10 ps High Power Laser System at 248 nm

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高功率1060 nm锥形激光器

为提高1060 nm锥形激光器的输出性能,对1060 nm锥形激光器的脊形波导区和锥形增益区长度进行了优化。当保持总腔长3 mm不变时,设置脊形波导区长度为500,750,1000μm。在输出功率为2 W时,对三种情况所需的输入电流、功率-电流曲线斜率效率、电光转换效率、输出光谱及远场特性进行了对比。研究结果表明,当脊形波导区长度为750μm,锥形增益区长度为2250μm时,1060 nm锥形激光器的输出性能最优。当输出功率为2 W时,所需输入电流为3.95 A,斜率效率为0.61 W/A,转换效率为33.9%,光谱宽度(半峰全宽)为0.3 nm,远场近似高斯分布且95%能量处的水平发散角约为14°。     

高性能9xx nm大功率半导体激光器（英文）

为了改善9xx nm高功率半导体激光器的性能,对n包层和p包层的掺杂分布进行了调整,以减小激光器的内部损耗。同时为了减小有源区载流子的泄漏,在有源区和波导层之间引入了高能量带隙GaAsP。设计并制作了内部损耗为1.25 cm^-1的高功率激光器。器件可靠性工作的最大输出功率为26.5 W。当输出功率为10.5 W时,最大电光功率转换效率为72.4%,斜率效率为1.16 W/A。     

High Power 1060 nm Distributed Feedback Semiconductor Laser

A GaAs based high power distributed feedback （DFB） semiconductor laser with a second-order grating has been demonstrated. An output power of 150row at an injection current of 350mA is realized with a 1-mm cavity length. With a new design of the waveguide structure, the DFB laser maintains a stable single longitudinal mode around 106Ohm with a side mode suppression ratio of larger than 50dB.     

248 nm高反膜抗激光损伤性能

用电子束蒸发法在熔融石英基底上沉积了适用于248 nm的HfO2/SiO2高反膜,为提高其抗激光损伤能力,设计并制备了两种保护层,一种是在常规高反膜系的基础上镀制二分之一波长厚度的SiO2保护层,另一种是用Al2O3/MgF2做保护层。测试了3种高反膜样品的激光损伤情况,通过损伤形貌的变化分析了两种保护层使抗激光损伤能力提高的原因以及存在的问题。     

248 nm高反膜抗激光损伤性能

用电子束蒸发法在熔融石英基底上沉积了适用于248nm的HfO2/SiO2高反膜,为提高其抗激光损伤能力,设计并制备了两种保护层,一种是在常规高反膜系的基础上镀制二分之一波长厚度的SiO2保护层,另一种是用Al2O3/MgF2做保护层。测试了3种高反膜样品的激光损伤情况,通过损伤形貌的变化分析了两种保护层使抗激光损伤能力提高的原因以及存在的问题。     

高峰值功率808nm垂直腔面发射激光器列阵

为了实现808 nm垂直腔面发射激光器(VCSEL)的高功率输出,对808 nm VCSEL的分布式布拉格反射镜(DBR)结构材料进行了优化设计,分析了AlxGa1-xAs材料中Al组分对于折射率与吸收的影响,并最终确定了材料。采用非闭合环结构制备了2×2 VCSEL列阵。通过波形分析法对VCSEL列阵的功率进行了测量:在脉冲宽度为20 ns、重复频率为100 Hz、注入电流为110 A的条件下,最大峰值功率为30 W;在脉冲宽度为60 ns、重复频率为100 Hz、注入电流为30 A的条件下,最大功率为9 W。对列阵的近场和远场进行了测量,激光器垂直发散角和水平发散角半高全宽分别为16.9°和17.6°。     

Surface structures on crystalline silicon irradiated by 10 ps laser pulses at 694.3 nm

The grating-like spatially periodic structures are produced on the (100) surfaces of the single crystal silicon by the trains of 10 ps mode-locked ruby laser pulses at the wavelength of 694.3 nm. The periods and orientations of the structures are consistent with the model which involves the interference of the incident light with the surface electromagnetic wave excited through the coupling by surface roughness. Previously unappreciated elliptic ripple patterns are found and explained as the trails of the capillary wave excited on the molten Si surface due to the radially non-uniform deposition of energy.     

