提拉法生长镓酸锂晶体及缺陷研究

研究了提拉法生长的镓酸锂单晶的生长习性和结晶质量.晶体表面呈乳白色且表面粗糙.通过光学显微镜、四晶X射线衍射、透射光谱和电感耦合等离子体发射光谱对样品进行了表征,结果表明,在(001)面的抛光样品上存在三种缺陷: [110]和[-110]方向的十字线、[010]方向排列的气泡包裹物以及平行于(010)面的界面,界面的产生起因于(010)晶面的滑移;晶体的结晶质量从顶部到底部逐渐下降,这是由于在生长过程中氧化锂的挥发导致熔体成分偏离化学计量比造成的.     

温梯法Ce:YAG闪烁晶体的宏观缺陷观察

采用温度梯度法(TGT)成功生长了直径为76mm高光学质量的Ce:YAG高温闪烁晶体,采用偏光显微镜研究了Ce:YAG闪烁晶体中的主要宏观缺陷,观察到了生长条纹、侧心、气泡、包裹物以及应力双折射等宏观缺陷.实验结果表明,晶体中的气泡、包裹物以及应力双折射等宏观缺陷主要集中在晶体边缘部分,因此温梯法可以获得高质量的Ce:YAG闪烁晶体.     

改进热交换法生长蓝宝石晶体的气泡研究

采用改进的热交换法生长的蓝宝石晶体,气泡是其主要缺陷之一.本文采用数值模拟研究了晶体生长过程中氦气流量对坩埚内温场、固液界面形状的影响.并结合晶体生长实验结果,分析了在实际的晶体生长过程中,氦气流量的线性增加对晶体内气泡的尺寸、形态和分布的影响.     

Study of the mechanical and structural properties of silicon oxynitride films for optical applications

In this work, we report studies on the residual stress and structure of silicon oxynitride films deposited by PECVD with nitrogen atomic percent varying from 24 to 55. The stress response to thermal annealing at different temperatures is analyzed and correlated with Rutherford backscattering spectroscopy, ellipsometry, Fourier transform infrared spectroscopy, small-angle X-ray scattering spectroscopy and X-ray near edge absorption spectroscopy at the Si–K edge measurements. The results show that the stress varies from compressive to tensile for the as-deposited samples. The annealing process increased the stress value in samples that had a tensile behavior as-deposited, while decreased its value in samples with compressive stress as-grown. It is observed that the stress shifts with annealing in a way that can be correlated with the volume density of voids, also depending on the composition and structure of the films.     

温梯法白宝石晶体的缺陷研究

采用导向温梯法(TGT)生长出[0001]方向直径为76mm的白宝石晶体.利用扫描电子显微镜(SEM)观察晶体(0001)面的腐蚀坑形态,并对晶体内部的包裹物进行了能谱(EDS)分析.白宝石晶体中的生长缺陷主要为位错和包裹体等.Al2O3晶体(0001)面的位错腐蚀坑呈六角形,并且有台阶状结构.分析了(0001)面内的位错类型.确定了TGT法生长的白宝石内部的包裹物的主要成分为碳.     

The impact of the nitridation process on the properties of the Si–SiO2 interface

A newly developed technique for the simultaneous measurement of the oxide–silicon interface properties and of minority carrier lifetime in the silicon volume was used for a systematic study of the nitridation process of oxide films.This technique is based on the surface recombination velocity measurements, and does not require the formation of a capacitor structure, so it is suitable for the measurement of as-grown interface properties. Oxides grown both in dry and in wet environments were prepared, and nitridation processes in N₂O and in NO were compared to N₂ annealing processes. The effect of nitridation temperature and duration were also studied, and processes of rapid thermal oxidation (RTO) and nitridation (RTN) were compared to conventional furnace nitridation processes. Surface recombination velocity was correlated with nitrogen concentration at the oxide–silicon interface obtained by secondary ion mass spectroscopy (SIMS) measurements. Surface recombination velocity (hence surface state density) decreases with increasing nitrogen pile-up at the oxide–silicon interface, indicating that in nitrided interfaces surface state density is limited by nitridation. NO treatments are much more effective than N₂O treatments in the formation of a nitrogen–rich interface layer and, as a consequence, in interface state reduction. X-ray photoelectron spectrometry (XPS) analyses were used to extend our correlation to very thin oxides (3 nm).     

