Comparison of the band alignment of strained and strain-compensated GaInNAs QWs on GaAs and InP substrates

We present a comparison of the band alignment of the Ga_1−xIn_xN_yAs_1−y active layers on GaAs and InP substrates in the case of conventionally strained and strain-compensated quantum wells. Our calculated results present that the band alignment of the tensile-strained Ga_1−xIn_xN_yAs_1−y quantum wells on InP substrates is better than than that of the compressively strained Ga_1−xIn_xN_yAs_1−y quantum wells on GaAs substrates and both substrates provide deeper conduction wells. Therefore, tensile-strained Ga_1−xIn_xN_yAs_1−y quantum wells with In concentrations of x0.53 on InP substrates can be used safely from the band alignment point of view when TM polarisation is required. Our calculated results also confirm that strain compensation can be used to balance the strain in the well material and it improves especially the band alignment of dilute nitride Ga_1−xIn_xN_yAs_1−y active layers on GaAs substrates. Our calculations enlighten the intrinsic superiority of N-based lasers and offer the conventionally strained and strain-compensated Ga_1−xIn_xN_yAs_1−y laser system on GaAs and InP substrates as ideal candidates for high temperature operation.     

Recombination dynamics in strained In1-xGaxAs/InP-quantum well structures

We present a comprehensive study of the excitonic recombination lifetime in strained and unstrained In_1-xGa_xAs/InP-quantum well structures as a function of well width and Ga mole fraction. In the lattice-matched case a minimum lifetime of 650ps is observed for a well thickness of 2nm. For widths larger as well as smaller than 2nm the lifetime increases. In strained In_1-xGa_xAs/InP quantum wells the recombination lifetime shows a strong dependence on the Ga content. While the lifetime is nearly constant in the compressively strained case (x_Ga < 0.47), we observe a drastic increase with rising Ga content for tensile strain (x_Ga > 0.47).     

Highly strained InxGa(1−x)As−InyAl(1−y)As (x>0.8,y<0.3) layers for short wavelength QWIP and QCL structures grown by MBE

Highly strained quantum cascade laser (QCL) and quantum well infrared photodetector (QWIPs) structures based on In_xGa_(1−x)As−In_yAl_(1−y)As (x>0.8,y<0.3) layers have been grown by molecular beam epitaxy. Conditions of exact stoichiometric growth were used at a temperature of 420°C to produce structures that are suitable for both emission and detection in the 2–5 μm mid-infrared regime. High structural integrity, as assessed by double crystal X-ray diffraction, room temperature photoluminescence and electrical characteristics were observed. Strong room temperature intersubband absorption in highly tensile strained and strain-compensated In_0.84Ga_0.16As/AlAs/In_0.52Al_0.48As double barrier quantum wells grown on InP substrates is demonstrated. Γ–Γ intersubband transitions have been observed across a wide range of the mid-infrared spectrum (2–7 μm) in three structures of differing In_0.84Ga_0.16As well width (30, 45, and 80 Å). We demonstrate short-wavelength IR, intersubband operation in both detection and emission for application in QC and QWIP structures. By pushing the InGaAs–InAlAs system to its ultimate limit, we have obtained the highest band offsets that are theoretically possible in this system both for the Γ–Γ bands and the Γ–X bands, thereby opening up the way for both high power and high efficiency coupled with short-wavelength operation at room temperature. The versatility of this material system and technique in covering a wide range of the infrared spectrum is thus demonstrated.     

High-temperature operation of AlGaInAs/InP lasers1994

We discuss the design of uncooled lasers which minimizes the change in both threshold current and slope efficiency over the temperature range from–40 to +85°C [1]. To prevent carrier overflow under high-temperature operation, the electron confinement energy is increased by using the Al _x Ga _y In_1–x–y As/InP material system [1] instead of the conventional Ga _x In_1–x As _y P_1–y /InP material system. Experimentally, we have investigated strained quantum well lasers with three different barrier layers and confirmed that the static and dynamical performance of the lasers with insufficient carrier confinement degrades severely under high-temperature operation [2]. With an optimized barrier layer, the Al _x Ga _y In_1–x–y As/InP strained quantum well lasers show superior hightemperature performance, such as a small drop of 0.3 dB in slope efficiency when the heat sink temperature changes from 25 to 100°C [3], a maximum CW operation temperature of 185°C [4], a thermally-limited 3-dB bandwidth of 13.9 GHz at 85°C [2], and a mean-time-to-failure of 33 years at 100°C and 10 mW output power [5].     

