高电荷态离子126Xeq+与Ti固体表面作用的激发光谱

报道用 15 0keV的高电荷态离子1 2 6 Xeq + (6≤q≤ 30 )轰击Ti固体表面产生 2 0 0— 10 0 0nm波段发射光谱的实验结果 .结果显示 ,用电荷态足够高的离子作光谱激发源 ,无需很强的束流强度 (nA量级 ) ,便可激发起样品表面的原子和离子在可见光波段的特征谱线 .当入射离子剥离度q >qc≈ 2 0时 ,Ti原子及其离子的特征谱线强度突然显著增强 ;不同金属靶 ,特征谱线突然增强的qc值不同 .理论分析表明 ,这与q大于此临界值后 ,单电子转移释放能量激发靶材料传导电子气体的表面等离激元密切相关 .     

高电荷态离子Arq+与不同金属靶作用产生的X射线

研究了高电荷态离子Ar^q+(q=16，17，18)入射金属Be，Al，Ni，Mo，Au靶表面产生的X射线谱.实验结果表明，Ar的Kα-X射线是离子在与固体表面相互作用过程中固体表面之下形成空心原子发射的.电子组态1s²的高电荷态Ar¹⁶⁺离子在金属表面中性化过程中，存在的多电子激发过程使Ar¹⁶⁺的K壳层电子激发产生空穴，级联退激发射Ar的Kα 特征X射线.Ar¹⁷⁺离子在金属表面作用过程中产生的X射线谱形与靶材料没有明显的关联,入射离子的Kα-X射线产额与其最初的电子组态有关，靶原子的X射线产额与入射离子的动能有关. 关键词： 高电荷态离子 空心原子 多电子激发 X射线     

高电荷态离子入射Al表面库仑势对靶原子特征谱线强度的影响

用同一动能(150keV)而不同电荷态的⁴⁰Ar^q+(8≤q≤16)离子入射金属Al表面,靶原子受激辐射产生特征光谱线. 实验结果表明：高电荷态离子与金属表面相互作用过程中,经过与靶原子碰撞(Penning碰撞)交换动能和共振电子俘获(resonant capture)释放库仑势能,将携带的能量沉积于靶表面,使靶原子激发. 这种激发不同于光激发,它不仅激发了原子复杂电子组态之间的跃迁,而且跃迁辐射的特征谱线强度增强的趋势与入射粒子的库 关键词： 高电荷态离子 库仑势 特征光谱 光谱强度     

近Bohr速度129Xeq+离子入射Ta靶发射近红外光谱线

用动能一定的高电荷态¹²⁹Xe^q+(17≤q≤27)离子,分别入射洁净的Ta靶表面,测量中性化的激发态Xe原子从组态5p⁵(²P°_3/2) nl退激到组态5p⁵(²P°_3/2) ml’过程中辐射的近红外光谱线.实验结果表明:多激发态的空心原子退激发射其特征光谱线,部分典型的跃迁按照阶梯方式退激.Xe原子发射的谱线的单粒子荧光产额和激发的Ta原子发射谱线的单粒子荧光产额随入射离子电荷态的增加而增加,其增加的趋势与入射离子携带的势能随电荷态增加的趋势一致.证明在近Bohr速度的能区,经典过垒模型是成立的.     

126Xeq+轰击Al表面产生的原子和离子光谱线

报道了高电荷态离子^126Xe^q (6≤q≤30)入射到固体Al表面产生的200～1000nm波段的发射光谱的实验结果。实验表明,在弱束流(nA量级)高电荷态的情况下,通过入射离子与固体靶的相互作用可有效地产生原子和离子的复杂组态间跃迁所形成的可见光波段的特征谱线,而且当入射离子的电荷剥离数超过一临界值后(对Al,q=26),谱线相对强度突然显著增强。根据经典过垒模型COB(The classic over-barrier model),在入射离子的动能较小(～1keV／u)的条件下．高电荷态离子与表面相互作用过程中电子的俘获或转移起着非常重要的作用,通过提高入射离子的电荷态可增强入射离子俘获电子的能力．显著增强激发粒子的光谱线的强度。     

