Penetration of plasma surface modification into porous media. III. Multiple samples exposed to CF4 and C2F4 low temperature cascade arc torch

The depth and possible mechanisms of the penetration of surface modification into porous media by a low temperature cascade are torch are investigated. Two different modes of such penetration (“flow controlled” and “diffusion controlled”) are evaluated. Three porous samples [stacks of 10 sheets of nonwoven fabrics of poly(ethylene terephthalate)each], placed at an axial distance of 24, 28, and 32 cm from the cascade are anode, are exposed to a low temperature cascade arc torch containing argon and CF₄ or C₂F₄, and surface properties of each of the sheets within treated porous samples are examined by ESCA. It is shown that interaction of chemically reactive species, created in the low temperature cascade arc torch, with the surface is not limited to the surface directly contacted by the torch. The flow controlled penetration is more pronounced for the outer layers, while diffusion controlled penetration is within the inner layers of the porous structure. Substantial differences in the fluorination effect of CF₄ (nonpolymer forming gas) and C₂F₄ (polymer forming gas) discharges for the second and third stacks are observed, that can be explained by the fact that the major effect of the CF₄ cascade arc torch treatment is based on the reaction of reactive species with the surface polymer molecules. The effect of C₂F₄ cascade arc torch treatment is based on the reactions of reactive species with polymers as well as reactions of reactive species themselves at the surface (plasma polymerization). Reactivity of the species created in C₂F₄ discharge is much higher compared to that created in CF₄ discharge, which is one of the major factors influencing penetration trends of low temperature cascade arc treatment into porous media. © 1995 John Wiley & Sons, Inc.     

Optical emission diagnostics in cascade arc plasma polymerization and surface modification processes

Optical Emission Spectroscopy (OES) was used to identify reactive species and their excitation states in low-temperature cascade arc plasmas of N₂, CF₄, C₂F₄, CH₄, and CH₃OH. In a cascade arc plasma, the plasma gas (argon or helium) was excited in the cascade arc generator and injected into a reactor in vacuum. A reactive gas was injected into the cascade arc torch (CAT) that was expanding in the reactor. What kind of species of a reactive gas, for example, nitrogen, are created in the reactor is dependent on the electronic energy levels of the plasma gas in the cascade arc plasma jet. OES revealed that no ion of nitrogen was found when argon was used as the plasma gas of which metastable species had energy less than the ionization energy of nitrogen. When helium was used, ions of nitrogen were found. While OES is a powerful tool to identify the products of the cascade arc generation (activation process), it is less useful to identify the reactive species that are responsible for surface modification of polymers and also for plasma polymerization. The plasma surface modification and plasma polymerization are deactivation processes that cannot be identified by photoemission, which is also a deactivation process. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 1583–1592, 1998     

Plasma fluorination of polystyrene

ESCA and contact-angle measurements were used to characterize the surfaces of polystyrene films exposed to SF₆, CF₄, and C₂F₆ plasmas. SF₆ plasmas cause loss of aromaticity in the polystyrene surface region via saturation of the phenyl ring and/or carbon-bond breakage and subsequent fluorination. C₂F₆ plasmas graft CF_x radicals directly to the polystyrene surface without necessarily destroying the aromaticity of the polymer. CF₄ plasmas appear to be intermediate in character between SF₆ and C₂F₆ plasmas.     

Does the thermal motion of macromolecules really influence the fluorine-atomic concentration of plasma-fluorinated polyolefin surfaces?

The relative fluorine-atomic concentrations and the abundance of CF_x functionalities from CF₄- and C₆F₆-RF-plasma treated polypropylene (PP) film surfaces were evaluated. Survey and high resolution (HR) ESCA data indicate that intense surface fluorination can be carried out, from both fluorine precursors, under relatively low power and treatment time conditions. However, it was found that the stability (under open laboratory conditions and under various solvent and temperature environments) of plasma implanted fluorine based groups significantly depend on the nature of plasma gases involved. Simulation of plasma induced molecular fragmentation, at different electron energy MS conditions, indicates the presence of a much higher fluorine atom concentration from a CF₄-plasma in comparison to a C₆F₆-plasma. It is suggested that fluorine atom mediated fragmentation of macromolecular backbones is probably responsible for the erosion of plasma fluorinated surfaces, rather than thermal motion induced burying processes.     

