Influences of chain heterogeneity on instability of polymeric thin films: dewetting of polystyrenes, polychloromethylstyrenes and its copolymers

This study compares the stability of various polymeric thin films supported on SiO(x)/Si substrate. Dewetting behaviors of polystyrenes (PS), polychloromethylstyrenes, and random poly(styrene-co-chloromethylstyrene)s are investigated by utilizing atomic force microscopy. A systematic addition of the chloromethylstyrene (ClMS) unit into PS chain causes the increase of segment polarity, affecting interfacial and interchain interactions in thin films. It is found that stability of the polymeric films depends on two major parameters, ratio of the ClMS unit and film thickness. For approximately 5 nm thick film, the addition of only 5 mol% ClMS unit causes a drastic increase of its stability, attributed to the enhanced interfacial interactions between ClMS group and SiO(x) layer. Further increasing the ClMS mole ratio to 20, 45, and 100% is accompanied by a systematic increase of the film stability. Thicker films (thicknesses approximately 22 and approximately 45 nm) of the copolymer with 5 mol% ClMS unit exhibit rather different behavior. They are found to be less stable compared to the PS films. However, the films of copolymers with ClMS unit of 20, 45, and 100% are still much more stable than the PS films. These dewetting behaviors of the copolymers are correlated to the interfacial interactions, interchain interactions and segmental segregation in thin films.     

Effect of Interfacial Adsorption on the Stability of Thin Polymer Films in a Solvent-induced Process

The stability of ultrathin polymer films plays a crucial role in their technological applications. Here, we systematically investigated the influence of interfacial adsorption in physical aging and the stability of thin polymer films in the solvent-induced process. We further identify the stability mechanism from the theory of thin film stability. Our results show that the aging temperature and film thickness can strongly influence the stability of thin PS films in acetone vapor. Physical aging can greatly improve the stability of thin polymer films when the aging temperature T_(aging1)T_g. A thinner PS film more quickly reaches a stable state via physical aging. At short aging time, the formation of the adsorbed layer can reduce the polar interaction; however, it slightly influences the stability of thin polymer films in the solvent-induced process. At later aging stage,the conformational rearrangement of the polymer chains induced by the interfacial effect at the aging temperature T_(aging1) plays an important role in stabilizing the thin polymer films. However, at T_(aging2)T_g, the process of physical aging slightly influences the stability of the thin polymer films.The formation of the adsorbed layer at T_(aging2) can reduce the short-range polar interaction of the thin film system and cannot suppress the instability of thin polymer films in the solvent-induced process. These results provide further insight into the stable mechanism of thin polymer films in the solvent-induced process.     

聚苯乙烯/聚二甲基硅氧烷嵌段共聚物的表面形态研究

采用原子力显微镜(AFM)和透射电镜(TEM)研究了聚苯乙烯/聚二甲基硅氧烷嵌段共聚物(PS-b-PDMS)薄膜的相形态.结果表明,当采用甲苯作为溶剂,旋转涂膜的薄膜样品呈现网络状的形态分布在表面,而样品所对应的透射电镜照片中,PDMS相作为球状分布在PS的连续相中.退火温度对共聚物表面形态有一定的影响,当退火温度高于PDMS的玻璃化温度,表面中PDMS相增多.PS-b-PDMS嵌段共聚物的表面形态随着所用溶剂的变化而有所不同,当采用甲苯作为溶剂时,样品的PS相形成凹坑分布在PDMS的相区之中,而采用环己烷作为溶剂时,PS相作为突起分布在PDMS相区之中.另外,基底对共聚物薄膜表面形态的有较大的影响,当采用硅晶片作为基底时,样品中的PDMS相和PS相呈现近似平行于表面的层状结构.     

基底界面效应对聚苯乙烯薄膜分子运动行为的影响

本文研究了Si／Si02、Si／Si—H基底与聚苯乙烯（Ps）之间的界面相互作用对Ps薄膜的玻璃化转变及相关力学性能的影响．结果显示,无论何种基底,Ps薄膜的玻璃化转变温度（L）都随其厚度降低而降低．但相同厚度（〈110nm）下,以Si／Si-H为基底时Ps薄膜的瓦比以Si／Si02为基底的PS薄膜高．Si／Si02表面Ps薄膜疋开始下降的临界厚度为110nm,远高于以Si／Si—H为基底时的40nm．对Ps薄膜的膨胀系数和弹性模量进行研究,也得到相似的临界厚度．另外,与Si／Si02基底相比,在Si／Si-H上的Ps薄膜具有更低的膨胀系数以及较高弹性模量．可能原因是Si／Si-H与Ps具有较强的相互作用,限制了该界面分子的运动能力,导致基底／PS界面效应对薄膜分子运动的影响力增强,造成该薄膜瓦的厚度依赖性下降,并呈现出相对较硬的力学特征．     