Studies on crystal growth,optical and electrical characterization of pure and Dy-doped bismuth silicate single crystals

(0.5 mol%) Dysprosium (Dy) doped bismuth silicon oxide (BSO) single crystals were grown by the Czochralski technique under air atmosphere. Detailed analysis of Dy-doped BSO with pure BSO has been studied through optical analysis. The absorption edges of pure and Dy-doped BSO crystals are found to be 405 nm and 415 nm, respectively. The shift in the absorption edge is contributed to the defect centers created in the crystal with Dy-doping. The shifts observed in the Raman spectra on doping Dy are found to be lower, when compared with the pure BSO crystal. This effect can be correlated to the lattice distortion induced by the Dy doping. The oxide formation and intrinsic defects in the BSO crystal have been identified by photoluminescence analysis. Dielectric measurements reveal that higher permeability value in the BSO sample is due to the presence of charged defects, which can be related to the space charge polarization. There is a slight decrease in dielectric constant on doping with Dy. The piezoelectric value explains the defects formed in the crystal. On poling, d₃₃ value of BSO and Dy-doped BSO are 32 pC/N and 40 pC/N, respectively.     

Growth of large-sized Ce:Y3Al5O12 (Ce:YAG) scintillation crystal by the temperature gradient technique (TGT)

In this work, Ce:YAG crystal with the size of ?4 in was successfully grown by the TGT method. The optical and scintillation properties of as-grown Ce:YAG crystals were investigated. Three obvious absorption bands at 223, 340 and 460 nm and two weak color-center absorption bands at 296 and 370 nm are observed in as-grown Ce:YAG crystal. Fluorescence with an emission peak at 398 nm is observed due to the color centers, and absorption bands of the color centers can be eliminated by annealing in O₂ or H₂ atmosphere at 1673 K for 24 h. Yellow-green fluorescence centered at 530 nm is found when the crystal was excited at 460 nm and the 530 nm excitation spectrum shows two peaks at 340 and 460 nm. X-ray fluorescence spectrum of as-grown crystal shows three emission peaks at 300, 360 and 530 nm. An average light output of 1360 phe/MeV and a single exponential decay with the decay time constant of 62.97 ns are found in as-grown Ce:YAG crystal.     

零声表面波频率温度系数方向的硅酸镓镧晶体生长

采用提拉法生长了高质量、大尺寸、结构完整的声表面波零温度系数切向LGS晶体.XRD图谱显示,生长的晶体为单一相LGS晶体,晶格常数为a=0.816274 nm,c=0.509253 nm,密度为5.7463 g/cm3.压电常数、介电常数、热膨胀性能等与传统方向生长的晶体一致.用此方向生长的LGS晶体制作声表面波频率温度性能优化的切片,只需要垂直生长方向进行切割,可以大大简化晶体的加工工艺、提高LGS晶体的利用率,节省材料成本.     

Synthesis and characterization of 3C–SiC nanowires

Silicon carbide nanowires have been synthesized by carbothermal reduction, from carbon monoxide and single crystal silicon. Transmission electron microscopy and cathodoluminescence studies confirm the growth of a cubic β-SiC core, coated with an amorphous oxide shell. Planar defects, as stacking faults and rotational twins, are present on (1 1 1) planes. The formation of short thick rods or long thin wires, depending on the growth temperature and time, is discussed.     

