Die chromatographische Bestimmung von SiCl4 COCl2, Cl2 und HCl in Bortrichlorid

Ohne Zusammenfassung     

Growth of HfO2 films using an alternate reaction of HfCl4 and O2 under atmospheric pressure

HfO₂ films were deposited onto a Si(1 0 0) substrate using an alternate reaction of HfCl₄ and O₂ under atmospheric pressure. Self-limiting growth of the HfO₂ was achieved in the range of the growth temperature above 873 K. The X-ray diffraction of the HfO₂ films showed a typical diffraction pattern assigned to the monoclinic polycrystalline phase. Residual chloride concentration in HfO₂ films were not higher than 0.1 at%. When the growth temperature was 973 K, the HfSiO_x is formed in HfO₂ film. This gives effective permittivity value of 9.6 for the HfO₂ film grown at 573 K.     

低阶煤半焦利用热重在O2/CO2、O2/N2和O2/Ar气氛下燃烧特性研究

利用热重研究了两种中国西北典型低阶煤半焦的燃烧特性。探究了不同气氛（O₂/CO₂、O₂/N₂和O₂/Ar）和不同氧气浓度对其燃烧特性的影响。实验结果表明,无论是反应气氛还是氧气浓度都会对低阶煤半焦的燃烧产生影响。相比于N₂和Ar,CO₂明显有利于燃烧反应进行：当反应气氛由O₂/CO₂变为O₂/Ar时,两种不同低阶煤半焦的燃尽温度分别升高了63.7和68.8℃;而当反应气氛由O₂/CO₂变为O₂/N₂时,两种不同低阶煤半焦的燃尽温度分别升高了135.9和129.6℃。在研究范围内,氧气浓度的提高也能明显提高半焦的燃烧性能。与此同时,半焦燃烧特性的动力学分析表明,随着氧气浓度提高,两种半焦燃烧反应的表观活化能E和指前因子A均呈增大趋势。通过对E和A两者关系的分析结果表明,半焦富氧燃烧的活化能和指前因子存在动力学补偿效应。     

单核Cu（H）配合物C18H12CuN402的密度泛函研究

用量子化学从头算方法，在R0B3LYP／LANL2MB水平上，对单核配合物C18H12CuN402进行了理论计算，优化得到了该配合物的平衡几何构型，并计算了它的谐振动频率．结果表明：该配合物分于是可以稳定存在的，电子自旋布居主要集中在Cu原于及配体原于上，Cu原于和配体原于的自旋布居符号相同，说明体系中存在较强的自旋离城效应．体系的前沿轨道主要由cu原于的d轨道和配体原于的p轨道组成，这种组成有利于配体与磁中心之间的电子转移．计算结果与实验符合得较好。     

Vibrational spectra of the peroxotantalates (NH4)3[Ta(O2)4], K3[Ta(O2)4], Rb3[Ta(O2)4] and Cs3[Ta(O2)4] and the crystal structure of Rb3[Ta(O2)4]

The compounds (NH₄)₃[Ta(O₂)₄], K₃[Ta(O₂)₄], Rb₃[Ta(O₂)₄] and Cs₃[Ta(O₂)₄] have been prepared and investigated by X-ray powder methods as well as Raman- and IR-spectroscopy. In the case of Rb₃[Ta(O₂)₄] the structure has been solved from single crystal data. It is shown that all these compounds are isotypic and crystallize in the K₃[Cr(O₂)₄] type (SG , No. 121). The infrared- and Raman spectra (recorded on powdered samples) are discussed with respect to the internal vibrations of the peroxo-group and the dodecahedral [Ta(O₂)₄]³⁻ ion. Symmetry coordinates for the [Ta(O₂)₄]³⁻ ion are given from which the vibrational modes of the O-O stretching vibrations of the O₂²⁻ groups, the Ta-O stretching vibrations and the Ta-O bending vibrations are deduced.     

Molecular structures of (SiCl3)2CH2 and (SiCl3)2CCl2 as studied by electron diffraction

An electron diffraction analysis of the molecular structures of 1,1,1,3,3,3-hexachloro-1,3-disilapropane and octachloro-1,3-disilapropane has been carried out. Deviations from the staggered conformation are indicated. The data may be approximated by models with C₂ symmetry and a small tilt of the SiCl₃ groups. The main bond lengths (r_g) and bond angles obtained for (SiCl₃)₂ CH₂ are: SiCl, 202.7(4); SiC, 186.6(6); CH, 109.8(24) pm, ClSiCl, 107.9(1); SiCSi, 118.3(7)°; and for (SiCl₃)₂CCl₂: SiCl, 202.0(4); SiC, 190.2(9); CCl, 179.6(9) pm; ClSiCl, 109.5(1); SiCSi, 120.6(9); ClCCl, 110.9(16); SiCCl, 106.3(3)°.     

