Electroreduction of chromic acid during the chromium deposition: An RRDE study

The rate of the trivalent chromium ion formation during the chromic acid reduction in the presence of sulfate ions is studied in a wide potential range by the RRDE method. At potentials of incomplete reduction of chromate ions, the reaction is attendant by a side process (probably, the hydrogen ion reduction). With a phase film covering the disk cathode, the ring current does not correspond to the number of Cr(III) ions formed at the disk, rather it characterizes the oxidation of products of a phase film comprising oxide-hydroxide compounds of Cr(III). The hypothesis about the formation of a phase cathodic film, presumably preceding the metallic chromium deposition, is confirmed experimentally. The oxide-hydroxide species of Cr(III), which are main film-forming substances, undergo phase transitions in a zone that depends on the sulfate ion concentration. The phase transitions whose products may reach the ring electrode occur in the near-electrode layer. The lower the sulfate ion concentration, the larger the extension of the layer.     

铭酸溶液中金属铬电沉积的机理

从铬酸溶液中电沉积金属铬的机理曾经有过不少探索.许多研究者认为,阴极表面形成难溶的膜层金属铬的电沉积起着关键性的作用.本文应用交流阻抗谱研究金属铬电沉积过程中阴极表面膜的形成,利用X光电子能谱(XPS)和俄歇电子能谱(AES)分析了表面膜的组成,并且对SO_4~(2-)的作用进行了初步的探讨。     

Characterization of cathodic film formed during reduction of chromic acid: role of sulphuric acid concentration

The surface composition of chromium, electrodeposited from a chromic acid solution with different amounts of sulphuric acid, has been investigated by means of Auger Electron Spectroscopy (AES) and X‐ray Photoelectron Spectroscopy (XPS). The quantity of sulphuric acid is a critical parameter in order to form metallic chromium instead of a non‐reducible chromium (III) oxide layer. The intermediate cathodic film formed on the electrode before the metallic chromium deposition has been investigated and XPS measurements have shown that a chromium oxide film is formed whatever the sulphuric acid concentration. However, in the presence of sufficient amounts of sulphate, this oxide is dissolved or the layer is broken down, giving rise to a free steel surface where the reduction of chromate ions into metallic chromium can take place. Copyright © 2004 John Wiley & Sons, Ltd.     

酸性介质中丙烯基硫脲对铜阳极溶出和阴极沉积过程影响的EQCM研究

采用循环伏安(CV)和电化学石英晶体微天平(EQCM)方法研究了酸性介质中铜阳极溶出和阴极沉积过程以及丙烯基硫脲(AT)对该过程的影响. 结果表明, 铜阳极溶出和阴极沉积过程的M/n分别为32.0和34.2 g/mol, 都是两电子过程, 其间未检测到Cu(Ⅰ)中间产物. AT改变了铜阳极溶出和阴极沉积的历程. 在含AT的溶液中, 铜阳极溶出和阴极沉积过程的M/n分别为61.9和65.4 g/mol, 可指认铜阳极溶出产物为CuAT+, 并提出了AT存在下Cu阳极溶出和阴极沉积过程的反应机理; 从电极表面质量定量变化的角度提供了Cu阳极溶出和阴极沉积过程的新数据.     

Influence of electrodeposition conditions on the properties of CdTe films

The results of the influence of electrodeposition conditions on the structural, compositional, optical, and photoelectrochemical properties of CdTe thin films deposited in one-step electrochemical method are presented. The CdTe films were prepared electrochemically from aqueous acidic solution with low ratios of Cd²⁺ ions to Te(IV) ions concentration. Instead of commonly used TeO₂, water-soluble Na₂TeO₃ was used as a source of tellurium ions. The cathodic deposition of CdTe was performed at different constant potentials from solutions containing different cadmium and tellurium ions concentration. As-deposited CdTe thin films were studied by different analytical techniques. The X-ray photoelectron spectroscopy spectra exhibited CdTe formation on the electrode with some amount of tellurium oxides and cadmium oxides. The best quality CdTe deposits, free of TeO₂, were formed in bath containing excess of Cd²⁺ ions and at the potential of ?0.65 V vs. saturated calomel electrode, slightly more positive than E _eq of Cd/Cd²⁺ system. Structural X-ray diffraction studies revealed polycrystallinity of deposits with the highest content of the (111)-oriented cubic (111) form. Optical band gap energy values were found in the range from 1.36 to 1.6 eV for CdTe films prepared at various synthesis conditions. The preliminary photoelectrochemical studies have shown that the variation of the deposition potential as well as bath composition leads to the formation of p- or n-type CdTe films. As-deposited CdTe films were not stable in polysulfide solution under illumination.     

