脉冲激光沉积PMN-PT薄膜及其性能研究

以较低温度烧结获得的PMN-PT块材料为靶,采用脉冲激光沉积方法在石英衬底上制备了PMN-PT薄膜,研究了后续退火处理对PMN-PT薄膜的结构及光学特性的影响.结果显示,采用脉冲激光沉积可获得质量较好的钙钛矿结构的PMN-PT薄膜,优化的后续退火温度大约在550℃～750℃之间.     

利用脉冲激光沉积法制备高Mg掺杂的六方相MgZnO薄膜

选用Mg0.2Zn0.8O陶瓷靶,利用脉冲激光沉积(PLD)法,在单晶Si(100)和石英衬底上生长了一系列MgZnO薄膜(MZO)。通过X射线衍射(XRD)、扫描电子显微镜(SEM)、X射线能谱(EDS)和紫外可见光透射光谱(UV-Vis)等实验手段,研究了在不同工作压强下生长的薄膜样品的晶体结构、微观形貌和光学性能的变化。结果表明:所有的薄膜样品都是单一的ZnO六方相,禁带宽度随生长压强的升高而增加,变化范围在3.83～4.05eV之间,最短吸收边接近300nm。     

脉冲激光沉积(PLD)法生长高质量ZnO薄膜及其发光性能

采用脉冲激光沉积(PLD)法在单晶Si(100)衬底上生长ZnO薄膜,以X射线衍射(XRD)、原子力显微镜(AFM)和透射电镜(TEM)等手段分析了所得ZnO薄膜的晶体结构和微观形貌。优化工艺(700℃,20Pa)下生长的ZnO薄膜呈c轴高度择优取向,柱状晶垂直衬底表面生长,结构致密均匀。室温光致发光(PL)谱分析结果表明,随着薄膜生长时O₂分压的增大,近带边紫外发光峰与深能级发光峰之比显著增强,表明薄膜的结晶性能和化学计量比都有了很大的改善。O₂分压为20Pa时所生长的ZnO薄膜具有较理想的化学计量比和较高的光学质量。     

飞秒脉冲激光沉积钕掺杂薄膜特性研究

采用脉冲激光沉积(PLD)技术在Si(100)衬底上生长了Nd∶YAG薄膜以及Nd∶Glass薄膜,利用扫描电子显微镜(SEM)、能谱仪(EDS)、傅里叶变换红外光谱仪(FTIR)、光学掺量振荡器(OPO)以及光栅光谱仪等测试装置分析了薄膜的表面和断面结构形貌、组成成分、光学吸收谱以及光致发光谱。结果表明：在室温衬底温度下生长的Nd∶YAG薄膜以及Nd∶Glass薄膜均呈无规则非定型结构,没有明显的取向性微晶生长;PLD生长的Nd∶YAG薄膜中存在0.15 at.%化学计量比的Nd元素;Nd∶YAG块体靶材在750和808 nm有两个明显的吸收峰,而薄膜没有明显的吸收峰;Nd∶YAG薄膜在808 nm波长泵浦光下没有明显的光致发光谱峰,而Nd∶Glass薄膜在877和1 064 nm波长处有明显的光致发光谱峰。说明在室温衬底温度下生长的Nd∶Glass薄膜中Nd元素以Nd3+光学活性离子形式掺杂进玻璃基质中,而Nd∶YAG薄膜中的Nd元素没有以Nd3+光学活性离子形式掺杂进YAG基质中。     

脉冲激光沉积GaN薄膜的结构和光学特性研究

采用准分子脉冲激光,在Si(111)衬底上生长了带有AlN缓冲层的GaN薄膜, 利用X射线衍射(XRD)、原子力显微镜(AFM)和光致发光光谱(PL)等测试手段研究了不同沉积温度所生长的GaN薄膜结构特征和光学性能.研究表明:沉积温度影响GaN薄膜结构和光学性能,黄带发射峰主要与晶体缺陷有关.在400～700℃沉积范围内随着温度升高,GaN薄膜结构和光学性能提高.     