Energy band gaps for the GaxIn1−xAsyP1−y alloys lattice matched to different substrates

A pseudopotential formalism within the virtual crystal approximation in which the effects of composition disorder are involved is applied to the Ga_xIn_1−xAs_yP_1−y quaternary alloys in conditions of lattice matching to GaAs, InP and ZnSe substrates so as to predict their energy band gaps. Very good agreement is obtained between the calculated values and the available experimental data for the alloy lattice matched to InP and GaAs. The alloy is found to be a direct-gap semiconductor for all y compositions whatever the lattice matching to the substrates of interest. The (Γ→Γ) band-gap ranges and the ionicity character are found to depend considerably on the particular lattice-matched substrates suggesting therefore that, for an appropriate choice of y and the substrate, Ga_xIn_1−xAs_yP_1−y could provide more diverse opportunities to obtain desired band gaps, which opens up the possibility of discovering new electronic devices with special features and properties.     

Cation diffusion in InP/In0.53Ga0.47As superlattices: strain build-up and relaxation

InP and In_0.53Ga_0.47As are lattice matched and can form superlattices that are free of crystalline defects. Zn indiffusion enhances the diffusion of cations while leaving the anions unaffected; the resultant In_1–x Ga _x P/In_1–x Ga _x As superlattices are strained. Since the as-grown specimens are pseudomorphic, any defects observed after Zn diffusion must be attributed to strain relaxation. Studies of the post-growth strain build-up and relaxation in this novel system suggest a new strain relief mechanism for buried strained layers of face-centred-cubic (fcc) structures. The signature defect of the proposed mechanism is a microtwin along a {111} plane spanning the buried strained layer and terminating at both interfaces with partial dislocations of 1/6112 type. Energy analysis indicates that this new partial-dislocation strain relief mechanism is more effective than the conventional 60 perfect-dislocation mechanism for relieving the in-plane strain in buried strained layers. Therefore, the proposed mechanism is an energetically favourable relaxation channel and limits the useful thicknesses of strained layers in electronic and optoelectronic devices.     

Low-density band-filling in strained InAs quantum wells

We study the low-temperature photoluminescence (PL) of strained InAs single quantum wells (SQWs) embedded in a Ga_0.47In_0.53As matrix grown on InP substrates by modified solid-source molecular beam epitaxy. The spectra are interpreted in the frame of a two-level rate equation model describing the carrier dynamics in the structures. We show that band-filling occurs in these QWs for an excitation power as low as 30 Wcm^–2. Moreover, the spectra reveal that the band-filling results from the rapid population of the hole subband. This observation highlights the low in-plane heavy-hole mass in the compressively strained film. Our results therefore demonstrate the high potential of InAs/Ga_0.47In_0.53As QW nonlinear optical devices operating in the mid-IR wavelength range.     

Numerical study of strained InGaAs quantum well lasers emitting at 2.33 μm using the eight-band model

We investigate the band structure of a compressively strained In(Ga)As/In 0.53 Ga 0.47 As quantum well (QW) on an InP substrate using the eight-band k · p theory.Aiming at the emission wavelength around 2.33 μm,we discuss the influences of temperature,strain and well width on the band structure and on the emission wavelength of the QW.The wavelength increases with the increase of temperature,strain and well width.Furthermore,we design an InAs /In 0.53 Ga 0.47 As QW with a well width of 4.1 nm emitting at 2.33 μm by optimizing the strain and the well width.     

Lpe growth method possibilities in A3B5 semiconductors preparation

Pre-diffusion limited technique of liquid phase epitaxy is used for preparation of quaternary solid solution Ga _x In_1−x As _y P_1−y and binary InP. Surface morphology of the layers prepared at this condition has been compared with those prepared by conventional LPE. Quaternary strained layers with composition near to Ga_0.21In_0.79As_0.75P_0.25 were grown with perpendicular lattice mismatch up to 1.6% in compression, on the InP substrates of (100) orientation. The used epitaxial technique has been modified for perspective attempt to heal the growth interfaces. Modification was tested by InP growth. Presented at the 6th Joint Seminar “Development of Materials Science in Research and Education”, Karlštejn, Czech Republic, 17–19 September 1996.     

