共查询到20条相似文献,搜索用时 15 毫秒
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《Current Applied Physics》2015,15(6):739-747
The linear Hilbert phase mask or transform has found applications in image processing and spectroscopy. An optical version of the fractional Hilbert mask is considered here, comprising an imaging system with a circular, unobscured pupil in which a variable phase delay is introduced into one half of the pupil, split bilaterally.The radial Hilbert phase mask is also used in image processing and to produce optical vortices which have applications in optical tweezers and the detection of exoplanets.We subjected the fractional and radial Hilbert phase masks to Zernike function expansion in order to compute the image plane electromagnetic field distribution using Nijboer-Zernike theory. The Zernike functions form an orthogonal basis on the unit circle. The complex-valued Zernike expansion coefficients for these two phase masks were derived for use in the context of the Extended Nijboer-Zernike (ENZ) theory of image formation. The ENZ approach is of interest in that it allows a greater range of defocus to be dealt with, provides a simple means of taking a finite source size into account and has been adapted to high Numerical Aperture (NA) imaging applications.Our image plane results for the fractional Hilbert mask were verified against a numerical model implemented in the commercial optical design and analysis code, Zemax®. It was found that the Nijboer-Zernike result converged to the Zemax® result from below as the number of Zernike terms in the expansion was increased. 相似文献
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波前编码系统采用在传统光学系统中加入相位板来扩大光学系统的景深而避免传统景深延拓技术的不利影响. 由于相位板的参数不可调, 整个系统的景深延拓扩展率也不能动态可调. 采用两相位板组合的方法可以有效克服这一点. 本文首先从光线差的角度提出了两三次相位板组合下的光线像差分布以及点扩散函数尺寸的具体关系表达式, 直观体现了系统的光线结构, 指出了光线结构和点扩散函数尺寸受两三次相位板的面型和相对位移量的影响. 其次采用稳相法从空间域给出了系统点扩散函数表达式, 依据点扩散函数的振荡性质给出了有效带宽表达式, 提出了点扩散函数在像面的位置会随两相位板面型参数以及相对于光瞳中心的位移量而发生平移. 最后利用菲涅耳积分给出两三次相位板任意面型参数和相对位移组合下的准确光学传递函数. 在得到的调制传递函数中直观体现出了面型参数和相对位移量对调制传递函数和相位传递函数以及有效带宽的影响, 并说明了此系统相位传递函数的非线性性质. 通过空间域与频率域相结合的方法分析验证了传统的两三次相位板组合具有景深可调和带宽可调的性质, 为设计可调谐波前编码系统提供了理论依据. 相似文献
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A new method to eliminate the security risk of the well-known interference-based optical cryptosystem is proposed. In this method, which is suitable for security authentication application, two phase-only masks are separately placed at different distances from the output plane, where a certification image (public image) can be obtained. To further increase the security and flexibility of this authentication system, we employ one more validation image (secret image), which can be observed at another output plane, for confirming the identity of the user. Only if the two correct masks are properly settled at their positions one could obtain two significant images. Besides, even if the legal users exchange their masks (keys), the authentication process will fail and the authentication results will not reveal any information. Numerical simulations are performed to demonstrate the validity and security of the proposed method. 相似文献
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菲涅耳非相干相关全息术(Fresnel incoherent correlation holography,FINCH)利用在空间光调制器(spatial light modulator,SLM)上加载双透镜模式对同一物点光分束自相干,并通过改变加载的相位因子得到不同的相移全息图.本系统利用SLM可分区编码调制特性,将FINCH成像中SLM上分三次加载的0°,120°,240°相位双透镜掩模各提取1/3组成一幅复合相移模式加载,并研究了三种相位分布方式对FINCH成像质量的影响.结果表明:三个相位在SLM上分布间隔越大,再现像越清晰.在此基础上,提出了一种新的掩模加载方式,在SLM加载透镜阵列,每一个相位因子对应一个双透镜,具有一个光轴.实验表明,通过这种加载方式,通过SLM后形成的三个相移图能够一次在电荷耦合器上记录,并且三个相移图不重叠,然后通过MATLAB编程计算将不同相移角度的全息图分别提取出来,通过三步相移计算合成一幅包含有物光波的复值全息图,最后通过数值再现算法重建待测样品.此系统可用于对光源相干性较低的实时成像系统,也为微小形变测量、动态物体的观测提供了新方法,为非相干数字全息术的发展提供了新思路. 相似文献
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The layer transfer process is one of the most promising methods for low-cost and highly-efficient solar cells, in which transferrable mono-crystalline silicon thin wafers or films can be produced directly from gaseous feed-stocks. In this work,we show an approach to preparing seeded substrates for layer-transferrable silicon films. The commercial silicon wafers are used as mother substrates, on which periodically patterned silicon rod arrays are fabricated, and all of the surfaces of the wafers and rods are sheathed by thermal silicon oxide. Thermal evaporated aluminum film is used to fill the gaps between the rods and as the stiff mask, while polymethyl methacrylate(PMMA) and photoresist are used as the soft mask to seal the gap between the filled aluminum and the rods. Under the joint resist of the stiff and soft masks, the oxide on the rod head is selectively removed by wet etching and the seed site is formed on the rod head. The seeded substrate is obtained after the removal of the masks. This joint mask technique will promote the endeavor of the exploration of mechanically stable,unlimitedly reusable substrates for the kerfless technology. 相似文献
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Emerging networks and applications require enormous data storage. Holographic techniques promise high-capacity storage, given resolution of a few remaining technical issues. In this paper, we propose a technique to overcome one such issue: mitigation of large magnitude peaks in the stored image that cause material saturation resulting in readout errors. We consider the use of ternary data symbols, with modulation in amplitude and phase, and use a phase mask during the encoding stage to reduce the probability of large peaks arising in the stored Fourier domain image. An appropriate mask is selected from a predefined set of pseudo-random masks by computing the Fourier transform of the raw data array as well as the data array multiplied by each mask. The data array or masked array with the lowest Fourier domain peak values is recorded. On readout, the recorded array is multiplied by the mask used during recording to recover the original data array. Simulations are presented that demonstrate the benefit of this approach, and provide insight into the appropriate number of phase masks to use in high capacity holographic data storage systems. 相似文献
