双离子束溅射沉积HfO­­2光学薄膜的研究

用双离子束溅射沉积氧化铪光学薄膜,并对此工艺下制备的氧化铪薄膜进行了光学性质、残余应力、结构特性以及激光损伤特性的研究。实验结果表明,用双离子束溅射沉积的氧化铪薄膜不仅结构均匀,膜层致密,无定形结构,而且具有极低的散射和吸收,均匀的非晶结构,杂质缺陷少,激光损伤阈值高。     

双离子束溅射沉积HfO­­2光学薄膜的研究

 用双离子束溅射沉积氧化铪光学薄膜，并对此工艺下制备的氧化铪薄膜进行了光学性质、残余应力、结构特性以及激光损伤特性的研究。实验结果表明，用双离子束溅射沉积的氧化铪薄膜不仅结构均匀,膜层致密,无定形结构，而且具有极低的散射和吸收,均匀的非晶结构,杂质缺陷少,激光损伤阈值高。     

Effects of thermal annealing on titanium oxide films prepared by ion-assisted deposition

Titanium oxide thin films are prepared at a substrate temperature of 250 °C by electron-beam evaporation and ionassisted deposition. The effects of thermal annealing temperatures from 100 to 450 °C on the optical and mechanical properties are studied. The optical and mechanical properties include refractive indices, extinction coefficients, residual stress, surface roughness and crystallization. Experimental results show these properties of titanium oxide films clearly depend on the thermal annealing process.     

Nucleation and growth studies of gold films prepared by evaporation and ion-assisted deposition

Thin gold films have been deposited onto glass substrates by electron-beam evaporation and by oxygen and argon ion-assisted deposition. The nucleation and growth of the films have been monitored in situ by ellipsometry and spectral reflectance and transmittance measurements. The composition of the film surface has been characterized by ion-scattering spectroscopy. These techniques show that the thickness at which coalescence of gold islands occurs is less for both ion-assisted films than for the evaporated film deposited on a clean substrate. Monitoring of coalesced films during sputter-etching combined with measurements of reflectance from both sides of the coated surface indicate that all films have a layer of density less than bulk near the air-film interface, and for evaporated and argon ion-assisted films, another near the gold-substrate interface. Oxygen ion-assisted films showed no evidence of an interfacial layer near the substrate and it is concluded that these films had a much greater area of contact with the substrate than evaporated or argon ion-assisted films.     

Modelling ion-assisted deposition of CeO2 films

The theory presented explains quantitatively the experimentally observed increase in film density of a vapor-deposited CeO₂ film when bombarded during growth with low-energy O ₂ ⁺ ions. The density enhancement is expressed in terms of the yields for recoil implantation of surface atoms, ion incorporation and sputtering, which have been determined by employing a three-dimensional Monte Carlo cascade calculation. Ion-to-vapor flux ratios between 0 and 1.4 and O⁺ ion energies between 25 and 600 eV have been examined. The density shows an almost linear increase with the ratio of ion-to-vapor fluxes. An optimum O⁺ ion energy for densification is found at about 200 eV which is in agreement with experiment.     

AgAsS2 amorphous chalcogenide films prepared by pulsed laser deposition

A pulsed laser deposition technique has been applied to prepare amorphous ternary Ag–As–S films without an annealing process after the deposition. The films were prepared from AgAsS₂ bulk glass using a KrF excimer laser. Energy-dispersive X-ray analysis and Rutherford backscattering were used to obtain the composition of the studied films. VASE ellipsometry has been used to determine optical properties and homogeneity of the index of refraction. Comparison of two models is presented. PACS 78.66.Jg; 81.15.Fg; 81.40.Wx     

Amorphous chalcogenide AgSbS2 films prepared by pulsed laser deposition

The pulsed laser deposition technique has been applied to prepare amorphous ternary AgSbS films. The films were prepared from AgSbS₂ bulk glass using a KrF excimer laser. The composition of prepared films according to the results of the energy dispersive X-ray analysis and the Rutherford backscattering was close to bulk one. Optical transmission and spectral dependence of the refractive index proved the good optical quality of the films. The Ar⁺ ion laser dot exposures of the films show a potential applicability of the films as a new type of optical recording material. PACS 78.66.Jg; 81.15.Fg; 81.40.Wx     