Surface fluorination of paper in CF4-RF plasma environments

Plasma-based technologies are an exciting alternative for cellulose andpaper modification. Barrier coatings and surface functionalization of celluloseenhances properties and creates new possibilities for cellulose-based products.A parallel plate radio frequency (RF)-plasma reactor was used to modify papersubstrates under discharge parameters such as power, time and pressure. Carbontetrafluoride RF-plasma treatment of paper caused intense fluorination and itwas demonstrated that the fluorination reaction mechanisms can be controlled bythe external plasma parameters. Fluorine contents as high as 51.3% (contactangle=147°) were obtained for the treated cellulose. It was shown that eventreatment times as low as 30 s can generate relative surface fluorineatomic concentrations as high as 30%. High resolution ESCA and ATR-FTIRanalysisindicated covalently bound CF_x functional groups with CF₄treatment. It was found that under certain experimental conditionssuper-hydrophobic paper surfaces are created by combining the high surfacefluorine atomic concentrations with specific plasma-generated surfacetopographies.     

Penetration of plasma surface modification. I. Cf4 and C2F4 glow discharge plasmas

Plasma treatment of a polymeric surface could involve at least three major mechanisms: (1) direct interaction of reactive species in the low-temperature plasma state with the surface (line of sight irradiation effect), and (2) chemical reactions of plasma-induced reactive species with the surface, and (3) reactions among reactive species and the surface (plasma polymerization). The first and the third effects are considered to be limited to the surfaces which directly contact with plasma (glow). The second effect is not limited to the surfaces that contact with plasma state but can penetrate beyond the plasma zone by diffusion. Using an assembly of fibers, of which only the top layer contacts with plasma (glow), the penetration of chemical changes caused by plasma exposure was investigated. Results indicate that the fluorination effect (incorporation of fluorine-containing moieties on the surface of polymeric substrate) penetrates through a considerable thickness of the assembly of fibers, depending on the porosity (gas permeability) of the system. Chemical reactions of plasma-induced (chemically) reactive but nonpolymerizing species with the substrate fibers seems to predominate. The direct interactions of energetic species, such as ions, electrons, and electronically excited species, with polymeric surfaces seems to play relatively minor roles in the plasma treatment investigated. The major role of plasma, in this case, seems to be creating such chemically reactive species. © 1994 John Wiley & Sons, Inc.     

Experimental Study of Capacitive RF <Emphasis Type="Italic">c</Emphasis>-C<Subscript>4</Subscript>F<Subscript>8</Subscript> Discharge with Synchrotron Vacuum Ultraviolet Photoionization Mass Spectrometry

Capacitive radio frequency (RF) discharge of c-C₄F₈ (octafluorocyclobutane) has been studied with synchrotron vacuum ultraviolet (SVUV) photoionization mass spectrometry (PIMS) at 4 Torr and 33.33 kHz. Various free radicals and reactive intermediates have been identified through measurement of photoionization mass spectra and photoionization efficiency (PIE) spectra. CF₂=CF₂ is main product in the plasma, indicating that the dissociation of c-C₄F₈ into CF₂=CF₂ is one of prominent reactions in the present experimental conditions. The observation of large species including C₅F₈, C₅F₁₀ and C₆F₁₀ is presented in our work. Besides, the dependences of the signals of neutral species in the discharge of c-C₄F₈ on RF power are presented in this paper.     

Surface modification of several carbon-based materials: comparison between CF4 rf plasma and direct F2-gas fluorination routes

Due to their extreme reactivity, fluorine and fluorinated gases may be used to modify the surface properties of numerous materials. In the following, the surface fluorination of some carbon-based compounds (graphite, graphitised carbon fibres, carbon blacks and elastomers) using CF₄ rf plasma technique and direct F₂-gas fluorination is proposed. From XPS studies, the different types of CF bonding obtained in the materials after treatment have been correlated either to the physico-chemical characteristics of the pristine material or to the experimental parameters of the fluorination. Reaction mechanisms are proposed.     