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E. Caroli R. C. Butler G. Di Cocco P. P. Maggioli L. Natalucci A. Spizzichino 《Il Nuovo Cimento C》1984,7(6):786-804
Summary Coded-mask telescopes are presently considered as one of the best solutions for producing images of the sky in hard-X-ray
and γ-ray astronomy, because they can possess optimum signal-to-noise ratio (SNR), which is crucial in an energy range in
which the expected fluxes are generally low compared with the background. For a given field of the sky, the values of the
SNR, associated with each pixel of the reconstructed image, depend on both the mask design and the decoding technique employed.
The expressions for the SNR of a variety of replicated masks are derived for the cases of the inversion and the correlation
methods, in different conditions of background and source fluxes. For the inversion method, the SNR is found to be simply
inversely proportional to the square root of the trace of the matrix associated with the mask, but generally in the case of
the correlation method the SNR is limited by an additional systematic term due to the cross-talk between sources in the field
of view. The effect of this term can be avoided by choosing a uniformly redundant array pattern.
Paper presented at the 2° Convegno Nazionale di Fisica Cosmica, held at L'Aquila, 29 May–2 June 1984. 相似文献
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The effect of variations in defect printability must be considered in order to correctly evaluate mask defect inspection procedures.
Because of nonlinear transfer effects and strong dependence of printability on defect types, it is difficult to define the
boundary between real defect and false defect. To overcome this problem we developed a new algorithm for die-to-wafer-like
image (D-to-WI) inspection in real time. This inspection method compares the die (wafer image calculated from CAD data) with
the wafer-like image (WI) calculated from the mask image detected by the mask inspection system.
To precisely calculate WI in real time, we developed a new simulation-based software. Since the phase of a mask inspection
image cannot be measured, we introduce some assumptions regarding its phase. Moreover, we introduce some corrections for WI
such as adding a DC component and multiplying by a proper value. To calculate the die which realizes the desired image with
sufficient accuracy in real time, we also introduce a perturbation approach. We demonstrate numerically the possibility of
a new algorithm for D-to-WI inspection. We confirm that this technique of generating WI from a measured mask pattern is well
suited for attenuated phase shift masks (PSMs) and Cr binary masks. 相似文献
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For a mixture of target speech and noise in anechoic conditions, the ideal binary mask is defined as follows: It selects the time-frequency units where target energy exceeds noise energy by a certain local threshold and cancels the other units. In this study, the definition of the ideal binary mask is extended to reverberant conditions. Given the division between early and late reflections in terms of speech intelligibility, three ideal binary masks can be defined: an ideal binary mask that uses the direct path of the target as the desired signal, an ideal binary mask that uses the direct path and early reflections of the target as the desired signal, and an ideal binary mask that uses the reverberant target as the desired signal. The effects of these ideal binary mask definitions on speech intelligibility are compared across two types of interference: speech shaped noise and concurrent female speech. As suggested by psychoacoustical studies, the ideal binary mask based on the direct path and early reflections of target speech outperforms the other masks as reverberation time increases and produces substantial reductions in terms of speech reception threshold for normal hearing listeners. 相似文献
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Sophie Massou Igor Ozerov Kheya Sengupta Margrit Hanbücken 《Applied Surface Science》2009,256(2):395-398
We have used ordered anodic alumina membranes as masks to create large scale ordered arrays of either holes or chemical islands on silica. Regularly spaced holes were obtained by direct etching of silica/silicon or glass substrates through the membranes used as etching masks. To create an array of chemically functional islands, the membrane is first glued on the substrate using a soft polymer and subsequently the polymer is etched gently though the mask. Finally organo-silane molecules are deposited through the alumina/polymer hybrid mask and the mask is removed chemically leaving nanoislands on the substrate. We anticipate that this technique will be useful in future biological and biomedical applications. 相似文献
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By properly designing a phase pupil mask to modulate or encode the optical images and then digitally restoring them, one can greatly extend the depth of field and improve image quality. The original works done by Dowski and Cathey introduce the use of a cubic phase pupil mask to extend the depth of field. The theoretical and experimental researches all verified its effectiveness. In this paper, we suggest the use of an exponential phase pupil mask to extend the depth of field. This phase mask has two variable parameters for designing to control the shape of the mask so as to modulate the wave-front more flexible. We employ an optimization procedure based on the Fisher information metric to obtain the optimum values of the parameters for the exponential and the cubic masks, respectively. A series of performance comparisons between these two optimized phase masks in extending the depth of field are then done. The results show that the exponential phase mask provide slight advantage to the cubic one in several aspects. 相似文献