Pulsed laser deposition of doped skutterudite thin films

Ca_xCo₄Sb₁₂ skutterudite thin films have been prepared by pulsed laser deposition using a Nd:YAG laser working at 532 or 266 nm of wavelength. Characterization has been carried out by X-ray diffraction, atomic force microscopy and scanning electron microscopy. Emphasis has been put on the difficulty to obtain the skutterudite phase. Influence of the deposition temperature, the way of sticking the substrate, the laser fluence, the base pressure prior to deposition and the laser wavelength has been studied. All parameters revealed to have a drastic effect, and the skutterudite could only be achieved in a very narrow range of temperature and laser fluence, for a given wavelength, showing the importance on how these parameters are measured to ensure reproducible results.     

脉冲激光沉积方法制备ZnO薄膜生长参量对发光特性的影响

用脉冲激光沉积（PLD）方法在Si（111）衬底上制备了ZnO薄膜。以325nmHe-Cd激光器为光源对薄膜进行了荧光光谱分析,用X射线衍射仪（XRD）和原子力显微镜（AFM）分别对薄膜的结构和形貌进行了分析。脉冲激光沉积方法的主要生长参量为氧压、激光重复频率、生长温度和激光能量。通过控制这些参量变量,研究了这些参量对ZnO薄膜发光特性的影响,得到了用于紫外发光的ZnO薄膜生长的优化条件：发现在温度为650℃左右、氧压50Pa左右、频率5Hz左右的范围内能得到半峰全宽较窄,强度较大的紫外发光峰。分析认为紫外峰主要是由激子辐射复合发光形成的,绿光带主要和Ozn的存在密切相关,氧空位是蓝光发射的重要原因。     

氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响

使用脉冲激光沉积(PLD)方法在石英(SiO2)和单晶Si(111)基底上制备了具有高c轴择优取向的ZnO薄膜。测试结果显示:在30～70sccm氧气流量范围内,氧气流量50sccm时制备的ZnO薄膜具有较好的结晶质量、较高的光学透过率(≥80%)、较高的氧含量(～40.71%)、较快的生长速率(～252nm/h)和较好的发光特性:450～580nm附近发射峰最弱,同时～378nm附近的紫外发光峰最强,表明薄膜材料中含有较少的氧空位等缺陷。     

Size and Interface Control of Novel Nanocrystalline Materials Using Pulsed Laser Deposition

We have developed a novel method based upon pulsed laser deposition to produce nanocrystalline materials with an accurate grain size and interface control. Using this method, the grain size in the case of Cu thin films was controlled by introducing a few monolayers of insoluble elements having high surface energy such as W, which increases interfacial energy and provides more nucleation sites. The grain size is determined by the thickness of Cu layer and the substrate temperature at which it transforms into islands (nanocrystalline grains) of fairly uniform size which we desgnate as self-assembling approach. Using this approach, the grain size was reduced from 160nm (Cu or Si (100) substrate) to 70–80nm for a simple W layer (Cu/W/Si (100)) to 4nm for a multilayer (Cu/W/Cu/W/Si (100)) thin film. The hardness of these films was evaluated using a nanoindentation technique, a significant increase in hardness from 2.0GPa for coarse-grained 180nm to 12.5GPa for 7nm films was observed. However, there is decrease in hardness below 7nm for copper nanocrystals. The increase in hardness with the decrease in grain size can be rationalized by Hall–Petch model. However, the decrease in slope and eventually the decrease in hardness below a certain grain size can be explained by a new model based upon grain-boundary deformation (sliding). We also used a similar materials processing approach to produce quantum dots in semiconductor heterostructures consisting of Ge and ZnO dots or nanocrystals in AlN or Al₂O₃ matrix. The latter composites exhibit novel optoelectronic properties with quantum confinement of phonons, electrons, holes and excitons. Similarly, we incorporated metal nanocrystals in ceramics to produce improved mechanical and optical properties.     