Preparation of chloropentafluoroethane from dichlorotetrafluoroethane - note 1.

Gaseous fluorination with hydrogen fluoride at atmospheric pressure of the two isomers CClF₂CClF₂ and CCl₂FCF₃ was carried out continuously on a chromic oxide based catalyst. The fluorinated derivative, obtained in a yield greater than 90%, was chloropentafluoroethane. Hexafluoroethane and an isomeric mixture of trichlorotrifluoroethane were obtained as by-products. The latter was recycled with unconverted C₂Cl₂F₄ for further fluorination. Both conversion of C₂Cl₂F₄ and selectivity to the formation of C₂ClF₅ were affected by temperature, contact time and molar ratio of the reagents. The catalytic activity of chromic oxide was adversely affected by small amounts of water in the hydrogen fluoride. A difference was also observed in the reactivity of the two isomersCCl₂FCF₃ and CClF₂OClF₂ The formation of C₂Cl₃F₃ as a by-product was due to the disproportionating activity of chromic oxide upon C₂Cl₂F₄.     

Plasma fluorination of polyolefins

ESCA and contact angle measurements were used to characterize the surfaces of Polyethylene and polypropylene films exposed to SF₆, CF₄, and C₂F₆ plasmas. None of these gases polymerized in the plasma. However, all plasma treatments grafted fluorinated functionalities directly to the polymer surfaces. SF₆ plasmas graft fluorine atoms to a polyolefin surface. CF₄ plasmas also react by a mechanism dominated by fluorine atoms, but with some contribution from CF_x-radical reactions. Although C₂F₆ does not polymerize, the mechanism of grafting is still dominated by the reactions of CF_x radicals. For all gases studied, the lack of polymerization is attributed to competitive ablation and polymerization reactions occurring under conditions of ion bombardment.     

Fluorination of alumino-silicate minerals: The example of lepidolite

The effect of fluorination on silicate and alumino-silicate minerals has been investigated, in particular on the lepidolite [K(Li,Al)₃ [Si₃AlO₁₀] (F,OH)₂] of the mica-type. The fluorination techniques included direct F₂-gas and cold radio-frequency-plasma involving c-C₄F₈ or O₂/CF₄ mixtures. The modifications of the surface properties have been followed mostly by XPS. Depending of the fluorination route used, either a reactive etching process involving M-F bonding occurs (direct F₂-gas; O₂-CF₄ rf-plasma), or a carbon fluoride deposition takes place (c-C₄F₈ rf-plasma).     

Fundamental aspect and behavior of saturated fluorocarbons in glow discharge in absence of potential source of hydrogen

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling-off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF₄ and C₂F₆, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc.     

Density Functional Study of Two Seven-Membered Unconventional Fullerenes C58F17CF3 and C58F18

The density functional method is used to study the structure, electronic properties, static linear polarizabilities, and optical absorption spectra of two seven‐membered unconventional fullerene derivatives C₅₈F₁₇CF₃ and C₅₈F₁₈. It is calculated that three sites chosen to locate the CF₃ are isoenergetic. The energy gaps of C₅₈F₁₈ and C₅₈F₁₇CF₃ are much larger than that of C₅₈, indicating the fluorination and trifluoromethylation of C₅₈ can remarkably enhance the kinetic stability. The density of states explore that the influence of CF₃ to the energy levels is mainly distributed in the energy range from ?10 to ?2 eV. However, when the CF₃ substitutes for F in C₅₈F₁₈, the bond lengths, energy gaps, static linear polarizabilities, and optical absorption spectra all show small variety.     

Obtainement of pentafluoroethane from dichlorotetrafluoroethane - Note I

Gaseous fluorination with hydrogen fluoride at atmospheric pressure of the two isomers CClF₂-CClF₂ and CF₃-CCl₂F was continuously carried out on a chromic oxide based catalyst. The fluorinated derivative, obtained at a selectivity higher than 90%, was pentafluorochloroethane. Hexafluoroethane and an isomeric mixture of trichlorotrifluoroethanes were obtained as byproducts. The latter were recycled to fluorination together with unconverted C₂Cl₂F₄. Both conversion of C₂Cl₂F₄ and selectivity to C₂ClF₅ were affected by temperature, contact time and molar ratio of the reagents.The catalytic activity of chromic oxide was adversely affected by small amounts of water in the hydrogen fluoride. A difference in reactivity between the two isomers CF₃-CCl₂F and CClF₂-CClF₂ was also observed.It was also observed that the byproduction of C₂Cl₃F₃ was due to the disproportionating activity of obromic oxide versus C₂Cl₂F₄.     