129Xe30+轰击Ni表面激发靶原子偶极跃迁和禁戒 (M1和E2)跃迁的特征光谱线

报道了用高电荷态离子129Xe30+(150keV) 轰击金属Ni表面，激发的200—1000nm NiⅠ和NiⅡ的特征光谱线的实验结果.实验结果表明：用电荷态足够高的离子作光谱 激发源，无需很强的束流强度（nA量级），便可有效地产生原子和离子的复杂组态间跃迁所 形成的可见光波段的特征谱线，特别是NiⅠ和NiⅡ偶极禁戒的电四极跃迁E2和磁偶极跃迁M1 的特征光谱线.通过分析发现，在禁戒跃迁的谱线中，有些是电子组态相同而原子态不同的 偶极禁戒跃迁光谱线而且NiⅡ的684.84nm谱线较强. 关键词： 光谱 禁戒跃迁 电子组态 高电荷态离子     

高电荷态离子入射Al表面库仑势对靶原子特征谱线强度的影响

用同一动能(150keV)而不同电荷态的⁴⁰Ar^q+(8≤q≤16)离子入射金属Al表面，靶原子受激辐射产生特征光谱线. 实验结果表明：高电荷态离子与金属表面相互作用过程中，经过与靶原子碰撞(Penning碰撞)交换动能和共振电子俘获(resonant capture)释放库仑势能，将携带的能量沉积于靶表面，使靶原子激发. 这种激发不同于光激发，它不仅激发了原子复杂电子组态之间的跃迁，而且跃迁辐射的特征谱线强度增强的趋势与入射粒子的库     

Ar16+和Ar17+离子与Zr作用产生的X射线谱

将超导离子源提供的10—20keV/q Ar¹⁶⁺和Ar¹⁷⁺离子入射到Zr金属表面,在相互作用中产生的X射线谱表明,高电荷态Ar¹⁶⁺离子在金属表面中性化过程中有可能存在多电子激发,使Ar¹⁶⁺的K壳层电子被激发形成空穴,在退激过程中发射特征Kα-X射线.空心原子Ar的K层发射X射线强度随入射离子的动能而减弱,靶原子Zr的L壳层发射X射线强度随入射离子动能的增加而增强.Ar¹⁷⁺的单离子的Kα- 关键词： 高电荷态离子 空心原子 X射线     

高电荷态Krq+与Al表面碰撞发射可见光的研究

利用低速(V≈0.01 V_Bohr)高电荷态Kr^q+ (q=8, 10, 13, 15, 17)离子轰击金属Al表面, 获得了碰撞过程产生的300–600 nm的光谱. 实验结果表明: 低能大流强(μA/cm²量级)离子束入射金属表面, 可产生溅射原子、离子和入射离子中性化后发射的可见光. 随着入射离子势能(电荷态)增加, 碰撞过程中发射谱线的强度增强. 与激发态3d能级相比, 较高的势能可以有效地激发Al原子的电子到较高4s能级. 关键词： 高电荷态离子 可见光发射 离子与表面作用     

高电荷态离子Arq+与不同金属靶作用产生的X射线

研究了高电荷态离子Arq+(q=16,17,18)入射金属Be,Al,Ni,Mo,Au靶表面产生的X射线谱.实验结果表明,Ar的Kα-X射线是离子在与固体表面相互作用过程中固体表面之下形成空心原子发射的.电子组态1s2的高电荷态Ar16+离子在金属表面中性化过程中,存在的多电子激发过程使Ar16+的K壳层电子激发产生空穴,级联退激发射Ar的Kα特征X射线.Ar17+离子在金属表面作用过程中产生的X射线谱形与靶材料没有明显的关联,入射离子的Kα-X射线产额与其最初的电子组态有关,靶原子的X射线产额与入射离子的动能有关.     

The characteristic spectral lines of target atoms in the impact of ~(40)Ar~(q+) ions on metal surfaces

1 Introduction It has been found that a large number of ions and atoms can be sputtered; and elec-trons and X-ray can be emitted in the impact of slow highly charged ions (SHCI) onmetal surfaces. It has also been shown that a slow highly charged ion can deposit anamount of potential energy ranging from tens to hundreds of keV within a nanometer-sized volume on femtosecond time scale during impinging on a solid surface. Theequivalent power density is about 1014 W/cm2 and bombardment craters …     

Optical emission spectroscopy by Ar ion sputtering of Ti surface under O2 environment

Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar³⁺ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250-850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8 × 10⁻⁵ Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti⁺ ions.     

200 nm–1000 nm spectra of light emitted in the impact of <Superscript>40</Superscript>Ar<Superscript>10+</Superscript> upon Al and Si solid surfaces

This paper reports the measured results of the 200 nm–1000 nm characteristic spectral lines of Al, Si and Ar atoms when highly charged ions ⁴⁰Ar¹⁰⁺ are incident upon Al and P-type Si surfaces. The ion ⁴⁰Ar¹⁰⁺ is provided by the ECR ion source of the National Laboratory of the Heavy Ion Accelerator in Lanzhou. The results show that when the low-speed ions in the highly charged state interact with the solid surfaces, the characteristic spectral lines of the target atoms and ions spurted from the surfaces can be effectively excited. Moreover, because of the competition of the non-radiation de-excitation of the hollow atom by emitting secondary electrons with the de-excitation process by radiating photons, the spectral intensity of the characteristic spectral lines of Ar atoms on the P-type Si surface is, as a whole, greater than that of Ar atoms on the Al surface.     

