电子回旋共振微波等离子体化学气相沉积

本文叙述了电子回旋共振微波等离子体化学气相沉积（ＥＣＲＰＣＶＤ）的工作原理、特点及其应用．ＥＣＲＰＣＶ Ｄ由放电室、淀积室、微波系统、磁场线圈、气路与真空系统组成．处于放电室的等离子体在磁场中做回旋运动，使电子的回旋运动频率与微波频率相同；处于回旋共振条件下的电子有效地吸收微波功率而获得高的能量，从而产生高活性和高密度的等离子体．电离度大于１０％，电子密度为１０１３ｃｍ３．ＥＣＲＰＣＶＤ可在低的气体流量、衬底不加热的情况下高速淀积高质量薄膜．以该技术淀积的Ｓｉ，Ｎ４，ＳｉＯ２薄膜可分别与高温ＣＶＤ的Ｓｉ３Ｎ４高温热氧化的ＳｉＯ２相比拟．ＥＣＲＰＣＶＤ淀积ａ－Ｓｉ：Ｈ淀积速率为通常ＣＶＤ的２０倍，而性能与射频ＣＶＤ淀积的ａ－Ｓｉ：Ｈ相当．ＥＣＲＰＣＶＤ 已成功用于淀积多种薄膜。     

电子回旋共振等离子体技术

微波电子回旋共振是一种先进的低温等离子体技术，它具有优良的综合指标，提高了微电子，光电子集成电路制造工艺等应用领域中的低温等离子体加工水平，文章介绍了电子回旋共振等离子体产生原理，特点及重要的实验研究结果。     

电子回旋共振微波等离子体离子束刻蚀技术

电子回旋共振微波等离子体技术在薄膜制备技术、材料的表面处理、离子源和等离子体刻蚀等方面得到了广泛的应用，取得了长足的进展。这些特点在ICF实验制靶过程中有重要应用，如调制靶等，而且加工精度高，能满足ICF制靶的要求。基于在未来的ICF实验中对各种有机膜制备、各种调制靶的制备需求，开展了电子回旋共振微波等离子体技术在薄膜制备和等离子体刻蚀方面的预研工作。     

电子回旋共振（ECR）等离子体的研究和应用

近年来,在低气压、低温等离子体研究和应用中的一个重要发展是微波电子回旋共振放电。由于它是一种无极放电,能够在低气压下产生高密度、高电离度、大体积均匀的等离子体,所以在等离子体物理研究,表面处理和薄膜制备等应用中,成为一个十分引人注目的新领域。本文综述了ECR放电的基本物理过程和实验研究概况,介绍了ECR等离子体在表面处理、镀膜和离子源等方面应用的最新结果。     

电子回旋共振微波等离子体技术及应用

 电子回旋共振微波等离子体技术(ECR-MP)在表面处理、等离子体刻蚀和薄膜制备，尤其是高品质的激光惯性约束聚变薄膜靶的制备中有着重要的应用。综述了ECR-MP的基本原理、反应装置、实验研究、理论研究和应用情况的发展现状，同时分析了其今后可能的发展趋势。     

电子回旋共振微波等离子体技术及应用

电子回旋共振微波等离子体技术(ECR-MP)在表面处理、等离子体刻蚀和薄膜制备,尤其是高品质的激光惯性约束聚变薄膜靶的制备中有着重要的应用。综述了ECR-MP的基本原理、反应装置、实验研究、理论研究和应用情况的发展现状,同时分析了其今后可能的发展趋势。     

电子回旋共振微波等离子体及其在材料科学中的应用

 低气压、低温放电方面的一个重要的最新进展是电子回旋共振(ECR)放电。这种技术首先是在核聚变研究中发展起来的。最初,它被用于磁镜实验装置产生和加热等离子体,后来,又被发展成为托卡马克、串级磁镜等聚变装置实验中进行等离子体加热的主要手段之一,即电子回旋共振加热(ECRH)。目前,这一高技术已被移植到各种低温等离子体应用之中,显示了蓬勃的生命力。电子回旋共振微波等离子体是指:当输入的微波频率ω等于电子回旋共振频率ωce时,微波能量可以共振耦合给电子,获得能量的电子电离中性气体,产生放电。电子回旋频率为ωce=eB/m,e和m为电子电荷及其质量,B是磁场强度。     

电子回旋共振等离子体源的数值模拟

采用自洽微波功率吸收的二维混合模型,对电子回旋共振等离子体源中的各种物理参量(电离速率、等离子体密度、位势、电子温度)进行数值模拟.结果表明:等离子体参数随运行条件(中性气压和微波功率)变化呈现出区域特征、饱和现象和振荡行为等非线性现象 关键词：     

电子回旋共振微波等离子体刻蚀α:CH薄膜的工艺

为了刻蚀出图形完整、侧壁陡直、失真度小的α:CH薄膜微器件,研究了有铝和无铝掩膜、气体流量比、工作气压对刻蚀速率的影响,并对纯氧等离子体刻蚀稳定性进行了研究。研究结果表明：在相同条件下,刻蚀速率随刻蚀时间变化不大;a:CH薄膜上有铝和无铝掩膜时,刻蚀速率相同;流量一定时,刻蚀速率随氩气和氧气体积比的增大而降低,当用纯氩气时,几乎没刻蚀作用;刻蚀速率随工作气压的增大而降低。实验中,得到最佳刻蚀条件是：纯氧气,流量4 mL·s-1,工作气压9.9×10-2 Pa,微波源电流80 mA,偏压-90 V。     

