‐layer technique on a silicon oxide surface modified with a 3‐aminopropyltriethoxysilane (APTES) monolayer. The surface pK_a value of the APTES monolayer was determined by cyclic voltammetry to be approximately 5.61, on the basis of which a pH value of 2.0 was chosen for layer‐by‐layer assembly. Micropatterned polyelectrolyte films were obtained by deep‐UV (254 nm) photolysis though a mask. Absorbed fluorescent latex beads were used to visualize the patterned surfaces. Lipid bilayer arrays were fabricated on the micropatterned surfaces by immersing the patterned substrates into a solution containing egg phosphatidylcholine vesicles. Fluorescence recovery after photobleaching studies yielded a lateral diffusion coefficient for probe molecules of 1.31±0.17 μm² s^?1 in the bilayer region, and migration of the lipid NBD PE in bilayer lipid membrane arrays was observed in an electric field.     

Exploring the Dual Characteristics of CH3OH Adsorption to Metal Atomic Structures on Si (111)-7 × 7 Surface

Metal atoms were deposited on an Si (111)-7 × 7 surface, and they were adsorbed with alcohol gases (CH₃OH/C₂H₅OH/C₃H₇OH). Initially, C_nH_2n+1OH adsorption was simply used as an intermediate layer to prevent the chemical reaction between metal and Si atoms. Through scanning tunneling microscopy (STM) and a mass spectrometer, the C_nH_2n+1OH dissociation process is further derived as the construction of a surface quasi-potential with horizontal and vertical directions. With the help of three typical metal depositions, the surface characteristics of CH₃OH adsorption are more clearly presented in this paper. Adjusting the preheating temperature, the difference of thermal stability between CH₃O^– and H⁺ could be obviously derived in Au deposition. After a large amount of H⁺ was separated, the isolation characteristic of CH₃O^– was discussed in the case of Fe deposition. In the process of building a new metal-CH₃O^–-H⁺ model, the dual characteristics of CH₃OH were synthetically verified in Sn deposition. CH₃O^– adsorption is prone to influencing the interaction between the metal deposition and substrate surface in the vertical direction, while H⁺ adsorption determines the horizontal behavior of metal atoms. These investigations lead one to believe that, to a certain extent, the formation of regular metal atomic structures on the Si (111)-7 × 7-CH₃OH surface is promoted, especially according to the dual characteristics and adsorption models we explored.     

Transport Processes at α‐Quartz–Water Interfaces: Insights from First‐Principles Molecular Dynamics Simulations

Car–Parrinello molecular dynamics (CP–MD) simulations are performed at high temperature and pressure to investigate chemical interactions and transport processes at the α‐quartz–water interface. The model system initially consists of a periodically repeated quartz slab with O‐terminated and Si‐terminated (1000) surfaces sandwiching a film of liquid water. At a temperature of 1000 K and a pressure of 0.3 GPa, dissociation of H₂O molecules into H⁺ and OH^? is observed at the Si‐terminated surface. The OH^? fragments immediately bind chemically to the Si‐terminated surface while Grotthus‐type proton diffusion through the water film leads to protonation of the O‐terminated surface. Eventually, both surfaces are fully hydroxylated and no further chemical reactions are observed. Due to the confinement between the two hydroxylated quartz surfaces, water diffusion is reduced by about one third in comparison to bulk water. Diffusion properties of dissolved SiO₂ present as Si(OH)₄ in the water film are also studied. We do not observe strong interactions between the hydroxylated quartz surfaces and the Si(OH)₄ molecule as would have been indicated by a substantial lowering of the Si(OH)₄ diffusion coefficient along the surface. No spontaneous dissolution of quartz is observed. To study the mechanism of dissolution, constrained CP–MD simulations are done. The associated free energy profile is calculated by thermodynamic integration along the reaction coordinate. Dissolution is a stepwise process in which two Si? O bonds are successively broken. Each bond breaking between a silicon atom at the surface and an oxygen atom belonging to the quartz lattice is accompanied by the formation of a new Si? O bond between the silicon atom and a water molecule. The latter loses a proton in the process which eventually leads to protonation of the oxygen atom in the cleaved quartz Si? O bond. The final solute species is Si(OH)₄.