Applications of ESCA to polymer chemistry. XII. Structure and bonding in commercially produced fluorographites

A series of fluorinated graphites, Fluorographites, of varying fluorine content has been examined by ESCA, and the chemical shifts and relative intensities of the core electron lines yield a consistent picture of the compositions and structures in the surface regions of the materials. Fluorographites of composition (C₁F_0.81)_n to (C₁F_1.00)_n are fully fluorinated in the outermost ～40 Å and consist of a bulk structure composed of tertiary →CF groups with ? CF₂? groups at the prismatic edges of the fluorinated graphite layers. This is also the case for (C₁F_1.05)_n, but, in addition, some of the C? C bonds involving edge →CF carbons are broken and replaced by C? F bonds, giving a higher concentration of ? CF₂? groups at the outermost surfaces of the particles of this material. The ESCA data for (C₁F_0.25)_n are consistent with a structure comprising six-membered aromatic rings in which each ring carbon is attached to a →CF group acting as a bridge among three similar rings, with the C? F bonds alternately pointing up and down with respect to the plane defined by the carbon atoms. At the immediate surface the valence requirements of the carbon atoms at the prismatic edges of the graphite-like layers are satisfied by bonding with oxygen. This is also the apparent structure of (C₁F_0.37)_n, but in addition there exist discrete regions of composition (C₁F₁)_n distributed uniformly throughout this material. The Fluorographites (C₁F_0.34)_n, and (C₁F_0.40)_n, and (C₁F_0.63)_n consist of blocks of C₁F₁ stoichiometry and blocks of unreacted graphite. The presence of ? CF₂? groups and the complete absence of oxygen in the surface regions of these Fluorographites suggests that the prismatic edge sites are fully fluorinated. The inhomogeneous block-like structures of (C₁F_0.37)_n, (C₁F_0.37)_n, and (C₁F_0.34)_n, (C_1F0.40)_n, and (C₁F_0.63)_n, give rise to differential sample charging, resulting in apparent shifts in the binding energy scales between the spectral components originating from different regions of the samples. Such differential sample charging is also described for a number of mixtures of the Fluorographites and of graphite with the Fluorographites. It is pointed out that in view of these results it is necessary to exercise considerable caution in using the ESCA lines of an added compound as a reference in measuring core electron-binding energies.     

Catalytic Gas‐phase Fluorination of Hexachlorobutadiene to 1,2‐Dichlorotetrafluorocyclobutene over Cr/Zn‐based Catalysts

In this paper, the gas‐phase fluorination of hexachlorobutadiene (HCBD) to synthesize 1,2‐dichlorotetrafluorocyclobutene (DTB) was carried out over a series of Cr/M/Zn catalysts (M = Ni, Co, Cu, In, Al). The influence of prefluorination by different fluorinating agents (HF, 95%HF + 5%Cl₂, 95%HF + 5%O₂, CF₂O, CF₂Cl₂) on catalytic performance of Cr/Co/Zn sample was also investigated. The addition of prompters to the Cr/Zn catalyst improved remarkably its catalytic properties. The Cr/Ni/Zn catalyst exhibited the best catalytic activity (1.318 mmol/h/g) at 390 °C and the Cr/Co/Zn catalyst showed the best DTB selectivity (42.5%) at 350 °C. Compared to that of gaseous HF, the catalytic performance of the Cr/Co/Zn catalyst after treatment by HF + O₂ and CF₂O increased considerably, whereas for HF + Cl₂ and CF₂Cl₂ it showed little effect. In order to identify the different species (Cr─O, Cr─F, CrO _xF _y) present on catalysts’ surface and determine their exact role, these catalysts before and after the reaction were characterized by X‐ray photoelectron spectroscopy. It was found that the concentration of the various species was responsible for the activity and lifetime of catalysts. Moreover, a possible reaction route is proposed based upon the product distribution. The most feasible formation pathway of DTB proceeded via the cyclization of C₄Cl₄F₂ or C₄Cl₃F₃ to yield c‐C₄Cl₄F₂ and c‐C₄Cl₃F₃ followed by further the Cl/F exchange.     