The fast reaction of CH2OH with O2

The rate coefficient of the reaction CH₂ + O₂OH → HO₂ + CH₂O, has been measured at 300 K by the LMR flow-tube method, and found to have the unexpectedly large value k = (2_?1⁺²) × 10^?12 cm³ molecule^?1 s^?1. This reaction, preceded by isomerization, may be an important route for the oxidation of CH₃O in the upper atmosphere.     

The rate constant for the reaction O3 + NO2 → O2 + NO3 over the temperature range 259–362 °K

The rate constant for the reaction of ozone with nitrogen dioxide has been measured over the temperature range 259 to 362°K, using a stopped-flow system coupled to a beam sampling mass spectrometer. A fit of the data to the Arrhenius equation gave: k = (9.44 ± 2.46) × 10¹⁰ exp[(?2509 ± 76)/T] cm³ mol^?1 sec^?1.     

Spektrochemische Bestimmung der Spurenverunreinigung von Bor in SiCl4 GeCl4 und SiHCl3

Zusammenfassung Ein mit der Voranreicherung mit Triphenylchlormethan kombiniertes spektrographisches Verfahren zur quantitativen Bestimmung des Spurenelements Bor im Bereich von 1 · 10^–9 bis 1 · 10^–5 g B/g in Siliciumtetrachlorid und Silicochloroform wird mitgeteilt.Die Wirkung der Atmosphäre auf die Intensität der Linien von Bor wurde untersucht. Die Vorteile des Arbeitens in Luft wurden ausgenutzt und mit Hilfe der koinzidierenden SiO-Linien eine einfache Berechnungsmethode angegeben. Zwei Verfahren zur Herstellung von Standardserien wurden entwickelt.

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Summary A spectrographic method combined with triphenylchloromethane pre-enrichment is recommended which is suitable for the determination of boron trace-impurities in SiCl₄(GeCl₄) and SiHCl₃ ranging from 1 · 10^–9 to 1 · 10^–5 g B/g.The effect of the atmosphere on the intensity of the boron line was examined; a simple method is reported for taking into consideration the influence of the coincident SiO line utilising the advantage of excitation in the air-atmosphere. Two reliable standard-methods are discussed.

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Die Verfasser sprechen Frau E. Sztankó für ihre Hilfe bei den Messungen ihren aufrichtigen Dank aus.     

Solid state photodecomposition studies of K4Ti(O2)4·2H2O, K3Ta(O2)2F4 and K2V2O3(O2)2F2

The compounds K₄Ti(O₂)₄·2H₂O, K₃Ta(O₂)₂F₄ and K₂V₂O₃(O₂)₂F₂ undergo photolysis in the solid state. The photolysis kinetics obey the parabolic rate equation p = kt^1/2 and indicate a monoexcitation process for the photolysis. These features are similar to those reported previously for peroxo complexes. The mechanism of evolution of oxygen reported earlier appears to be the same in all these solids.     

Computational comparison of Rh2(esp)2 and Rh2(O2CH)4 as catalysts in a carbenoid reaction

A computational study of Rh₂(esp)₂-catalysed cyclopropanation of styrene with ethyl bromodiazoacetate is presented. The calculated structures and the energy profile of the reaction show a high level of similarity between Rh₂(esp)₂, a catalyst with sizeable, tethered ligands, and the simplified model catalyst Rh₂(O₂CH)₄.     

Kinetics of the reaction OH (v = 0) + O3 → HO2 + O2

The rate constant of the reaction OH (v = 0) + O₃

HO₂ + O₂ was measured over the temperature range from 220 to 450°K at total pressures between 2 and 5 torr using ultraviolet fluorescent scattering for the detection of OH radicals. An Arrhenius expression, k₁ = 1.3 × 10^?12 exp(?1900/RT) cm³/sec was obtained and the rate constant for the reaction HO₂ + O₃

OH + 2O₂ was inferred to be less than 0.1 k₁ over the entire temperature interval.     