Effect of [Zn]/[S] ratios on the properties of chemical bath deposited zinc sulfide thin films

ZnS thin films have been prepared by chemical bath deposition (CBD) technique onto glass substrates deposited at about 80 °C using aqueous solution of zinc sulfate hepta-hydrate, ammonium sulfate, thiourea, ammonia and hydrazine hydrate. Ammonia and hydrazine hydrate were used as complexing agents. The influence of the ratio of [Zn]/[S] on formation and properties of ZnS thin films has been investigated. The ratio of [Zn]/[S] was changed from 3:1 to 1:9 by varying volumes and/or concentrations of zinc sulfate hepta-hydrate and thiourea in the deposition solution. The structural and morphological characteristics of films have been investigated by X-ray diffraction (XRD), scanning electron microscope and UV-vis spectroscopic analysis. ZnS films were obtained with the [Zn]/[S] ratio ranged from1:1 to 1:6. In the cases of [Zn]/[S] ratio ≥ 3:1 or ≤1:9, no deposition was found. Transparent and polycrystalline ZnS film was obtained with pure-wurtzite structure at the [S]/[Zn] ratio of 1:6. The related formation mechanisms of CBD ZnS are discussed. The deposited ZnS films show good optical transmission (80-90%) in the visible region and the band gap is found to be in the range of 3.65-3.74 eV. The result is useful to further develop the CBD ZnS technology.     

Au-BaTiO3复合薄膜的脉冲激光沉积制备及其非线性光学效应

利用脉冲激光沉积技术制备了掺杂金纳米颗粒的钛酸钡复合薄膜Au-BaTiO3,用高分辨透射电镜和X射线光电子能谱对薄膜进行了表征。从透射电镜照片可以看出,制备的样品中金颗粒大小约为2~3 nm,呈球形,均匀分布在载体介质中。X射线光电子能谱给出了Ba3d、Ti2p和Au4f电子芯能级结合能,结果表明载体介质是以BaTiO3的形式存在,而Au以金属的状态掺杂其中。330~800 nm范围的线性吸收谱表明样品中Au颗粒的共振吸收峰在500 nm附近。用单光束纵向扫描方法测量了样品的三阶非线性光学效应,使用的光源为调Q的YAG激光器,波长为532 nm,脉宽为10 ns,得到的非线性折射率和非线性吸收系数分别为-2.42×10-6esu和2.22×10-6m/W,表明了Au-BaTiO3复合薄膜有较大的非线性光学响应。     

Achieving desired quality of ZnS buffer layer by optimization using air annealing for solar cell applications

The possibility of maximum transmittance at lower thickness of light transmitting ZnS layer and its optimization by air-annealing as an alternative to hazardous and expensive CdS is reported in this communication in order to achieve better buffer layer for solar cells. Thin films of ZnS were deposited using e-beam evaporation on glass and ITO substrates and subjected to air-annealing followed by characterizations for physical properties. XRD patterns revealed amorphous behavior which transformed into cubic (111) plane with change of substrate and annealing whereas surface topography reveals hill and deep valley like structures. Optimal transmittance of maximum 95% in visible region, direct band gap of 3.38 eV and maximum electrical conductivity were observed for 200 °C annealed films. The study refers that films annealed at 200 °C are claimed to be suitable for buffer layer applications.     