Characterization of a Czochralski grown silicon crystal doped with 1020 cm‐3 germanium

A dislocation‐free silicon single crystal doped with 10²⁰ cm^‐3 germanium (Ge) has been grown using the Czochralski (CZ) growth technique. The Ge concentration in the seed‐end and tang‐end of the crystal was 8×10¹⁹cm^‐3and 1.6×10²⁰ cm^‐3, respectively. The effective segregation coefficient of Ge, the distribution of flow pattern defects (FPDs) and the wafer warpage have been characterized. Both the effective segregation coefficient and the equilibrium segregation coefficient of Ge in silicon were evaluated. Then, the density of FPDs was traced from seed‐end to tang‐end of the ingot, a suppression of FPDs by Ge doping was shown. That is probably because the Ge atoms consume free vacancies and thus a higher density of smaller voids is formed. Furthermore, the mechanical strength of wafers has also been characterized by batch warpage analysis. The warpage in the seed‐end was larger than that in the tang‐end of the ingot, showing that the mechanical strength of wafers is enhanced by Ge doping. Such improvement is interpreted by an enhanced dislocation pinning effect associated with the enhanced nucleation of grown‐in oxygen precipitates in the Ge‐doped silicon wafers. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Voids in hydrogenated amorphous silicon materials

Effusion measurements of hydrogen and of implanted helium are used to characterize the presence of voids in hydrogenated amorphous silicon (a-Si:H) materials as a function of substrate temperature, hydrogen content, etc. For undoped plasma-grown a-Si:H, interconnected voids are found to prevail at hydrogen concentrations exceeding 15–20 at.%, while isolated voids which act as helium traps appear at hydrogen concentrations ≤ 15 at.%. The concentration of such isolated voids is estimated to some 10¹⁸/cm³ for device-grade undoped a-Si:H deposited at a substrate temperature near 200 °C. Higher values are found for, e.g., doped material, hot wire grown a-Si:H and hydrogen-implanted crystalline Si. The results do not support recent suggestions of predominant incorporation of hydrogen in a-Si:H in (crystalline silicon type) divacancies, since such models predict a concentration of voids (which act as helium traps) in the range of 10²¹/cm³ and a correlation between void and hydrogen concentrations which is not observed.     

Growth and morphology of p-terphenyl single crystals

The results of a preliminary investigation of the growth and morphology of p-terphenyl crystals grown by sublimation and by solvent evaporation methods are reported. It was observed that lozenge–shaped (001) crystal plates are obtained from xylene and benzene solution while dendritic crystals by sublimation. Crystallographic orientation of the plates and microscopic observations of as-grown crystal surfaces are also described.     

直流喷射电弧等离子体制备金刚石单晶的研究

通过利用光发射谱技术,探测了大功率直流喷射电弧等离子体增强化学气相沉积方法中沉积区域的气相激元分布,进而优选了金刚石生长的位置.在沉积过程中,不断使衬底做背向等离子体的运动,实现了大颗粒金刚石的连续生长,颗粒尺寸达到约1 mm3.采用劳厄背反射X射线衍射测试技术和拉曼谱技术,对所制备的样品进行了测试,结果表明:所制备的颗粒为金刚石单晶.对于大尺寸衬底,研究了背向运动速度对沉积晶体的形貌和质量的影响,发现了ATG型不稳定形貌.     

Effects of the Li-evaporation on the Czochralski growth of γ-LiAlO2

Two-inch-diameter γ-LiAlO₂ single crystals were grown from the melt by Czochralski method. The crystals were examined by optical methods, high-resolution X-ray diffraction and transmission electron microscopy (TEM). Inductively coupled plasma optical emission spectrometry (ICP-OES) was used to determine the Li/Al ratio in the residual melts. The Li-evaporation from both melt and grown crystal is the main problem in the γ-LiAlO₂ growth and has to be controlled by acting on the vertical temperature gradient. Shallow gradients increase the Li-evaporation from the crystal surface resulting in boules with a milky rim. On the other hand, steep gradients may induce cracks in the boule and enhance the Li₂O escape from melt with consequent variation of the composition. ICP-OES investigations reveal that melt compositions can vary in the range from 46.5 to 50 mol% Li₂O to obtain transparent LiAlO₂ crystals. Beyond this value, the formation of inclusions inside the crystals is probable. We have established an optimized growth assembly, which allows remaining the melt composition stoichiometric. The as-grown crystals exhibit defects like subgrains, twins and a core of voids and fine-grained inclusions. The latter could be characterized by TEM as submicron LiAl₅O₈ crystallites.     