硫酸溶液中的铋对铅酸蓄电池负极性能的影响

电解液;硫酸溶液中的铋对铅酸蓄电池负极性能的影响     

Factors affecting the preparation and properties of electrodeposited silica thin films functionalized with amine or thiol groups

Well-adherent sol-gel-derived silica films functionalized with amine or thiol groups have been electrogenerated on gold electrodes and both the deposition process and the film properties have been studied by various physicochemical techniques. Electrodeposition was achieved by combining the formation of a self-assembled "nanoglue" on the electrode surface, the sol-gel process, and the electrochemical manipulation of pH to catalyze polycondensation of the precursors. Gold electrodes pretreated with mercaptopropyltrimethoxysilane (MPTMS) were immersed in sol solutions containing the selected precursors (tetraethoxysilane, TEOS, in mixture with (3-aminopropyl)triethoxysilane, APTES, or MPTMS) where they underwent a cathodic electrolysis to generate the hydroxyl ions that are necessary to catalyze the formation of the organosilica films on the electrode surface. Special attention was given to analyze the effects of deposition time and applied potential and to compare APTES and MPTMS films. Characterization was made using quartz crystal microbalance, scanning electron microscopy, cyclic voltammetry, and atomic force microscopy (including in situ monitoring). The electrodeposition process was found to occur at two growing rates: a first slow stage giving rise to rather homogeneous, yet rough, films with thickness in the sub-mum range (increasing continuously when increasing the deposition time), which was followed by a faster gelification step resulting in much thicker (>1 microm) and rougher macroporous deposits. These two successive situations were observed independently on the applied potential except that more cathodic values led to narrower sub-microm ranges (as expected from the larger amounts of the electrogenerated hydroxyl catalyst). Thiol-functionalized silica films were deposited more rapidly than the amine ones and, for both of them, permeability to redox probe was found to decrease when increasing the film thickness because of higher resistance to mass transport.     

Fe-Ni-S软磁薄膜的电沉积

酸性镀液中以硼酸为缓冲剂、柠檬酸三钠为配合剂,在紫铜箔上电沉积得到非晶Fe-Ni-S合金薄膜。 采用扫描电子显微镜和能谱分析技术(EDS)研究了镀液组成和沉积条件对镀层表面形貌和组成的影响。 结果表明,在镀液中加入2 g/L C7H5O3NS（糖精）和0.4 g/L 1,4-丁炔二醇可获得表面平整无裂缝和较小内应力的合金镀层;电流密度和镀液pH值对镀层组成影响较小,但施镀温度对镀层组成影响较大。 获得了理想的镀液组成和沉积条件,所得Fe73Ni9.5S17.5薄膜的X射线衍射表明其为非晶结构,在室温下具有较高的饱和磁化强度(Ms约为876.25 kA/m)和较低的矫顽力(Hc约为4.96 kA/m),具有良好的软磁性能。 循环伏安曲线和阴极极化曲线均表明,镀液中CS(NH2)2会促进Fe-Ni-S共沉积。     

Copper in Acid Chloride Solutions: Electrochemical Behavior by Quartz Microgravimetry and Voltammetry

The cathodic deposition of copper on a gold electrode and its subsequent anodic dissolution in an acid chloride solution, where two successive stages of a one-electron transfer are distinguishable because of the stability of chloride complexes of Cu(I), is studied by voltammetry and quartz microgravimetry. The formation of a film of an intermediate compound of Cu(I) during the deposition and dissolution of copper is revealed experimentally. Techniques for identifying the intermediate solid species are suggested. During a cathodic polarization, a film of intermediate compound CuCl forms at a reduced concentration of chloride ions in the Cu(II)/Cu(I) process, while during the anodic dissolution of the copper deposit formed during the cathodic polarization the intermediates appear in the Cu(0)/Cu(I) process, the concentration of chloride ions notwithstanding. The change in the electrochemical behavior of the system caused by a decrease in the concentration of chloride ions is explained.     