高电荷态离子轰击Au固体表面激发的特征光谱线

报道了高电荷态离子129X6+e和129X30+e轰击金属Au表面激发的200～1000 nm波段光谱的实验结果.实验结果表明：高电荷态离子所激发的靶原子的谱线强度与入射离子的电荷态密切相关,与入射离子的初动能没有强的相关性.     

Persistent mechanoluminescence induced by elastic deformation of ZrO2:Ti phosphors

ZrO₂:Ti phosphors show such a strong mechanoluminescence (ML) that it can be seen in day light with naked eye. When a pellet of ZrO₂:Ti phosphor mixed in epoxy resin is deformed in the elastic region at a fixed strain rate using a testing machine, ML intensity increases linearly with time, and when the deformation is stopped, ML intensity decreases exponentially with time. For a given strain rate, ML intensity increases linearly with pressure, and for a given pressure, ML intensity increases linearly with the strain rate. The total ML intensity, in the deformation region, increases quadratically with pressure; however, the total ML intensity in the post-deformation region increases linearly with pressure. ML intensity decreases with successive number of pressings, whereby the reduced ML intensity can be recovered by UV-irradiation of the sample. ML intensity increases linearly with density of filled electron traps and it is optimum for a particular concentration of Ti in ZrO₂. ML intensity should change with increasing temperature of the phosphors. Although ZrO₂ is non-piezoelectric as a whole, it seems that the local structures near the Ti ions in ZrO₂ crystals are in the piezoelectric phase. The elastico ML in ZrO₂ phosphors can be understood on the basis of the localized piezoelectrification-induced detrapping model. According to this model, the localized piezoelectric field near Ti ions causes detrapping of electrons and subsequently the detrapped electrons moving in the conduction band are captured by the energy state of excited Ti⁴⁺ ions, whereby excited Ti⁴⁺ ions are produced and consequently the decay of excited Ti⁴⁺ ions gives rise to the light emission. The expressions derived on the basis of this model are able to explain satisfactorily the characteristics of ML. The relaxation time of localized piezoelectric charges and the threshold pressure for the ML emission can be determined from ML measurements. The long decay of elastico ML indicates the possibility of exploring persistent elastico ML, which may be useful for the fabrication of dim light sources capable of operating without any external power.     

低速Xe~(q+)(4≤q≤20)离子与Ni表面碰撞中的光辐射

实验中测量了0.38V_(Bohr)(460 keV)高电荷态Xe~(q+)(4≤q≤20)离子轰击高纯Ni表面发射的400-510 nm光谱.实验结果包括NiⅠ原子谱线,NiⅡ离子谱线,以及入射离子中性化发射的XeⅠ,XeⅡ和XeⅢ谱线.研究了谱线XeⅡ410.419,XeⅢ430.444,XeⅡ434.200,XeⅡ486.254,NiⅠ498.245,NiⅠ501.697,NiⅠ503.502,NiⅠ505.061和NiⅠ508.293 nm的光子产额随着入射离子电荷态的变化.结果表明,入射离子中性化和溅射Ni原子发射谱线的光子产额随着入射离子电荷态的增加而增加,其趋势与入射离子势能一致.     

200 nm-1000 nm spectra of light emitted in the impact of ~(40)Ar~(10+) upon Al and Si solid surfaces

This paper reports the measured results of the 200 nm-1000 nm characteristic spectral lines of Al, Si and Ar atoms when highly charged ions 40Ar10+ are incident upon Al and P-type Si surfaces. The ion 40Ar10+ is provided by the ECR ion source of the National Laboratory of the Heavy Ion Accelerator in Lanzhou. The results show that when the low-speed ions in the highly charged state interact with the solid surfaces, the characteristic spectral lines of the target atoms and ions spurted from the surfaces can be effectively excited. Moreover, because of the competition of the non-radiation de-excitation of the hollow atom by emitting secondary electrons with the de-excitation process by radiating photons, the spectral intensity of the characteristic spectral lines of Ar atoms on the P-type Si surface is, as a whole, greater than that of Ar atoms on the Al surface.