倾斜式生长ZnS纳米柱状薄膜及其透射性能的研究

采用倾斜式生长的方法,在本底真空为3×10-4 Pa,生长率为0.2 nm·s-1的条件下,通过改变衬底的法线方向与入射粒子流的夹角α,在ITO导电玻璃衬底上制备了ZnS纳米薄膜。在α=80°和85°时,样品的Ｘ射线衍射谱证实了不同倾斜角时所制备薄膜中均有纳米ZnS晶体形成,扫描电子显微镜(SEM)图像显示,所形成的薄膜均呈现出了柱状结构,并且倾斜角为85°时所得到的纳米柱直径大于80°时所得结果;在α=0°时,相应测量结果表明,虽然在不同衬底上也形成了纳米ZnS晶体薄膜,但并未见柱状结构,而是形成了一层均匀且致密的薄膜。对两种薄膜结构的生长动力学过程作了分析。ITO衬底上薄膜的透射光谱表明ZnS柱状薄膜能够提高可见光的透过率,因此对柱状ZnS纳米薄膜的研究将有利于提高电致发光器件的发光效率。     

脉冲激光沉积法制备(Cu,C)Ba2Ca3Cu4Oy 涂层导体

(Cu,C)Ba2Ca3Cu4Oy 是超导转变温度Tc 约为116 K 的无毒铜氧化物超导材料, 在迄今为止的超导材料中, 高压法制备的(Cu,C)Ba2Ca3Cu4Oy 多晶块材在液氮温区具有最高的不可逆场 Hirr ~ 15 T. 为了实现(Cu,C)Ba2Ca3Cu4Oy 超导材料的规模化制备, 本文利用脉冲激光沉积技术在 LaMnO3/MgO/Y2 O3/Al2 O3/Hastelloy 柔性金属基底上依次外延生长了 LaAlO3 帽子层和(Cu,C)Ba2Ca3Cu4Oy 超导薄膜. X 射线衍射实验结果表明(Cu,C)Ba2Ca3Cu4Oy 薄膜沿a 轴外延生长, 电学输运数据表明(Cu,C)Ba2Ca3Cu4Oy 薄膜的超导转变温度Tc onset 为115K, 零电阻温度Tc0 为52 K, 不可逆场为9 T@35 K. 本文首次报道了(Cu,C)Ba2Ca3Cu4Oy 在柔性金属缓冲层衬底的成功制备, 推动了(Cu,C)Ba2Ca3Cu4Oy 超导材料的实用化进程.     

Pulsed laser deposition of nanostructured Ag films

Ultra-thin (0.5-5 nm) films of Ag have been prepared by pulsed laser deposition in vacuum using a 26 ns KrF excimer laser at 1 J cm⁻². The deposition was controlled using a Langmuir ion probe and a quartz crystal thickness monitor. Transmission electron microscopy showed that the films are not continuous, but are structured on nanometer size scales. Optical absorption spectra showed the expected surface plasmon resonance feature, which shifted to longer wavelength and increased in strength as the equivalent film thickness was increased. It is shown that Maxwell Garnett effective medium theory can be used to calculate the main features of optical absorption spectra.     

缓冲层对LBO晶体上1 064 nm|532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1％和0.2％.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1％和25.8％,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

缓冲层对LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1%和0.2%.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1%和25.8%,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

溶液pH值对化学浴法制备的Cd_xZn_(1-x)S薄膜光电性能的影响

采用氯化镉、氯化锌、硫脲、柠檬酸钠和氨水的溶液体系通过化学浴沉积法合成Cd_xZn_(1-x)S薄膜,利用X射线衍射分析、扫描电子显微镜、能谱仪和紫外可见近红外分光光度计等表征手段研究了Cd_xZn_(1-x)S薄膜的形貌、相结构和光学性能,测试了薄膜的光电流响应曲线并对薄膜的光电性能进行了分析.结果表明:在pH值为10至13范围内成功制备了均匀的Cd_xZn_(1-x)S薄膜;随着pH值升高,薄膜中Zn原子比例与光学带隙减小;制备的薄膜均表现出明显的光电导现象.pH值为11和12时薄膜的表面最为平整致密,结晶性最好,光学带隙分别为2.92eV和2.72eV,光暗电导比均为1.20,光源关闭后电流下降过程最快,10s后电流分别下降了约68.55%和69.39%.