Ordered porous ZnO thin films formed by dip-coating method using PS templates

Monolayer polystyrene spheres (∼400 nm) array templates were assembled orderly on clean glass substrates by dip-coating method from emulsion of polystyrene (PS). Porous ZnO thin films were also prepared by dip-coating method to fill the interstices among the close-packed PS templates with ZnO and annealing to remove the PS templates. Results showed that ZnO sol concentration and dipping time of PS templates in sol had great influences on the morphology of ordered porous ZnO thin films. There was a shrinkage ratio of about 30% from pore to PS. SEM observation showed that the PS array templates had face-centered cubic close-packing. X-ray diffraction (XRD) spectra showed the porous ZnO thin film was wurtzite structure. The optical transmittance decreased with decreasing wavelength of lights, but was kept above 80% beyond the wavelength of 550 nm. Optical band-gap of the porous ZnO thin film annealed at 500°C was 3.22 eV.     

The influence of nanoparticle fillers on the morphology of a spin-cast thin film polymer blend

Polymer/nanoparticle composite films are receiving growing attention thanks to their potential for application in ultra-thin electronic and optical devices. Polymer blend demixing has been shown to be a suitable technique for the structuring of polymer thin films and the patterning of nanoparticles (NP) within them. In this work we show that the morphology of thin polymer films made by spin-casting a polymer blend solution containing NP fillers on a surface depends strongly on the concentration of NP fillers. More specifically, polystyrene/polymethylmethacrylate (PS/PMMA) films formed from a toluene solution, and which demix following a nucleation and growth mechanism, were studied. It was found that both the height and the surface density of PMMA domains increased as the concentration of CoPt:Cu NPs in the film was increased. We find that similar effects are induced in a NP-free PS/PMMA demixed film upon increasing the molecular weight of the PS molecules. This suggests that under certain conditions the NPs and the polymer molecules in the blend do not behave as separate species but form aggregates.     

Dewetting behavior of a block copolymer/homopolymer thin film on an immiscible homopolymer substrate

Numerous previous studies have established that the addition of a microphase-ordered AB diblock copolymer to a thin homopolymer A (hA) film can slow, if not altogether prevent, film rupture and subsequent film dewetting on a hard substrate such as silica. However, only a few reports have examined comparable phenomena when the hA/AB blend resides on a soft B-selective surface, such as homopolymer B (hB). In this work, the dewetting kinetics of thin films composed of polystyrene (PS) and a symmetric poly(styrene-b-methyl methacrylate) (SM) diblock copolymer on a poly(methyl methacrylate) substrate is investigated by hot-stage light microscopy. Without the SM copolymer, the dewetting rate of the PS layer is constant under isothermal conditions and exhibits Arrhenius behavior with an apparent activation energy of approximately 180 kJ/mol. Addition of the copolymer promotes a crossover from early- to late-stage dewetting kinetics, as evidenced by measurably different dewetting rates. Transmission electron microscopy reveals the morphological characteristics of dewetted PS/SM films as functions of film thickness and SM concentration.     

Composite thin films of poly(phenylene oxide)/poly(styrene) and PPO/silver via vapor phase deposition

We report fabrication of thin (100～300 nm) poly(phenylene oxide) (PPO) films and their composites with poly (styrene) (PS) and silver (Ag) nanoparticles using a one‐step electron beam‐assisted vapor phase co‐deposition technique. Surface morphology and the structure of the deposited polymer thin film composites were characterized by FTIR, Raman, X‐ray spectroscopy, and contact angle measurements. As‐deposited PPO films and PPO/Ag composites were of porous nature and contrary to solvent casting techniques were free from nodular growth. In the case of PPO/PS thin film polymer composites, however, film morphology displayed nodular growth of PPO with nodule diameters of about ～200 nm and height of approximately 50 nm. Unique morphological changes on the porous PPO thin film surface were noticed at different Ag filling ratios. Further, the capacitance of PPO/Ag composites (<16 wt%) were measured under radio‐frequency conditions and they were functional up to 100 MHz with an average capacitance density of about 2 nF/cm². The fabricated PPO‐based composite systems are discussed for their potential applications including embedded capacitor technology. Copyright © 2008 John Wiley & Sons, Ltd.     

