H2Cl^＋（X^1A1）体系的结构与势能函数

在ａｂｉｎｉｔｉｏ计算的基础上，应用多体展式理论方法导出了Ｈ２Ｃｌ＋（Ｘ１Ａ１）体系的全势能表面。结果表明在Ｃｌ＋Ｈ＋２通道上存在一鞍点，垒高０．５ｅＶ。     

低温宽带NaCl（OH^—）：（F^＋2）H色心激光的实验研究

在ＮａＣｌ晶体中掺入ＯＨ＾－离子可以有效地提高Ｆ＾＋２心的稳定性。采用四镜折迭Ｘ型像散补偿腔，获得了峰值波长１．５７μｍ、输出功率＞２５０ｍＷ的低温宽带ＮａＣｌ（ＯＨ＾－）：（Ｆ＾＋２）Ｈ色心激光。本文着重讨论ＯＨ＾－对Ｆ＾＋２心的稳定作用和影响色心激光振荡的各种因素。     

金属羰基化合物（CpFe（CO）2）2与金属氧化物表面作用的傅里叶变…

用漫反射红外光谱和光声红外光谱研究了金属羰基化合物（ＣｐＦｅ（ＣＯ）２）２Ｃｐ＝η＾５－Ｃ５Ｈ５与酸性，中性和碱性Ａｌ２Ｏ３及ＴｉＯ２的相互作用，结果表明，在Ａｌ２Ｏ３表面生成的洗生物种类及浓度与Ａｌ２Ｏ３的酸碱度明显相关，在酸性Ａｌ２Ｏ３表面，主要存在衍生物（ＣｐＦｅ（ＣＯ）２Ｆｅ－Ｈ－Ｆｅ（ＣＯ２Ｃｐ）＾＋及少量的ＣｐＦｅ（ＣＯ）２（－Ｏ－）；在中性Ａｌ２Ｏ３表面存在的ＣｐＦｅ（ＣＯ）２（－Ｏ     

束—气条件下He（2^3S）＋CH2Cl2碰撞传能反应的动力学研究

本文在束－气条件下研究了亚稳态原子Ｈｅ（２＾３Ｓ）与ＣＨ２Ｃｌ２间的传能反应，测得了由该反应产生的ＣＨ（Ａ＾２△－Ｘ＾２П），ＣＨ（Ｂ＾２∑＾－Ｘ＾２П）ＣＨ（Ｃ＾２∑＾＋－Ｘ＾２П）和Ｈ原子（Ｂａｌｍｅｒ系）的化学发光光谱。通过对ＣＨ（Ａ，Ｂ）的光谱进行计算机模拟，推测出初手的ＣＨ（Ａ＾２△，ｖ＾１＝０－２）态振动分布为Ｎｏ：Ｎ１：Ｎ２＝１００：４０±５：１９±２，ＣＨ（Ａ＾２△，ｖ＾１＝０－０     

NaCl（OH－）中K~＋对F＋2型心的形成及其光谱性质的影响

研究了Ｋ＋对ＮａＣｌ（ＯＨ－）中（Ｆ＋２）Ｈ心的形成及其光谱性质的影响。结果表明，Ｋ＋的存在抑制了Ｆ＋２型心的形成，改变了（Ｆ＋２）Ｈ心的光谱性质，拓宽了发射谱的半功率谱宽。从而修正了Ｐｏｌｏｃｋ的实验结果。同时指出，研制具有更宽波长发射范围的Ｎａ１－ｘＫｘＣｌ（ＯＨ－）复合基质Ｆ＋２型色心激光材料是可能的     

类锂V^20＋—Cu^26＋离子的谱线波长和振子强度

用多组态ＨＸＲ方法计算了类Ｌｉ离子Ｖ２０＋－Ｃｕ２６＋１ｓ２ｎｌ（ｎ＝２～６，ｌ＝０～４）组态能级之间的电偶极跃迁波长和振子强度，并和已有的实验结果进行了比较。     

H2O＋Cl→HCl＋OH反应中D同位素的动力学效应的理论研究

根据传统过渡态，变分过渡理论计算了Ｈ２Ｏ＋Ｃｌ→ＨＣｌ＋ＯＨ（Ｒ１）反应中Ｄ代替的同位素动力学效应（ＫＩＥ）得到了ＨＯＤ＋Ｃｌ→ＤＣｌ＋ＯＨ（Ｒ２），ＤＯＨ＋Ｃｌ→ＨＣｌ＋ＯＤ（Ｒ３）反应不同的ＫＩＥ值，对ＫＩＥ进行了分解，讨论了平动（ｔｒａｒｓ）转动（ｒｏｔ）振动（ｖｉｂ）等各种因素的作用，在反应Ｒ２中，由于ＨＯＤ中ＯＤ键直接参与反应，Ｄ同位素的ＫＥ很大，对Ｒ２的ＫＩＥ分解表明，振动对ＫＩＥ贡献     