Electrodeposition of carbon nanotubes-chitosan-glucose oxidase biosensing composite films triggered by reduction of p-benzoquinone or H2O2

We report here on the electroreduction of p-benzoquinone (BQ) or H2O2 as a new trigger for simple, fast, uniform, and controllable electrodeposition of chitosan (CS) hydrogels and biosensing nanocomposite films of CS, multiwalled carbon nanotubes (MWCNTs), and glucose oxidase (GOD). The multiparameter electrochemical quartz crystal microbalance (EQCM) based on crystal electroacoustic impedance analysis was used to dynamically monitor the deposition processes. When the EQCM Au electrode was immersed in a weakly acidic solution (here pH 5.1 acetic buffer) containing BQ (or H2O2) and CS, the proton consumption during BQ (or H2O2) electroreduction increased the local solution pH near the electrode surface and led to the deposition of CS hydrogel on the electrode surface at local pH near and above the pKa value of CS. The concentration of BQ (or H2O2) required for CS electrodeposition was theoretically evaluated based on an electrogenerated base-to-acid titration model and supported by experiments. Co-deposition of GOD and MWCNTs with the CS hydrogel was achieved, and the resulting MWCNTs-CS-GOD nanocomposite films were demonstrated for glucose biosensing. The MWCNTs-CS-GOD enzyme electrode prepared by BQ reduction exhibited a current sensitivity of 6.7 microA mM-1 cm-2 to glucose, and the linear range for glucose detection at 0.7 V vs SCE was from 5 microM to 8 mM, with a detection limit of 2 microM and a Michaelis-Menten constant of 6.8 mM. The BQ-electroreduction protocol exhibited the best sensor performance, as compared with H2O2-reduction and previously reported water-reduction values. The present protocol via electroreduction of a deliberately added oxidant that is accompanied by a local pH change is highly recommended for wider applications in pH-dependent deposition of other films.     

Electrolysis of water in the diffusion layer: first-principles molecular dynamics simulation

With Car-Parrinello molecular dynamics simulations the elementary reaction steps of the electrolysis of bulk water are investigated. To simulate the reactions occurring near the anode and near the cathode, electrons are removed or added, respectively. The study focuses on the reactions in pure water. Effects depending on a particular electrode surface or a particular electrolyte are ignored. Under anodic conditions, the reaction continues till molecular oxygen is formed, under cathodic conditions the formation of molecular hydrogen is observed. In addition the formation of hydrogen peroxide is observed as an intermediate of the anodic reaction. The simulations demonstrate that the electrochemistry of oxygen formation without direct electrode contact can be explained by radical reactions in a solvent. These reactions may involve the intermediate formation of ions. The hydrogen formation is governed by rapid proton transfers between water molecules.     

Preparation of Amorphous Film on Ni-S Alloy by Electroplating Method

IntroductionRecently,amorphousalloyshaveattTactedconsiderableattentionasnewfunctionalmaterial.Theycanbeattainedbyelectroplating,suchasplatingNi-P,Ni-B,Fe-W,Ni-Mo,Fe-P,etc..ThestructureofcodepositednickelandsulfurwasfirststudiedbyBrilllwithXRD.He,however,didnotdiscussthemethodofcodepositingnickelandsulfur.Afterwards,thereweresomereportsonNi-Sdeposit.Ingeneral,aNi-SdepositcanbeobtainedbyelectroplatingfromaWattsbathcontainingsuchsulfursourcesasthiocyanateKCNS',thioureaNH,CSNH,',andso…     

Effect of hydrodynamic electrolysis conditions on the kinetics of cathodic processes in chromium(III) sulfate electrolytes