重氮树脂基磁性超薄膜及其图形化

构建磁性薄膜,在磁性理论和应用技术上都有重要意义．通过磁性膜的研究,能揭示磁性机制,对界面磁性、维度磁性、磁性的藕合特征、磁性量子效应等建立新的认识．磁性膜还提供一种新的人造磁性材料,在信息储存、磁性图像、医学等方面有潜在应用．目前,形成磁性薄膜的技术主要有溅射(Sputtering)、分子外延性生长(Molecular beam epitaxy)、真空喷镀、电泳、脉冲激光沉积、Langmuir-Blodgett(LB)沉积、层层组装(LBL)等方法．     

Structure and dewetting behavior of polyhedral oligomeric silsesquioxane-filled polystyrene thin films

Polyhedral oligomeric silsesquioxane (POSS) meets increasing interest as a building unit for inorganic-organic hybrid materials. The incorporation of cyclopentyl-substituted POSS (CpPOSS) into polystyrene (PS) thin films led to an inhibition of dewetting. In this paper, the dispersion state of CpPOSS in the CpPOSS/PS hybrid films and, furthermore, the relationships between the structure and dewetting inhibition effect are discussed. Structural analysis of the hybrid films revealed that CpPOSS segregated to the film surface and crystallized. The segregation of CpPOSS to the surface changes the surface free energy and spreading coefficient of the film. Interfacial structure was also roughened by the segregation of CpPOSS, which can contribute to the inhibition of dewetting by pinning the contact line of the PS film with the substrate. The inhibition of dewetting can be attributed to the modification of the film surface and interface by the segregation of CpPOSS.     

Photoalignment of liquid crystals by a covalently attached self-assembled ultrathin film

In this paper, the polyanion-containing cinnamoyl group (PACSS-CF3) was self-assembled with diazoresin (DR) to form a kind of stable covalent ultrathin film by irradiation with 365?nm UV light. The photoalignment properties of the DR/PACSS-CF₃ covalent film were investigated. The covalent film was found to have anisotropy after irradiation by 297?nm linearly polarised ultraviolet light (LPUVL), and could induce uniform alignment of liquid crystals (LCs). The pretilt angle of the LC was 2.5°. The stability of the film was enhanced by the covalent bonds. The films were thermally stable to 180°C. Polarised UV-Vis spectroscopy was utilised to investigate the photochemical process of the covalent film. It was found that cinnamoyl moieties parallel to the polarisation direction of the LPUVL were consumed by the photoreaction faster than those perpendicular to the polarisation direction. It can be concluded that the selective photoreaction induced the anisotropy of the films. The anisotropic films induced the homogeneous alignment of LC.     

Cross‐linked Polymer‐Blend Gate Dielectrics through Thermal Click Chemistry

New cross‐linking reagents were synthesized and mixed with polystyrene (PS) in solution to form a blend. Thin‐films were spin‐coated from the blend and then cross‐linked by thermal activation at relatively low temperature (100 °C) to form cross‐linked gate dielectrics. This new method is compatible with plastic substrates in flexible electronics. The azide and alkyne cross‐linking reagents are kinetically stable at room temperature, so any premature cross‐linking is avoided during processing. This method also significantly improved the dielectric performances of PS thin films. Solution‐processed top‐gate organic field‐effect transistor devices with indacenodithiophene–benzothiadiazole copolymer as semiconductor layer and the cross‐linked PS blend as dielectric layer showed improved performances with lower gate leakages and higher operation stabilities than devices with neat PS film as dielectric layer.     

The effect of water or salt solution on thin hydrophobic films

Hydrophobic films of polystyrene synthesized in bulk (PS) and by emulsion polymerization in the presence of the cationic surfactant cetyltrimethylammonium bromide (PS-CTAB) or the anionic surfactant sodium dodecyl sulfate (PS-SDS) were characterized by means of ellipsometry, contact angle measurements, and atomic force microscopy. Thin (approximately 65 nm) and thick (approximately 300 nm) films were spin-coated on hydrophilic silicon wafers. PS films presented scarcely tiny holes, while PS-CTAB and PS-SDS films presented holes and protuberances. The former were attributed to dewetting effects and the latter to surfactant clusters. The films were exposed to water or to a 0.1 mol/L NaCl solution for 24 h. Ex situ measurements evidenced strong topographic alterations after the exposure to the fluid. A model based on the diffusion of water (or electrolyte) molecules to the polymer/silcon dioxide interface through holes or defects on the film edges was proposed to explain the appearance of wrinkles and protuberances. In situ ellipsometric measurements were performed and compared with simulations, which considered either a water layer between a polymer and a silcon dioxide layer or an air layer between a polymer and water (medium). In the case of thin PS films, the ellipsometric angles evidenced a very thin (0.5-1.0 nm) air layer between water and the PS films. Upon increasing the PS film thickness, no air layer could be observed by ellipsometry. Regardless of the thickness, the ellipsometric data obtained for PS-CTAB and PS-SDS films did not indicate the presence of an air layer between them and the aqueous media. The dramatic changes in the topography of PS, PS-CTAB, and PS-SDS after immersion in salt solution were explained with proposed models. From a practical point of view, this study is particularly relevant because many hydrophobic polymers are used as substrates for biomedical purposes, where the physiological ionic strength is 0.15 mol/L NaCl.     