原子层沉积HfO_2薄膜的激光损伤特性分析

以目前激光惯性约束聚变中应用最广泛的高折射率材料二氧化铪(HfO2)为研究对象,在熔石英基底上分别采用TEMAH和HfCl4前驱体制备了HfO2薄膜,沉积温度分别为100,200和300℃。采用椭偏仪和激光量热计对薄膜的光学性能进行了测量分析,采用X射线衍射仪(XRD)对薄膜的微结构进行了测量。最后在小口径激光阈值测量平台上按照1-on-1测量模式对薄膜的损伤阈值进行了测试,并采用扫描电子显微镜(SEM)对损伤形貌进行了分析。研究表明,用同一种前驱体源时,随着沉积温度升高,薄膜折射率增加,吸收增多,损伤阈值降低。在相同温度下,采用有机源制备的薄膜更容易在薄膜内部形成有机残留,导致薄膜吸收增加,损伤阈值降低。采用HfCl4作为前驱体源在100℃制备氧化铪薄膜时,损伤阈值能够达到31.8J/cm2(1064nm,3ns)。     

Ta_2O_5薄膜的低能离子辅助蒸镀

用低能氧离子辅助蒸镀技术,制备了一系列Ta_2O_5薄膜.观测了薄膜的微结构,测量了薄膜的光吸收和光散射.实验指出,离子束轰击和基片加热同时进行,能够制得透明而匀均的Ta_2O_5薄膜.     

Properties of HfO2 thin films prepared by dual-ion-beam reactive sputtering

HfO₂ thin films were prepared in dual-ion-beam reactive sputtering (DIBRS) method. Spectrophotometer, surface thermal lensing (STL) technique, Rutherford backscattering (RBS), and X-ray diffraction (XRD) were employed in measuring the transmittance, absorptance, stoichiometry, and microstructure, respectively. Experimental results indicate that the peak transmittance value of the sample is about 90%. Weak absorptance measurement for 1064 nm wavelength laser by STL technique investigated that the absorption is 180 ppm for as-grown sample, which is larger than expected. Substoichiometry is the main cause for larger absorptance, which could be proved by RBS and annealing test results. XRD result shows that the films are polycrystalline, and the monoclinic is the dominant phase.     

Influence of coating material on laser damage threshold of TiO2 films

The optical property, structure, surface properties (roughness and defect density) and laser-induced damage threshold (LIDT) of TiO2 films deposited by electronic beam (EB) evaporation of TiO2 (rutile), TiO2 (anatase) and TiO2 + Ta2O5 composite materials are comparatively studied. All films show the polycrystalline anatase TiO2 structure. The loose sintering state and phase transformation during evaporating TiO2 anatase slice lead to the high surface defect density, roughness and extinction coefficient, and low LIDT of films. The TiO2 + Ta2O5 composite films have the lowest extinction coefficient and the highest LIDT among all samples investigated. Guidance of selecting materials for high LIDT laser mirrors is given.OCIS codes: 310.3840, 140.3330.     

HfO_2单层膜的吸收和激光损伤阈值测试

薄膜吸收是降低膜层激光损伤阈值的重要原因,为了研究薄膜吸收对激光损伤阈值的影响,对HfO2单层膜在1 064 nm处的吸收及其在不同波长激光辐照下的损伤阈值进行了测试和分析。研究结果表明:薄膜的激光损伤阈值由薄膜吸收平均值(决定于薄膜中缺陷的种类和数量)和吸收均匀性(决定于薄膜中缺陷的分布)共同决定;根据HfO2单层膜在1064 nm波长处的吸收值,不但可以定性判断薄膜在1 064 nm波长,而且还可以判断在其它波长激光辐照下的抗激光损伤能力。     

金属Fe薄膜的PLD制备及其非线性光学性质研究

采用脉冲激光沉积（PLD）技术在MgO基片上制备了金属Fe薄膜.利用原子力显微镜研究了不同制备温度对薄膜表面形貌的影响.x射线衍射分析表明沉积温度大于500℃时，Fe薄膜在MgO基片上有很好的结晶性，并有单一取向.通过z扫描方法测量了超薄Fe膜的光学非线性，得到了Fe薄膜的非线性折射率n₂＝709×10^-5cm²/ kW，非线性吸收系数 β＝-552×10^-3cm/W. 关键词： Fe薄膜 非线性 脉冲激光沉积     

沉积温度对HfO2薄膜残余应力的影响

 用电子束蒸发方法制备了HfO₂薄膜，根据镀膜前后基片曲率半径的变化，用Stoney公式计算了薄膜应力，讨论了沉积温度对薄膜残余应力的影响。结果发现，HfO₂薄膜的残余应力均为张应力，应力值随沉积温度的升高先增大后减小，在280 ℃左右出现极大值。对样品进行了XRD测试，从微观结构上对实验结果进行了分析，发现微结构演变引起的内应力变化是引起薄膜残余应力改变的主要因素，HfO2薄膜在所选沉积温度60~350 ℃内出现了晶态转变，堆积密度随温度升高而增大。     