KGW 晶体外腔式高功率579 nm喇曼黄光激光器

报道了579 nm高功率KGd(WO₄)₂喇曼晶体外腔式喇曼黄光激光器的输出特性.基于808 nm脉冲激光二极管侧面泵浦Nd:YAG陶瓷、腔内BBO电光晶体同步延迟调Q和Ⅰ类临界相位匹配的LBO晶体腔外倍频方案,并通过外腔式KGW晶体Ng轴二阶斯托克斯喇曼频移,获得了579.54 nm黄光激光输出.当脉冲信号重复频率为1 kHz、532 nm泵浦光最高平均功率为5.02 W、脉冲宽度为10.1 ns时,获得了最高平均功率2.58 W、脉冲宽度7.4 ns、峰值功率348.6 kW的579.54 nm二阶斯托克斯喇曼黄光激光输出;532 nm至579.54 nm的光-光转化效率为51.4%、斜率效率为54.8%,光束质量因子M_x-579.54²=5.829、M_y-579.54²=6.336,输出功率不稳定性小于±2.35%.实验表明:外腔式喇曼结构能够高效地获得喇曼黄光,具有很高的光-光转化效率及良好的功率稳定性,并通过脉冲LD结合同步延迟电光调Q可获得高重复频率、高平均功率、窄脉冲宽度和高峰值功率的黄光激光输出.     

808nm大功率半导体激光迭阵偏振耦合技术

随着半导体激光器在工业、军事、核能等领域的应用越来越多,单个迭阵输出的光功率密度已经不能满足实际的需求,这就需要将多个半导体激光迭阵的光束耦合成为一个共同的光束,以提高输出功率和亮度.所以采用怎样的光束耦合技术能实现高亮度、高质量的激光输出就成了一个关键性的问题.对于该技术的研究,国内还没有实验方面的报道.主要介绍了大功率半导体激光器偏振耦合原理、实验的技术路线,以及对808nm半导体激光迭阵进行耦合实验的结果及分析.对2个bar、功率为40W/bar的808nm连续半导体激光迭阵,实现偏振耦合的总效率超过90%,聚焦得直径为3mm光斑,输出功率达到134W,总体效率超过84%.对7个bar、峰值功率100W/ba、r占空比20%的808nm准连续半导体激光迭阵进行了偏振耦合,其效率达到67%,得到4.5mm×4.5mm的光斑.     

KGW晶体外腔式高功率579nm喇曼黄光激光器

报道了579nm高功率KGd(WO4)2喇曼晶体外腔式喇曼黄光激光器的输出特性.基于808nm脉冲激光二极管侧面泵浦Nd∶YAG陶瓷、腔内BBO电光晶体同步延迟调Q和Ⅰ类临界相位匹配的LBO晶体腔外倍频方案,并通过外腔式KGW晶体Ng轴二阶斯托克斯喇曼频移,获得了579.54nm黄光激光输出.当脉冲信号重复频率为1kHz、532nm泵浦光最高平均功率为5.02W、脉冲宽度为10.1ns时,获得了最高平均功率2.58 W、脉冲宽度7.4ns、峰值功率348.6kW的579.54nm二阶斯托克斯喇曼黄光激光输出;532nm至579.54nm的光-光转化效率为51.4%、斜率效率为54.8%,光束质量因子Mx2-579.54=5.829、My2-579.54=6.336,输出功率不稳定性小于±2.35%.实验表明:外腔式喇曼结构能够高效地获得喇曼黄光,具有很高的光-光转化效率及良好的功率稳定性,并通过脉冲LD结合同步延迟电光调Q可获得高重复频率、高平均功率、窄脉冲宽度和高峰值功率的黄光激光输出.     

110 W高功率高亮度915 nm半导体激光器光纤耦合模块研究(英文)

利用空间合束技术和光纤耦合技术将9只波长为915 nm单管芯半导体激光器高效率耦合进光纤中,制备出具有高功率、高亮度输出光纤耦合模块。应用ZEMAX光学软件进行模拟仿真后通过实验验证,光纤耦合模块可以通过芯径105μm、数值孔径0.22的光纤输出大于110 W的功率,并且亮度达到8.64 MW/(cm~2·sr)。     

高功率激光系统中B积分的研究

通过对非线性薛定谔方程的求解,数值模拟了高功率激光系统中钕玻璃的B积分传输规律,并理论分析了B积分对光脉冲的波形和频谱的影响,详细介绍了几种消除B积分影响的方法。这对高功率激光系统中光放大有一定指导意义。     

Photodissociation dynamics of the methylsulfinyl radical at 248 nm

The photodissociation dynamics of jet-cooled methylsulfinyl radicals, CH₃SO, at 248?nm have been investigated using molecular beam photofragment translational spectroscopy. The primary channel is CH₃S?+?O, which occurs via the initially prepared excited CH₃SO state by rapid cleavage of the S-O bond to produce ground state products. The minor SO?+?CH₃ channel has two components in comparable proportions: a fast feature corresponding to rapid C-S cleavage on the excited state to produce CH₃ and electronically excited SO, and a slow feature due to internal conversion of CH₃SO followed by statistical dissociation on the ground electronic state. Statistical ground state dissociation also produces small amounts of CH₂SO, likely sulfine, and H-atoms.     