The effect of stirring on the kinetics of electrode processes in a chromium-plating electrolyte based on chromium(III) sulfate is studied. The electrolyte, in which thick (up to 120 μm) hard chromium coatings can be obtained, is stirred with a magnetic stirrer. Hydrodynamic conditions in the system are calibrated in a modeling solution containing the same components as the electrolyte (with the exception of chromium sulfate which is replaced by an equivalent amount of aluminum sulfate), by the reaction of discharge of hydronium ions. It is shown that reactions of discharge of hydronium ions and incomplete reduction of trivalent chromium ions occur in a diffusion mode. The Cr(III)-Cr(II) system is classified with quasi-reversible redox electrodes and is described by the known equation for diffusion kinetics. The electrodeposition of metallic chromium occurs in the mixed kinetics mode     

The processes involved in the Se electrodeposition and dissolution on Au electrode: the H<Subscript>2</Subscript>Se formation

The processes involved in the Se electrodeposition, mainly the one related to the formation of H₂Se species on Au electrode in perchloric acid solutions, have been investigated through cyclic voltammetry, electrochemical quartz crystal microbalance (EQCM), rotating ring-disc electrode (RRDE), and atomic force microscopy (AFM) techniques. In the experiments performed with the EQCM, with the potential sweep in the negative direction, the responses for the mass variation were divided in three well-defined potential regions: A (from 1.55 to 0.35 V), B (from 0.35 to −0.37 V), and C (from −0.37 to −0.49 V). It was verified that the following processes can occur, respectively: the species (AuO)₂H₂SeO₃ was desorbed during the AuO reduction, the reduction of Se(IV) to Se(0), and the formation of H₂Se. When the potential was swept in the positive direction, the responses for the mass variation were divided in four well-defined potential regions: D (from −0.49 to 0.66 V), E (from 0.66 to 0.99 V), F (from 0.99 to 1.26 V), and G (from 1.26 to 1.55 V), and the described processes in these regions were, respectively: the Se deposition and adsorption of water molecules and/or perchlorate ions, the Se dissolution, the Se incorporating mass in the form of HO–Se, and the Au oxidation (all potentials are referred to the Ag/AgCl electrode). Making use of the RRDE, using the collection technique, the formation of H₂Se species during the Se electrodeposition was investigated. Therefore, it was confirmed that this species is formed on the disc electrode between −0.3 and −0.55 V vs the Ag/AgCl potential range (collecting the oxidized compound onto the ring electrode). AFM images also indicated that the surface topography of the Se-massive deposit on Au is different from the images registered after the formation of H₂Se species, confirming the cathodic stripping of Se.     

二甲基甲酰胺中电沉积制备钐钴合金

稀土;恒电位电沉积;柠檬酸;二甲基甲酰胺中电沉积制备钐钴合金     

Electrochemical synthesis of Zn-Al layered double hydroxide (LDH) films

A new electrodeposition condition to produce Zn-Al LDH films was developed using nitrate solutions containing Zn (2+) and Al (3+) ions. Deposition was achieved by reducing nitrate ions to generate hydroxide ions on the working electrode. This elevates the local pH on the working electrode, resulting in precipitation of Zn-Al LDH films. The effect of deposition potential, pH of the plating solution, and the Zn (2+) to Al (3+) ratio in the plating solution on the purity and crystallinity of the LDH films deposited was systematically studied using X-ray diffraction and energy dispersive spectroscopy (EDS). The optimum deposition potential to deposit pure and well-ordered Zn-Al LDH films was E = -1.65V versus a Ag/AgCl in 4 M KCl reference electrode at room temperature using a solution containing 12.5 mM Zn(NO 3) 2.6H 2O and 7.5 mM Al(NO 3) 3.9H 2O with pH adjusted to 3.8. The resulting film contained 39 atomic %Al (3+) ions replacing Zn (2+) ions, leading to a composition of Zn 0.61Al 0.39(OH) 2(NO 3) 0.39. xH 2O. Increasing or decreasing the aluminum concentration in the plating solution resulted in the formation of aluminum- or zinc-containing impurities, respectively, instead of varying aluminum content incorporated into the LDH phase. Choosing an optimum deposition potential was important to obtain LDH as a pure phase in the film. When the potential more negative than the optimum potential is used, zinc metal or zinc hydroxide was deposited as a side product, whereas making the potential less negative than the optimum potential resulted in the formation of zinc oxide as the major phase. The pH condition of the plating solution was also critical, as increasing pH destabilizes the formation of the LDH phase while decreasing pH promoted deposition of other impurities.     