碳化钼催化剂的XPS研究

用程序升温碳化法在ＣＨ４／Ｈ２气流中，由前驱体ＭｏＣ２／Ｃ出发，制备了活性炭担载斩高分散Ｍｏ２Ｃ／Ｃ催化剂，并用ＸＰＳ和ＸＲＤ等方法考察了制备温度，钼含量，钝化处理和氢还原活化对催化剂表面状态的影响，６８０℃碳化制得的具有高甲烷活性的Ｍｏ２Ｃ／Ｃ催化剂表面钼中以Ｍｏ＾４＋组分为主，Ｃｌｓ单峰位于２８４．５ｅＶ未发现反映Ｃ－Ｍｏ键合的低结合能的Ｃｌｓ峰，６００℃氢还原后，表面的Ｏ／Ｍｏ原子比仍在０．     

稀土（Eu^3＋,Tb^3＋）含氮杂环配合物的合成,表征及其荧光性质

在无水乙醇溶液中分别合成了Ｅｕ＾２＋离子、Ｔｂ＾３＋离子与２，２‘－联吡啶、１，１０－邻菲罗啉押种配合物，研究了配合物的荧光性质，由于Ｐｈｅｎ含有较大范围的共轭π键和较好的刚性平面，含Ｐｈｅｎ配合物的荧光强度均要比配合物的强；配合物的高分辨荧光光谱表明，Ｅｕ＾３＋离子在Ｅｕ（Ｄｉｐｙ）２Ｃｌ３’２Ｈ２Ｏ和Ｅｕ（Ｐｈｅｎ）２Ｃｌ３．２Ｈ２Ｏ配合物中处于Ｃ１或Ｃ２或Ｃ５的对称性位置。     

ZrO2在Rh/γ-Al2O3催化剂中对NO催化还原反应的作用

测定了含ＺｒＯ２的Ｒｈ／γ－Ａｌ２Ｏ３催化剂上ＮＯ＋Ｃ２Ｈ４和ＮＯ＋Ｃ２Ｈ４＋Ｏ２的反应活恬性,并应用ＴＰＲ、ＸＲＤ、ＢＥＴ比表面等表征了ＺｒＯ２的加入方式和晶型对Ｒｈ／γ／Ａｌ２Ｏ３催化剂活性和结构的影响。结果表明,ＺｒＯ２的加入一定程度也抑制了Ｒｈ＾３＋与γ－Ａｌ２Ｏ３之间的相互作用和Ａｌ２Ｏ３的相变,提高了催化剂的热稳定性,明显提高了８５０℃老化样品的ＮＯ＋Ｃ２Ｈ４反应活性。对于ＮＯ＋Ｃ２     

Simulation of the radiation of a wide-aperture XeCl laser excited with an electron beam

A wide-aperture exciplex XeCl laser (308 nm) based on the Ar:Xe: HCl mixture and pumped with an electron beam is considered as a final unit of a system that generates subpetawatt femtosecond pulses.     

Excitation of iron atoms in a plasma of excimer emitters under transverse-discharge pumping

The optical characteristics of a transverse-discharge plasma initiated in He/Xe(Kr)/HCl(CF₂Cl₂) mixtures were studied. The mixtures contained a small amount of iron vapor due to metal cathode erosion. The iron atoms were shown to be excited by the spontaneous emission of KrCl (λ=22 nm) and XeCl (λ=308 nm) molecules in a nanosecond transverse discharge.     

低气压下XeCl准分子的形成研究

本工作利用高频介质阻挡放电对较低气压(70～1330 Pa)Xe/Cl_2混合气体中XeCl准分子的形成过程进行研究。通过探测不同Xe/Cl_2混合气压和不同Xe/Cl_2混合比条件下放电等离子体在285～315nm波长范围的荧光发射谱,得到了XeCl准分子在308nm附近的荧光发射以及荧光强度随气压变化曲线。得出该实验条件下生成XeCl准分子的最佳Xe/Cl_2混合比为4:1。     

Characteristic of a negative corona discharge in active media of Xe(6p−5d) and eximer lasers

The article contains results of a study of electric and optical characteristics of a negative corona discharge in a “needles-grid” electrode system in the mixtures He/Xe and He/Xe(Kr)/HCl, which are used in periodic pulsed electric-discharge Xe(6p−5d), XeCl, and KrCl lasers. The corona discharge was ignited in a multielectrode system whose length is commensurable with the length of the active medium of the lasers. Voltage-current characteristics, radiation spectra of the discharge plasma, and the dependences of the radiation intensity of atomic spectral lines and the band λ=308 nm of XeCl (B-X) on parameters of the corona discharge are studied. For the mixture He/Xe the corona discharge exists as a spatially homogeneous discharge that is intermediate between corona and glow discharges and is transformed into an anode streamer at higher charge voltages. Collisional purification of the 6p states of the Xe atom by helium was observed. In the mixture He/Xe/HCl the corona discharge is ignited in the form of individual generation zones and a dark external region and can be used in electric systems for pumping the active media of XeCl and KrCl lasers. Uzhgorod State University, 46, Pidgirna St., Uzhgorod, 294000, Ukraine. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 65, No. 2, pp. 205–210, March–April, 1998.     