Electronic structures of the zinc-blende GaN/Ga1−xAlxN compressively strained superlattices and quantum wells

The electronic structures of the zinc-blende GaN/Ga_0.85Al_0.15N compressively strained superlattices and quantum wells are investigated using a 6×6 Hamiltonian model (including the heavy hole, light hole and spin-orbit splitting band). The energy bands, wavefunctions and optical transition matrix elements are calculated. It is found that the light hole couples with the spin-orbit splitting state even at thek=0 point, resulting in the hybrid states. The heavy hole remains a pure heavy hole state atk=0. The optical transitions from the hybrid valence states to the conduction states are determined by the transitions of the light hole and spin-orbit splitting states to the conduction states. The transitions from the heavy hole, light hole and spin-orbit splitting states to the conduction states obey the selection rule Δn=0. The band structures obtained in this work will be valuable in designing GaN/GaAlN based optoelectronic devices.     

Low temperature photoluminescence of GaxIn1−xAs/GaAs strained layer superlattices

The low temperature photoluminescence spectra of several Ga_xIn_1−xAs/GaAs strained layer superlattices have been measured. Excitomic recombination between electrons and holes confined in the ternary layers and conduction band-acceptor transitions have been observed. The excitonic transition energies calculated with a simple model which takes into account both strain and quantization are in good agreement with the measured values provided the additional strain due to the mismatch between the SLS and the buffer layer is taken into account. The hydrogenic acceptor binding energy is smaller in the SLS than in the bulk ternary because the reduction due to the decrease of the hole mass under strain appears to be more important than the two dimensional quantization enhancement in the present samples.     

1.55μm InGaAsP/InP应变量子阱激光器的LP－MOCVD生长

本文首次报导了生长温度为550℃,以三甲基镓(TMGa)和三甲基铟(TMIn)为Ⅲ族源,用低压金属有机物气相沉积(LFMOCVD〕技术,高质量1.62um和1.3umInGaAsP及In_0.57Ga_0.43As_0.98P_0.04/In_0.73Ga_0.27As_0.6P_0.4量子阶结构的生长,并给出了1.55umGaAsP/InP分别限制应变量子阱结构激光器的生长条件,激光器于室温下脉冲激射,其阈值电流密度为2.4kA/cm².     

Quantum point contacts on InGaAs/InP heterostructures

For the first time we have observed quantized conductance in a split gate quantum point contact prepared in a strained In_0.77Ga_0.23As/InP two-dimensional electron gas (2DEG). Although quantization effects in gated two-dimensional semiconductor structures are theoretically well known and proven in various experiments on AlGaAs/GaAs and also on In_0.04Ga_0.96As/GaAs, no quantum point contact has been presented in the InGaAs/InP material with an indium fraction as high as 77% so far. The major problem is the comparatively low Schottky barrier of the InGaAs (φ_B≈ 0.2 eV) making leakage-free gate structures difficult to obtain. Nevertheless this heterostructure—especially with the highest possible indium content—has remarkable properties concerning quantum interference devices and semiconductor/superconductor hybrid devices because of its large phase coherence length and the small depletion zone, respectively. In order to produce leakage-free split gate point contacts the samples were covered with an insulating SiO₂layer prior to metal deposition. The gate geometry was defined by electron-beam lithography. In this paper we present first measurements of a point contact on an In_0.77Ga_0.23As/InP 2DEG clearly showing quantized conductance.     

Electro-absorption modulator using a type-II quantum well in the InxGa1 − xAs/InAlAs/InP system

In this paper photoluminescence measurements at low temperature under different excitation powers were carried out on an InGaAs tensile strained (x =  0.3) quantum well with InGaAs barriers lattice matched (LM) to InP. Evidence of a type-II recombination was found between carriers confined in the tensile layer and in the LM layer. This study allows us to deduce an accurate determination of the conduction band offset in the In_0.3Ga_0.7As/In_0.53Ga_0.47As/InP system. Moreover, we include the previous type-II structure between InAlAs barriers in order to confine both electrons and holes. This structure has potential applications in electro-optical modulators. We simulate its optical modulation by solving the Schrödinger equation using the envelope function approximation and calculating the absorption spectrum taking into account excitonic effects.     