电子回旋共振微波等离子体刻蚀α:CH薄膜的工艺

 为了刻蚀出图形完整、侧壁陡直、失真度小的α:CH薄膜微器件,研究了有铝和无铝掩膜、气体流量比、工作气压对刻蚀速率的影响,并对纯氧等离子体刻蚀稳定性进行了研究。研究结果表明：在相同条件下,刻蚀速率随刻蚀时间变化不大;a:CH薄膜上有铝和无铝掩膜时,刻蚀速率相同;流量一定时,刻蚀速率随氩气和氧气体积比的增大而降低,当用纯氩气时,几乎没刻蚀作用;刻蚀速率随工作气压的增大而降低。实验中,得到最佳刻蚀条件是：纯氧气,流量4 mL·s^-1,工作气压9.9×10^-2 Pa,微波源电流80 mA,偏压-90 V。     

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The generation and control of microwave electron cyclotron resonance (ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75mA at gas pressure of 7×10⁻⁴Pa, and the energy of the electron beam can reach 9keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20mm to 13mm and the electron beam current keeps the value unchanged.     

Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source

Electron cyclotron plasma reactor are prone to instabilities in specific input power [3–7] region (150–450 watts). In this region power absorption by gas molecules in the cavity is very poor and enhanced input power gets reflected substantially without increasing ion density. There are abrupt changes in plasma characteristics when input power was decreased from maximum to minimum, it was observed that reflected power changed from <2% to ∼50%. Minimum two jumps in reflected power were noticed in this specific power region and these appear to be highly sensitive to three stub tuner position in the waveguide for this particular input power zone. Unstable plasma region of this source is found to be dependent upon the magnetic field strength. Some changes in reflected power are also noticed with pressure, flow and bias and they are random in nature.     

小型空心阴极等离子体电子枪实验

基于空心阴极效应和低压辉光放电原理,设计了一种小型空心阴极等离子体电子枪并进行了实验研究,在低气压下获得了稳定的空心阴极辉光放电,测量电子枪放电结果表明：在空心阴极中加入灯丝热子可明显降低放电气压;电子束电流的大小随放电电压增大而增大,受气体气压影响较小;在气压2 Pa,放电电压10 kV,脉宽4 μs脉冲下放电,可得到脉宽为2 μs,电流为600 mA的电子束。     

小型空心阴极等离子体电子枪实验

基于空心阴极效应和低压辉光放电原理,设计了一种小型空心阴极等离子体电子枪并进行了实验研究,在低气压下获得了稳定的空心阴极辉光放电,测量电子枪放电结果表明:在空心阴极中加入灯丝热子可明显降低放电气压;电子束电流的大小随放电电压增大而增大,受气体气压影响较小;在气压2Pa,放电电压10kV,脉宽4μs脉冲下放电,可得到脉宽为2μs,电流为600mA的电子束。     

Numerical study of chaotic oscillations in the electron beam with virtual cathode in the external non-uniform magnetic fields

In this Letter the results of theoretical investigations of the chaotic microwave oscillator based on the electron beam with a virtual cathode are presented. Nonlinear non-stationary processes in these electron systems are studied by means of numerical analysis of 2.5D model. It was discovered that the non-uniform external magnetic field value controls the dynamical regime of oscillations in the virtual cathode oscillator. The processes of the chaotization of output microwave radiation are described and interpreted from the point of view of the formation and interaction of electron structures (bunches) in the electron beams. The numerical results have shown that the investigated electron system with virtual cathode could be considered as a promising controlled source of wideband chaotic oscillations in the microwave range.     

Fokker-planck study of tokamak electron cyclotron resonance heating

A Fokker－Planck study is carried out for tokamak electron cyclotron resonance heating by writing the quasi-linear diffusion operator into a form adaptive to the collision operator and considering the wave absorption characteristics of both the O-mode and the X-mode in different magnetic surfaces. Though the Fokker－Planck code is non-relativistic in nature, however, if the relativistic resonance condition for the nearly perpendicularly propagating waves is treated suitably, we can obtain correct results. The energy loss mechanism through anomalous transport is also modelled using a suitable loss term. In the heating phase, the electron distribution deviates from the Maxwellian distribution substantially, which leads to non-linear absorption characteristics. The wave damping rate is non-linear and changes with time. The electron pressure is usually anisotropic under different conditions: p_{e⊥}/p_{e‖}>2 for different D_0 and τ_e.     

电子回旋共振离子源等离子体的密度测量

 诊断电子回旋共振离子源等离子体的传统方法是采用传统的单探针无发射时测量伏安曲线,并根据曲线的拐点由理论公式计算出的等离子体密度。本文设计并研制了等离子体密度的测量装置。采用单根朗缪尔探针（该探针可以用来发射电子）测量等离子体的伏安特性。在探针有发射和无发射两种状态下测量得到两条伏安曲线,根据这两条曲线的"分叉点"得到等离子体电位,然后根据该电位直接由计算机计算出电子温度、电子密度。采用该新方法,测量得到的等离子体参量空间电位约为17 V,悬浮电位约为-5 V,电子温度约为4.4 eV,离子密度为1.10×10¹¹cm^-3,与传统方法计算出的等离子体1.12×10¹¹cm^-3相比,两者相差仅1.8％,但新方法效率和精度更高。     

离子通道电子束回旋脉塞的等离子体波效应

 研究了离子通道回旋电子束脉塞（ICECM）中的等离子体波非线性效应。利用流体理论与自洽非线性理论方法对ICECM中等离子体波效应的微观机理进行了分析。研究发现，等离子体波加强了电子束的纵向群聚，束-波互作用的能量交换效率及系统增益得到明显提高。数值模拟计算表明，对于中等等离子体密度、1.5kA电流和1MV加速电压的电子束，系统能够获得的脉冲功率和频率分别为200MW和280GHz的毫米波束。