Relationship between grown-in defects and thermal history during CZ Si crystal growth

An abrupt change of the crystal growth rate at temperatures in the range 1150–1080°C affects the annihilation or the agglomeration of grown-in defects such as flow pattern defects (FPD), crystal originated particles (COP), laser scattering defects (LSTD) and the defects measured by an optical precipitate profiler (OPPDs). Moreover, it is demonstrated that the densities of FPDs and LSTDs correlate with each other, and also with the cooling rate in such a temperature range. These relationships were investigated by growing several silicon single crystals in 10 kinds of hot-zone (HZ) configurations designed by using a numerical simulation. The cooling rate from 1412°C, the melting point of silicon, to 1150°C does not seem to be so important for the generation or the annihilation of these defects.     

Synthesis of tin oxide nanosized crystals embedded in silica matrix through sol–gel process using alkoxide precursors

Materials made of tin oxide nanocrystals homogeneously dispersed into a silica glass matrix have been elaborated through sol–gel processing. Addition of strong acids was used to control the hydrolysis–condensation in tin and silicon alkoxides mixed alcoholic solutions. Fourier transform infrared spectroscopy (FTIR) and Small angle X-ray scattering (SAXS) measurements show that the introduction of HCl allows to synthesize gels containing up to 50% of tin oxide precursor without significant modification of the pure silica gel network. Thermal treatments of slowly dried bulk gels induce the crystallization of tin oxide nanoparticles. After firing at 1000 °C, dense materials containing tin oxide nanocrystals (with a mean diameter close to 1–2 nm) are obtained. The crystal size distribution was estimated by X-ray diffraction line profile analysis. The narrowness of this distribution makes these materials interesting for optical applications.     

碲锌镉晶体晶格畸变的测定与分析

在高分辨X射线衍射仪上,利用不对称布拉格衍射STD技术与单晶摇摆曲线技术相结合的方法,对碲锌镉单晶材料的晶格畸变进行了分析测定.此方法实现了一次装样,多角度、多次测定晶体的摇摆曲线,从而利用多组实验数据完成多元线性回归方程组的求解,避开了一般应变测定方法中难以确定无应力状态下衍射角的问题.所测定的生长态碲锌镉晶片晶格畸变量为10-3～10-2数量级,该畸变量是碲锌镉晶片存在成份偏析、位错和空位等缺陷以及晶片受到的应力综合作用的结果.     

High energy Si ion irradiation effects on 10 nm thick oxide MOS capacitors

We investigated the charge trapping properties of 10 nm thick oxide metal-oxide-semiconductor capacitors after 158 MeV silicon ion beam exposure up to 20 Mrad(Si) dose. Devices were biased during irradiation by a positive or negative gate voltage to drift radiation induced holes to the silicon/oxide and gate/oxide interface, respectively. Experimental results show that the radiation induced effective positive charge increases linearly with dose and is larger for the positive biased devices. The positive charge recombines with electrons injected in the oxide by Fowler–Nordheim tunnelling. After positive charge recombination a net negative charge builds up, due to electron trapping in radiation induced neutral defects. The negative charge density increases linearly with dose and it is larger for positive biased devices. The negative charge centroid is close to the oxide centre. The probability that one effective negative charge is generated by one radiation induced effective positive charge is 0.153±0.005.     

Color centers and charge state change in Ce:YAG crystals grown by temperature gradient techniques

Color centers and impurity defects of Ce:YAG crystals grown in reduction atmosphere by temperature gradient techniques have been investigated by means of gamma irradiation and thermal treatments. Four absorption bands associated with color centers or impurity defects at 235, 255, 294 and 370 nm were observed in as-grown crystals. Changes in optical intensity of the 235 and 370 nm bands after gamma irradiation indicate that they are associated with F⁺-type color center. Charge state change processes of Fe³⁺ impurity and Ce³⁺ ions take place in the irradiation process. The variations of Ce³⁺ ions concentration clearly indicate that Ce⁴⁺ ions exist in Ce:YAG crystals and gamma irradiations could increase the concentration of Ce³⁺ ions. Annealing treatments and the changes in optical density suggest that a heterovalent impurity ion associated with the 294 nm band seems to be present in the crystals.