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We present the digital-division-mask technique for the first time to solve the problem of decline in transverse resolution, which is caused by using digital micro-mirror device (DMD) to make binary optical elements (BOEs). One high-frequency gray-tone mask can be divided into several low-frequency masks by fixed or variable low-frequency period sampling. And the superimposed lithography effect of these low-frequency masks in the spatial or temporal domain is the same as that of the original high-frequency gray-tone mask. The paper firstly analyzes the digital-division-mask technique in theory and describes the feasibility and advantages. Then taking the diffractive surface fabrication of refractive-diffractive hybrid lens as an example, we conclude that the digital-division-mask technique improves the edge sharpness of lithography pattern, and enhances the diffractive efficiency of BOEs by experiment. 相似文献
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《Current Applied Physics》2014,14(5):833-837
Synchrotron hard X-ray irradiation can be utilized in lithography processes to manufacture precise structures. Due to the difficulty of precise X-ray mask fabrication in hard X-ray lithography, this X-ray process has been used mainly to fabricate precise microstructures. In this study, a technology is proposed for fabricating novel multi-scale patterns that include submicron-scale structures using hard X-rays. The required X-ray masks for submicron-sized patterning are fabricated by a simple UV lithography process and sidewall metal deposition. Above all, thanks to the high penetration capability of hard X-rays with sub-nanometer wavelengths, it is possible to employ multiple masks to fabricate a variety of patterns. By combining each sub-micron X-ray mask with typical micro-sized X-ray masks, a unique X-ray lithography is performed, and various multi-scale structures are fabricated. The usefulness of the proposed technology is demonstrated by the realization of these structures. 相似文献
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Correction of a coherent image during KrF excimer laser ablation using a mask projection 总被引:1,自引:1,他引:0
Dong Sig Shin Jae Hoon Lee Jeong Suh To Hoon Kim 《Optics and Lasers in Engineering》2006,44(6):615-622
Using masks for laser ablation has proven useful in the fabrication of prototypes for the manufacturing of micro-fluidic devices. In this work, an excimer laser was used to engrave microscopic channels on the surface of polyethylene terephthalate (PET), which showed a high absorption ratio for an excimer laser beam with a wavelength of 248 nm. When 50 μm wide rectangular microscopic channels were made using a 500×500 μm square mask and a magnification ratio of 1/10, ditch-shaped defects were found at both corners. The calculation of the laser beam intensity showed that a coherent image in the PET specimen caused the defects. An analysis based on the Fourier diffraction theory enabled the prediction of a coherent shape at the image plane, as well as a diffracted beam between the mask and the image plane. The analysis also showed that the diameter of the aperture was a predominant factor toward the elimination of ditch-shaped defects in the rectangular microscopic channels on the PET produced by an excimer laser ablation. 相似文献
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A multiple-image cryptosystem is proposed based on the cascaded fractional Fourier transform. During an encryption procedure, each of the original images is directly separated into two phase masks. A portion of the masks is subsequently modulated into an interim mask, which is encrypted into the ciphertext image; the others are used as the encryption keys. Using phase truncation in the fractional Fourier domain, one can use an asymmetric cryptosystem to produce a real-valued noise-like ciphertext, while a legal user can reconstruct all of the original images using a different group of phase masks. The encryption key is an indivisible part of the corresponding original image and is still useful during decryption. The proposed system has high resistance to various potential attacks, including the chosen-plaintext attack. Numerical simulations also demonstrate the security and feasibility of the proposed scheme. 相似文献
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A two-stage laser ablation process is described, which initially generates a laser-light absorbing image from a conventional photolithographic mask via a UV-flood exposure step. For this purpose a colorless precursor of a dye, i.e., its leuco form, is imbedded into the polymer to be ablated as a dopant. For poly(methyl methacrylate) as such a polymer, triphenylmethanol, the leuco precursor for the corresponding triphenylmethyl dye represents a good choice for ablation with excimer lasers operating at the wavelength 351 nm. In this fashion conventional masks and exposure tools of UV-photolithography may be used in combination with laser ablation. The resulting images are characterized by a good contrast and reasonably sharp contours. The photochemical mechanism and additional aspects of this two-step process, which resembles the “portable conformal mask” approach of photolithography, are outlined. 相似文献