The formation and reduction of anodic films on electrodeposited ruthenium

The formation and reduction of anodic films on bright ruthenium was investigated using substrates prepared by electrodeposition onto gold-plated platinum from a commercial ruthenium bath operated at 70°C. Anodic films formed on the ruthenium may be reduced by maintaining the electrode at potentials below 0.2 V. The reduction behaviour was markedly affected by the anodization potential and, at short times, by the period of anodization. The bell-shaped cathodic current-time curves observed with films produced at potentials in the region of 1.2 V, suggest that the process in this case involves nucleation of reduction centres on a relatively stable surface layer. The influence of potential, time, and both the concentration and nature of the electrolyte on the extent of anodic film formation was investigated. The results are discussed in terms of the formation of stable phase oxides in the relatively thick anodic film produced on the ruthenium surface.     

Potassium ion-selective electrode based on a cobalt(II)-hexacyanoferrate film-modified electrode

A potassium ion-selective electrode based on a cobalt(II)-hexacyanoferrate(III) (CHCF) film-modified glassy carbon electrode is proposed. The electroactive film is introduced onto the glassy carbon electrode surface by electrodeposition of cobalt, which forms a thin CHCF film on subsequent anodic scanning in KClHCl solution (pH 5.0–5.5) containing K₃Fe(CN)₆. The thickness of the film on the electrode surface can be controlled by changing the electrodeposition time and the concentrations of cobalt(II) and Fe(CN)^3?₆ ions. The modified electrode exhibits a linear response in the concentration range 1 × 10^?1 ?3 × 10^?5 M potassium ion activity, with a near-Nernstian slope (48–54 mV per decade) at 25 ± 1°C. The detection limit is 1 × 10^?5 M. The stability, response time and selectivity were investigated. The electrode exhibits good selectivity for potassium ion with the twelve cations investigated. The relative standard deviation is 1.5% (n=10). The effects of the thickness of the electroactive film and the pH of the solution on the electrode response were also investigated.     

不同分子量PEG的铜电镀液对电化学沉积铜行为的研究

研究了在酸性镀铜溶液中添加不同分子量的PEG对直径为50微米、深径比为1的镀层盲孔填充效果的影响.结果表明,随着PEG分子量的增加,电镀铜溶液的微孔填充力明显提高.电流密度为2 A/dm2,添加剂PEG分子量(u)超过6000时,镀液可以完全填充盲孔,镀层不出现任何空洞和缝隙.这是由于添加剂PEG能明显加强电镀铜镀液阴极极化,抑制了电镀铜的沉积.同时,PEG于镀液中的扩散系数还随其分子量的增加而降低,从而增加了SPS在微孔底部的吸附力,加速了电镀铜在微孔底部的沉积.进一步,增大PEG分子量,沉积铜膜的表面粗糙度、铜膜结晶度和电阻率均有所降低.     

Reduction of Triple-Charged Chromium Ions on Indium Cathode in Alkaline Sulfate Solutions

The problem of how the surface coverage of an indium electrode with chromium adatoms formed during the discharge of Cr(III) ions affects electrolytic evolution of hydrogen in alkaline solutions is studied using linear and cyclic voltametry. The method used permits stating that, in alkalinized media, the chromium deposition abruptly decelerates due to the formation of a hydroxide film on the electrode surface. Based on the results obtained, it is assumed that this film consists of mixed Cr(III)- and Cr(II)-containing hydroxo compounds (of the chromite type) and coadsorbed Cr_n clusters formed in the course of electrolysis.