Fabrication of Stable Chiral Polyaniline Nanocomposite‐Based Patterns

Summary: We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, leading to the formation of a (DR/PAA)₂DR/(CPAN/DR)_n film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed.

Scanning electron microscopy image of the patterned (CPAN/DR)₅ thin film on Si wafer.     

Fabrication of Ordered TiO2 Porous Thin Films by Sol-Dipping PS Template Method

Monolayer polystyrene spheres (∼400 nm) array templates were assembled orderly on clean glass substrates by dip-drawing method from emulsion of PS and porous TiO₂ thin films were prepared by using sol-dipping template method to fill TiO₂ sol into the interstices among the close-packed PS templates and then annealing to remove the PS templates. The effects of TiO₂ precursor sol concentration and dipping time in sol on the porous structure of the thin films were studied. The results showed pore size of the ordered TiO₂ porous thin film depended mainly on PS size and partly on TiO₂ sol concentration. The shrinkage of pore diameter was about 10% for 0.2 M and 20% for 0.4 M TiO₂ sol concentrations. X-ray diffraction (XRD) spectra indicated the porous thin film was anatase structure. The transmittance spectrum showed that optical transmittance of the porous thin film kept above 70% beyond the wavelength of 430 nm. Optical band-gap of the porous TiO₂ thin film (fired at 550^∘;C) was 3.12 eV.     

Dewetting of thin polystyrene films under confinement

The dewetting behavior of thin polystyrene (PS) film has been investigated by placing an upper plate with a ca. 140 nm gap from the underlying substrate with the spin-coated thin polymer films. Three different kinds of dewetting behaviors of thin PS film have been observed after annealing according to the relative position of the PS film to the upper plate. Since the upper plate is smaller than the underlying substrate, a part of the polymer film is not covered by the plate. In this region (I), thin PS film dewetting occurs in a conventional manner, as previously reported. While in the region covered by the upper plate (III), the PS film exhibits unusual dewetted patterns. Meanwhile, in the area right under the edge of the plate (II) (i.e., the area between region I and region III), highly ordered arrays of PS droplets are formed. Formation mechanisms of different dewetted patterns are discussed in detail. This study may offer an effective way to improve the understanding of various dewetting behaviors and facilitate the ongoing exploration of utilizing dewetting as a patterning technique.     

Nanoporous block copolymer micelle/micelle multilayer films with dual optical properties

We introduce a novel and versatile approach for preparing self-assembled nanoporous multilayered films with tunable optical properties. Protonated polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) and anionic polystyrene-block-poly(acrylic acid) (PS-b-PAA) block copolymer micelles (BCM) were used as building blocks for the layer-by-layer assembly of BCM multilayer films. BCM film growth is governed by electrostatic and hydrogen-bonding interactions between the opposite BCMs. Both film porosity and film thickness are dependent upon the charge density of the micelles, with the porosity of the film controlled by the solution pH and the molecular weight (M(w)) of the constituents. PS(7K)-b-P4VP(28K)/PS(2K)-b-PAA(8K) films prepared at pH 4 (for PS(7K)-b-P4VP(28K)) and pH 6 (for PS(2K)-b-PAA(8K)) are highly nanoporous and antireflective. In contrast, PS(7K)-b-P4VP(28K)/PS(2K)-b-PAA(8K) films assembled at pH 4/4 show a relatively dense surface morphology due to the decreased charge density of PS(2K)-b-PAA(8K). Films formed from BCMs with increased PS block and decreased hydrophilic block (P4VP or PAA) size (e.g., PS(36K)-b-P4VP(12K)/PS(16K)-b-PAA(4K) at pH 4/4) were also nanoporous. This is attributed to a decrease in interdigitation between the adjacent corona shells of the low M(w) BCMs, thus creating more void space between the micelles. Multilayer films with antireflective and photochromic properties were obtained by incorporating a water-insoluble photochromic dye (spiropyran) into the hydrophobic PS core of the BCMs assembled in the films. The optical properties of these films can be modulated by UV irradiation to selectively and reversibly control the transmission of light. Light transmission of higher than 99% was observed with accompanying photochromism in the (PS(7K)-b-P4VP(28K)/PS(2K)-b-PAA(8K)) multilayer films assembled at pH 4/6. Our approach highlights the potential to incorporate a range of materials, ranging from conventional hydrophilic materials with specific interactions to hydrophobic compounds, into the assembled BCMs to yield multifunctional nanoporous films.     