The effects of the intense laser field on bound states in GaxIn1-xNyAs1-yN/GaAs single quantum well

We have investigated the effects of the intense laser field and nitrogen concentration on bound state energy levels in Ga _x In_{1- x} N _y As_{1- y} N/GaAs quantum well. The results show that both intense laser field and N-incorporation into the GaInNAs have strong influences on carrier localization. We hope that our results can stimulate further investigations of the related physics, as well as device applications of group-III nitrides.     

Wafer and epilayer improvement for integrated optics devices on InP: the ESPRIT project 2518

Ga _x In_1–x As _y P_1–y alloys lattice matched to InP substrates are currently used to fabricate optoelectronic and integrated optics devices. To achieve devices with high performances and high fabrication yield, the uniformity and reproducibility of the Ga _x In_1–x As _y P_1–y epitaxial layers (composition, thickness, doping, etc.) have become key parameters. These problems have been addressed in the frame of ESPRIT project 2518 and are presented in this paper. Several aspects have been considered starting from the optimization of InP substrates, the MOVPE growth of uniform GalnAsP layers, the material characterization to the validation of material uniformity on passive optical waveguides. Both scanning photoluminescence analysis and waveguide losses measurements performed on 2 inch wafers with a high lateral resolution have shown that high quality uniform GalnAsP layers can be obtained reproducibly on 2 InP substrates using a commercially available LP-MOCVD growth process. In particular, more than 60% of 36 mm long, 3m wide and 100m spaced rib waveguides exhibit losses below 0.8dBcm^–1.     

Evidence by Raman scattering on In1−xGaxAsyP1−y of the two-mode behaviour of In1−xGaxP

We report the Raman scattering study of optical vibrations in indium rich In_1?xGa_xAs_yP_1?y epitaxial layers grown on InP. We evidence the splitting of the LO line of InP even for very small x and demonstrate it is due to the presence of gallium in the samples. These results lead us to ascribe to In_1?xGa_xP a somewhat modified two-mode behaviour and to In_1?xGa_xAs_yP_1?y a four-mode behaviour.     

Band offset calculations applied to III–V nitride quantum well device engineering

Band offset calculations for zinc-blende pseudomorphically strained Al_1−xGa_xN/Al_1−yGa_yN and In_xGa_1−xN/In_yGa_1−yN interfaces have been performed on the basis of the model solid theory combined with ab initio calculations. From the results obtained, we have calculated, separately, the valence and conduction band discontinuities of In_xGa_1−xN/GaN and GaN/Al_1−xGa_xN as a function of the indium and gallium contents respectively. Using the latter results, we have extended our study to simulate band discontinuities for strained Ga_1−xIn_xN/relaxed Al_1−yGa_yN heterointerfaces. Information derived from this investigation will be useful for the design of lattice mismatched heterostructures in modeling optoelectronic devices emitting at ultraviolet to near infrared wavelengths.     

Influence of stoichiometry on the luminescent properties of InAs quantum dots grown on a heterostructure

We report photoluminescence (PL) spectra of InP/In_xGa_1-xAs/InAs/InP dot-in-a-well structures grown by MOVPE, with different compositions of the ternary layer. Measurements with atomic force microscopy showed that the largest quantum dot (QD) height is obtained when the InAs QDs are grown on the In_xGa_1-xAs layer with a mismatch of 1000 ppm, and the height decreases as the mismatch departs from this value. PL spectra of the QDs showed an asymmetric band, which involves transitions between dot energy levels and can be deconvoluted into two peaks. The highest energy PL peak of this band was observed for the sample with the QDs grown on top of the lattice-matched In_xGa_1-xAs layer and it shifted to lower energies for strained samples as the degree of mismatch increased. Theoretical calculations of the energy levels of the entire structure were used to interpret the obtained PL spectra and determine the possible detection tunability range.     

Structural characterization of InxGa1−xAs/Inp layers under different stresses

In_xGa_1−xAs layers on InP substrate can be subjected to compressive or tensile strain due to lattice parameter differences depending on the alloy composition. In order to examine in details the strain of InGaAs/InP epiatxial layers and its evolution after subjecting the layers to annealing at high pressure, X-ray synchrotron topography, high resolution X-ray diffraction and atomic force microscopy have been employed. The data show that the changes of structural properties of the InGaAs layers subjected to high temperature-high pressure treatment at 670 K-1.2 Gpa, strongly depend on initial strain state and defect structure. The annealing of samples under high pressure results in change of strain in tensile layers only. The behaviour of observed defects is discussed.