Optical emission from tetrafluoromethane plasma and its relationship to surface modification of hexatriacontane

The optical emission from tetrafluoromethane plasma (2% argon included) has been studied by emission spectroscopy. The evolution ofCF ^*,CF ₂ ^* , andF emissions has been followed during the treatment of an organic surface. An-alkane, hexatriacontane, has been used as a model for high density polyethylene surface and treated in different plasma conditions. We found that the evolution of fluorinated species emissions in the plasma gas phase is not only a measurement of the reactive species concentrations, but also an indication of the surface modifications. The surface properties, such as surface energy and surface roughness are correlated to the emission intensity of reactives species in the plasma gas phase. A mild exposure to the plasma can result in a great decrease of surface energy corresponding to the fluorination. The surface roughness only changes under drastic plasma conditions.     

Thermal chlorofluorination of propyne and propadiene II

Propyne and propadiene have been previously reported to readily undergo vapor phase catalyzed chlorofluorination at temperatures to 285 °C to form C₃F₄Cl₄ mixtures that are primarily CFCl₂-CF₂-CFCl₂. Continued fluorination at temperatures up to 485 °C produce the rearranged C₃F₆Cl₂ isomers CF₃-CCl₂-CF₃ and CF₂Cl-CFCl-CF₃.     

Explored routes to unknown polyfluoroorganyliodine hexafluorides, RFIF6

Two routes to R_FIF₆ compounds were investigated: (a) the substitution of F by R_F in IF₇ and (b) the fluorine addition to iodine in R_FIF₄ precursors. For route (a) the reagents C₆F₅SiMe₃, C₆F₅SiF₃, [NMe₄][C₆F₅SiF₄], C₆F₅BF₂, and 1,4-C₆F₄(BF₂)₂ were tested. C₆F₅IF₄ and CF₃CH₂IF₄ were used in route (b) and treated with the fluoro-oxidizers IF₇, [O₂][SbF₆]/KF, and K₂[NiF₆]/KF. The observed sidestep reactions in case of routes (a) and (b) are discussed. Interaction of C₆F₅SiX₃ (X = Me, F), C₆F₅BF₂, 1,4-C₆F₄(BF₂)₂ with IF₇ gave exclusively the corresponding ring fluorination products, perfluorinated cyclohexadiene and cyclohexene derivatives, whereas [NMe₄][C₆F₅SiF₄] and IF₇ formed mixtures of C₆F_nIF₄ and C₆F_nH compounds (n = 7 and 9). CF₃CH₂IF₄ was not reactive towards the fluoro-oxidizer IF₇, whereas C₆F₅IF₄ formed C₆F_nIF₄ compounds (n = 7 and 9). C₆F₅IF₄ and CF₃CH₂IF₄ were inert towards [O₂][SbF₆] in anhydrous HF. CF₃CH₂IF₄ underwent C-H fluorination and C-I bond cleavage when treated with K₂[NiF₆]/KF in HF. The fluorine addition property of IF₇ was independently demonstrated in case of perfluorohexenes. C₄F₉CFCF₂ and IF₇ underwent oxidative fluorine addition at −30 °C, and the isomers (CF₃)₂CFCFCFCF₃ (cis and trans) formed very slowly perfluoroisohexanes even at 25 °C. The compatibility of IF₇ and selected organic solvents was investigated. The polyfluoroalkanes CF₃CH₂CHF₂ (PFP), CF₃CH₂CF₂CH₃ (PFB), and C₄F₉Br are inert towards iodine heptafluoride at 25 °C while CF₃CH₂Br was slowly converted to CF₃CH₂F. Especially PFP and PFB are new suitable organic solvents for IF₇.