Multiwave excimer lamps using XeF/XeCl/KrF/KrCl molecules

Results are presented of an investigation of the spectral and temporal characteristics of an electricdischarge excimer lamp emitting simultaneously on the 351 nm XeF, 308 nm XeCl, 249 nm KrF, and 222 nm KrCl transitions. The He/Kr/Xe/SF₆/HCl working mixtures were excited in a transverse discharge with ultraviolet spark preionization at a total pressure of 25–100 kPa. In order to obtain the same brightness the concentration ratio [Kr]/[Xe] for the excimer molecular transitions was 8/0.8 kPa, and that for the halogen-containing molecules was [SF₆]/[HCl][=[0.06–0.12]/[0.08–0.16] kPa. The duration of the radiation pulses for the excimer molecular transitions at atmospheric pressure was 100–200 ns and when the total mixture pressure was reduced to 250 kPa, this was doubled or trebled. The service life of the spontaneous radiation for B-X transitions in excimer molecules was 10⁵ pulses. Zh. Tekh. Fiz. 68, 64–67 (December 1998)     

An XeCl* Excimer Fluorescence Study on the Pulse Radiolysis of Xe–nCCl4 and Xe–SOCl2 Systems

The mechanism and kinetics of energy transfer from highly excited Xe states (E _ex > 9.5 eV), generated by a 12-ns electron beam, to chlorine donor molecules were deduced from time-resolved spectra of fluorescence in the region 240–340 nm. The emissions at 240–250 nm were assigned to Xe₂** excimers, and those at 308 and 340 nm to XeCl(B) and XeCl(C) states. Kinetic analysis of the recorded spectra for Xe–CCl₄ and Xe–SOCl₂ gas mixtures at constant xenon pressure and various pressures of molecular admixtures (0.1–1 Torr) allowed us to find the rate constants for the reactions (5) Xe** + RCI products, (6a) Xe** + RCl XeCl(B) + R*, and (6b) Xe** + RCl XeCl(C) + R*, where R is any radical.     

Xe2Cl fluorescence and absorption in self-sustained discharge XeCl lasers

Fluorescence at 490 nm from the triatomic excimer Xe₂Cl^* has been investigated to determine the 308 nm absorption due to this species in an x-ray preionized, self-sustained gas discharge XeCl laser. The dependence of Xe₂Cl^* density on laser intensity (at 308 nm), buffer gas and Xe and HCl partial pressures has been determined for discharges with a peak electrical power deposition of 2.5 GWl^–1. Xe₂Cl^* absorption is estimated to reach 0.6% cm^–1 under non-lasing conditions but decreases to a non-saturable 0.2% cm^–1 for intracavity laser intensity>1 MW cm^–2. XeCl^* and Xe₂Cl^* fluorescence intensities were found to be a similar for both helium and neon buffer gases but laser output was a factor of two greater with a neon buffer.     

Investigation of the plasma of a 308-nm XeCl excimer light emitter based on an inert-gas-CCl4 mixture

Results are presented from optical measurements of the plasma of a transverse volume discharge in He(Ar)/Xe/CCl₄(HCl) mixtures (at pressures of P=10–100 kPa) that are used in excimer lamps emitting the XeCl 308-nm band. Emission spectra in different stages of the formation and degradation of the active medium, as well as temporal and resource characteristics of the emitter, are studied. The main products of decomposition of CCl₄ molecules that are detected by the plasma emission are C* atoms and C ₂ ^* and CN* radicals. The operating resource of the XeCl emitter is found to be (3–5)×10⁴ pulses and depends strongly on the pressure and composition of the active medium. The duration of the emission pulse at a wavelength of λ=308 nm is 200–300 ns.     

Quantum state-resolved probing of strong-field-ionized xenon atoms using femtosecond high-order harmonic transient absorption spectroscopy

Femtosecond high-order harmonic transient absorption spectroscopy is used to resolve the complete |j,m quantum state distribution of Xe+ produced by optical strong-field ionization of Xe atoms at 800 nm. Probing at the Xe N4/5 edge yields a population distribution rhoj,|m| of rho3/2,1/2ratiorho1/2,1/2ratiorho3/2,3/2=75+/-6 :12+/-3 :13+/-6%. The result is compared to a tunnel ionization calculation with the inclusion of spin-orbit coupling, revealing nonadiabatic ionization behavior. The sub-50-fs time resolution paves the way for tabletop extreme ultraviolet absorption probing of ultrafast dynamics.