Possible production of O2(1Δg) and O2(1Σ+g) in the reaction of NO with O3

High-resolution spectra of the NO₂ continuum emission produced from the reaction NO + O₃ → NO₂ + O₂ have been investigated to detect any possible emission from O₂(¹Δ_g) at 1270 nm or O₂(¹Σ⁺_g) at 762 nm. The photolysis of O₃/O₂ mixtures at 253.7 nm, which produces both states of O₂ with known quantum efficiency, has been used as an internal standard. From the results it is concluded that less than 1/300 and 1/200 of the NO + O₃ reactive collissions result in production of O₂(¹Δ_g) or O₂(¹Σ⁺_g), respectively, at room temperature.     

The effect of Li and La on NiO/Al2O3 catalyst for CH4/O2 to syngas reaction

The thermal stability and an 80 h life test over nickel-based catalysts for CH₄/O₂ to syngas reaction were investigated by flow-reactor, XPS, XRD and AAS analysis. The results indicate that the introduction of Li and La not only stabilized the support γ-Al₂O₃ phase, but also suppressed the sintering and loss of nickel, and in addition, enhanced the ability to suppress the carbon-deposition over NiO/Al₂O₃ during the high-temperature reaction.     

Conversion of NO in NO/N2, NO/O2/N2, NO/C2H4/N2 and NO/C2H4/O2/N2 Systems by Dielectric Barrier Discharge Plasmas

An experimental study on the conversion of NO in the NO/N₂, NO/O₂/N₂, NO/C₂H₄/N₂ and NO/C₂H₄/O₂/N₂ systems has been carried out using dielectric barrier discharge (DBD) plasmas at atmospheric pressure. In the NO/N₂ system, NO decomposition to N₂ and O₂ is the dominating reaction; NO conversion to NO₂ is less significant. O₂ produced from NO decomposition was detected by an on-line mass spectrometer. With the increase of NO initial concentration, the concentration of O₂ produced decreases at 298 K, but slightly increases at 523 K. In the NO/O₂/N₂ system, NO is mainly oxidized to NO₂, but NO conversion becomes very low at 523 K and over 1.6% of O₂. In the NO/C₂H₄/N₂ system, NO is reduced to N₂ with about the same NO conversion as that in the NO/N₂ system but without NO₂ formation. In the NO/C₂H₄/O₂/N₂ system, the oxidation of NO to NO₂ is dramatically promoted. At 523 K, with the increase of the energy density, NO conversion increases rapidly first, and then almost stabilizes at 93–91% of NO conversion with 61–55% of NO₂ selectivity in the energy density range of 317–550 J L⁻¹. It finally decreases gradually at high energy density. A negligible amount of N₂O is formed in the above four systems. Of the four systems studied, NO conversion and NO₂ selectivity of the NO/C₂H₄/O₂/N₂ system are the highest, and NO/O₂/C₂H₄/N₂ system has the lowest electrical energy consumption per NO molecule converted.     

Oxygen analysis of O2MF6 and O2M2F11 salts

The dioxygenyl salts O₂MF₆ or O₂M₂F₁₁ where M = As, Sb, Bi, Nb, Ta, Ru, Au, and Pt, were hydrolysed aqueous base (40% NaOH) to evaluate their purity and to gain further information about their thermal instability. Compounds containing As, Sb, Bi, Nb and Ta yielded 1.25 moles O₂ per mole of starting material whereas for compounds containing Ru, Au and Pt, 1.5 moles of O₂ per mole of salt was produced. The difference is a consequence of the greater oxidizing power of the RuF^-₆, AuF^-₆ and PtF^-₆ anions. All of the dioxygenyl salts are intrinsically unstable at room temperature in vacuum.     

Reaktionen von N4+-Clusterionen mit O2 und CH4

Ohne Zusammenfassung     

Vibrational emission of NO2 from the reaction of NO with O3

Vibrational chemiluminescence in the Δν₁ = Δν₃ = ?1 band of NO₂ is observed both in the O + NO and O₃ + NO reactions and shown to be emitted by molecules with up to 11 000 cm^?1 of vibrational energy. Quenching rate constants of NO₂³ are estimated ranging from about 6 × 10^?14 for Ar to about 3 × 10^?12 cm³ s^?1 for NO₂. The ratio of vibrational to electronic emission is 0.06 ± 0.03 for O + NO and 5.3 ± 1.0 for O₃ + NO. It is suggested that vibrationally excited NO₂ is a major product of that channel of the O₃ + NO reaction which forms ground-state NO₂(²A₁) directly.