Nonlinear processes in UV optical materials at 248 nm

Nonlinear processes in UV optical materials were investigated by using 280-fs, 248-nm pulses. Nonlinear absorption in CaF₂ was confirmed to be a two-photon process by using the luminescence of self-trapped excitons, which was also used for the single shot pulse width measurement. The absorption bands due to F centers were identified in CaF₂, MgF₂, and LiF after several hundred shots at 100 GW/cm². Absorption at 248 nm was considerable especially in MgF₂ and LiF. Self-focusing and self-phase modulation were observed in CaF₂.     

980 nm大功率垂直腔面发射激光器偏振特性

大功率垂直腔面发射激光器单管器件出光口径大、横向模式多。随着注入电流和工作温度的改变出射光偏振态在两个正交偏振基态上转换。为分析输出光偏振特性,采用500μm出光口径980nm底发射器件,通过控制器件热沉温度,利用偏振分光镜分离正交偏振基态为透射波和反射波,半导体综合参数测试仪测量其功率、中心波长等参量。分析得出:两个偏振态的光功率温度特性与未加偏振分光镜时的总输出光的温度特性基本一致,中心波长差随温度升高缓慢增加。在温度低于328K时,随着注入电流的增大,反射波首先达到阈值,形成激射。但透射光波形成激射后其斜效率大于反射波。因此在达到某个电流后两个偏振态的功率变化曲线出现交替。当温度升高到328K以上时两个偏振态的功率曲线却没有明显的交替。根据对大尺寸VCSEL器件偏振特性的研究,提出通过外腔选频的方法来控制偏振的方案,分析计算后得出外腔腔长大约为0.45mm。     

Two-photon-absorption of frequency converter crystals at 248 nm

The two-photon-absorption coefficient of KDP, BBO, LTB, and CLBO crystals has been determined from the measurement of the intensity dependent transmission through long samples. The intensity of the sub-picosecond KrF excimer laser pulses on the samples was varied from 0.2–80 GW/cm². The linear absorption of the samples was determined by using a low intensity, long pulse KrF laser. The first-principle simulations to the experimental data show a TPA value of 0.48 cm/GW for KDP, 0.5 cm/GW (o-ray) and 0.34 cm/GW (e-ray) in BBO, 0.22 cm/GW in LTB and 0.53 cm/GW in CLBO. PACS 78.20.Ci; 42.65.Ky; 42.65.Yj     

用于高功率激光装置中的电脉冲整形系统

采用射频GaAs场效应管和微带传输线技术,研制出用于高功率激光装置中的电脉冲整形系统.该系统电脉冲整形宽度为3.5 ns,幅度在0~5 V范围内调节,时域调整精度200 ps.整形后的方波,前沿383 ps,后沿642 ps,顶部不平坦度4~5%,波形幅度稳定性4~5%（p-p).利用该系统产生的整形电脉冲驱动电光波导调制器进行激光脉冲整形,得到了理想的整形激光脉冲.     

High Power Continuous-Wave and Acousto-Optic Q-Switched Nd：GdVO4 Laser Operated at 912 nm

We present a high power and efficient operation of the ^4F3/2 → ^4I9/2 transition in Nd：GdVO4 at 912nm. In the cw mode, the maximum output power of 8.6 W is achieved when the incident pump power is 40.3 W, leading to a slope efficiency of 33.3% and an optical-optical efficiency of 21.3%. To the best of our knowledge, this is the highest cw laser power at 912nm obtained with the conventional Nd：GdVO4 crystal. Pulsed operation of 912nm laser has also been realized by inserting a small aeousto-optie （A-O） Q-Switch inside the resonator. As a result, the minimal pulse width of 20ns and the average laser power 1.43 W at the repetition rate of lOkHz are obtained, corresponding to 7.1 kW peak power. We believe that this is the highest laser peak power at 912nm. Furthermore, duration of 65ns has also been acquired when the repetition rate is 100 kHz.     

941nm2%占空比大功率半导体激光器线阵列

计算了半导体激光器的激射波长与量子阱宽度以及有源层中In组分的关系,确定了941nm波长的量子阱宽度和In组分.并利用金属有机化合物气相淀积(MOCVD)技术生长了InGaAs/GaAs/AlGaAs分别限制应变单量子阱激光器材料.利用该材料制成半导体激光器线阵列的峰值波长为940.5 nm,光谱的FWHM为2.6 nm,在400 μs,50 Hz的输入电流下,输出峰值功率达到114.7 W(165 A),斜率效率高达0.81 W/A,阈值电流密度为103.7 A/cm2;串联电阻5 mΩ,最高转换效率可达36.9%.