Phase separation morphology of thin films of polystyrene/polyisoprene blends

We present the results of a study of the morphology of phase separation in a thin film blend of polystyrene (PS) and polyisoprene (PI) in a common solvent of toluene. The blend is quenched by rapid solvent evaporation using a spincoating technique rather than a temperature quench. The mass fraction of polystyrene is varied to determine the effect of the substrate on thin film phase separation morphology. We compare the phase separation morphology for very thin films of the PS/PI blend cast onto three different substrates: Si(001) with a native oxide layer (Si (SINGLEBOND) SiO_x), Si(001) etched in hydrofluoric acid (Si-H), and a Au/Pd alloy sputtered onto Si(001). We observe large differences between the morphologies of 1000 Å thick blend films on the Si(SINGLEBOND) SiO_x and Si-H substrates as the mass fraction is varied due to the difference in the wetting properties of PS on the two substrates. Smaller differences are observed between the films on the Si(SINGLEBOND) SiO_x and Au/Pd substrates only for film thicknesses h < 600 Å. © 1996 John Wiley & Sons, Inc.     

Competition between dewetting and cross-linking in poly(N-vinylpyrrolidone)/polystyrene bilayer films

We investigated the dewetting of metastable poly(N-vinylpyrrolidone) (PNVP) thin films (45 nm) on top of polystyrene (PS) thin films (58 nm) as a function of annealing temperature and molecular weight of PS (96 and 6850 kg/mol). We focused on the competition between dewetting, occurring as a result of unfavorable intermolecular interactions at the PNVP/PS interface, and spontaneous cross-linking of PNVP, occurring during thermal annealing, as we recently reported (Telford, A. M.; James, M.; Meagher, L.; Neto, C. ACS Appl. Mater. Interfaces 2010, 2, 2399-2408). Using optical microscopy, we studied how the dewetting morphology and dynamics at different temperatures depended on the relative viscosity of the top PNVP film, which increased with cross-linking time, and of the bottom PS film. In the PNVP/PS96K system, cross-linking dominated over dewetting at temperatures below 180 °C, reducing drastically nucleated hole density and their maximum size, while above 180 °C the two processes reversed, with complete dewetting occurring at 200 °C. On the other hand, the PNVP/PS6850K system never achieved advanced dewetting stages as the dewetting was slower than cross-linking in the investigated temperature range. In both systems, dewetting of the PNVP films could be avoided altogether by thermally annealing the bilayers at temperatures where cross-linking dominated. The cross-linking was characterized quantitatively using neutron reflectometry, which indicated shrinkage and densification of the PNVP film, and qualitatively through selective removal of the bottom PS film. A simple model accounting for progressive cross-linking during the dewetting process predicted well the observed hole growth profiles and produced estimates of the PNVP cross-linking rate coefficients and of the activation energy of the process, in good agreement with literature values for similar systems.     

Control of dispersion state of silsesquioxane nanofillers for stabilization of polystyrene thin films

The influence of the dispersion states of the nanofillers on the dewetting behavior of the polymer thin film was investigated. Polyhedral oligomeric silsesquioxanes (POSS) with various substituents were added into polystyrene (PS) thin films as the nanofillers. The dewetting rate of the films drastically changed with the surface substituents of POSS additives. Neutron reflectivity measurements indicated that the difference of the dewetting rate was associated with the dispersion state of POSS additives in the films. POSS with phenethyl groups (PhPOSS), which homogeneously dispersed into the films, resulted in the decrease of the glass transition temperature of PS and the enhancement of the dewetting of the films. POSS with a fluoroalkyl group (CpPOSS-R f) segregated to the film surface and showed the retardation of the dewetting by the decrease of the surface energy of the film. POSS with hydroxyl groups (CpPOSS-2OH) segregated to the film surface and film-substrate interface and led to the elimination of the dewetting, suggesting the importance of the interfacial segregation for the inhibition of dewetting. These results revealed the strong relationship between the dispersion state of the nanofillers and the dewetting of the nanofilled films.