制备工艺对HfO_2薄膜抗激光损伤能力的影响

采用反应蒸镀法镀制了单层ＨｉＯ２薄膜,观察了薄膜表面主要的微结构缺陷, 研究了基片清洗工艺对薄膜损伤阈值的影响。测量了薄膜沉积前后表面粗糙度变化。结果表 明：沉积工艺可以改变粗糙度,并对薄膜抗激光损伤能力有较大的影响。     

A spectroscopic ellipsometry study of TiO2 thin films prepared by ion-assisted electron-beam evaporation

Film characterization based on variable-angle spectroscopic ellipsometry (VASE) is desirable in order to understand physical and optical characteristics of thin films. A number of TiO₂ film samples were prepared by ion-assisted electron-beam evaporation with 200-nm nominal thickness, 2.0 Å/s deposition rate and 8 sccm oxygen flow rate. The samples were maintained at 250 °C during the deposition, and annealed in air atmosphere afterwards. As-deposited and annealed films were analyzed by VASE, spectrophotoscopy and X-ray diffractometry. From ellipsometry modeling process, the triple-layer physical model and the Cody–Lorentz dispersion model offer the best results. The as-deposited films are inhomogeneous, with luminous transmittance and band gap of 62.37% and 2.95 eV. The 300 °C and 500 °C are transition temperatures toward anatase and rutile phases, respectively. Increasing temperature results in an increase of refractive index, transmittance percentage and band gap energy. At 500 °C, the highest refractive index and band gap energy are obtained at 2.62 and 3.26 eV, respectively. The developed VASE-modeling process should be able to characterize other TiO₂ films, using similar physical and optical modeling considerations.     

Hydrogen doping of MgO thin films prepared by pulsed laser deposition

Hydrogen doped MgO films were grown by pulsed laser deposition method. Gaseous hydrogen stored in cavities of milky MgO single crystal targets provided doping in film deposition process. Clear MgO targets without hydrogen were used in the preparation of reference films. The influence of hydrogen doping on firing voltage (FV) of gas discharge and its AC frequency dependence was investigated. According to thermoluminescence experiments, the films grown from milky targets contained two kinds of electron traps with the activation energies of 0.051 and 0.31 eV, while latter traps were absent in reference samples. The 0.31 eV trap was assigned to the hydride ion H⁻ occupying an oxygen vacancy site in MgO crystal structure. Using standard gas mixture (Ne-10% Xe), FVs of hydrogen doped sample showed considerable frequency dependence and were up to 55 V lower in comparison to the reference sample. The FVs of reference sample were shifted 14-28 V to higher values when N₂ gas was added to the mixture. The N₂ addition lowered the FVs of hydrogen doped sample up to 38 V and almost eliminated the FV frequency dependence.     

Magnetic properties of strontium hexaferrite films prepared by pulsed laser deposition

The magnetic properties of strontium hexaferrite (SrFe₁₂O₁₉) films fabricated by pulsed laser deposition on the Si(100) substrate with Pt(111) underlayer have been studied as a function of film thickness (50–700 nm). X-ray diffraction patterns confirm that the films have c-axis perpendicular orientation. The coercivities in perpendicular direction are higher than those for in-plane direction which indicates the films have perpendicular magnetic anisotropy. The coercivity was found to decrease with increasing of thickness, due to the increasing of the grain size and relaxation in lattice strain. The 200 nm thick film exhibits hexagonal shape grains of 150 nm and optimum magnetic properties of M_s=298 emu/cm³ and H_c=2540 Oe.     

CEMS study on diluted magneto titanium oxide films prepared by pulsed laser deposition

6% ⁵⁷Fe doped titanium oxide films, prepared by pulsed laser deposition (PLD) on sapphire substrate at 650°C under various vacuum conditions, were characterized mainly by conversion electron Mössbauer spectrometry (CEMS). Two magnetic sextets with hyperfine fields 33 and 29 T, and one doublet were observed in the CEMS spectra of TiO₂ films prepared under PO₂ = 10^?6 and 10^?8 torr, which showed ferromagnetism at room temperature, whereas only the doublet of paramagnetic Fe³⁺ species was observed for the film prepared under PO₂ = 10^?1 torr.     

Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

Amorphous chalcogenide thin films were prepared from As₂Se₃, As₃Se₂ and InSe bulk glasses by pulsed laser deposition using a KrF excimer laser. Thickness profiles of the films were determined using variable angle spectroscopic ellipsometry. The influence of the laser beam scanning process during the deposition on the thickness distribution of the prepared thin films was evaluated and the corresponding equations suggested. The results were compared with experimental data.